公开(公告)号：US06558053B2

公开(公告)日：2003-05-06

申请号：US10125229

申请日：2002-04-18

Applicant: Kazuhito Shigemori ,  Masakazu Sanada ,  Minobu Matsunaga ,  Katsushi Yoshioka ,  Kenji Sugimoto ,  Kaoru Aoki ,  Moritaka Yano ,  Satoshi Yamamoto ,  Tsuyoshi Mitsuhashi ,  Takashi Nagao ,  Mitsumasa Kodama ,  Yukihiko Inagaki ,  Yoshihisa Yamada

Inventor： Kazuhito Shigemori ,  Masakazu Sanada ,  Minobu Matsunaga ,  Katsushi Yoshioka ,  Kenji Sugimoto ,  Kaoru Aoki ,  Moritaka Yano ,  Satoshi Yamamoto ,  Tsuyoshi Mitsuhashi ,  Takashi Nagao ,  Mitsumasa Kodama ,  Yukihiko Inagaki ,  Yoshihisa Yamada

IPC: G03D500

CPC classification number: H01L21/67161 ,  H01L21/6715 ,  H01L21/67167 ,  H01L21/67178

Abstract: A substrate processing apparatus includes a coating section, a developing section, a heat-treating section and a transport mechanism. The coating section has first processing units each for performing a coverage process to supply a photoresist solution to a substrate and cover a surface of the substrate with the photoresist solution, a second processing unit for spinning the substrate, after the coverage process, at high speed to make the photoresist solution into a film, dry the photoresist film, and clean the substrate. All substrates are processed with the same coating conditions to suppress differences in quality among the substrates. The first and second processing units perform the respective processes concurrently to improve the throughput of substrate processing.

公开(公告)号：US06436626B1

公开(公告)日：2002-08-20

申请号：US09625460

申请日：2000-07-25

Applicant: Yusuke Kawahara ,  Tsukasa Ito ,  Tsuyoshi Mitsuhashi

Inventor： Yusuke Kawahara ,  Tsukasa Ito ,  Tsuyoshi Mitsuhashi

IPC: G03C1498

CPC classification number: G03C1/498 ,  G03C1/49881 ,  G03C2200/60

Abstract: A heat-developable light-sensitive element is disclosed. The element comprises a non-light-sensitive organic silver salt and a light-sensitive silver halide and an average radius r of the sphere of influence is from 0.35 &mgr;m to 10 &mgr;m when the element is exposed to light of from 35 &mgr;J/cm2 to 50 &mgr;J/cm2 and developed by a developing drum at a temperature of 123°±3° C. for a time of 16±3 seconds.

Abstract translation: 公开了一种可热显影的感光元件。 该元件包括非感光有机银盐和感光卤化银，并且当元件暴露于35μJ/ cm 2的光下时，影响球的平均半径r为0.35μm至10μm， 50微克/平方厘米，并由显影鼓在123±3℃的温度下显影16秒±3秒。

公开(公告)号：US5871893A

公开(公告)日：1999-02-16

申请号：US900998

申请日：1997-07-25

Applicant: Tsuyoshi Mitsuhashi

Inventor： Tsuyoshi Mitsuhashi

IPC: G03C1/35 ,  G03C1/85 ,  G03C5/16

CPC classification number: G03C1/853 ,  G03C1/35 ,  Y10S430/166

Abstract: A silver halide photographic light-sensitive material is disclosed. The light-sensitive material comprises a transparent support having thereon a hydrophilic colloid layer comprising a silver halide emulsion layer and an electric conductive layer, in which the electric conductive layer contains colloidal particles of a kind of metal oxide and at least one layer of the hydrophilic colloid layer contains a leucocompound of a blue dye.

Abstract translation: 公开了一种卤化银照相感光材料。 感光材料包括其上具有包含卤化银乳剂层和导电层的亲水胶体层的透明载体，其中导电层含有一种金属氧化物的胶体颗粒和至少一层亲水性 胶体层含有蓝色染料的化合物。

公开(公告)号：US5779928A

公开(公告)日：1998-07-14

申请号：US799478

申请日：1997-02-12

Applicant: Tetsuro Yamashita ,  Tsuyoshi Mitsuhashi ,  Manabu Yabe

Inventor： Tetsuro Yamashita ,  Tsuyoshi Mitsuhashi ,  Manabu Yabe

IPC: B05C11/08 ,  B05D3/10 ,  B08B3/08 ,  C11D7/50 ,  C11D11/00 ,  H01L21/00 ,  H01L21/311 ,  B44C1/22 ,  B08B6/00

CPC classification number: H01L21/6715 ,  B08B3/08 ,  C11D11/0047 ,  C11D7/5022 ,  H01L21/31133

Abstract: A film dissolving liquid is ejected from a needle-shaped nozzle onto a peripheral edge portion of a substrate surface of a SOG film, while being subjected to the film dissolving liquid. The substrate is rotated in order to dissolve and remove the SOG film from the peripheral edge portion of the substrate. The film dissolving liquid is a solvent or mixture of two or more solvents selected from the group cyclohexanone, .gamma.-butyrolactone, ethyl lactate or ethyl pyruvate. As a result, a swelling of the SOG film is not created at the edge portion of the substrate. A crack is not therefore created at the edge portion of the SOG film, and generation of particles due to a damage at the film swelling portion thereof is prevented.

Abstract translation: 将薄膜溶解液从针状喷嘴喷射到SOG膜的基板表面的周边部分上，同时进行溶解液体。 旋转基板以从基板的周边部分溶解并除去SOG膜。 膜溶解液是选自环己酮，γ-丁内酯，乳酸乙酯或丙酮酸乙酯的两种或更多种溶剂的溶剂或混合物。 结果，在基板的边缘部分处不产生SOG膜的膨胀。 因此，在SOG膜的边缘部分处不产生裂纹，并且防止了由于其在膜膨胀部分处的损坏而产生的颗粒。

公开(公告)号：US5762709A

公开(公告)日：1998-06-09

申请号：US680983

申请日：1996-07-16

Applicant: Kenji Sugimoto ,  Katsushi Yoshioka ,  Seiichiro Okuda ,  Tsuyoshi Mitsuhashi

Inventor： Kenji Sugimoto ,  Katsushi Yoshioka ,  Seiichiro Okuda ,  Tsuyoshi Mitsuhashi

IPC: G03F7/16 ,  B05C11/08 ,  B05D1/40 ,  H01L21/00 ,  H01L21/027 ,  B05C11/02

CPC classification number: H01L21/6715 ,  B05C11/08

Abstract: A substrate spin coating apparatus for forming a coating film on the upper surface of a spinning substrate includes a spin chuck for supporting and spinning the substrate while holding same substantially in horizontal posture. A scatter preventive cup surrounds lateral and lower regions of the spin chuck, and defines an opening in an upper central region thereof for allowing entry of air flows. An exhaust vent is provided for downwardly exhausting the air flows, and a nozzle is provided for supplying a coating solution through the opening of the scatter preventive cup to the upper surface of the substrate. The scatter preventive cup includes an air passage formed in a bottom region thereof and opening toward a lower surface of the substrate. An air flow adjusting unit is connected to the air passage for adjusting an air flow to a predetermined temperature and supplying the adjusted air flow to the air passage.

Abstract translation: 用于在纺丝基材的上表面上形成涂膜的基材旋涂装置包括：旋转卡盘，用于支撑和旋转基材，同时基本保持水平姿势。 散射防止杯围绕旋转卡盘的横向和下部区域，并且在其上部中心区域中限定开口以允许空气流进入。 设置有用于向下排出空气流的排气口，并且设置有用于通过散射防止杯的开口将涂布溶液供给到基板的上表面的喷嘴。 散射防止杯包括形成在其底部区域中并且朝向基板的下表面开口的空气通道。 气流调节单元连接到空气通道，用于将空气流调节到预定温度，并将经调节的空气流供应到空气通道。

公开(公告)号：US5049483A

公开(公告)日：1991-09-17

申请号：US532946

申请日：1990-06-04

Applicant: Naoko Yatsuyanagi ,  Tsuyoshi Mitsuhashi

Inventor： Naoko Yatsuyanagi ,  Tsuyoshi Mitsuhashi

IPC: G03C1/485

CPC classification number: G03C1/48515 ,  Y10S430/141 ,  Y10S430/164

Abstract: There is disclosed a direct positive silver halide light-sensitive material which can be processed in ultra-rapid processing and have a higher sensitivity, a lower Dmin, an excellent antistatic property and less flactuation of the properties in storing. The light-sensitive material contains an electron-accepting compound in a silver halide emulsion layer, and a fluorinated surfactant and/or at least one of the compounds represented by Formulas I-a to II-b in a photographic component layer: ##STR1## wherein R.sub.1 to R.sub.4 represent independently a hydrogen atom, a lower alkyl group, an alkoxy group, a carboxy group, an alkoxycarbonyl group, a sulfo group, a halogen atom, and a nitro group, provided that at least one of R.sub.1 and R.sub.2 is a carboxy group, an alkoxycarbonyl group or a sulfo group.

公开(公告)号：US09299596B2

公开(公告)日：2016-03-29

申请号：US12343292

申请日：2008-12-23

Applicant: Hiroyuki Ogura ,  Tsuyoshi Mitsuhashi ,  Yoshiteru Fukutomi ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

Inventor： Hiroyuki Ogura ,  Tsuyoshi Mitsuhashi ,  Yoshiteru Fukutomi ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

IPC: B05C13/02 ,  H01L21/677 ,  H01L21/67 ,  C23C16/00

CPC classification number: H01L21/67225 ,  B05C9/12 ,  B05C9/14 ,  B05C13/00 ,  B05C13/02 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67196 ,  H01L21/67276 ,  H01L21/67742

Abstract: A substrate treating apparatus for treating substrates includes a plurality of substrate treatment lines arranged vertically for carrying out plural types of treatment on the substrates while transporting the substrates substantially horizontally, and a controller for changing processes of treatment carried out on the substrates for each of the substrate treatment lines. By changing the processes of treatment carried out for the substrates for each substrate treatment line, the processes of treatment carried out for the substrates can be changed for each substrate conveniently. Thus, a plurality of different processes of treatment corresponding to the number of substrate treatment lines can be carried out in parallel for the respective substrates.

Abstract translation: 用于处理基板的基板处理装置包括：垂直布置的多个基板处理线，用于在基板上大致水平地输送基板的同时在基板上进行多种处理;以及控制器，用于改变对基板的处理 底物处理线。 通过改变对于每个基板处理线的基板的处理过程，可以方便地对每个基板改变对基板进行的处理的处理。 因此，对于各个基板，可以并行地执行与基板处理线的数量相对应的多个不同的处理处理。

公开(公告)号：US09230834B2

公开(公告)日：2016-01-05

申请号：US13401617

申请日：2012-02-21

Applicant: Yoshiteru Fukutomi ,  Tsuyoshi Mitsuhashi ,  Hiroyuki Ogura ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

Inventor： Yoshiteru Fukutomi ,  Tsuyoshi Mitsuhashi ,  Hiroyuki Ogura ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

IPC: B05D3/12 ,  H01L21/677 ,  H01L21/67 ,  B05C13/00 ,  B05D3/04 ,  B05B15/12 ,  H01L23/34

CPC classification number: H01L21/67178 ,  B05B14/43 ,  B05B14/44 ,  B05C13/00 ,  B05C13/02 ,  B05D3/0486 ,  G03F7/26 ,  H01L21/67017 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67225 ,  H01L23/34 ,  H01L2924/0002 ,  Y10S414/135 ,  H01L2924/00

Abstract: A substrate treating method for treating substrates with a substrate treating apparatus having an indexer section, a treating section and an interface section includes performing resist film forming treatment in parallel on a plurality of stories provided in the treating section and performing developing treatment in parallel on a plurality of stories provided in the treating section.

Abstract translation: 用具有分度器部分，处理部分和界面部分的基板处理装置处理基板的基板处理方法包括在设置在处理部分中的多个故事层并行地进行抗蚀剂膜形成处理，并且在 在治疗部分设置多个故事。

公开(公告)号：US20120156380A1

公开(公告)日：2012-06-21

申请号：US13401617

申请日：2012-02-21

Applicant: Yoshiteru Fukutomi ,  Tsuyoshi Mitsuhashi ,  Hiroyuki Ogura ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

Inventor： Yoshiteru Fukutomi ,  Tsuyoshi Mitsuhashi ,  Hiroyuki Ogura ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

IPC: B05D3/02 ,  B05D3/00

CPC classification number: H01L21/67178 ,  B05B14/43 ,  B05B14/44 ,  B05C13/00 ,  B05C13/02 ,  B05D3/0486 ,  G03F7/26 ,  H01L21/67017 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67225 ,  H01L23/34 ,  H01L2924/0002 ,  Y10S414/135 ,  H01L2924/00

Abstract: A substrate treating method for treating substrates with a substrate treating apparatus having an indexer section, a treating section and an interface section includes performing resist film forming treatment in parallel on a plurality of stories provided in the treating section and performing developing treatment in parallel on a plurality of stories provided in the treating section.

Abstract translation: 用具有分度器部分，处理部分和界面部分的基板处理装置处理基板的基板处理方法包括在设置在处理部分中的多个故事层并行地进行抗蚀剂膜形成处理，并且在 在治疗部分设置多个故事。

公开(公告)号：US20120145074A1

公开(公告)日：2012-06-14

申请号：US13401644

申请日：2012-02-21

Applicant: Yoshiteru Fukutomi ,  Tsuyoshi Mitsuhashi ,  Hiroyuki Ogura ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

Inventor： Yoshiteru Fukutomi ,  Tsuyoshi Mitsuhashi ,  Hiroyuki Ogura ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

IPC: B05C13/02

CPC classification number: H01L21/67178 ,  B05B14/43 ,  B05B14/44 ,  B05C13/00 ,  B05C13/02 ,  B05D3/0486 ,  G03F7/26 ,  H01L21/67017 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67225 ,  H01L23/34 ,  H01L2924/0002 ,  Y10S414/135 ,  H01L2924/00

Abstract: A substrate treating apparatus includes a treating block including a plurality of cells arranged one over another. Each cell has treating units for treating substrates and a single main transport mechanism for transporting the substrates to the treating units. Each cell also has a blowout unit for supplying a clean gas into a transporting space of the main transport mechanism and an exhaust unit for exhausting gas from the transporting space. The blowout unit and the exhaust unit are arranged one over the other in the transporting space to separate the transporting space of each cell from that of another cell.

Abstract translation: 一种基板处理装置，包括处理块，该处理块包括多个彼此排列的单元。 每个电池具有用于处理基板的处理单元和用于将基板输送到处理单元的单个主输送机构。 每个电池还具有用于向主输送机构的输送空间供给清洁气体的吹出单元和用于从输送空间排出气体的排气单元。 喷出单元和排气单元在传送空间中彼此重叠配置，以将每个单元的传送空间与另一个单元的传送空间分开。