公开(公告)号：US4764673A

公开(公告)日：1988-08-16

申请号：US44227

申请日：1987-04-30

Applicant: Charles E. Bryson, III ,  Michael A. Kelly

Inventor： Charles E. Bryson, III ,  Michael A. Kelly

IPC: G01Q30/02 ,  G01Q90/00 ,  H01J37/05 ,  H01J49/48 ,  H01J47/00

CPC classification number: H01J37/05 ,  H01J49/48

Abstract: In an electron spectrometer, electrons emanating from a source are collected and focused to a collimated stream by an electrostatic lens free of spherical aberration. The lens includes a pair of axially spaced concave grids approximating sections of concentric ellipsoids having a common focii and coaxial semi-major axes. The collimated electron stream is inducted into an electric radial cylindrical analyzer for focusing the electrons into radially dispersed lines on a position-sensitive detector with the radial dispersion being a function of their energies. The cylindrical analyzer section subtends an angle of approximately 63.5.degree.. The grid openings in the grids of the electrostatic collimating lens are elongated in a direction transverse to the stream of the electrons passing therethrough and parallel to the radial electric field lines at the entrance to the electric analyzer to reduce the dispersive effect of the grids.

Abstract translation: 在电子光谱仪中，从源发出的电子被收集并通过没有球面像差的静电透镜聚焦到准直流。 透镜包括一对轴向间隔的凹形网格，近似具有共同焦点和同轴半长轴的同心椭圆体的部分。 准直电子流被引入电子径向圆柱形分析器中，用于将电子聚焦在位置敏感检测器上的径向分散线中，其中径向扩散是其能量的函数。 圆柱形分析器对角度约为63.5°。 静电准直透镜的栅格中的栅格开口在横穿电子流的方向上延伸，并且平行于电分析器入口处的径向电场线，以减小栅格的色散效应。

公开(公告)号：US4587432A

公开(公告)日：1986-05-06

申请号：US637514

申请日：1984-08-03

Applicant: Derek Aitken

Inventor： Derek Aitken

IPC: H01J37/05 ,  H01J37/317 ,  H01L21/265 ,  H01J37/08

CPC classification number: H01J37/05 ,  H01J37/3171

Abstract: An ion implantation system in which surfaces of ion flight tube and drift tube perpendicular to ion dispersion plane have geometric configuration which precludes sputtering of contaminants onto path through resolving slit.

Abstract translation: 一种离子注入系统，其中离子飞行管和漂移管的表面垂直于离子色散平面具有几何构型，其排除了通过分辨狭缝将污染物溅射到路径上。

公开(公告)号：USRE29500E

公开(公告)日：1977-12-20

申请号：US710420

申请日：1976-08-02

Applicant: Walter Hoppe

Inventor： Walter Hoppe

IPC: G21K1/02 ,  H01J37/04 ,  H01J37/05 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/05 ,  G21K1/025 ,  H01J37/04 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2441 ,  H01J2237/24465 ,  H01J2237/2449 ,  H01J2237/24507 ,  H01J2237/24585

Abstract: For dark-field imaging of the specimen, a scanning corpuscular-beam micrope is equipped with multiple annular apertures located between the beam source and the specimen on the one hand and between the specimen and the detector on the other hand. The areas of the multiple annular apertures conjointly i.e. complementarily cover the ray path. The aperture situated in front of the detector is surrounded by a wide, radiation-transmitting region. The invention affords utilizing for the generation of the image not only the rays scattered outside of the aperture cone but also a large part of the rays scattered within this cone.

公开(公告)号：US3863069A

公开(公告)日：1975-01-28

申请号：US43572574

申请日：1974-01-23

Applicant: JEOL LTD

Inventor： SHIROTA KOHEI

IPC: G01Q30/02 ,  H01J37/05 ,  H01J37/141 ,  H01J37/26

CPC classification number: H01J37/05 ,  H01J37/141

Abstract: An electron microscope in which the image forming lens system is employed as an energy analyzer. During beam energy analysis, an electron beam which passes through a slit positioned along the optical axis adjacent an objective lens is deflected so as to strike an intermediate lens off-axially by a deflecting means provided between said slit and said intermediate lens whereby the beam is dispersed by field (off-axis) chromatic aberration of the intermediate lens.

Abstract translation: 使用成像透镜系统作为能量分析仪的电子显微镜。 在光束能量分析期间，通过沿着邻近物镜的光轴定位的狭缝的电子束被偏转，以便通过设置在所述狭缝和所述中间透镜之间的偏转装置离轴地撞击中间透镜，由此光束是 由中间透镜的场（离轴）色差分散。

公开(公告)号：US3626184A

公开(公告)日：1971-12-07

申请号：US3626184D

申请日：1970-03-05

Applicant: ATOMIC ENERGY COMMISSION

Inventor： CREWE ALBERT V

IPC: H01J37/04 ,  H01J37/05 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J49/48

CPC classification number: H01J37/28 ,  H01J37/045 ,  H01J37/05 ,  H01J37/22 ,  H01J37/244 ,  H01J49/484 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/24507 ,  H01J2237/24585

Abstract: In an electron microscope transmitted electrons are detected according to whether they are unscattered, elastically scattered or inelastically scattered by the specimen. The elastically scattered electrons are further separated according to the magnitude of the scattering. Signals from the separate detectors can be used separately or combined as desired to enhance the information obtained from a specimen.

公开(公告)号：US3517191A

公开(公告)日：1970-06-23

申请号：US3517191D

申请日：1965-10-11

Applicant: HELMUT J LIEBL

Inventor： LIEBL HELMUT J

IPC: G01Q10/00 ,  G01Q30/06 ,  H01J29/58 ,  H01J37/05 ,  H01J37/252 ,  H01J37/256 ,  H01J49/02 ,  H01J49/14 ,  H01J49/20 ,  H01J49/28 ,  H01J49/30 ,  H01J49/32 ,  G01N23/22 ,  H01J37/08 ,  H01J37/28

CPC classification number: H01J49/30 ,  H01J29/58 ,  H01J37/05 ,  H01J37/252 ,  H01J37/256 ,  H01J49/022 ,  H01J49/142 ,  H01J49/20 ,  H01J49/286 ,  H01J49/32 ,  H01J49/322

公开(公告)号：US3500042A

公开(公告)日：1970-03-10

申请号：US3500042D

申请日：1966-02-07

Applicant: CSF

Inventor： CASTAING RAYMOND ,  SLODZIAN GEORGES

IPC: G01N27/62 ,  G01Q30/02 ,  H01J29/60 ,  H01J29/84 ,  H01J37/05 ,  H01J37/252 ,  H01J49/26 ,  H01J49/28 ,  H01J37/26

CPC classification number: H01J29/60 ,  H01J29/845 ,  H01J37/05 ,  H01J37/252 ,  H01J49/286

公开(公告)号：US2429558A

公开(公告)日：1947-10-21

申请号：US61236145

申请日：1945-08-24

Applicant: RESEARCH CORP

Inventor： LADISLAUS MARTON

IPC: H01J37/05

CPC classification number: H01J37/15 ,  H01J37/05

公开(公告)号：US11929229B2

公开(公告)日：2024-03-12

申请号：US18196548

申请日：2023-05-12

Applicant: mi2-factory GmbH

Inventor： Florian Krippendorf ,  Constantin Csato

IPC: H01J37/317 ,  C23C14/18 ,  C23C14/48 ,  H01J37/05 ,  H01J37/147 ,  H01J37/20 ,  H01L21/04 ,  H01L29/32

CPC classification number: H01J37/05 ,  C23C14/18 ,  C23C14/48 ,  H01J37/1477 ,  H01J37/20 ,  H01J37/317 ,  H01J37/3171 ,  H01L21/046 ,  H01L29/32 ,  H01J2237/024 ,  H01J2237/057 ,  H01J2237/1518 ,  H01J2237/20214

Abstract: A semiconductor wafer includes a first surface and an implantation area adjacent to the first surface and a certain distance away from the first surface, the implantation area including implanted particles and defects. A defect concentration in the implantation area deviates by less than 5% from a maximum defect concentration in the implantation area.

公开(公告)号：US20240047168A1

公开(公告)日：2024-02-08

申请号：US18266733

申请日：2021-12-07

Applicant: mi2-factory GmbH

Inventor： Constantin Csato ,  Florian Krippendorf ,  André Zowalla

IPC: H01J37/05 ,  H01J37/317 ,  H01J37/147

CPC classification number: H01J37/05 ,  H01J37/3171 ,  H01J37/1474 ,  H01J2237/057

Abstract: An energy filter assembly (1, 100, 200, 300) for ion implantation system is provided comprising an energy filter (25), a first filter frame (40), and at least one coupling element (50). The energy filter (25) has at least one filter element (25a) absorbing the beam energy of an ion beam (10). The at least one coupling element (50) elastically connects the first filter frame (40) with the energy filter (25).