公开(公告)号：US20240096585A1

公开(公告)日：2024-03-21

申请号：US17768802

申请日：2020-10-20

Applicant: Technische Universiteit Delft ,  Applied Materials Israel, Ltd.

Inventor： Pieter KRUIT

IPC: H01J37/147 ,  H01J37/10

CPC classification number: H01J37/147 ,  H01J37/10

Abstract: Disclosed are an apparatus and method for generating a plurality of substantially collimated charged particle beamlets. The apparatus includes a charged particle source for generating a diverging charged particle beam, a beam splitter for splitting the charged particle beam in an array of charged particle beamlets, a deflector array includes an array of deflectors including one deflector for each charged particle beamlet of said array of charged particle beamlets, wherein the deflector array is configured for substantially collimating the array of diverging charged particle beamlets. The apparatus further includes a beam manipulation device configured for generating electric and/or magnetic fields at least in an area between the charged particle source and the deflector array. The apparatus has a central axis, and the beam manipulation device is configured for generating electric and/or magnetic fields substantially parallel to the central axis and substantially perpendicular to the central axis.

公开(公告)号：US11887807B2

公开(公告)日：2024-01-30

申请号：US18158444

申请日：2023-01-23

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/06 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/1474 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/1478 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/1534 ,  H01J2237/1536

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

公开(公告)号：US20230317404A1

公开(公告)日：2023-10-05

申请号：US17757133

申请日：2022-01-26

Applicant: FOCUS-EBEAM TECHNOLOGY (BEIJING) CO., LTD.

Inventor： Shuai LI

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/244 ,  H01J37/10

CPC classification number: H01J37/1474 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28

Abstract: Provided is an electron beam system, including: an electron source, configured to generate an electron beam; a first beam guide, configured to accelerate the electron beam; a second beam guide, configured to accelerate the electron beam; a first control electrode arranged between the first beam guide and the second beam guide, configured to change movement directions of backscattered electrons and secondary electrons generated by the electron beam acting on a specimen to be tested; a first detector arranged between the first beam guide and the first control electrode, configured to receive the backscattered electrons generated by the electron beam acting on the specimen to be tested. The first control electrode according to the embodiments of the present disclosure changes the movement directions of the backscattered electrons and secondary electrons generated by the electron beam generated by the electron source acting on the specimen to be tested, so that the first detector arranged between the first beam guide and the first control electrode can receive pure backscattered electrons generated by the electron beam acting on the specimen to be tested.

公开(公告)号：US20230230801A1

公开(公告)日：2023-07-20

申请号：US18099127

申请日：2023-01-19

Applicant: JEOL Ltd.

Inventor： Yuichiro Ohori ,  Keiji Tajima

IPC: H01J37/304 ,  H01J37/305 ,  H01J37/10 ,  H01J37/21

CPC classification number: H01J37/304 ,  H01J37/10 ,  H01J37/21 ,  H01J37/305 ,  H01J2237/0492 ,  H01J2237/2448 ,  H01J2237/30483 ,  H01J2237/31749

Abstract: An FIB system includes an ion source for producing the ion beam, a lens system which includes an objective lens and which is operative to focus the ion beam onto a sample such that secondary electrons are produced from the sample, a detector for detecting the secondary electrons, and a controller for controlling the lens system. The controller operates i) to provide control so that a focus of the ion beam is varied by directing the ion beam onto the sample, ii) to measure a signal intensity from the secondary electrons produced from the sample during the variation of the strength of the objective lens, iii) to adjust the focus of the ion beam, iv) to acquire a secondary electron image containing an image of a trace of a spot, and v) to correct the deviation of the field of view of the ion beam.

公开(公告)号：US11651930B2

公开(公告)日：2023-05-16

申请号：US17540442

申请日：2021-12-02

Applicant: Hitachi High-Tech Corporation

Inventor： Makoto Kuwahara ,  Koh Saitoh

IPC: H01J37/073 ,  H01J37/10 ,  H01J37/153 ,  H01J37/26 ,  H03F1/02 ,  H03F3/24 ,  H04B1/04 ,  H04L25/03 ,  H04L27/08 ,  H04L27/26 ,  H04L27/36 ,  H04W56/00 ,  H04W74/00 ,  H04W88/02 ,  H04W88/08

CPC classification number: H01J37/073 ,  H01J37/10 ,  H01J37/153 ,  H01J37/26 ,  H03F1/02 ,  H03F3/24 ,  H04B1/04 ,  H04L25/03012 ,  H04L25/03343 ,  H04L27/08 ,  H04L27/2647 ,  H04L27/368 ,  H04W56/0035 ,  H01J2237/1534 ,  H04B2001/045 ,  H04B2001/0408 ,  H04W74/004 ,  H04W74/006 ,  H04W88/02 ,  H04W88/08

Abstract: The present invention is to generate a spatially phase modulated electron wave. A laser radiating apparatus, a spatial light phase modulator, and a photocathode are provided. The photocathode has a semiconductor film having an NEA film formed on a surface thereof, and a thickness of the semiconductor film is smaller than a value obtained by multiplying a coherent relaxation time of electrons in the semiconductor film by a moving speed of the electrons in the semiconductor film. According to the configuration, a spatial distribution of phase and a spatial distribution of intensity of spatial phase modulated light are transferred to an electron wave, and the electron wave emitted from an NEA film is modulated into the spatial distribution of phase and the spatial distribution of intensity of the light. Since the spatial distribution of phase of the light can be modulated as intended by a spatial phase modulation technique for light, it is possible to generate an electron wave having a spatial distribution of phase modulated as intended.

公开(公告)号：US20230112447A1

公开(公告)日：2023-04-13

申请号：US17910752

申请日：2021-03-09

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Yongxin WANG

IPC: H01J37/244 ,  G01N23/2251 ,  G01N23/203 ,  G01N23/2206 ,  H01J37/10 ,  H01J37/147

Abstract: Systems and methods of observing a sample using an electron beam apparatus are disclosed. The electron beam apparatus comprises an electron source configured to generate a primary electron beam along a primary optical axis, and a first electron detector having a first detection layer substantially parallel to the primary optical axis and configured to detect a first portion of a plurality of signal electrons generated from a probe spot on a sample. The method may comprise generating a plurality of signal electrons and detecting the signal electrons using the first electron detector substantially parallel to the primary optical axis of the primary electron beam. A method of configuring an electrostatic element or a magnetic element to detect backscattered electrons may include disposing an electron detector on an inner surface of the electrostatic or magnetic element and depositing a conducting layer on the inner surface of the electron detector.

公开(公告)号：US20230071801A1

公开(公告)日：2023-03-09

申请号：US17878113

申请日：2022-08-01

Applicant: Hitachi High-Tech Corporation

Inventor： Momoyo ENYAMA ,  Akira IKEGAMI ,  Takeshi MORIMOTO ,  Shun KIZAWA

IPC: H01J37/10 ,  H01J37/285 ,  H01J37/22 ,  H01J37/21

Abstract: An electron beam application apparatus includes: an optical system configured to irradiate a sample with excitation light; an electron optical system configured to project, onto a camera, a photoelectron image formed by photoelectrons emitted from the sample irradiated with the excitation light; and a control unit. The optical system includes a light source configured to generate the excitation light and a pattern forming unit. The excitation light forms an optical pattern on a surface of the sample when the pattern forming unit is turned on, and the excitation light is emitted to the sample without forming the optical pattern on the surface of the sample when the pattern forming unit is turned off. The control unit adjusts the electron optical system based on feature data of a bright and dark pattern formed by the optical pattern in the photoelectron image obtained by turning on the pattern forming unit.

公开(公告)号：US11551907B2

公开(公告)日：2023-01-10

申请号：US17263017

申请日：2019-07-26

Applicant: RIKEN ,  UNIVERSITY PUBLIC CORPORATION OSAKA

Inventor： Ken Harada ,  Keiko Shimada ,  Shigeo Mori ,  Atsuhiro Kotani

IPC: H01J37/26 ,  G01N23/201 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22

Abstract: An observation apparatus and method that avoids drawbacks of a Lorentz method and observes a weak scatterer or a phase object with in-focus, high resolution, and no azimuth dependency, by a Foucault method observation using a hollow-cone illumination that orbits and illuminates an incident electron beam having a predetermined inclination angle, an electron wave is converged at a position (height) of an aperture plate downstream of a sample, and a bright field condition in which a direct transmitted electron wave of the sample passes through the aperture plate, a dark field condition in which the transmitted electron wave is shielded, and a Schlieren condition in which approximately half of the transmitted wave is shielded as a boundary condition of both of the above conditions are controlled, and a spatial resolution of the observation image is controlled by selecting multiple diameters and shapes of the opening of the aperture plate.

公开(公告)号：US11462384B2

公开(公告)日：2022-10-04

申请号：US17017840

申请日：2020-09-11

Applicant: JEOL Ltd.

Inventor： Yuji Kohno

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/147 ,  H01J37/153 ,  H01J37/244 ,  H01J37/26

Abstract: A method of acquiring a dark-field image for a scanning transmission electron microscope is provided. The scanning transmission electron microscope includes a dark-field detector having an annular detection region which is capable of detecting electrons scattered at a specimen in a predetermined angular range, an objective lens, and an imaging lens group disposed at a stage following the objective lens. The method includes reducing an influence of a geometrical aberration on the electrons scattered in the predetermined angular range by shifting a focus of the imaging lens group from a diffraction plane of the objective lens.

公开(公告)号：US11462380B2

公开(公告)日：2022-10-04

申请号：US17266792

申请日：2019-07-03

Applicant: ASML NETHERLANDS B. V.

Inventor： Pieter Willem Herman De Jager

IPC: H01J37/153 ,  H01J37/10 ,  H01J37/147 ,  H01J37/20 ,  H01J37/28

Abstract: Systems, methods, and programming are described for inspecting a substrate having a pattern imaged thereon, including obtaining a plurality of selected target locations on the substrate, the selected target locations dependent on characteristics of the pattern, scanning the substrate with a plurality of electron beamlets, wherein the scanning includes individually addressing the beamlets to impinge on the selected target locations independently, detecting a reflected or a transmitted portion of the beamlets, and generating images of the selected target locations.