公开(公告)号：US12094684B1

公开(公告)日：2024-09-17

申请号：US16532459

申请日：2019-08-05

Applicant: Mochii, Inc.

Inventor： Christopher Su-Yan Own ,  Matthew Francis Murfitt

IPC: H01J37/28 ,  G01N23/2252 ,  H01J37/153 ,  H01J37/285

CPC classification number: H01J37/28 ,  G01N23/2252 ,  H01J37/153 ,  H01J37/285 ,  H01J2237/221 ,  H01J2237/2482 ,  H01J2237/2807

Abstract: A compact charged-particle-beam microscope, weighing less than about 50 kg and having a size of less than about 1 m×1 m×1 m, is provided for imaging a sample. The microscope has a vacuum chamber to maintain a low-pressure environment, a stage to hold a sample in the vacuum chamber, a charged-particle beam source to generate a charged-particle beam, charged-particle beam optics to converge the charged-particle beam onto the sample, and one or more beam scanners to scan the charged-particle beam across the sample. A charged-particle detector is provided to detect charged-particle radiation emanating from the sample and generate a corresponding charged-particle-detection signal. At least one energy dispersive x-ray spectrometer (EDS) is provided to detect x-rays emanating from the sample and generate a corresponding x-ray-detection signal. A controller analyzes the charged-particle-detection signal and the x-ray-detection signal to generate an image of the sample and a histogram of x-ray energies for at least a portion of the sample.

公开(公告)号：US12087541B2

公开(公告)日：2024-09-10

申请号：US17460381

申请日：2021-08-30

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen

IPC: H01J37/28 ,  H01J37/12 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/12 ,  H01J37/1472 ,  H01J37/1477 ,  H01J2237/04924 ,  H01J2237/083 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/2817

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

公开(公告)号：US20240282547A1

公开(公告)日：2024-08-22

申请号：US18647061

申请日：2024-04-26

Applicant: NuFlare Technology, Inc.

Inventor： Koichi ISHII ,  Atsushi ANDO

IPC: H01J37/153 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J37/317

CPC classification number: H01J37/153 ,  H01J37/1474 ,  H01J37/244 ,  H01J37/3177 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/2448 ,  H01J2237/2817 ,  H01J2237/31776

Abstract: A multi-electron beam image acquisition apparatus includes a multiple primary electron beams forming device to form multiple primary electron beams, a first-deflector to scan the multiple-primary electron beams over a target object by deflecting the multiple-primary electron beams, a corrector to correct a beam-array-distribution-shape of multiple-secondary electron beams emitted from the target object irradiated with the multiple-primary electron beams, a second-deflector to deflect the multiple-secondary electron beams whose beam-array-distribution-shape has been corrected, a detector to detect the deflected multiple-secondary electron beams, and a deflection control circuit to control applying, to the second-deflector, a superimposed potential obtained by superimposing a deflection potential which cancels out a position movement of the multiple-secondary electron beams moved along with scanning the multiple-primary electron beams on a correction potential which corrects a distortion being generated due to correcting the beam-array-distribution-shape of the multiple-secondary electron beams and being dependent on a deflection amount for scanning.

公开(公告)号：US20240274396A1

公开(公告)日：2024-08-15

申请号：US18110284

申请日：2023-02-15

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： John Breuer ,  Dominik Patrick Ehberger ,  Kathrin Mohler ,  Ivo Liska

IPC: H01J37/147 ,  H01J37/09 ,  H01J37/153 ,  H01J37/28

CPC classification number: H01J37/1472 ,  H01J37/09 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/022 ,  H01J2237/1516 ,  H01J2237/1534 ,  H01J2237/24514

Abstract: A method of forming a multipole device (100) for influencing an electron beam (11) is provided. The method is carried out in an electron beam apparatus (200) that comprises an aperture body (110) having at least one aperture opening (112). The method comprises directing the electron beam (11) onto two or more surface portions of the aperture body (110) on two or more sides of the at least one aperture opening (112) to generate an electron beam-induced deposition pattern (120) configured to act as a multipole in a charged state, particularly configured to act as a quadrupole, a hexapole and/or an octupole. The electron beam-induced deposition pattern (120) can be an electron beam-induced carbon or carbonaceous pattern. Further provided are methods of influencing an electron beam in an electron beam apparatus, particularly with a multipole device as described herein. Further provided is a multipole device for influencing an electron beam in an electron beam apparatus in a predetermined manner.

公开(公告)号：US20240249910A1

公开(公告)日：2024-07-25

申请号：US18417592

申请日：2024-01-19

Applicant: FEI Company

Inventor： Jaroslav Stárek ,  Jamie Dee Gravell ,  Jaroslav Maniš ,  Tomáš Onderlicka

IPC: H01J37/28 ,  G01N1/32 ,  H01J37/20

CPC classification number: H01J37/28 ,  G01N1/32 ,  H01J37/20 ,  H01J2237/31749

Abstract: Lamellae with thin regions for TEM of regions of interest include oppositely situated S-shaped cut faces that define a waist region. In some examples, the waist has a thickness of less than 25 nm and defines a double tapered region of height of between 400 nm and 800 nm that is suitable for TEM. A portion of the lamella at the top surface can comprising a metallic or other coating than serves to support the lamella.

公开(公告)号：US20240242925A1

公开(公告)日：2024-07-18

申请号：US18014803

申请日：2021-05-12

Applicant: Hitachi, Ltd.

Inventor： Shunya TANAKA ,  Takeshi OHMORI

IPC: H01J37/20 ,  G01N23/2204 ,  G01N23/2251 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/20 ,  G01N23/2204 ,  G01N23/2251 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/20207 ,  H01J2237/221

Abstract: There are provided a charged particle beam device capable of appropriately setting a tilt angle of a sample stage even if an observation surface is larger than the field of view, and a sample observation method using the same. The charged particle beam device is a device for obtaining an observation image of a sample by irradiating the sample with a charged particle beam, and is characterized by including: a sample stage that tilts with respect to each of two tilt axes intersecting with each other and holds the sample as well; a boundary detection unit that detects a boundary between an upper surface and a cleavage surface of the sample from each observation image obtained while changing a tilt angle of the sample stage, and calculates a tilt of the boundary with respect to the scanning direction of a charged particle beam; an upper surface detection unit that detects the upper surface from the observation image for each tilt angle, and calculates an upper surface vanishing angle that is a tilt angle of the sample stage at which the upper surface vanishes from the observation image; and a calculation processing unit that calculates an initial sample direction, which is a direction of the cleavage surface when the tilt angle is zero, on the basis of the tilt of the boundary for each tilt angle and the upper surface vanishing angle.

公开(公告)号：US20240242924A1

公开(公告)日：2024-07-18

申请号：US18560013

申请日：2022-02-25

Applicant: V TECHNOLOGY CO., LTD.

Inventor： Michinobu MIZUMURA

IPC: H01J37/153 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28

Abstract: A condenser lens works to process an ion beam into a collimated form. An electrical aperture unit is disposed between the condenser lens and the objective lens. The electrical aperture unit works to alter an area through which the ion beam, as processed by the condenser lens, passes, thereby controlling a diameter of the ion beam. A plurality of beam shielding plate units are provided each of which includes a pair of beam shielding plates which are diametrically opposed to each other across the ion beam which has passed through the condenser lens. The beam shielding plates are movable in a direction perpendicular to an optical axis of the ion beam. The beam shielding plate units are arranged around the ion beam to define a diameter of the ion beam passing therethrough.

公开(公告)号：US12033831B2

公开(公告)日：2024-07-09

申请号：US17408876

申请日：2021-08-23

Applicant: Applied Materials Israel Ltd.

Inventor： Ilya Blayvas ,  Yehuda Zur

IPC: H01J37/302 ,  H01J37/28 ,  H01J37/305 ,  H01L21/66

CPC classification number: H01J37/3023 ,  H01J37/28 ,  H01J37/305 ,  H01L22/12 ,  H01J2237/24578 ,  H01J2237/24585 ,  H01J2237/2814 ,  H01J2237/31749

Abstract: Analyzing a sidewall of a hole milled in a sample to determine thickness of a buried layer includes milling the hole in the sample using a charged particle beam of a focused ion beam (FIB) column to expose the buried layer along the sidewall of the hole. After milling, the sidewall of the hole has a known slope angle. From a perspective relative to a surface of the sample, a distance is measured between a first point on the sidewall corresponding to an upper surface of the buried layer and a second point on the sidewall corresponding to a lower surface of the buried layer. The thickness of the buried layer is determined using the known slope angle of the sidewall, the distance, and the angle relative to the surface of the sample.

公开(公告)号：US20240222069A1

公开(公告)日：2024-07-04

申请号：US18605106

申请日：2024-03-14

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Stefan Schubert

IPC: H01J37/28 ,  H01J37/244

CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J2237/24465 ,  H01J2237/24495

Abstract: A method for operating a multi-beam particle microscope in a contrast operating mode, comprises: irradiating an object with a multiplicity of charged first individual particle beams, each first individual particle beam irradiating a separate individual field region of the object in a scanning fashion; collecting second individual particle beams emerging or emanating from the object due to the first individual particle beams; defocused projecting the second individual particle beams onto detection regions of a detection unit so that the second individual particle beams emerging or emanating from two different individual field regions are projected onto different detection regions, a plurality of detection channels being assigned to each detection region, the detection channels each encoding angle information and/or direction information of the second individual particle beams when starting from the object; and generating individual images of each individual field region based on data obtained via signals from each detection region.

公开(公告)号：US20240212978A1

公开(公告)日：2024-06-27

申请号：US18599199

申请日：2024-03-08

Applicant: COXEM CO.,LTD

Inventor： Jun Hee LEE

IPC: H01J37/28 ,  H01J37/20

CPC classification number: H01J37/28 ,  H01J37/20 ,  H01J2237/2801

Abstract: The present invention provides a detachable column unit of a scanning electron microscope, and a method of providing the same, wherein the detachable column unit allows the column to be attached to and detached from the sample installation unit, and allows a simple correction related to the column, beam distortion, replacement of consumables, etc. Since problems related to the column are solved by replacing the column, the column has the advantage of being simple and easy to repair and maintain.