公开(公告)号：US20160151801A1

公开(公告)日：2016-06-02

申请号：US14946875

申请日：2015-11-20

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Hiroyuki OGURA

IPC: B05C5/02 ,  B05B1/02 ,  B05D1/00 ,  B05C11/06

CPC classification number: B05C5/0254 ,  B05B1/044 ,  B05B13/0228 ,  B05B13/0421 ,  B05B13/0442 ,  B05C11/06 ,  B05D1/005 ,  B05D3/04 ,  G03F7/162 ,  H01L21/6715

Abstract: A slit opening of a slit nozzle extends unidirectionally in a longitudinal direction from near the center of a circular substrate to near an outer edge of the substrate, and has a length in the longitudinal direction equal to or smaller than a radius of the substrate. When the slit nozzle discharges chemical onto the substrate, a rotary holder rotates the substrate and the slit nozzle relatively to each other about the center of the substrate. Accordingly, the chemical from the slit nozzle all adheres to a surface of the substrate to form an excellent liquid column and a chemical film on an almost entire surface of the substrate along the outer edge of the circular substrate. This yields satisfactory coating of the substrate with the chemical while waste chemical is suppressed.

Abstract translation: 狭缝喷嘴的狭缝开口在从圆形基板的中心附近的纵向方向上单向延伸到基板的外边缘附近，并且其长度方向上的长度等于或小于基板的半径。 当狭缝喷嘴将化学品喷射到基板上时，旋转保持器围绕基板的中心相对于基板旋转基板和狭缝喷嘴。 因此，来自狭缝喷嘴的化学物质全部附着于基板的表面，以在圆筒状基板的外缘部的基板整体的表面形成优异的液柱和化学膜。 这产生了令人满意的用化学品涂覆的基材，而废化学品被抑制。

公开(公告)号：US09217193B2

公开(公告)日：2015-12-22

申请号：US13519221

申请日：2010-12-22

Applicant: Takashi Tomikawa ,  Shinichiro Sakamoto ,  Katsumi Yamamoto

Inventor： Takashi Tomikawa ,  Shinichiro Sakamoto ,  Katsumi Yamamoto

IPC: F16C33/12 ,  C22F1/047 ,  B05D3/00 ,  C22C21/06 ,  B32B15/04 ,  C23C28/00 ,  C22C21/08 ,  B32B15/08 ,  B32B15/088 ,  B32B15/18 ,  B32B15/20 ,  B05D3/04 ,  B05D3/02 ,  F16C33/14 ,  F16C33/10

CPC classification number: C22C21/06 ,  B05D3/0254 ,  B05D3/04 ,  B32B15/04 ,  B32B15/08 ,  B32B15/088 ,  B32B15/18 ,  B32B15/20 ,  C22C21/08 ,  C22F1/047 ,  C23C28/30 ,  C23C28/322 ,  C23C28/324 ,  C23C28/34 ,  F16C33/1095 ,  F16C33/121 ,  F16C33/14 ,  F16C2204/20 ,  Y10T428/12569 ,  Y10T428/12736 ,  Y10T428/12757

Abstract: With regard to an Al—Cr—Zr based alloy having annealing temper, a high temperature strength at 180 to 200 degrees C. is ensured. An aluminum alloy for a plain bearing having improved fatigue resistance is to be provided. An aluminum alloy for a plain bearing solving the problems has a composition of 3 to 7 mass % Mg, 0.1 to 0.3 mass % Cr, and 0.1 to 0.3 mass % Zr, with the balance being Al and inevitable impurities. A principal structure of the aluminum alloy consist of an Al matrix containing solute Mg, minute particles of Cr, and Zr.

Abstract translation: 关于具有退火回火的Al-Cr-Zr系合金，确保了180〜200℃的高温强度。 提供一种用于具有改善的耐疲劳性的滑动轴承的铝合金。 解决问题的滑动轴承用铝合金具有3〜7质量％的Mg，0.1〜0.3质量％的Cr和0.1〜0.3质量％的Zr，余量为Al和不可避免的杂质。 铝合金的主要结构由含有溶质Mg的Al基体，Cr和Zr的微小颗粒组成。

公开(公告)号：US09134268B2

公开(公告)日：2015-09-15

申请号：US14127033

申请日：2012-06-13

Applicant: Masashi Kawai

Inventor： Masashi Kawai

IPC: B05D5/12 ,  G01N27/407 ,  C23C16/56 ,  B05D3/04 ,  C23C14/58

CPC classification number: G01N27/407 ,  B05D3/04 ,  C23C14/58 ,  C23C14/5853 ,  C23C16/56 ,  G01N27/4075

Abstract: A manufacturing method for an oxygen sensor that includes an oxygen sensor element includes: coating both surfaces of a solid electrolyte element of the oxygen sensor element with Pt films as a pair of electrodes; and heating at least one of the coated Pt films, coated on a side exposed to measured gas, in a gas atmosphere having a higher oxygen gas concentration than atmospheric gas to align a crystal orientation of the at least one of the Pt films with a (001) plane.

Abstract translation: 包括氧传感器元件的氧传感器的制造方法包括：用Pt膜作为一对电极涂覆氧传感器元件的固体电解质元件的两个表面; 并且在具有比大气气体高的氧气浓度的气体气氛中加热涂覆在暴露于测量气体的一侧的涂覆的Pt膜中的至少一种，以使至少一个Pt膜的晶体取向与（ 001）飞机。

公开(公告)号：US20140349139A1

公开(公告)日：2014-11-27

申请号：US14448135

申请日：2014-07-31

Applicant: MITSUBISHI MATERIALS CORPORATION

Inventor： Jun Fujii ,  Hideaki Sakurai ,  Takashi Noguchi ,  Nobuyuki Soyama

IPC: H01L41/187 ,  B05D3/04 ,  C23C30/00

CPC classification number: H01L41/1876 ,  B05D3/02 ,  B05D3/0209 ,  B05D3/04 ,  B05D3/0406 ,  B05D3/0413 ,  B05D3/0453 ,  B05D3/0473 ,  C01G25/006 ,  C01P2002/50 ,  C01P2006/40 ,  C04B24/40 ,  C04B24/42 ,  C04B35/491 ,  C04B35/493 ,  C04B35/624 ,  C04B35/632 ,  C04B35/6325 ,  C04B2111/92 ,  C04B2235/3224 ,  C04B2235/3225 ,  C04B2235/3227 ,  C04B2235/3229 ,  C04B2235/3232 ,  C04B2235/3293 ,  C04B2235/3298 ,  C04B2235/3418 ,  C04B2235/44 ,  C04B2235/441 ,  C04B2235/443 ,  C04B2235/447 ,  C04B2235/449 ,  C04B2235/6585 ,  C23C18/1204 ,  C23C18/1225 ,  C23C18/1279 ,  C23C30/00 ,  H01B3/14 ,  H01G4/1245 ,  H01G4/206 ,  H01L21/02197 ,  H01L21/02282 ,  H01L21/31691 ,  H01L27/108 ,  H01L27/11502 ,  H01L28/55 ,  H01L41/18 ,  H01L41/1875 ,  H01L41/318

Abstract: Disclosed is a composition for ferroelectric thin film formation which is used in the formation of a ferroelectric thin film of one material selected from the group consisting of PLZT, PZT, and PT. The composition for ferroelectric thin film formation is a liquid composition for the formation of a thin film of a mixed composite metal oxide formed of a mixture of a composite metal oxide (A) represented by general formula (1): (PbxLay)(ZrzTi(1-z))O3 [wherein 0.9

Abstract translation: 公开了用于形成选自PLZT，PZT和PT的一种材料的铁电薄膜的铁电薄膜形成用组合物。 铁电薄膜形成用组合物是由通式（1）表示的复合金属氧化物（A）：（PbxLay）（ZrzTi（Zr x Ti y））的混合物形成的混合复合金属氧化物的薄膜的液体组合物， 1）表示的复合氧化物（B）或羧酸（B），通式（2）表示的化合物（其中0.9

公开(公告)号：US20130337152A1

公开(公告)日：2013-12-19

申请号：US13915487

申请日：2013-06-11

Applicant: The Regents of the University of California

Inventor： Yat Li ,  Gongming Wang

IPC: H01M14/00

CPC classification number: H01M14/005 ,  B05D3/0209 ,  B05D3/04 ,  B05D5/12 ,  B05D2202/30 ,  C25B1/003 ,  H01L21/324 ,  H01L31/0224 ,  Y02E60/368 ,  Y02P20/135

Abstract: A method of electrode hydrogenation for photoelectrochemical (PEC) water oxidation is provided that includes annealing a PEC electrode in air, and annealing the PEC electrode in hydrogen to form a hydrogenated-PEC electrode, where PEC performance is improved by enhancing charge transfer and transport in the hydrogenated-PEC electrode.

Abstract translation: 提供了一种用于光电化学（PEC）水氧化的电极氢化方法，其包括在空气中退火PEC电极，并且在氢气中退火PEC电极以形成氢化PEC电极，其中通过增强电荷转移和运输来改善PEC性能 氢化-PEC电极。

公开(公告)号：US20130284245A1

公开(公告)日：2013-10-31

申请号：US13928197

申请日：2013-06-26

Applicant: LG CHEM, LTD.

Inventor： Hyun Cheol KIM ,  Yoon Kyung Kwon

IPC: H01L31/048

CPC classification number: H01L31/04 ,  B05D3/002 ,  B05D3/02 ,  B05D3/04 ,  B05D3/08 ,  B05D3/101 ,  B05D3/144 ,  B32B18/00 ,  B32B27/06 ,  B32B27/18 ,  B32B27/304 ,  B32B27/308 ,  B32B27/322 ,  B32B27/34 ,  B32B27/36 ,  B32B27/40 ,  B32B2255/10 ,  B32B2255/26 ,  B32B2255/28 ,  B32B2327/12 ,  B32B2327/18 ,  B32B2333/04 ,  B32B2333/08 ,  B32B2333/12 ,  B32B2367/00 ,  B32B2377/00 ,  B32B2457/12 ,  C08F14/18 ,  C08F14/22 ,  C08F34/02 ,  C08J5/18 ,  C08J7/04 ,  C08J7/045 ,  C08J7/047 ,  C08J2367/02 ,  C08J2427/12 ,  C08K3/01 ,  C08K3/013 ,  C08K3/014 ,  C08K5/0008 ,  C08K5/005 ,  C08L23/04 ,  C08L27/04 ,  C08L27/14 ,  C08L27/16 ,  C08L27/18 ,  C08L27/20 ,  C08L33/06 ,  C08L33/062 ,  C08L33/08 ,  C08L33/10 ,  C08L33/12 ,  C08L39/04 ,  C09D127/04 ,  C09D127/12 ,  C09D127/14 ,  C09D127/16 ,  C09D127/18 ,  C09D127/20 ,  C09D133/00 ,  C09D133/06 ,  C09D133/062 ,  C09D133/08 ,  C09D133/10 ,  C09D133/12 ,  C09D139/00 ,  H01L31/049 ,  H01L31/18 ,  H01L31/186 ,  Y02E10/50 ,  Y10T428/264 ,  Y10T428/266 ,  Y10T428/3154 ,  Y10T428/31544 ,  Y10T428/3158 ,  Y10T428/3175 ,  Y10T428/31797 ,  Y10T428/31935

Abstract: A multi-layered film, a backsheet for photovoltaic modules, a method of manufacturing the same, and a photovoltaic module are provided. The multi-layered film can be configured so that a resin layer including a fluorine-based polymer and an oxazoline group-containing polymer is formed on a substrate. As a result, the resin layer including the fluorine-based polymer can have excellent durability and weather resistance, and show high interfacial adhesive strength to the substrate. During the preparation of the multi-layered film, a drying process can also be performed at a relatively low temperature, so that the manufacturing costs can be reduced and the quality of the product can be prevented from being deteriorated by thermal deformation or thermal shock. The multi-layered film may be effectively used as the backsheet in a variety of photovoltaic modules.

公开(公告)号：US20130224396A1

公开(公告)日：2013-08-29

申请号：US13883042

申请日：2011-10-31

Applicant: Hitoshi Furusho

Inventor： Hitoshi Furusho

IPC: B05D3/04

CPC classification number: B05D3/04 ,  H01L21/02532 ,  H01L21/02689 ,  H01L21/326

Abstract: There is provided a plasma annealing device that can change the crystal structure of a film by processing the film (coating) on a substrate and that has excellent productivity. A method for producing a film includes step (A) irradiating a film on a substrate with atmospheric pressure plasma, wherein the crystal structure of a constituent of the film is changed. The step (A) may include generating plasma under atmospheric pressure by energization at a frequency of 10 hertz to 100 megahertz and a voltage of 60 volts to 1,000,000 volts, and directly irradiating the film on the substrate with the generated plasma. A method for changing a crystal structure of a constituent of a film includes step (A). A plasma generation device used in step (A). An electronic device produced through step (A).

Abstract translation: 提供了一种等离子体退火装置，其可以通过在基板上加工膜（涂层）并且具有优异的生产率来改变膜的晶体结构。 膜的制造方法包括使大气压等离子体在基板上照射膜的工序（A），其中，膜的成分的晶体结构发生变化。 步骤（A）可以包括在大气压下通过以10赫兹至100兆赫兹的频率通电并且产生60伏至1,000,000伏特的电压来产生等离子体，并且用所产生的等离子体直接照射该基片上的该膜。 改变膜的成分的晶体结构的方法包括步骤（A）。 在步骤（A）中使用的等离子体产生装置。 一种通过步骤（A）生产的电子装置。

公开(公告)号：US08104497B2

公开(公告)日：2012-01-31

申请号：US11685654

申请日：2007-03-13

Applicant: Marc Unger ,  Hou-Pu Chou ,  Todd Thorsen ,  Axel Scherer ,  Stephen Quake ,  Markus Enzelberger ,  Mark Adams ,  Carl Hansen

Inventor： Marc Unger ,  Hou-Pu Chou ,  Todd Thorsen ,  Axel Scherer ,  Stephen Quake ,  Markus Enzelberger ,  Mark Adams ,  Carl Hansen

IPC: B08B3/04

CPC classification number: B05D3/04 ,  B01J2219/00355 ,  B01J2219/00378 ,  B01J2219/00396 ,  B01J2219/00398 ,  B01J2219/00439 ,  B01J2219/005 ,  B01J2219/00527 ,  B01J2219/00605 ,  B01J2219/00612 ,  B01J2219/00621 ,  B01J2219/00659 ,  B01J2219/00707 ,  B01J2219/00722 ,  B01J2219/00725 ,  B01L3/502707 ,  B01L3/50273 ,  B01L3/502738 ,  B01L7/54 ,  B01L9/527 ,  B01L2200/025 ,  B01L2200/027 ,  B01L2200/0605 ,  B01L2200/10 ,  B01L2300/0681 ,  B01L2300/0861 ,  B01L2300/0887 ,  B01L2300/123 ,  B01L2300/14 ,  B01L2300/18 ,  B01L2400/046 ,  B01L2400/0481 ,  B01L2400/06 ,  B01L2400/0655 ,  B01L2400/0688 ,  B32B2037/1081 ,  B65B31/00 ,  B81B2201/036 ,  B81B2201/054 ,  B81C1/00119 ,  B81C2201/019 ,  C12Q1/6832 ,  C12Q1/6874 ,  C30B29/54 ,  F04B43/043 ,  F15C1/06 ,  F15C3/00 ,  F15C5/00 ,  F16K99/0001 ,  F16K99/0015 ,  F16K99/0046 ,  F16K99/0051 ,  F16K99/0059 ,  F16K2099/0074 ,  F16K2099/0076 ,  F16K2099/0078 ,  F16K2099/008 ,  F16K2099/0084 ,  F16K2099/0094 ,  Y10T137/0324 ,  Y10T137/0379 ,  Y10T137/0424 ,  Y10T137/206 ,  Y10T137/2082 ,  Y10T137/2164 ,  Y10T137/2169 ,  Y10T137/2174 ,  Y10T137/2202 ,  Y10T137/2224 ,  Y10T137/3084 ,  Y10T137/7837 ,  Y10T137/86027 ,  Y10T156/10 ,  Y10T428/24479 ,  Y10T428/24612 ,  C12Q2535/125

Abstract: A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer; bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.

公开(公告)号：US20110206839A1

公开(公告)日：2011-08-25

申请号：US12746044

申请日：2009-01-05

Applicant: Vladimir Bulovic ,  Murali Chaparala ,  Jianglong Chen ,  Eric Wing -Jing Lam ,  Valerie Leblanc ,  Martin A. Schmidt

Inventor： Vladimir Bulovic ,  Murali Chaparala ,  Jianglong Chen ,  Eric Wing -Jing Lam ,  Valerie Leblanc ,  Martin A. Schmidt

IPC: B05D5/06 ,  B05C11/00

CPC classification number: G02B6/138 ,  B05D3/04 ,  B05D3/0453 ,  B05D3/107 ,  G02B2006/12071 ,  G03F7/168

Abstract: The disclosure relates to providing printed structures of polymer that have substantially flat printed surfaces. In one embodiment, the disclosure relates to a post-printing treatment apparatus for receiving a substrate supporting a polymer printing thereon. The polymer can be PMMA or other suitable polymer. In a related embodiment, the polymer defines a thermoplastic polymer having a glass transition temperature. The apparatus can comprise of a chamber, and input manifold, an exhaust manifold, a solvent reservoir and a gas reservoir. The solvent reservoir provides one or more solvent systems adapted to chemically bind, and potentially react, with the polymer. The gas reservoir provides one or more gases for drying the substrate and printed polymer after the solvent treatment step. In one application, a substrate having printed surface thereon is placed in the chamber and exposed to the solvent system for sufficient period of time to provide substantially flat print surfaces.

Abstract translation: 本公开涉及提供具有基本平坦的印刷表面的聚合物的印刷结构。 在一个实施例中，本公开涉及一种用于接收支撑其上的聚合物印刷的基板的后印刷处理设备。 聚合物可以是PMMA或其它合适的聚合物。 在相关实施方案中，聚合物限定了具有玻璃化转变温度的热塑性聚合物。 该装置可以包括腔室，输入歧管，排气歧管，溶剂储存器和气体储存器。 溶剂储存器提供一种或多种溶剂体系，其适于与聚合物化学结合并潜在地与聚合物反应。 在溶剂处理步骤之后，气体储存器提供用于干燥基底和印刷聚合物的一种或多种气体。 在一个应用中，其上具有印刷表面的基板放置在室中并暴露于溶剂系统足够的时间以提供基本平坦的印刷表面。

公开(公告)号：US07766055B2

公开(公告)日：2010-08-03

申请号：US11932107

申请日：2007-10-31

Applicant: Marc A. Unger ,  Hou-Pu Chou ,  Todd A. Thorsen ,  Axel Scherer ,  Stephen R. Quake ,  Markus M. Enzelberger ,  Mark L. Adams ,  Carl L. Hansen

Inventor： Marc A. Unger ,  Hou-Pu Chou ,  Todd A. Thorsen ,  Axel Scherer ,  Stephen R. Quake ,  Markus M. Enzelberger ,  Mark L. Adams ,  Carl L. Hansen

IPC: B65B31/00

CPC classification number: B05D3/04 ,  B01J2219/00355 ,  B01J2219/00378 ,  B01J2219/00396 ,  B01J2219/00398 ,  B01J2219/00439 ,  B01J2219/005 ,  B01J2219/00527 ,  B01J2219/00605 ,  B01J2219/00612 ,  B01J2219/00621 ,  B01J2219/00659 ,  B01J2219/00707 ,  B01J2219/00722 ,  B01J2219/00725 ,  B01L3/502707 ,  B01L3/50273 ,  B01L3/502738 ,  B01L7/54 ,  B01L9/527 ,  B01L2200/025 ,  B01L2200/027 ,  B01L2200/0605 ,  B01L2200/10 ,  B01L2300/0681 ,  B01L2300/0861 ,  B01L2300/0887 ,  B01L2300/123 ,  B01L2300/14 ,  B01L2300/18 ,  B01L2400/046 ,  B01L2400/0481 ,  B01L2400/06 ,  B01L2400/0655 ,  B01L2400/0688 ,  B32B2037/1081 ,  B65B31/00 ,  B81B2201/036 ,  B81B2201/054 ,  B81C1/00119 ,  B81C2201/019 ,  C12Q1/6832 ,  C12Q1/6874 ,  C30B29/54 ,  F04B43/043 ,  F15C1/06 ,  F15C3/00 ,  F15C5/00 ,  F16K99/0001 ,  F16K99/0015 ,  F16K99/0046 ,  F16K99/0051 ,  F16K99/0059 ,  F16K2099/0074 ,  F16K2099/0076 ,  F16K2099/0078 ,  F16K2099/008 ,  F16K2099/0084 ,  F16K2099/0094 ,  Y10T137/0324 ,  Y10T137/0379 ,  Y10T137/0424 ,  Y10T137/206 ,  Y10T137/2082 ,  Y10T137/2164 ,  Y10T137/2169 ,  Y10T137/2174 ,  Y10T137/2202 ,  Y10T137/2224 ,  Y10T137/3084 ,  Y10T137/7837 ,  Y10T137/86027 ,  Y10T156/10 ,  Y10T428/24479 ,  Y10T428/24612 ,  C12Q2535/125

Abstract: A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer; bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.