Process for manufacture of a component made of opaque synthetic quartz glass, and quartz glass tube manufactured according to the method
    16.
    发明申请
    Process for manufacture of a component made of opaque synthetic quartz glass, and quartz glass tube manufactured according to the method 有权
    由不透明的合成石英玻璃制成的部件的制造方法以及根据该方法制造的石英玻璃管

    公开(公告)号:US20020134108A1

    公开(公告)日:2002-09-26

    申请号:US09839795

    申请日:2001-04-20

    Abstract: A process for manufacture of a component made of opaque synthetic quartz glass, and a quartz glass tube manufactured according to said process. The process comprises (i) providing a starting material in the form of granulated material of highly pure, synthetic SiO2 comprising at least partially porous agglomerates of SiO2 primary particles, the granulated material having a compacted bulk density of no less than 0.8 g/cm3, (ii) filling the granulated material into a mold and converting it to an opaque quartz glass preform through a process of melting, and (iii) reshaping the preform in a heat reshaping process to obtain a component made of opaque quartz glass. A quartz glass tube is made of quartz glass consisting of a granulated material of synthetic SiO2 with a lithium content of no more than 100 wt-ppb, and the wall thickness of said component being in the range of 0.5 mm to 15 mm.

    Abstract translation: 一种制造由不透明的合成石英玻璃制成的部件的方法,以及根据所述方法制造的石英玻璃管。 该方法包括(i)提供高纯度合成SiO 2的造粒材料形式的起始材料,其包含SiO 2一次颗粒的至少部分多孔附聚物,所述造粒材料的压实堆积密度不小于0.8g / cm 3, (ii)将造粒材料填充到模具中并通过熔化过程将其转化为不透明的石英玻璃预制件,以及(iii)在热成型工艺中重新成形预成型件以获得由不透明石英玻璃制成的部件。 石英玻璃管由石英玻璃制成,石英玻璃由合成SiO 2的粒状材料组成,锂含量不超过100wt-ppb,所述组分的壁厚在0.5mm至15mm的范围内。

    Method for producing synthetic quartz glass for use in ArF excimer laser lithography
    17.
    发明授权
    Method for producing synthetic quartz glass for use in ArF excimer laser lithography 失效
    用于ArF准分子激光光刻的合成石英玻璃的制造方法

    公开(公告)号:US06266978B1

    公开(公告)日:2001-07-31

    申请号:US09392427

    申请日:1999-09-09

    CPC classification number: C03C23/0025 C03C3/06 C03C23/002 C03C2201/50

    Abstract: A simple method for producing a synthetic quartz glass having excellent homogeneity and high transmittance, which is useful as an optical material in producing steppers equipped with an ArF excimer laser as a radiation source. A method for producing a synthetic quartz glass for use in ArF excimer laser lithography, which comprises irradiating a highly homogeneous synthetic quartz glass containing less than 60 ppb of Na with ultraviolet radiation having a maximum wavelength of 260 nm for not less than the duration expressed by the equation: Y=(80X−1880)/Z wherein X represents an Na concentration (ppb), Y represents the duration of irradiation (hours), and Z represents the illuminance of an ultraviolet radiation on an irradiated surface (mW/cm2).

    Abstract translation: 用于制造具有优异的均匀性和高透射率的合成石英玻璃的简单方法,其可用作制备装备有ArF准分子激光器作为辐射源的步进机中的光学材料。 一种用于制造用于ArF准分子激光光刻的合成石英玻璃的方法,其包括:将含有小于60ppb的Na的高度均匀的合成石英玻璃与最大波长为260nm的紫外线辐射照射不少于由 方程式:其中X表示Na浓度(ppb),Y表示照射持续时间(小时),Z表示照射表面上的紫外线照射的照度(mW / cm 2)。

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