LASER ILLUMINATED GAS IMAGING
    131.
    发明申请
    LASER ILLUMINATED GAS IMAGING 有权
    激光照射气体成像

    公开(公告)号:US20150369730A1

    公开(公告)日:2015-12-24

    申请号:US14310914

    申请日:2014-06-20

    Abstract: Aspects of the invention generally relate to illumination gas imaging and detection. Camera systems can illuminate a target scene with light sources configured to emit absorbing and non-absorbing wavelengths with respect to a target gas. An image of the target scene illuminated with a non-absorbing wavelength can be compared to a non-illuminated image of the target scene in order to determine information about the background of the target scene. If sufficient light of the non-absorbing wavelength is scattered by the scene toward a detector, the target scene comprises an adequate background for performing a gas imaging process. A camera system can alert a user of portions of the target scene suitable or unsuitable for performing a gas imaging process. If necessary, the user can reposition the system until sufficient portions of the target scene are recognized as suitable for performing the gas imaging process.

    Abstract translation: 本发明的方面通常涉及照明气体成像和检测。 相机系统可以照亮目标场景,光源被配置成相对于目标气体发射吸收和非吸收波长。 可以将用非吸收波长照射的目标场景的图像与目标场景的非照明图像进行比较,以便确定关于目标场景的背景的信息。 如果足够的非吸收波长的光被场景散射到检测器,则目标场景包括用于执行气体成像处理的足够的背景。 相机系统可以向用户提醒适合于或不适合执行气体成像过程的目标场景的部分。 如果需要,用户可以重新定位系统,直到目标场景的足够部分被识别为适合执行气体成像过程。

    APPARATUS AND METHOD FOR EXTREME ULTRAVIOLET SPECTROMETER CALIBRATION
    134.
    发明申请
    APPARATUS AND METHOD FOR EXTREME ULTRAVIOLET SPECTROMETER CALIBRATION 有权
    超声波紫外光谱仪校准的装置和方法

    公开(公告)号:US20150346029A1

    公开(公告)日:2015-12-03

    申请号:US14490948

    申请日:2014-09-19

    CPC classification number: G01J3/0297 G01J3/10 G01J3/28 G01J3/2803 G01J2003/282

    Abstract: Disclosed are herein an apparatus and method for extreme ultraviolet (EUV) spectroscope calibration. The apparatus for EUV spectroscope calibration includes an EUV generating module, an Al filter, a diffraction grating, a CCD camera, a spectrum conversion module, and a control module that compares a wavelength value corresponding to a maximum peak among peaks of the spectrum depending on the order of the EUV light converted from the spectrum conversion module with a predetermined reference wavelength value depending on an order of high-order harmonics to calculate a difference value with the closest reference wavelength value, and controls the spectrum depending on the order of the EUV light converted from the spectrum conversion module to be moved in a direction of wavelength axis by the calculated difference value. Thus, it is possible to accurately measure a wavelength of a spectrum of EUV light used in EUV exposure technology and mask inspection technology.

    Abstract translation: 本文公开了用于极紫外(EUV)分光仪校准的装置和方法。 用于EUV分光仪校准的装置包括EUV生成模块,Al滤光片,衍射光栅,CCD照相机,光谱转换模块和控制模块,该模块将与频谱峰值中的最大峰值对应的波长值与 根据高次谐波的顺序,从频谱转换模块转换成具有预定参考波长值的EUV光的顺序,以计算具有最接近参考波长值的差值,并根据EUV的顺序来控制光谱 从光谱转换模块转换为沿波长轴方向移动计算出的差值的光。 因此,可以精确地测量在EUV曝光技术和掩模检查技术中使用的EUV光的光谱的波长。

    Test method for an escape route marking
    135.
    发明授权
    Test method for an escape route marking 有权
    逃生路线标记的测试方法

    公开(公告)号:US09201009B2

    公开(公告)日:2015-12-01

    申请号:US13983016

    申请日:2012-02-03

    Applicant: Torben Biehl

    Inventor: Torben Biehl

    Abstract: A testing method for an escape path marking which has an installation position and is illuminated by a light source located in a defined position relative to the installation position, in order to charge the escape path marking for achieving afterglow,the following steps: An excitation curve A (λ) for the escape path marking is provided; the irradiance E (λ) of the light source is recorded for the installation position of the escape path marking; a weighted irradiance B (λ) is determined as a product of the irradiance and the excitation curve; a charging irradiance (BiL) is determined as an integral over the weighted irradiance across the wavelength; and a characteristic curve Kt1 (BiL) depending upon the charging time t1 specifies what afterglow time emerges for the escape path marking with the charging time t1 for the charging irradiance (BiL).

    Abstract translation: 一种逃生路径标记的测试方法,其具有安装位置,并被位于相对于安装位置的限定位置的光源照射,以便对逸出路径标记进行充电以实现余辉,以下步骤:激发曲线 提供了用于逃生路径标记的A(λ); 记录光源的辐照度E(λ)用于逃生路径标记的安装位置; 加权辐照度B(λ)被确定为辐照度和激发曲线的乘积; 充电辐照度(BiL)被确定为跨越波长的加权辐照度的积分; 并且根据充电时间t1的特性曲线Kt1(BiL)指定对于充电辐照度(BiL)的充电时间t1,逃逸路径标记出现余辉时间。

    GAS ABSORPTION SPECTROSCOPIC SYSTEM AND GAS ABSORPTION SPECTROSCOPIC METHOD
    137.
    发明申请
    GAS ABSORPTION SPECTROSCOPIC SYSTEM AND GAS ABSORPTION SPECTROSCOPIC METHOD 有权
    气体吸收光谱系统和气体吸收光谱法

    公开(公告)号:US20150338342A1

    公开(公告)日:2015-11-26

    申请号:US14758900

    申请日:2013-12-25

    Abstract: Provided is a gas absorption spectroscopic system and gas absorption spectroscopic method capable of accurately measuring the concentration or other properties of gas even in high-speed measurements. Laser light with a varying wavelength is cast into target gas. A spectrum profile representing a change in the intensity of the laser light transmitted through the target gas with respect to wavelength is determined. For this spectrum profile, polynomial approximation is performed at each wavelength point within a predetermined wavelength width, using an approximate polynomial. Based on the coefficients of the terms in the approximate polynomial at each point, an nth order derivative curve, where n is an integer of zero or larger, of the spectrum profile is created. A physical quantity of the target gas is determined based on the thus created nth order derivative curve.

    Abstract translation: 提供即使在高速测量中也能够精确地测量气体的浓度或其它性质的气体吸收光谱系统和气体吸收光谱法。 具有不同波长的激光被投入到目标气体中。 确定表示相对于波长透过目标气体的激光的强度变化的光谱分布。 对于该频谱分布,使用近似多项式在预定波长宽度内的每个波长点处执行多项式近似。 基于每个点处的近似多项式中的项的系数,产生频谱分布中n为零或更大的整数的n阶微分曲线。 基于由此产生的n阶导数曲线确定目标气体的物理量。

    Apparatus and method for extreme ultraviolet spectrometer calibration
    139.
    发明授权
    Apparatus and method for extreme ultraviolet spectrometer calibration 有权
    用于极紫外光谱仪校准的仪器和方法

    公开(公告)号:US09188485B1

    公开(公告)日:2015-11-17

    申请号:US14490948

    申请日:2014-09-19

    CPC classification number: G01J3/0297 G01J3/10 G01J3/28 G01J3/2803 G01J2003/282

    Abstract: Disclosed are herein an apparatus and method for extreme ultraviolet (EUV) spectroscope calibration. The apparatus for EUV spectroscope calibration includes an EUV generating module, an Al filter, a diffraction grating, a CCD camera, a spectrum conversion module, and a control module that compares a wavelength value corresponding to a maximum peak among peaks of the spectrum depending on the order of the EUV light converted from the spectrum conversion module with a predetermined reference wavelength value depending on an order of high-order harmonics to calculate a difference value with the closest reference wavelength value, and controls the spectrum depending on the order of the EUV light converted from the spectrum conversion module to be moved in a direction of wavelength axis by the calculated difference value. Thus, it is possible to accurately measure a wavelength of a spectrum of EUV light used in EUV exposure technology and mask inspection technology.

    Abstract translation: 本文公开了用于极紫外(EUV)分光仪校准的装置和方法。 用于EUV分光仪校准的装置包括EUV生成模块,Al滤光片,衍射光栅,CCD照相机,光谱转换模块和控制模块,该模块将与频谱峰值中的最大峰值对应的波长值与 根据高次谐波的顺序,从频谱转换模块转换成具有预定参考波长值的EUV光的顺序,以计算具有最接近参考波长值的差值,并根据EUV的顺序来控制光谱 从光谱转换模块转换为沿波长轴方向移动计算出的差值的光。 因此,可以精确地测量在EUV曝光技术和掩模检查技术中使用的EUV光的光谱的波长。

    TERAHERTZ-WAVE GENERATION DEVICE AND MEASUREMENT APPARATUS INCLUDING THE SAME
    140.
    发明申请
    TERAHERTZ-WAVE GENERATION DEVICE AND MEASUREMENT APPARATUS INCLUDING THE SAME 审中-公开
    TERAHERTZ波形发生装置及其测量装置

    公开(公告)号:US20150316832A1

    公开(公告)日:2015-11-05

    申请号:US14698569

    申请日:2015-04-28

    Inventor: Takahiro Sato

    Abstract: At least one terahertz-wave generation device configured to generate a terahertz wave includes a polarization control unit configured to control a polarization direction of light from a light source, and a waveguide including a nonlinear optical crystal disposed such that the light having the polarization direction controlled by the polarization control unit is incident on the nonlinear optical crystal. The nonlinear optical crystal emits a terahertz wave upon the light being incident thereon. The polarization control unit is further configured to control an electric-field intensity of the light to be incident on the nonlinear optical crystal in a direction of a Z-axis of the nonlinear optical crystal.

    Abstract translation: 配置成产生太赫兹波的至少一个太赫波发生装置包括:偏振控制单元,被配置为控制来自光源的光的偏振方向;以及波导,包括非线性光学晶体,其被布置为使得具有偏振方向的光被控制 由偏振控制单元入射到非线性光学晶体上。 非线性光学晶体在入射到其上的光发射太赫兹波。 偏振控制单元还被配置为在非线性光学晶体的Z轴方向上控制入射到非线性光学晶体上的光的电场强度。

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