公开(公告)号：US09153404B2

公开(公告)日：2015-10-06

申请号：US13705084

申请日：2012-12-04

Applicant: Lawrence Livermore National Security, LLC

Inventor： Yu-Jiuan Chen

IPC: H01J3/26 ,  A61N5/10 ,  G21K1/087

CPC classification number: H01J3/26 ,  A61N5/1043 ,  A61N5/1077 ,  A61N2005/1087 ,  G21K1/087

Abstract: Devices and methods are provided to allow rapid deflection of a charged particle beam. The disclosed devices can, for example, be used as part of a hadron therapy system to allow scanning of a target area within a patient's body. The disclosed charged particle beam deflectors include a dielectric wall accelerator (DWA) with a hollow center and a dielectric wall that is substantially parallel to a z-axis that runs through the hollow center. The dielectric wall includes one or more deformed high gradient insulators (HGIs) that are configured to produce an electric field with an component in a direction perpendicular to the z-axis. A control component is also provided to establish the electric field component in the direction perpendicular to the z-axis and to control deflection of a charged particle beam in the direction perpendicular to the z-axis as the charged particle beam travels through the hollow center of the DWA.

Abstract translation: 提供了装置和方法以允许带电粒子束的快速偏转。 所公开的装置可以例如用作强子治疗系统的一部分，以允许扫描患者体内的目标区域。 所公开的带电粒子束偏转器包括具有中空中心的电介质壁加速器（DWA）和基本平行于穿过中空中心的z轴平行的电介质壁。 电介质壁包括一个或多个变形的高梯度绝缘体（HGI），其被配置为产生具有垂直于z轴的方向的分量的电场。 还提供控制组件以在垂直于z轴的方向上建立电场分量，并且当带电粒子束穿过中空中心时，控制带电粒子束在垂直于z轴的方向上的偏转 DWA。

公开(公告)号：US08921805B2

公开(公告)日：2014-12-30

申请号：US14218563

申请日：2014-03-18

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Josef Biberger ,  Ralph Pulwey ,  Andreas Adolf

IPC: H01J3/14 ,  H01J3/26 ,  H01J37/147 ,  H01J37/28 ,  H01J37/317

CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1477 ,  H01J37/28 ,  H01J37/317 ,  H01J2237/303 ,  H01J2237/31749

Abstract: An ion beam system comprises a voltage supply system 7 and at least one beam deflector 39 having at least one first deflection electrode 51a, 51b, 51c and plural second deflection electrodes 52a, 52b, 52c, wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation. The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.

Abstract translation: 离子束系统包括电压供应系统7和至少一个具有至少一个第一偏转电极51a，51b，51c和多个第二偏转电极52a，52b，52c的光束偏转器39，其中电压供应系统被配置为提供不同的 可变偏转电压到多个第二偏转电极，使得多个第二偏转电极和相对的至少一个第一偏转电极之间的电偏转场具有共同的取向。 该系统具有高动能模式，其中电偏转场的分布具有较大的宽度，其中电偏转场的分布具有较小宽度的低动能模式。

公开(公告)号：US20140224997A1

公开(公告)日：2014-08-14

申请号：US14180350

申请日：2014-02-13

Applicant: Industry-University Cooperation Foundation Sunmoon University

Inventor： Tae Sik OH ,  Ho Seob KIM ,  Dae Wook KIM ,  Seung Joon AHN

IPC: H01J3/26 ,  H01J3/14

CPC classification number: H01J3/26 ,  H01J3/021 ,  H01J3/12 ,  H01J3/14 ,  H01J3/18 ,  H01J3/30 ,  H01J37/04 ,  H01J2237/1205

Abstract: An ultra-miniaturized electron optical microcolumn is provided. The electron optical microcolumn includes an electron-emitting source emitting electrons using a field emission principle, an extraction electrode causing the emission of electrons from the electron-emitting source, a focusing electrode to which voltage is flexibly applied in response to a working distance to a target for regulating a focusing force of electron beams emitted from the electron-emitting source, an acceleration electrode accelerating electrons emitted by the extraction electrode, a limit electrode regulating an amount and a size of electron beams using electrons accelerated by the acceleration electrode, and a deflector deflecting electron beams towards the target.

Abstract translation: 提供超小型电子光学微柱。 电子光学微柱包括使用场致发射原理发射电子的电子发射源，引起来自电子发射源的电子的引出电极，响应于工作距离而被柔性施加电压的聚焦电极 用于调节从电子发射源发射的电子束的聚焦力的目标，加速由引出电极发射的电子的加速电极，限制电极使用由加速电极加速的电子来调节电子束的量和尺寸，以及 偏转器偏转电子束朝向目标。

公开(公告)号：US08729491B2

公开(公告)日：2014-05-20

申请号：US13789434

申请日：2013-03-07

Applicant: Hitachi High-Technologies Corporation

Inventor： Hideto Dohi ,  Akira Ikegami ,  Hideyuki Kazumi

IPC: H01J37/147 ,  H01J3/26 ,  H01J29/58

CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/1508

Abstract: The present invention provides a charged particle beam apparatus which is provided with a tilting deflector which is disposed between a charged particle source and an objective lens and tilts a charged particle beam, wherein a first optical element includes an electromagnetic quadrupole which generates dispersion to suppress the dispersion which is generated by deflection by the tilting deflector, and a second optical element is composed of a deflector for deflecting the charged particle beam which enters the first optical element or an electromagnetic quadrupole which causes the charged particle beam to generate a dispersion different from the dispersion generated by the first optical element.

Abstract translation: 本发明提供一种具有倾斜偏转器的带电粒子束装置，该倾斜偏转器设置在带电粒子源和物镜之间并使带电粒子束倾斜，其中第一光学元件包括电磁四极杆，其产生分散体以抑制 由倾斜偏转器偏转产生的色散，第二光学元件由用于偏转进入第一光学元件的电荷粒子束或电磁四极杆的偏转器组成，导致带电粒子束产生不同于 由第一光学元件产生的色散。

公开(公告)号：US08723114B2

公开(公告)日：2014-05-13

申请号：US13679181

申请日：2012-11-16

Applicant: National University of Singapore

Inventor： Anjam Khursheed ,  Hung Quang Hoang

IPC: H01J37/26 ,  H01J3/26 ,  H01J49/48 ,  H01J49/44

CPC classification number: H01J49/48 ,  H01J3/26 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28 ,  H01J49/44 ,  H01J2237/05 ,  H01J2237/0535 ,  H01J2237/24485

Abstract: A sequential radial mirror analyzer (RMA) (100) for facilitating rotationally symmetric detection of charged particles caused by a charged beam incident on a specimen (112) is disclosed. The RMA comprises a 0V equipotential exit grid (116), and a plurality of electrodes (119, 120a, 120b, 120c) electrically configured to generate corresponding electrostatic fields for deflecting at least some of the charged particles of a single energy level to exit through the exit grid (116) to form a second-order focal point on a detector (106). The second-order focal point is associated with the single energy level, and the detector (106) is disposed external to the corresponding electrostatic fields. A related method is also disclosed.

Abstract translation: 公开了一种用于促进由入射在样本（112）上的带电束引起的带电粒子的旋转对称检测的顺序径向镜分析器（RMA）（100）。 RMA包括0V等电位出口格栅（116），以及多个电极（119,120a，120b，120c），其被电配置为产生相应的静电场，用于偏转单个能级的至少一些带电粒子以便通过 出口格栅（116）以在检测器（106）上形成二阶焦点。 二阶焦点与单个能级相关联，并且检测器（106）设置在相应静电场的外部。 还公开了相关方法。

公开(公告)号：US20130140987A1

公开(公告)日：2013-06-06

申请号：US13308614

申请日：2011-12-01

Applicant: Chih-Hong Hwang ,  Chun-Lin Chang ,  Nai-Han Cheng ,  Chi-Ming Yang ,  Chin-Hsiang Lin

Inventor： Chih-Hong Hwang ,  Chun-Lin Chang ,  Nai-Han Cheng ,  Chi-Ming Yang ,  Chin-Hsiang Lin

IPC: H01J37/06

CPC classification number: H01J37/026 ,  H01J3/02 ,  H01J3/022 ,  H01J3/26 ,  H01J37/06 ,  H01J37/3171 ,  H01J2237/0041 ,  H01J2237/31705

Abstract: The present disclosure provides for various advantageous methods and apparatus of controlling electron emission. One of the broader forms of the present disclosure involves an electron emission element, comprising an electron emitter including an electron emission region disposed between a gate electrode and a cathode electrode. An anode is disposed above the electron emission region, and a voltage set is disposed above the anode. A first voltage applied between the gate electrode and the cathode electrode controls a quantity of electrons generated from the electron emission region. A second voltage applied to the anode extracts generated electrons. A third voltage applied to the voltage set controls a direction of electrons extracted through the anode.

Abstract translation: 本公开提供了控制电子发射的各种有利的方法和装置。 本公开的更广泛形式之一涉及电子发射元件，其包括电子发射器，其包括设置在栅电极和阴极之间的电子发射区。 阳极设置在电子发射区域的上方，并且在阳极上设置电压组。 施加在栅电极和阴极之间的第一电压控制从电子发射区产生的电子量。 施加到阳极的第二电压提取产生的电子。 施加到电压组的第三电压控制通过阳极提取的电子的方向。

公开(公告)号：US20130134323A1

公开(公告)日：2013-05-30

申请号：US13723269

申请日：2012-12-21

Applicant: ATTI INTERNATIONAL SERVICES COMPANY, INC.

Inventor： Artush A. Abgaryan ,  Eli Levi ,  Thomas Leddy

IPC: H01J3/26

CPC classification number: H01J3/14 ,  H01J3/26 ,  H01J37/244 ,  H01J2237/2446 ,  H01J2237/24507 ,  H01J2237/24514 ,  H01J2237/24542

Abstract: Electron beam profile testing and analysis method is introduced using the MOMS apparatus. The MOMS apparatus includes a Faraday Cup with a knife-wires scanning system which together perform simultaneous measurements. The scanning system has a five-dimensional processing mechanism for measuring different cross sections of an e-beam profile in a path of the e-beam. Measurements are conducted using the scanning system by virtually dividing each cross section into a plurality of subsections and measuring independent current values of at least one wire of the scanning system through which the electron beam passes from every pixel in each of the plurality of subsections. By providing relative movement between the scanning system and e-beam, the measured independent current values are analyzed to obtain the functional form of distribution of current density of the cross-section of the e-beam. The Faraday cup enables simultaneous measurement of the total value of the current.

Abstract translation: 使用MOMS仪器引入电子束剖面测试和分析方法。 MOMS装置包括具有刀线扫描系统的法拉第杯，它们一起执行同时测量。 扫描系统具有用于测量电子束的路径中的电子束轮廓的不同横截面的五维处理机构。 使用扫描系统进行测量，通过将每个横截面实际上划分成多个子部分并且测量扫描系统的至少一根导线的独立电流值，电子束通过该电子束从多个子部分中的每一个中的每个像素通过。 通过提供扫描系统和电子束之间的相对运动，分析测量的独立电流值以获得电子束横截面的电流密度分布的功能形式。 法拉第杯可以同时测量电流的总值。

公开(公告)号：US20130001432A1

公开(公告)日：2013-01-03

申请号：US13498131

申请日：2012-03-23

Applicant: Yves Jongen

Inventor： Yves Jongen

IPC: H01J3/14

CPC classification number: H01J3/26 ,  A61N5/01 ,  A61N5/10 ,  A61N5/1077 ,  A61N5/1081 ,  A61N2005/1087 ,  G21K1/093

Abstract: The present invention relates to a particle therapy apparatus used for radiation therapy. More particularly, this invention relates to a compact isocentric gantry for delivering particle beams perpendicularly to a rotation axis of the gantry. The gantry comprises three dipole magnets. The angle of the last dipole magnet is smaller than 90° and a most preferred bending angle for this last dipole magnet is 60°.

Abstract translation: 本发明涉及用于放射治疗的颗粒治疗装置。 更具体地，本发明涉及一种用于沿垂直于台架的旋转轴线输送颗粒束的紧凑型等中心台架。 龙门架包括三个偶极子磁体。 最后的偶极子磁体的角度小于90°，​​最后的偶极子磁体的最佳弯曲角度为60°。

公开(公告)号：US20110121195A1

公开(公告)日：2011-05-26

申请号：US12864612

申请日：2009-06-09

Applicant: Hisashi Harada ,  Takaaki Iwata

Inventor： Hisashi Harada ,  Takaaki Iwata

IPC: H01J1/50 ,  A61N5/10

CPC classification number: H01J3/22 ,  A61N5/1042 ,  A61N5/1043 ,  A61N5/1077 ,  A61N5/1078 ,  A61N2005/1087 ,  H01J3/26

Abstract: The objective is to obtain a particle beam therapy system, the irradiation flexibility of which is high and that can reduce the amount of irradiation onto a normal tissue. There are provided a scanning electromagnet that performs scanning and outputting in such a way that a supplied charged particle beam is formed in a three-dimensional irradiation shape based on a treatment plan; and deflection electromagnets that switch the orbits for the charged particle beam in such a way that the charged particle beam with which scanning and outputting are performed by the scanning electromagnet reaches an isocenter through a single beam orbit selected from a plurality of beam orbits established between the isocenter and the scanning electromagnet. The distance between the scanning electromagnet and the isocenter is made long.

Abstract translation: 目的是获得粒子束治疗系统，其照射灵活性高，并且可以减少照射到正常组织上的量。 提供一种扫描电磁体，其以这样一种方式执行扫描和输出，使得基于处理计划以三维照射形状形成所提供的带电粒子束; 以及偏转电磁体，其以使得由扫描电磁体执行扫描和输出的带电粒子束通过选自多个波束轨道中的单个波束轨道到达等角点的方式切换带电粒子束的轨道， 等距中心和扫描电磁铁。 扫描电磁铁与等角点之间的距离很长。

公开(公告)号：US20080203881A1

公开(公告)日：2008-08-28

申请号：US11915679

申请日：2006-05-29

Applicant: Ho Seob Kim ,  Byeng Jin

Inventor： Ho Seob Kim ,  Byeng Jin

IPC: H01J1/00 ,  H01K1/30

CPC classification number: H01J3/18 ,  H01J3/26 ,  H01J37/12 ,  H01J2237/0492 ,  H01J2237/1205

Abstract: The present invention relates to an electron column including an electron emission source and lenses, and, more particularly, to an electron column having a structure that can facilitate the alignment and assembly of an electron emission source and lenses. The electron column having an electron emission source and a lens unit according to the present invention is characterized in that the lens unit includes two or more lens layers and performs both a source lens function and a focusing function. Furthermore, the electron column is characterized in that the lens unit includes one or more deflector-type lens layers and additionally performs a deflector function.

Abstract translation: 本发明涉及包括电子发射源和透镜的电子柱，更具体地说，涉及具有能够促进电子发射源和透镜的对准和组装的结构的电子柱。 具有根据本发明的电子发射源和透镜单元的电子柱的特征在于，透镜单元包括两个或更多个透镜层，并且执行源透镜功能和聚焦功能。 此外，电子柱的特征在于，透镜单元包括一个或多个偏转器型透镜层，并且另外执行偏转器功能。