Abstract:
The present invention was made in view of a problem of an electron microscope in which a reduction in detection efficiency of electrons detected by a detector should be prevented by eliminating any influence of a leakage magnetic field through a gap in an objective lens onto the electrons emitted from a specimen. To solve the problem, the present invention provides an electron microscope having a configuration with: a pole piece electrode for accelerating primary electrons emitted at an electrons source; and an objective lens including the pole piece electrode. In the objective lens, an electrically and magnetically insulated gap is formed between the pole piece electrode and other pole piece, and an auxiliary coil is concentrically disposed with the objective lens at a middle position between the gap and a detection surface of the electron detector, with an electric current flowing through the auxiliary coil in the opposite direction from that of an electric current flowing through the objective lens coil.
Abstract:
A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.
Abstract:
A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.
Abstract:
A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.
Abstract:
A charged particle beam irradiator makes it possible to observe an image at a high resolution and preferable contrast while reserving an operating distance of a sample or an area for the installation of a sample stage. The charged particle beam irradiator scans charged particle beams emitted by a charged particle source on a sample and obtains a scanned image of said sample based on charged particles obtained as a result of said scanning and is equipped with an electromagnetic lens having a magnetic pole provided between said sample and said charged particle source and at least a pair of magnetic poles provided under said sample and configured to generate a magnetic field there between. This configuration makes it possible to observe an image at a high resolution and preferable contrast while reserving an operating distance of the sample throughout a wide range of acceleration voltage.
Abstract:
Deflectors are disclosed that are suitable for use in various charged-particle-beam (CPB) optical systems as used, for example, in CPB microlithography systems. The deflectors produce a strong magnetic beam-deflecting field when energized with a relatively small electrical current. The beam-deflecting field thus produced is stable with respect to temperature changes, is little affected by eddy currents, and exhibits low aberration caused by manufacturing tolerances of the coil and core. In an exemplary method for manufacturing such a deflector, a magnetic-tape laminate is used as the core. Also, high-precision positioning of the coil and the magnetic-tape laminate is performed using photolithography and electrocasting. Positioning of the magnetic-tape laminate can be performed using a resist pattern formed by photolithography.
Abstract:
A magnetic lens configured to apply a magnetic field to a charged particle beam is provided. The magnetic lens may include an outer pole piece and an inner pole piece. The outer pole piece may have at least two sectors and at least two slots. The magnetic lens may also have a primary coil winding interposed between the outer pole piece and the inner pole piece. In addition, the magnetic lens may have a number of sector coil windings, and each sector of the outer pole piece may be coupled to one sector coil winding. A magnetic potential of the outer pole piece relative to the inner pole piece may be generated by applying a current to the primary coil winding. A separate magnetic potential of each sector may also be generated by applying a current to the respective sector coil windings of each sector of the outer pole piece.