Abstract:
Disclosed is a method of manufacturing an optical fiber perform using MCVD including dehydration and dechlorination, which executes the following process repeatedly with changing the composition of soot generation gas according to the refractive index profile, the process including the steps of: forming a soot layer having pores on an inner wall of a deposition tube at a temperature lower than the soot sintering temperature with putting soot generation gas and oxygen gas into the rotating deposition tube; removing hydroxyl groups with keeping the pores by putting dehydration gas into the deposition tube; removing chlorine impurities existing in the soot layer with keeping the pores by putting dehydration gas into the deposition tube; and sintering the soot layer by heating the deposition tube at a temperature over the soot sintering temperature.
Abstract:
The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction. The quartz glass blank according to the invention is characterized by the following properties: a glass structure essentially free of oxygen defect sites, an H2-content in the range of 0.1×1016 molecules/cm3 to 4.0×1016 molecules/cm3, an OH-content in the range of 125 wt-ppm to 450 wt-ppm, an SiH group-content of less than 5×1016 molecules/cm3, a refractive index inhomogeneity, Δn, of less than 2 ppm, and a stress birefringence of less than 2 nm/cm. In the use according to the invention, the quartz glass blank complies with dimensioning rules (2), (3), and (4) in terms of its OH-content, minimal and maximal hydrogen contents, COH, CH2min, and CH2max, respectively, with P being the pulse number and ε being the energy density: COH [wt-ppm]=1,700×ε[mJ/cm2]0.4±50, (2) CH2min [molecules/cm3]=1×106ε2 P, (3) CH2max [molecules/cm3]=2×1018ε. (4) The procedure according to the invention is characterized in that a mixed quartz glass is generated from a first and a second quartz glass by mixing the two quartz glasses.
Abstract:
A method of making an optical fiber precursor includes generating vapors from an alkali metal source comprising compound containing oxygen and one or more alkali metals and applying the vapors to a surface of a glass article comprising silica at a temperature that promotes diffusion of the alkali metal into the surface of the glass article. An optical fiber has a core comprising silica and an alkali metal oxide of the form X2O, where X is selected from the group consisting of K, Na, Li, Cs, and Rb, wherein a concentration of the alkali metal oxide along a length of the core is uniform.
Abstract translation:制造光纤前体的方法包括从包含氧和一种或多种碱金属的化合物的碱金属源生成蒸气,并且在促进碱金属扩散的温度下将蒸气施加到包含二氧化硅的玻璃制品的表面 玻璃制品的表面。 光纤具有包含二氧化硅和X 2 O 2形式的碱金属氧化物的核,其中X选自K,Na,Li,Cs和Rb,其中浓度 的碱金属氧化物沿核心的长度是均匀的。
Abstract:
An optical member made of silica glass manufactured by the direct method where a material gas comprising an organosilicon compound is allowed to react in an oxidizing flame, said optical member having a 2×1014 molecules/cm3 or less concentration of formyl radical generated by X-ray irradiation whose dose is 0.01 Mrad or more and 1 Mrad or less.
Abstract translation:通过直接法制造的由石英玻璃制成的光学构件,其中包含有机硅化合物的材料气体在氧化火焰中反应,所述光学构件具有2×10 14分子/ cm 3 通过X射线照射产生的或更少浓度的甲酰基,其剂量为0.01Mrad以上且1Mrad以下。
Abstract:
A synthetic quartz glass preform is produced by flame hydrolysis with subsequent cooling and is suitable for the application of high-energy DUV radiation in the wave length range under 250 nm. The preform has a core area which contains ≧1150 ppm OH, a strain double refraction of ≦5 nm/cm and a resistance to high-energy DUV radiation as a result of a transmission reduction of ΔT ≦0.1%/cm thickness. The quartz glass has been exposed to the following radiation: wavelength λ1=248 nm, laser shot frequency ≧300 Hz, laser shot value ≧109 and lumination ≦10 mJ/cm2, and wavelength λ2=193 nm, laser shot frequency ≧300 Hz, laser shot value ≧109 and lumination
Abstract:
Disclosed is a method of manufacturing an optical fiber perform using MCVD including dehydration and dechlorination, which executes the following process repeatedly with changing the composition of soot generation gas according to the refractive index profile, the process including the steps of: forming a soot layer having pores on an inner wall of a deposition tube at a temperature lower than the soot sintering temperature with putting soot generation gas and oxygen gas into the rotating deposition tube; removing hydroxyl groups with keeping the pores by putting dehydration gas into the deposition tube; removing chlorine impurities existing in the soot layer with keeping the pores by putting dehydration gas into the deposition tube; and sintering the soot layer by heating the deposition tube at a temperature over the soot sintering temperature.
Abstract:
An optical waveguide fiber or body having a doped outer region which can be utilized in an optical coupler, a preform which can serve as the precursor for the fiber, an optical coupler, and methods of making same. Water, for example in the form of H2O and/or D2O, may be added to the cladding of the optical waveguide fiber or body.
Abstract:
Glass powders, methods for producing glass powders and compositions comprising glass powders. The powders preferably have a small particle size, narrow size distribution and a spherical morphology. The method includes forming the particles by a spray pyrolysis technique. The invention also includes novel devices and products formed from the glass powders. The compositions may be deposited on a substrate using various techniques including ink-jet printing.
Abstract:
Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02null1018 molecules/cm3 and about 0.18null1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.
Abstract:
An object of the present invention is to provide an optical fiber manufacturing method and an optical fiber in which an increase in the transmission loss is suppressed by preventing hydroxyl group from entering near the core portion. This invention provides a method for manufacturing an optical fiber 10 including forming a glass pipe 16 by applying a ring portion 15 on the inner face of a starting pipe 14 as a starting material, inserting a glass rod 13 that becomes a central core portion 11 and a depressed portion 12 into the inside of the glass pipe 16, integrating the glass pipe 16 and the glass rod 13 by collapse to form a glass body 17, forming a preform 10a by providing a jacket portion 18 outside the glass body 17, and drawing the preform 10a, wherein the thickness of the starting pipe 14 is set in a range from 4 mm to 8 mm.