公开(公告)号：US20220083081A1

公开(公告)日：2022-03-17

申请号：US17475294

申请日：2021-09-14

Applicant: APPLIED MATERIALS, INC.

Inventor： Nir Merry ,  Paul Wirth ,  Ming Xu ,  Sushant Koshti ,  Raechel Chu-Hui Tan

IPC: G05D7/06 ,  G01F1/86 ,  G01F1/72 ,  G01F1/684

Abstract: Disclosed herein are embodiments of a mass flow control apparatus, systems incorporating the same, and methods using the same. In one embodiment, a mass flow control apparatus comprises a flow modulating valve configured to modulate gas flow in a gas flow channel, a sensor device, such as a micro-electromechanical (MEMS) device, configured to generate a signal responsive to a condition of the gas flow, and a processing device operatively coupled to the flow modulating valve and the sensor device to control the flow modulating valve based on a signal received from the sensor device.

公开(公告)号：US20220081282A1

公开(公告)日：2022-03-17

申请号：US17475296

申请日：2021-09-14

Applicant: APPLIED MATERIALS, INC.

Inventor： Nir Merry ,  Ming Xu

IPC: B81B3/00

Abstract: Disclosed herein are embodiments of a sensor device, systems incorporating the same, and methods of fabricating the same. In one embodiment, a sensor device comprises a free-standing sensing element, such as a micro-electromechanical system (MEMS) device. The sensor device further comprises a metallic band to facilitate mounting the MEMS device to a mounting plate. The sensor device further comprises a conformal coating on a least a portion of a sensor region of the sensor device.

公开(公告)号：US20220075396A1

公开(公告)日：2022-03-10

申请号：US17521469

申请日：2021-11-08

Applicant: Applied Materials, Inc.

Inventor： Michael Rice ,  Joseph AuBuchon ,  Sanjeev Baluja ,  Ashley M. Okada ,  Alexander Fernandez ,  Ming Xu ,  Marcel E. Josephson ,  Sushant Suresh Koshti ,  Kenneth Le ,  Kevin M. Brashear

IPC: G05D7/06

Abstract: Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A regulator is positioned at an upstream end of a shared volume having a plurality of downstream ends. A flow controller is positioned at each downstream end of the shared volume, the flow controller comprising an orifice and a fast pulsing valve. Methods of using the gas distribution apparatus and calibrating the flow controllers are also described.

公开(公告)号：US11169547B2

公开(公告)日：2021-11-09

申请号：US16396684

申请日：2019-04-27

Applicant: Applied Materials, Inc.

Inventor： Michael Rice ,  Joseph AuBuchon ,  Sanjeev Baluja ,  Ashley M. Okada ,  Alexander Fernandez ,  Ming Xu ,  Marcel E. Josephson ,  Sushant Suresh Koshti ,  Kenneth Le ,  Kevin M. Brashear

IPC: G05D7/06 ,  G01F25/00

Abstract: Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A regulator is positioned at an upstream end of a shared volume having a plurality of downstream ends. A flow controller is positioned at each downstream end of the shared volume, the flow controller comprising an orifice and a fast pulsing valve. Methods of using the gas distribution apparatus and calibrating the flow controllers are also described.

公开(公告)号：US20210165428A1

公开(公告)日：2021-06-03

申请号：US17175313

申请日：2021-02-12

Applicant: APPLIED MATERIALS, INC.

Inventor： Ming Xu ,  Kenneth Le ,  Ashley M. Okada

IPC: G05D7/06

Abstract: A manufacturing system includes a processing chamber, an gas supply, and a mass flow control apparatus coupled to the gas supply and the processing chamber. The mass flow control apparatus includes a flow restriction element configured to restrict a flow rate of a gas, a bypass flow element configured to control the flow rate of the gas in parallel to the flow restriction element, and a pressure regulator configured to control a pressure of the gas between the pressure regulator and the flow restriction element and/or a pressure of the gas between the pressure regulator and the flow restriction element. The manufacturing system further includes a controller that is configured to flow gas from the gas supply to the processing chamber via the mass flow control apparatus in view of a first pressure setting. The controller further determines to modify the flow of the gas from a first flow rate associated with the first pressure setting to a second flow rate. The controller further determines a second pressure setting associated with the second flow rate and causes the pressure regulator to modify the pressure of the gas between the pressure regulator and the flow restriction element and/or the pressure regulator and the bypass flow element in view of the second pressure setting.

公开(公告)号：US09330887B2

公开(公告)日：2016-05-03

申请号：US13783776

申请日：2013-03-04

Applicant: APPLIED MATERIALS, INC.

Inventor： Kenneth S. Collins ,  Andrew Nguyen ,  Martin Jeffrey Salinas ,  Imad Yousif ,  Ming Xu

IPC: C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  H01J7/24 ,  H05B31/26 ,  H01J37/32

CPC classification number: H01J37/32082 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32935

Abstract: Correction of skew in plasma etch rate distribution is performed by tilting the overhead RF source power applicator about a tilt axis whose angle is determined from skew in processing data. Complete freedom of movement is provided by incorporating exactly three axial motion servos supporting a floating plate from which the overhead RF source power applicator is suspended.

公开(公告)号：US12068135B2

公开(公告)日：2024-08-20

申请号：US17175216

申请日：2021-02-12

Applicant: Applied Materials, Inc.

Inventor： Ming Xu ,  Ashley Mutsuo Okada ,  Michael D. Willwerth ,  Duc Dang Buckius ,  Jeffrey Ludwig ,  Aditi Mithun ,  Benjamin Schwarz

IPC: H01J37/32 ,  H01L21/3065 ,  H01L21/67

CPC classification number: H01J37/32449 ,  H01L21/3065 ,  H01J2237/332 ,  H01J2237/334

Abstract: A gas distribution apparatus is provided having a first reservoir with a first upstream end and a first downstream end and a second reservoir with a second upstream end and a second downstream end. A reservoir switch valve is in fluid communication with the first downstream end of the first reservoir and the second downstream end of the second reservoir. The reservoir switch valve operable to selectively couple the first reservoir to an outlet of the reservoir switch valve when in a first state, and couple the second reservoir to the outlet of the reservoir switch valve when in a second state. A plurality of proportional flow control valves are provided having inlets coupled in parallel to the outlet of the reservoir switch valve The plurality of proportional flow control valves have outlets configured to provide gas to a processing chamber.

公开(公告)号：US20230314269A1

公开(公告)日：2023-10-05

申请号：US18190418

申请日：2023-03-27

Applicant: Applied Materials, Inc.

Inventor： Yen-Kun Wang ,  Alex J. Tom ,  Ming Xu ,  Ashley Okada ,  Kenneth Le

IPC: G01M3/28 ,  H01L21/67

CPC classification number: G01M3/2815 ,  H01L21/67253

Abstract: A method and system for monitoring and detecting a gas leak in a gas stick assembly is provided. The method includes measuring the pressure in the mass flow controller of the gas stick assembly at different time points and determining whether there is a difference in the pressure at the different time points that exceeds a difference threshold.

公开(公告)号：US20230313376A1

公开(公告)日：2023-10-05

申请号：US17855031

申请日：2022-06-30

Applicant: APPLIED MATERIALS, INC.

Inventor： Srikanth Krishnamurthy ,  Ming Xu ,  Ashley M. Okada

IPC: C23C16/455

CPC classification number: C23C16/45557 ,  C23C16/45544 ,  C23C16/45504 ,  C23C16/45561

Abstract: Certain embodiments of the present disclosure relate to a sensor assembly including a housing having a first channel configured to flow a gas in a first direction and a second channel configured to flow the gas in a second direction. The housing is configured to couple to a gas flow assembly. A substrate is disposed within the housing. The substrate has an outer region, an inner region within the first channel, and a middle region between the outer region and the inner region. The substrate further includes electrical contact pads on at least the inner region. A sensor die is coupled to the inner region of the substrate, having an electrical connection to the electrical contact pads. The sensor die is disposed within a gas flow path of the first channel.

公开(公告)号：US20220189793A1

公开(公告)日：2022-06-16

申请号：US17120976

申请日：2020-12-14

Applicant: Applied Materials, Inc.

Inventor： Arun Chakravarthy Chakravarthy ,  Chahal Neema ,  Abhijit A. Kangude ,  Elizabeth Neville ,  Vishal S. Jamakhandi ,  Kurt R. Langeland ,  Syed A. Alam ,  Ming Xu ,  Kenneth Le

IPC: H01L21/67 ,  H01J37/32

Abstract: Exemplary substrate processing systems may include a lid plate. The systems may include a gas splitter seated on the lid plate. The gas splitter may define a plurality of gas inlets and gas outlets. A number of gas outlets may be greater than a number of gas inlets. The systems may include a plurality of valve blocks that are interfaced with the gas splitter. Each valve block may define a number of gas lumens. An inlet of each of the gas lumens may be in fluid communication with one of the gas outlets. An interface between the gas splitter and each of the valve blocks may include a choke. The systems may include a plurality of output manifolds seated on the lid plate. The systems may include a plurality of output weldments that may couple an outlet of one of the gas lumens with one of the output manifolds.