公开(公告)号：US09539788B2

公开(公告)日：2017-01-10

申请号：US14092551

申请日：2013-11-27

Applicant: Wisconsin Alumni Research Foundation

Inventor： Paul Franklin Nealey ,  Mark Petar Stoykovich ,  Konstantinos C. Daoulas ,  Marcus Muller ,  Juan J. De Pablo ,  SangMin Park

IPC: B05D3/06 ,  B32B3/30 ,  B01D69/10 ,  B01D71/80 ,  B81C1/00 ,  B82Y30/00 ,  G03F7/20 ,  B05D5/00 ,  B01D71/40

CPC classification number: B32B17/10 ,  B01D69/10 ,  B01D71/40 ,  B01D71/80 ,  B01D2323/225 ,  B05D5/00 ,  B32B3/00 ,  B32B3/30 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  G03F7/70408 ,  Y10T428/24322 ,  Y10T428/24331 ,  Y10T428/24612 ,  Y10T428/24802 ,  Y10T428/269

Abstract: Methods of fabricating complex three-dimensional structures on patterned substrates and related compositions are provided. The methods involve depositing on the substrate a block copolymer material that is “mismatched” to the substrate pattern, and then ordering the material to form a complex three-dimensional structure. According to various embodiments, the copolymer material mismatches the substrate pattern in that the symmetry and/or length scale of its bulk morphology differs from that of the pattern. When ordered, a balance between the physics that determines the bulk block copolymer morphology and the physics that determines the substrate surface interfacial interactions results in a thermodynamically stable complex three-dimensional film that varies in a direction perpendicular to the substrate and has a morphology that differs from its bulk morphology.

Abstract translation: 提供了在图案化基底和相关组合物上制备复杂三维结构的方法。 所述方法包括在衬底上沉积与衬底图案“失配”的嵌段共聚物材料，然后排序材料以形成复杂的三维结构。 根据各种实施方案，共聚物材料使衬底图案失配，因为其体形态的对称性和/或长度尺度与图案的对称性和/或长度尺度不同。 当订购时，确定体积嵌段共聚物形态的物理学和确定衬底表面界面相互作用的物理学之间的平衡导致热力学稳定的复合三维膜在垂直于衬底的方向上变化并且具有不同的形态 从其大量形态。

公开(公告)号：US20160304654A1

公开(公告)日：2016-10-20

申请号：US15101915

申请日：2014-12-08

Applicant: LG CHEM, LTD.

Inventor： Je Gwon Lee ,  Jung Keun Kim ,  No Jin Park ,  Sung Soo Yoon

IPC: C08F293/00 ,  G03F7/00

CPC classification number: C08F293/005 ,  B81C1/00428 ,  B81C1/00531 ,  B81C2201/0149 ,  B82Y40/00 ,  C07C35/48 ,  C07C43/215 ,  C07C43/225 ,  C07C217/84 ,  C07C2601/16 ,  C07D209/48 ,  C07F7/1804 ,  C08F12/20 ,  C08F12/22 ,  C08F12/26 ,  C08F12/32 ,  C08F212/14 ,  C08F220/10 ,  C08F220/30 ,  C08F2438/03 ,  C08J5/18 ,  C08J7/123 ,  C08J7/14 ,  C08J2353/00 ,  C09D153/00 ,  G03F7/0002 ,  G03F7/038 ,  G03F7/039 ,  G03F7/162

Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.

公开(公告)号：US09442371B2

公开(公告)日：2016-09-13

申请号：US14603106

申请日：2015-01-22

Applicant: Tokyo Ohka Kogyo Co., Ltd.

Inventor： Takehiro Seshimo ,  Takaya Maehashi ,  Takahiro Dazai ,  Yoshiyuki Utsumi ,  Tasuku Matsumiya ,  Ken Miyagi ,  Daiju Shiono ,  Tsuyoshi Kurosawa

IPC: G03F7/004 ,  G03F7/00 ,  G03F7/11 ,  G03F7/20 ,  G03F7/16 ,  G03F7/36 ,  G03F7/38 ,  C09D153/00 ,  C09D183/10 ,  B82Y40/00 ,  B81C1/00 ,  C08G18/61 ,  G03F7/075

CPC classification number: G03F7/0002 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y40/00 ,  C08G18/61 ,  C09D153/00 ,  C09D183/10 ,  G03F7/0752 ,  G03F7/11 ,  G03F7/168 ,  G03F7/20 ,  G03F7/36 ,  G03F7/38

Abstract: A method of producing a structure containing a phase-separated structure, including a step in which a layer including an Si-containing block copolymer having a plurality of blocks bonded is formed between guide patterns on a substrate; a step in which a solution of a top coat material is applied to the layer and the guide patterns so as to form a top coat film; and a step in which the layer including the Si-containing block copolymer and having the top coat film formed thereon is subjected to annealing treatment so as to conduct a phase separation of the layer; in which a solvent of the solution of the top coat material contains no basic substance.

Abstract translation: 一种制备包含相分离结构的结构的方法，包括在衬底上的引导图案之间形成包含具有多个块结合的含Si嵌段共聚物的层的步骤; 将面涂层材料的溶液施加到层和引导图案以形成面漆的步骤; 对包含含有嵌段共聚物的层并且在其上形成有顶涂层的层进行退火处理以进行层的相分离的步骤; 其中顶涂层材料溶液的溶剂不含碱性物质。

公开(公告)号：US09418888B2

公开(公告)日：2016-08-16

申请号：US14778562

申请日：2013-06-27

Applicant: Intel Corporation

Inventor： Robert L. Bristol ,  Rami Hourani ,  Eungnak Han ,  James M. Blackwell

IPC: H01L21/31 ,  H01L21/469 ,  H01L21/768 ,  H01L21/02 ,  H01L21/311 ,  H01L23/528 ,  H01L23/532

CPC classification number: H01L21/76897 ,  B81C1/00031 ,  B81C2201/0149 ,  H01L21/02118 ,  H01L21/0271 ,  H01L21/31051 ,  H01L21/31127 ,  H01L21/76822 ,  H01L21/76834 ,  H01L23/528 ,  H01L23/5328 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method of an aspect includes forming a directed self assembly alignment promotion layer over a surface of a substrate having a first patterned region and a second patterned region. A first directed self assembly alignment promotion material is formed selectively over the first patterned region without using lithographic patterning. The method also includes forming an assembled layer over the directed self assembly alignment promotion layer by directed self assembly. A plurality of assembled structures are formed that each include predominantly a first type of polymer over the first directed self assembly alignment promotion material. The assembled structures are each adjacently surrounded by predominantly a second different type of polymer over the second patterned region. The first directed self assembly alignment promotion material has a greater chemical affinity for the first type of polymer than for the second different type of polymer.

Abstract translation: 一个方面的方法包括在具有第一图案化区域和第二图案化区域的基底的表面上形成定向自组装对准促进层。 选择性地在第一图案化区域上形成第一定向自组装对准促进材料，而不使用平版印刷图案。 该方法还包括通过定向自组装在定向自组装对准促进层上形成组装层。 形成多个组装结构，每个组合结构主要包括第一类型的自组装排列促进材料上的第一类聚合物。 组装的结构在第二图案化区域上主要围绕第二种不同类型的聚合物。 第一定向自组装校准促进材料对于第一类聚合物具有比对于第二种不同类型的聚合物更大的化学亲和力。

公开(公告)号：US09382444B2

公开(公告)日：2016-07-05

申请号：US14297095

申请日：2014-06-05

Applicant: Dow Global Technologies LLC ,  ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Peter Trefonas, III ,  Phillip D. Hustad ,  Deyan Wang ,  Rahul Sharma ,  Mingqi Li ,  Jieqian J. Zhang

IPC: C08L53/00 ,  C09D153/00 ,  C08F293/00 ,  B81C1/00 ,  G03F7/00 ,  C08L83/10 ,  C08G77/442

CPC classification number: C09D153/00 ,  B81C1/00031 ,  B81C2201/0149 ,  C08F293/005 ,  C08F2438/03 ,  C08G77/442 ,  C08L53/00 ,  C08L83/10 ,  G03F7/0002 ,  C08L33/12

Abstract: Disclosed herein is a block copolymer comprising a first segment and a second segment that are covalently bonded to each other and that are chemically different from each other; where the first segment has a first surface free energy and where the second segment has a second surface free energy; and an additive copolymer; where the additive copolymer comprises a surface free energy reducing moiety where the surface free energy reducing moiety has a lower surface free energy than that of the first segment and the second segment; the additive copolymer further comprising one or more moieties having an affinity to the block copolymer; where the surface free energy reducing moiety is chemically different from the first segment and from the second segment; where the additive copolymer is not water miscible; and where the additive copolymer is not covalently bonded with the block copolymer.

Abstract translation: 本文公开了一种嵌段共聚物，其包含彼此共价键合并且在化学上彼此不同的第一链段和第二链段; 其中所述第一段具有第一表面自由能，并且其中所述第二段具有第二表面自由能; 和添加剂共聚物; 其中所述添加剂共聚物包含表面自由能减少部分，其中所述表面自由能减少部分具有比所述第一部分和所述第二部分更低的表面自由能; 所述添加剂共聚物还包含对所述嵌段共聚物具有亲和性的一个或多个部分; 其中表面自由能减少部分在化学上不同于第一段和第二段; 其中所述添加剂共聚物不是水混溶的; 并且其中所述添加剂共聚物不与嵌段共聚物共价键合。

公开(公告)号：US09372398B2

公开(公告)日：2016-06-21

申请号：US13543667

申请日：2012-07-06

Applicant: Paul Franklin Nealey ,  Shengxiang Ji

Inventor： Paul Franklin Nealey ,  Shengxiang Ji

IPC: B32B27/28 ,  B32B33/00 ,  B05D3/10 ,  G03F7/00 ,  B81C1/00

CPC classification number: G03F7/0002 ,  B81C1/00031 ,  B81C2201/0149 ,  Y10T428/24851

Abstract: Provided herein are block copolymer thin film structures and methods of fabrication. The methods involve directing the assembly of ABA triblock copolymers such that desired features are formed by domains of the assembled ABA triblock copolymer. In some embodiments, an ABA triblock copolymer is directed to assemble by a chemical pattern. Chemical patterns with periods much different than the natural period of the ABA triblock copolymer may be used to direct assembly of the ABA triblock copolymer.

Abstract translation: 本文提供了嵌段共聚物薄膜结构和制造方法。 所述方法包括引导ABA三嵌段共聚物的组合，使得所需特征由组装的ABA三嵌段共聚物的结构域形成。 在一些实施方案中，ABA三嵌段共聚物被引导通过化学图案组装。 可以使用与ABA三嵌段共聚物的自然周期大不相同的时期的化学图案来引导ABA三嵌段共聚物的组装。

公开(公告)号：US20160172237A1

公开(公告)日：2016-06-16

申请号：US14778562

申请日：2013-06-27

Applicant: Robert L. Bristol ,  Rami HOURANI ,  Eungnak HAN ,  James M. BLACKWELL

Inventor： Robert L. Bristol ,  Rami HOURANI ,  Eungnak HAN ,  James M. BLACKWELL

IPC: H01L21/768 ,  H01L23/532 ,  H01L23/528 ,  H01L21/02 ,  H01L21/311

CPC classification number: H01L21/76897 ,  B81C1/00031 ,  B81C2201/0149 ,  H01L21/02118 ,  H01L21/0271 ,  H01L21/31051 ,  H01L21/31127 ,  H01L21/76822 ,  H01L21/76834 ,  H01L23/528 ,  H01L23/5328 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method of an aspect includes forming a directed self assembly alignment promotion layer over a surface of a substrate having a first patterned region and a second patterned region. A first directed self assembly alignment promotion material is formed selectively over the first patterned region without using lithographic patterning. The method also includes forming an assembled layer over the directed self assembly alignment promotion layer by directed self assembly. A plurality of assembled structures are formed that each include predominantly a first type of polymer over the first directed self assembly alignment promotion material. The assembled structures are each adjacently surrounded by predominantly a second different type of polymer over the second patterned region. The first directed self assembly alignment promotion material has a greater chemical affinity for the first type of polymer than for the second different type of polymer.

公开(公告)号：US20160161647A1

公开(公告)日：2016-06-09

申请号：US15041764

申请日：2016-02-11

Applicant: JX NIPPON OIL & ENERGY CORPORATION ,  TOKYO INSTITUTE OF TECHNOLOGY

Inventor： Satoshi MASUYAMA ,  Madoka TAKAHASHI ,  Suzushi NISHIMURA ,  Maki FUKUDA ,  Takashi SEKI

IPC: G02B5/18 ,  B29C43/36 ,  B29C35/08 ,  H01L51/56 ,  C25D1/10 ,  G02B27/42 ,  H01L51/52 ,  B29C43/02 ,  B29D11/00

CPC classification number: G02B5/1852 ,  B29C33/3857 ,  B29C33/424 ,  B29C35/0805 ,  B29C43/021 ,  B29C43/36 ,  B29C2035/0827 ,  B29C2043/023 ,  B29D11/00769 ,  B29K2105/0061 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y20/00 ,  B82Y30/00 ,  B82Y40/00 ,  C25D1/10 ,  G02B5/1809 ,  G02B5/1847 ,  G02B27/4266 ,  G03F7/0002 ,  H01L51/52 ,  H01L51/5275 ,  H01L51/56

Abstract: A method for producing a mold includes: applying a block copolymer solution made of first and second polymers on a base member; performing a first annealing process at a temperature higher than Tg of the block copolymer after drying the coating film; forming a concavity and convexity structure on the base member by removing the second polymer by an etching process; performing a second annealing process of the concavity and convexity structure at a temperature higher than Tg of the first polymer; forming a seed layer on the structure; laminating or stacking a metal layer on the seed layer by an electroforming; and peeling off the metal layer from the base member. The second annealing process enables satisfactory transfer of a concavity and convexity structure on the base member onto the metal layer.

公开(公告)号：US20160122580A1

公开(公告)日：2016-05-05

申请号：US14527962

申请日：2014-10-30

Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.

Inventor： SungEun HONG ,  Naoki MATSUMOTO ,  Yasushi AKIYAMA ,  Kazunori KUROSAWA ,  Shinji MIYAZAKI ,  Guanyang LIN

IPC: C09D153/00 ,  H01J37/32

CPC classification number: C09D153/00 ,  B81C1/00031 ,  B81C1/00396 ,  B81C2201/0149 ,  H01J37/32009 ,  H01L21/3081

Abstract: The present invention relates to a two novel processes, “Dual Coating Process and Single Coating Process,” for forming an array of via's by employing a graphoepitaxy approach, where an array of pillars the surface of the pillars has been modified by the formation of a hydrophobic poly(vinyl aryl) brush at the surface of the pillars. The present invention also relates to a composition comprising a poly(vinyl aryl) hydrophopic polymer brush precursor terminated at one chain end with a reactive functional group, a diblock copolymer comprising an etch resistant hydrophobic block and a highly etchable hydrophilic block, a thermal acid generator and a solvent.

Abstract translation: 本发明涉及两种新型工艺：“双重涂布工艺和单一涂覆工艺”，用于通过采用石墨刻蚀方法形成通孔阵列，其中支柱的表面阵列已经通过形成 疏水性聚（乙烯基芳基）刷在柱的表面。 本发明还涉及一种组合物，其包含在一个末端用反应性官能团封端的聚（乙烯基芳基）水薰衣草聚合物刷子前体，包含耐蚀刻疏水嵌段的二嵌段共聚物和高度可蚀刻的亲水性嵌段，热酸产生剂 和溶剂。

公开(公告)号：US09314819B2

公开(公告)日：2016-04-19

申请号：US13922011

申请日：2013-06-19

Applicant: Board of Regents, The University of Texas System

Inventor： Carlton Grant Willson ,  Christopher John Ellison ,  Takehiro Seshimo ,  Julia Cushen ,  Christopher M Bates ,  Leon Dean ,  Logan J Santos ,  Erica L Rausch ,  Michael Maher

IPC: B05D7/26 ,  C09D137/00 ,  B05D7/00 ,  B05D1/00 ,  B05D5/00 ,  B81C1/00 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: B05D7/56 ,  B05D1/005 ,  B05D5/00 ,  B05D7/52 ,  B05D2252/02 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y40/00 ,  C09D137/00 ,  G03F7/0002

Abstract: The use of self-assembled block copolymer structures to produce advanced lithographic patterns relies on control of the orientation of these structures in thin films. In particular, orientation of cylinders and lamellae perpendicular to the plane of the block copolymer film is required for most applications. The preferred method to achieve orientation is by heating. The present invention involves the use of polarity-switching top coats to control block copolymer thin film orientation by heating. The top coats can be spin coated onto block copolymer thin films from polar casting solvents and they change composition upon thermal annealing to become “neutral”. Top coats allow for the facile orientation control of block copolymers which would otherwise not be possible by heating alone.

Abstract translation: 使用自组装嵌段共聚物结构产生先进的光刻图案依赖于这些结构在薄膜中的取向的控制。 特别地，对于大多数应用，需要垂直于嵌段共聚物膜的平面的圆柱体和薄片的取向。 实现取向的优选方法是通过加热。 本发明涉及使用极性转换顶涂层通过加热控制嵌段共聚物薄膜取向。 顶涂层可以从极性浇铸溶剂中旋涂到嵌段共聚物薄膜上，并且它们在热退火时改变组成以变成“中性”。 顶涂层允许嵌段共聚物的容易取向控制，否则通过单独加热将不可能。