公开(公告)号：US11908657B2

公开(公告)日：2024-02-20

申请号：US17646195

申请日：2021-12-28

Applicant: ZHONGKE JINGYUAN ELECTRON LIMITED

Inventor： Qinglang Meng ,  Weiqiang Sun

IPC: H01J37/21 ,  G01N23/2251 ,  H01J37/141 ,  H01J37/147 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/21 ,  G01N23/2251 ,  H01J37/141 ,  H01J37/1477 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/06375 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/1516 ,  H01J2237/2448 ,  H01J2237/24475 ,  H01J2237/2817

Abstract: A scanning electron microscope device for a sample to be detected and an electron beam inspection apparatus are provided, the scanning electron microscope device being configured to project electron beam to a surface of the sample to generate backscattered electrons and secondary electrons, and comprising: an electron beam source, a deflection mechanism, and an objective lens assembly. The deflection mechanism comprises a first deflector located downstream the electron beam source and a second deflector located downstream the first deflector. The objective lens assembly comprises: an excitation coil; and a magnetic yoke, formed by a magnetizer material as a housing which opens towards the sample and comprising a hollow body defining an internal chamber where the excitation coil is accommodated, and at least one inclined portion extending inward from the hollow body at an angle with reference to the hollow body and directing towards the optical axis, with an end of the at least one inclined portion being formed into a pole piece. The deflection mechanism further comprises a compensation electrode, which is located between the pole piece and the surface of the sample and is configured to adjust a focusing position of the electron beam at which the electron beam is focused, in a condition of excitation thereof with a voltage being applied thereon, by adjusting the voltage.

公开(公告)号：US11769649B2

公开(公告)日：2023-09-26

申请号：US17576156

申请日：2022-01-14

Applicant: Hitachi High-Tech Corporation

Inventor： Masanori Mita ,  Yoshinobu Ootaka ,  Hideto Dohi ,  Zhaohui Cheng

IPC: H01J37/153 ,  H01J37/141 ,  H01J37/147

CPC classification number: H01J37/153 ,  H01J37/1413 ,  H01J37/1474 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/1534

Abstract: An object is to provide a multipole unit capable of achieving both high positional accuracy and ease of assembling and preventing a decrease in the transmission rate of the magnetic flux. A multipole unit 109a includes a pole 1 that is made of a soft magnetic metal material, a shaft 2 that is made of a soft magnetic metal material and is magnetically connected to the pole, and a coil 3 that is wound around the shaft 2. The pole 1 is provided with a first fitting portion JP1 that forms a first recessed portion or a first protruding portion. The shaft 2 is provided with a second fitting portion JP2 that forms a second protruding portion or a second recessed portion. The first fitting portion JP1 and the second fitting portion JP2 are fitted with each other such that the pole 1 and the shaft 2 are physically separated from each other.

公开(公告)号：US20180286625A1

公开(公告)日：2018-10-04

申请号：US15935378

申请日：2018-03-26

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Dirk Preikszas ,  Bernd Hafner

IPC: H01J37/141

CPC classification number: H01J37/141 ,  H01J37/147 ,  H01J37/153 ,  H01J2237/063 ,  H01J2237/08 ,  H01J2237/083 ,  H01J2237/141 ,  H01J2237/1532

Abstract: A beam deflector includes a magnetic-flux-guiding structure which has an opening through which a beam axis extends, and at least two coils arranged at the magnetic-flux-guiding structure so that they produce a magnetic field B1 having lines passing through the two coils in succession, leave the magnetic-flux-guiding structure at a first location on a first side in relation to the beam axis, cross the beam axis at a second location which is arranged at a distance along the beam axis from the magnetic-flux-guiding structure, re-enter into the magnetic flux-guiding structure at a third location on a second side lying opposite the first side, and extend around the opening from the third location to the first location within the magnetic-flux-guiding structure.

公开(公告)号：US20160181054A1

公开(公告)日：2016-06-23

申请号：US15056143

申请日：2016-02-29

Applicant: CARL ZEISS MICROSCOPY GMBH ,  APPLIED MATERIALS ISRAEL, LTD.

Inventor： Rainer KNIPPELMEYER ,  Stefan SCHUBERT

IPC: H01J37/145

CPC classification number: H01J37/141 ,  H01J37/145 ,  H01J37/20 ,  H01J37/21 ,  H01J37/24 ,  H01J37/28 ,  H01J2237/002 ,  H01J2237/04922 ,  H01J2237/04926 ,  H01J2237/12 ,  H01J2237/1215 ,  H01J2237/14 ,  H01J2237/1405 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/2817

Abstract: An objective lens arrangement includes a first, second and third pole pieces, each being substantially rotationally symmetric. The first, second and third pole pieces are disposed on a same side of an object plane. An end of the first pole piece is separated from an end of the second pole piece to form a first gap, and an end of the third pole piece is separated from an end of the second pole piece to form a second gap. A first excitation coil generates a focusing magnetic field in the first gap, and a second excitation coil generates a compensating magnetic field in the second gap. First and second power supplies supply current to the first and second excitation coils, respectively. A magnetic flux generated in the second pole piece is oriented in a same direction as a magnetic flux generated in the second pole piece.

Abstract translation: 物镜配置包括第一，第二和第三极片，每个极片基本上是旋转对称的。 第一，第二和第三极片设置在物平面的同一侧。 第一极靴的端部与第二极靴的端部分离以形成第一间隙，并且第三极靴的端部与第二极靴的端部分离以形成第二间隙。 第一激励线圈在第一间隙中产生聚焦磁场，第二激励线圈在第二间隙中产生补偿磁场。 第一和第二电源分别向第一和第二励磁线圈提供电流。 在第二极靴中产生的磁通量在与第二极靴中产生的磁通量相同的方向上定向。

公开(公告)号：US20160064180A1

公开(公告)日：2016-03-03

申请号：US14833583

申请日：2015-08-24

Applicant: Hermes-Microvision, Inc.

Inventor： Weiming Ren ,  Xuerang Hu ,  Xuedong Liu ,  Zhongwei Chen

IPC: H01J37/141 ,  H01J37/28 ,  H01J37/147

CPC classification number: H01J37/141 ,  H01J37/1475 ,  H01J37/28 ,  H01J2237/141 ,  H01J2237/1508 ,  H01J2237/1526 ,  H01J2237/28 ,  H01J2237/2817

Abstract: A new apparatus of plural charged particle beams with multi-axis magnetic lenses is provided, which comprises a plurality of sub-columns The apparatus employs two modified multi-axis magnetic lenses, and magnetic sub-lenses thereof therefore function as the objective lenses and the condenser lenses of all the sub-columns respectively. The plurality of sub-columns can perform the same function or different functions required for observing a surface of a specimen, such as high-throughput inspection and high-resolution review of interested features thereon. Accordingly, the apparatus can be used as a yield management tool in semiconductor manufacturing industry.

Abstract translation: 提供了具有多轴磁透镜的多个带电粒子束的新装置，其包括多个子列。该装置采用两个改进的多轴磁性透镜，并且其磁性子透镜因此用作物镜，并且 所有子列的聚光透镜分别。 多个子列可以执行用于观察样本表面所需的相同功能或不同的功能，例如高通量检测和对其感兴趣的特征的高分辨率检查。 因此，该装置可以用作半导体制造业的屈服管理工具。

公开(公告)号：US09105440B2

公开(公告)日：2015-08-11

申请号：US14468674

申请日：2014-08-26

Applicant: Hermes-Microvision, Inc.

Inventor： Zhongwei Chen ,  Weiming Ren ,  Xuerang Hu ,  Xuedong Liu

IPC: H01J37/141 ,  H01J37/145 ,  H01J37/28

CPC classification number: H01J37/141 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/15 ,  H01J2237/281 ,  H01J2237/2817

Abstract: An apparatus of plural charged particle beams with multi-axis magnetic lens is provided to perform multi-functions of observing a specimen surface, such as high-throughput inspection and high-resolution review of interested features thereof and charge-up control for enhancing image contrast and image resolution. In the apparatus, two or more sub-columns are formed and each of the sub-columns performs one of the multi-functions. Basically the sub-columns take normal illumination to get high image resolutions, but one or more may take oblique illuminations to get high image contrasts.

Abstract translation: 提供具有多轴磁性透镜的多个带电粒子束的装置，以执行观察样品表面的多功能，例如高通量检测和其感兴趣特征的高分辨率检查以及用于增强图像对比度的充电控制 和图像分辨率。 在该装置中，形成两个或多个子列，并且每个子列执行多功能之一。 基本上，子列采取正常照明以获得高图像分辨率，但是一个或多个可能采取倾斜照明以获得高图像对比度。

公开(公告)号：US07897943B2

公开(公告)日：2011-03-01

申请号：US11341839

申请日：2006-01-27

Applicant: Kenneth H. Purser ,  Harald A. Enge ,  Norman L. Turner

Inventor： Kenneth H. Purser ,  Harald A. Enge ,  Norman L. Turner

IPC: G21K5/04

CPC classification number: H01J37/141 ,  H01J37/14 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/315 ,  H01J37/3171 ,  H01J2237/141 ,  H01J2237/1534 ,  H01J2237/31703

Abstract: A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also, the method and apparatus may be used for introducing quadrupole fields along a beam line.

公开(公告)号：US20090084975A1

公开(公告)日：2009-04-02

申请号：US12232638

申请日：2008-09-22

Applicant: Joachim Zach ,  Matthias Kallenbach

Inventor： Joachim Zach ,  Matthias Kallenbach

IPC: H01J3/14

CPC classification number: H01J1/50 ,  H01F5/003 ,  H01J29/762 ,  H01J29/768 ,  H01J37/153 ,  H01J37/26 ,  H01J2237/141 ,  H05K1/0393 ,  H05K1/165 ,  Y10T29/4902

Abstract: Multipole coils (1, 2, 3, 4, 5, 6) for influencing particle beams have at least two coils (1, 2) which concentrically enclose an imaginary axis (10), wherein a winding (7) made from a flexible circuit board (8) is formed by means of conducting paths (9) disposed thereon for each coil (1, 2, 3, 4, 5, 6) and the circuit boards (8) are rolled into at least one circuit board layer (11, 12, 13, 14). Multipole coils of this kind (1, 2, 3, 4, 5, 6) are utilized for aberration correction in particle optics, wherein the windings (7) of the multipole coils (1, 2, 3, 4, 5, 6) form windows (16) whose width in the peripheral direction is chosen in such a fashion that no secondary interfering fields occur and whose length in the axial direction corresponds at least to its width.

Abstract translation: 用于影响粒子束的多极线圈（1,2,3,4,5,6）具有至少两个同心地围绕虚轴（10）的线圈（1,2），其中由柔性电路制成的绕组（7） 板（8）通过为每个线圈（1,2,3,4,5,6）设置在其上的导电路径（9）形成，并且电路板（8）被卷入至少一个电路板层（11 ，12,13,14）。 这种多极线圈（1,2,3,4,5,6）用于粒子光学中的像差校正，其中多极线圈（1,2,3,4,5,6）的绕组（7） 选择圆周方向宽度的窗口（16），使得不产生二次干涉场，并且其在轴向上的长度至少等于其宽度。

公开(公告)号：US20070181832A1

公开(公告)日：2007-08-09

申请号：US11784073

申请日：2007-04-05

Applicant: Kenneth Purser ,  Harald Enge ,  Norman Turner

Inventor： Kenneth Purser ,  Harald Enge ,  Norman Turner

IPC: H01J37/08

CPC classification number: H01J37/141 ,  H01J37/14 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/315 ,  H01J37/3171 ,  H01J2237/141 ,  H01J2237/1534 ,  H01J2237/31703

Abstract: A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also, the method and apparatus may be used for introducing quadrupole fields along a beam line.

公开(公告)号：US20050242294A1

公开(公告)日：2005-11-03

申请号：US11154085

申请日：2005-06-16

Applicant: Kenneth Purser ,  Harald Enge ,  Norman Turner

Inventor： Kenneth Purser ,  Harald Enge ,  Norman Turner

IPC: H01J37/141 ,  H01J37/08 ,  H01J37/14 ,  H01J37/147 ,  H01J37/315 ,  H01J37/317 ,  H01L21/425

CPC classification number: H01J37/141 ,  H01J37/14 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/315 ,  H01J37/3171 ,  H01J2237/141 ,  H01J2237/1534 ,  H01J2237/31703

Abstract: A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also, the method and apparatus may be used for introducing quadrupole fields along a beam line.