公开(公告)号：US10096447B1

公开(公告)日：2018-10-09

申请号：US15666666

申请日：2017-08-02

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears

IPC: H01J37/145 ,  H01J37/244 ,  H01J37/28 ,  H01J37/073 ,  H01J37/075 ,  G01N23/2251

Abstract: A magnetic gun lens and an electrostatic gun lens can be used in an electron beam apparatus and can help provide high resolutions for all usable electron beam currents in scanning electron microscope, review, and/or inspection uses. An extracted beam can be directed at a wafer through a beam limiting aperture using the magnetic gun lens. The electron beam also can pass through an electrostatic gun lens after the electron beam passes through the beam limiting aperture.

公开(公告)号：US09892885B2

公开(公告)日：2018-02-13

申请号：US15269031

申请日：2016-09-19

Applicant: KLA-Tencor Corporation

Inventor： Frank Laske ,  Christopher Sears

IPC: G03F7/20 ,  G03F1/84 ,  H01J37/10 ,  H01J37/28 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/10 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1501

Abstract: A scanning electron microscopy system includes an electron beam source, a sample stage that includes a first alignment feature, an electron-optical column that includes electron-optical elements that include a lens having a second alignment feature, and an alignment plate having a third alignment feature. The system additionally includes a reference target, and a detector assembly. The electron-optical elements configurable to simultaneously focus on a substrate and the reference target. The system also includes a controller communicatively coupled to at least one or more portions of the electron-optical column and the sample stage, to make adjustments in order to align the electron beam to at least one of the first set of alignment features, the second set of alignment features, the third set of alignment features, the reference target or the substrate. The controller also makes adjustments to simultaneously focus the electron beam at a first and second high resolution plane.

公开(公告)号：US09881764B2

公开(公告)日：2018-01-30

申请号：US15255314

申请日：2016-09-02

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears ,  Douglas Larson

IPC: H01J37/26 ,  G21K5/04 ,  H01J37/04 ,  H01J37/21 ,  H01J37/147

CPC classification number: H01J37/045 ,  H01J37/147 ,  H01J37/21 ,  H01J2237/0451 ,  H01J2237/0492 ,  H01J2237/1505 ,  H01J2237/24592

Abstract: An electron beam apparatus addresses blanking issues resulting from sinking high-power heat onto an aperture diaphragm by evenly spreading heat on the aperture diaphragm. The apparatus can include an aperture diaphragm and a deflector that deflects the electron beam on the aperture diaphragm. The electron beam is directed at the aperture diaphragm in a pattern around the aperture. The pattern may be a circle, square, or polygon. The pattern also may include a variable locus relative to the aperture.

公开(公告)号：US20170278666A1

公开(公告)日：2017-09-28

申请号：US15269031

申请日：2016-09-19

Applicant: KLA-Tencor Corporation

Inventor： Frank Laske ,  Christopher Sears

IPC: H01J37/10 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/10 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1501

Abstract: A scanning electron microscopy system includes an electron beam source, a sample stage that includes a first alignment feature, an electron-optical column that includes electron-optical elements that include a lens having a second alignment feature, and an alignment plate having a third alignment feature. The system additionally includes a reference target, and a detector assembly. The electron-optical elements configurable to simultaneously focus on a substrate and the reference target. The system also includes a controller communicatively coupled to at least one or more portions of the electron-optical column and the sample stage, to make adjustments in order to align the electron beam to at least one of the first set of alignment features, the second set of alignment features, the third set of alignment features, the reference target or the substrate. The controller also makies adjustments to simultaneously focus the electron beam at a first and second high resolution plane.

公开(公告)号：US09653257B2

公开(公告)日：2017-05-16

申请号：US15058062

申请日：2016-03-01

Applicant: KLA-Tencor Corporation

Inventor： Christopher Sears ,  Ben Clarke

IPC: H01J37/28 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/265 ,  H01J2237/004 ,  H01J2237/153 ,  H01J2237/226

Abstract: A scanning electron microscopy system for mitigating charging artifacts includes a scanning electron microscopy sub-system for acquiring multiple images from a sample. The images include one or more sets of complementary images. The one or more sets of complementary images include a first image acquired along a first scan direction and a second image acquired along a second scan direction opposite to the first scan direction. The system includes a controller communicatively coupled to the scanning electron microscopy sub-system. The controller is configured to receive images of the sample from the scanning electron microscopy sub-system. The controller is further configured to generate a composite image by combining the one or more sets of complementary images.

公开(公告)号：US20160329189A1

公开(公告)日：2016-11-10

申请号：US15148331

申请日：2016-05-06

Applicant: KLA-Tencor Corporation

Inventor： Christopher Sears ,  Xinrong Jiang ,  Sameet K. Shriyan

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/153 ,  H01J37/20

CPC classification number: H01J37/28 ,  H01J37/1474 ,  H01J2237/1534 ,  H01J2237/1536

Abstract: A scanning electron microscopy system is disclosed. The system includes an electron beam source configured to generate a primary electron beam. The system includes a sample stage configured to secure a sample. The system includes a set of electron-optical elements configured to direct at least a portion of the primary electron beam onto a portion of the sample. The set of electron-optical elements includes an upper deflector assembly and a lower deflector assembly. The upper deflect assembly is configured to compensate for chromatic aberration in the primary electron beam caused by the lower deflector assembly. In addition, the system includes a detector assembly positioned configured to detect electrons emanating from the surface of the sample.

Abstract translation: 公开了一种扫描电子显微镜系统。 该系统包括被配置为产生一次电子束的电子束源。 该系统包括配置成固定样品的样品台。 该系统包括一组电子 - 光学元件，其被配置为将至少一部分一次电子束引导到样品的一部分上。 该组电子 - 光学元件包括上偏转器组件和下偏转器组件。 上偏转组件被配置为补偿由下偏转器组件引起的一次电子束中的色像差。 此外，该系统包括检测器组件，其被配置成检测从样品表面发出的电子。

公开(公告)号：US09171694B2

公开(公告)日：2015-10-27

申请号：US14532805

申请日：2014-11-04

Applicant: KLA-Tencor Corporation

Inventor： Christopher Sears

IPC: H01J37/147 ,  H01J37/141 ,  H01J37/12 ,  H01J37/153 ,  H01J37/10

CPC classification number: H01J37/1472 ,  H01J37/10 ,  H01J37/1471 ,  H01J37/153 ,  H01J2237/10 ,  H01J2237/1508 ,  H01J2237/1516 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/2602 ,  H01J2237/28

Abstract: An electron beam device for inspecting a target substrate or specimen thereon includes a beam separator with an asymmetric quadrupole electrostatic deflector for improving field uniformity for a single direction of deflection. The asymmetric quadrupole electrostatic deflector includes two orthogonal electrode plates spanning roughly 60 degrees and two electrode plates spanning roughly 120 degrees, the two latter plates defining a unidirectional deflection field. The device generates a primary electron beam and focuses the primary electron beam along an optical axis into the target substrate. Secondary electrons detected at the target substrate are focused into a secondary electron beam. The beam separator with asymmetric quadrupole electrostatic deflector deflects the secondary electron beam away from the axis of the primary electron beam in the direction of deflection and into a detector array.

Abstract translation: 用于检查目标衬底或样本的电子束装置包括具有不对称四极静电偏转器的光束分离器，用于改善单个偏转方向的场均匀性。 不对称四极静电偏转器包括跨越大约60度的两个正交电极板和跨越大约120度的两个电极板，后两个板限定单向偏转场。 器件产生一次电子束，并将一次电子束沿光轴聚焦到目标衬底中。 在目标衬底处检测到的二次电子被聚焦成二次电子束。 具有不对称四极静电偏转器的光束分离器使二次电子束在偏转方向上偏离一次电子束的轴线并且进入检测器阵列。

公开(公告)号：US11087950B2

公开(公告)日：2021-08-10

申请号：US16112832

申请日：2018-08-27

Applicant: KLA-TENCOR CORPORATION

Inventor： Christopher Sears ,  Luca Grella

IPC: H01J37/10 ,  H01J37/153 ,  H01J37/06 ,  H01J37/22 ,  H01J37/28

Abstract: Systems and methods to focus and align multiple electron beams are disclosed. A camera produces image data of light from electron beams that is projected at a fiber optics array with multiple targets. An image processing module determines an adjustment to a voltage applied to a relay lens, a field lens, or a multi-pole array based on the image data. The adjustment minimizes at least one of a displacement, a defocus, or an aberration of one of the electron beams. Using a control module, the voltage is applied to the relay lens, the field lens, or the multi-pole array.

公开(公告)号：US20190004298A1

公开(公告)日：2019-01-03

申请号：US15672797

申请日：2017-08-09

Applicant: KLA-Tencor Corporation

Inventor： Ichiro Honjo ,  Christopher Sears ,  Hedong Yang ,  Thanh Ha ,  Jianwei Wang ,  Huina Xu

IPC: G02B21/00 ,  H01J37/22 ,  H01J37/30 ,  G06N3/08

Abstract: Objective lens alignment of a scanning electron microscope review tool with fewer image acquisitions can be obtained using the disclosed techniques and systems. Two different X-Y voltage pairs for the scanning electron microscope can be determined based on images. A second image based on the first X-Y voltage pair can be used to determine a second X-Y voltage pair. The X-Y voltage pairs can be applied at the Q4 lens or other optical components of the scanning electron microscope.

公开(公告)号：US10056224B2

公开(公告)日：2018-08-21

申请号：US15231728

申请日：2016-08-08

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears ,  Harsh Sinha ,  David Trease ,  David Kaz ,  Wei Ye

IPC: H01J37/153 ,  H01J37/141

CPC classification number: H01J37/153 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/1536

Abstract: An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.