Scanning Electron Microscope
    121.
    发明申请
    Scanning Electron Microscope 有权
    扫描电子显微镜

    公开(公告)号:US20080135755A1

    公开(公告)日:2008-06-12

    申请号:US11953496

    申请日:2007-12-10

    Abstract: The present invention was made in view of a problem of an electron microscope in which a reduction in detection efficiency of electrons detected by a detector should be prevented by eliminating any influence of a leakage magnetic field through a gap in an objective lens onto the electrons emitted from a specimen. To solve the problem, the present invention provides an electron microscope having a configuration with: a pole piece electrode for accelerating primary electrons emitted at an electrons source; and an objective lens including the pole piece electrode. In the objective lens, an electrically and magnetically insulated gap is formed between the pole piece electrode and other pole piece, and an auxiliary coil is concentrically disposed with the objective lens at a middle position between the gap and a detection surface of the electron detector, with an electric current flowing through the auxiliary coil in the opposite direction from that of an electric current flowing through the objective lens coil.

    Abstract translation: 本发明考虑到电子显微镜的问题,其中通过消除通过物镜中的间隙的泄漏磁场对发射的电子的任何影响来防止检测器检测到的电子的检测效率的降低 从标本。 为了解决该问题,本发明提供一种具有以下结构的电子显微镜:具有用于加速在电子源发射的一次电子的极片电极; 以及包括极片电极的物镜。 在物镜中,在极片电极和其它极片之间形成电气且磁绝缘的间隙,并且辅助线圈与物镜同心地设置在间隙和电子检测器的检测表面之间的中间位置, 电流以与流过物镜线圈的电流相反的方向流过辅助线圈。

    Dual beam system
    122.
    发明申请
    Dual beam system 有权
    双光束系统

    公开(公告)号:US20080035860A1

    公开(公告)日:2008-02-14

    申请号:US11641540

    申请日:2006-12-18

    Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.

    Abstract translation: 双光束系统包括离子束系统和具有磁性物镜的扫描电子显微镜。 离子束系统适于在存在来自SEM物镜的磁场的情况下最佳地操作,使得物镜在离子束操作期间不被关闭。 可选的二次粒子检测器和可选的电荷中和泛喷枪适于在存在磁场的情况下操作。 磁性物镜被设计成具有恒定的热信号,不管产生的磁场的强度如何,使得当磁场改变时,系统不需要时间稳定。

    Electron beam apparatus and method for production of its specimen chamber
    123.
    发明授权
    Electron beam apparatus and method for production of its specimen chamber 有权
    电子束装置及其试样室的制造方法

    公开(公告)号:US07205550B2

    公开(公告)日:2007-04-17

    申请号:US11450382

    申请日:2006-06-12

    Abstract: A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

    Abstract translation: 提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。 电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室,其中具有导电性的非磁性材料用作至少一个反射镜的材料 桶和样品室的主体。 用于镜筒的材料或试样室的主体是铝合金,镜筒的侧壁或试样室的主体的厚度为10mm以上。 厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。

    Dual beam system
    124.
    发明授权
    Dual beam system 有权
    双光束系统

    公开(公告)号:US07161159B2

    公开(公告)日:2007-01-09

    申请号:US10889967

    申请日:2004-07-13

    Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.

    Abstract translation: 双光束系统包括离子束系统和具有磁性物镜的扫描电子显微镜。 离子束系统适于在存在来自SEM物镜的磁场的情况下最佳地操作,使得物镜在离子束操作期间不被关闭。 可选的二次粒子检测器和可选的电荷中和泛喷枪适于在存在磁场的情况下操作。 磁性物镜被设计成具有恒定的热信号,不管产生的磁场的强度如何,使得当磁场改变时,系统不需要时间稳定。

    Charged particle beam emitting device
    125.
    发明授权
    Charged particle beam emitting device 有权
    带电粒子束发射装置

    公开(公告)号:US06580074B1

    公开(公告)日:2003-06-17

    申请号:US09230528

    申请日:1999-01-27

    CPC classification number: H01J37/141 H01J2237/1035 H01J2237/1405

    Abstract: A charged particle beam irradiator makes it possible to observe an image at a high resolution and preferable contrast while reserving an operating distance of a sample or an area for the installation of a sample stage. The charged particle beam irradiator scans charged particle beams emitted by a charged particle source on a sample and obtains a scanned image of said sample based on charged particles obtained as a result of said scanning and is equipped with an electromagnetic lens having a magnetic pole provided between said sample and said charged particle source and at least a pair of magnetic poles provided under said sample and configured to generate a magnetic field there between. This configuration makes it possible to observe an image at a high resolution and preferable contrast while reserving an operating distance of the sample throughout a wide range of acceleration voltage.

    Abstract translation: 带电粒子束照射器使得可以在保留样品的操作距离或用于安装样品台的区域的同时以高分辨率和优选的对比度观察图像。 带电粒子束照射器将由带电粒子源发射的带电粒子扫描在样品上,并基于作为所述扫描的结果而获得的带电粒子获得所述样品的扫描图像,并且配备有电磁透镜, 所述样品和所述带电粒子源和设置在所述样品下方的至少一对磁极,并且被配置为在其间产生磁场。 通过该结构,能够在宽范围的加速电压的同时保持样品的运转距离,以高分辨率和优选的对比度观察图像。

    Low-aberration deflectors for use in charged-particle-beam optical systems, and methods for fabricating such deflectors
    126.
    发明申请
    Low-aberration deflectors for use in charged-particle-beam optical systems, and methods for fabricating such deflectors 失效
    用于带电粒子束光学系统的低像差偏转器以及用于制造这种偏转器的方法

    公开(公告)号:US20030025085A1

    公开(公告)日:2003-02-06

    申请号:US10197309

    申请日:2002-07-16

    Inventor: Katsushi Nakano

    Abstract: Deflectors are disclosed that are suitable for use in various charged-particle-beam (CPB) optical systems as used, for example, in CPB microlithography systems. The deflectors produce a strong magnetic beam-deflecting field when energized with a relatively small electrical current. The beam-deflecting field thus produced is stable with respect to temperature changes, is little affected by eddy currents, and exhibits low aberration caused by manufacturing tolerances of the coil and core. In an exemplary method for manufacturing such a deflector, a magnetic-tape laminate is used as the core. Also, high-precision positioning of the coil and the magnetic-tape laminate is performed using photolithography and electrocasting. Positioning of the magnetic-tape laminate can be performed using a resist pattern formed by photolithography.

    Abstract translation: 公开了适用于例如在CPB微光刻系统中使用的各种带电粒子束(CPB)光学系统的偏转器。 当相对较小的电流通电时,偏转器产生强磁场偏转场。 由此产生的光束偏转场相对于温度变化是稳定的,几乎不受涡流的影响,并且表现出由线圈和芯的制造公差引起的低像差。 在制造这种偏转器的示例性方法中,使用磁带层压体作为核心。 此外,使用光刻和电铸来进行线圈和磁带层压体的高精度定位。 可以使用通过光刻形成的抗蚀剂图案来进行磁带层压体的定位。

    Sectored magnetic lens and method of use

    公开(公告)号:US06515287B2

    公开(公告)日:2003-02-04

    申请号:US09882804

    申请日:2001-06-15

    Abstract: A magnetic lens configured to apply a magnetic field to a charged particle beam is provided. The magnetic lens may include an outer pole piece and an inner pole piece. The outer pole piece may have at least two sectors and at least two slots. The magnetic lens may also have a primary coil winding interposed between the outer pole piece and the inner pole piece. In addition, the magnetic lens may have a number of sector coil windings, and each sector of the outer pole piece may be coupled to one sector coil winding. A magnetic potential of the outer pole piece relative to the inner pole piece may be generated by applying a current to the primary coil winding. A separate magnetic potential of each sector may also be generated by applying a current to the respective sector coil windings of each sector of the outer pole piece.

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