公开(公告)号：US10777383B2

公开(公告)日：2020-09-15

申请号：US16028622

申请日：2018-07-06

Applicant: FEI Company

Inventor： Cameron James Zachreson ,  Dolf Timmerman ,  Milos Toth ,  Jorge Filevich ,  Steven Randolph ,  Aurelien Philippe Jean Maclou Botman

IPC: H01J37/28 ,  G02B27/09 ,  G02B26/10 ,  H01J37/147 ,  H01J37/26 ,  H01J37/22

Abstract: A method and system are disclosed for observing and aligning a beam of light in the sample chamber of a charged particle beam (CPB) system, such as an electron microscope or focused ion beam system. The method comprises providing an imaging aid inside the sample chamber with a calibration surface configured such that when illuminated by light, and simultaneously illuminated by a CPB, the intensity of the secondary radiation induced by the CPB is different in regions also illuminated by light relative to regions with lower light illumination levels, thereby providing an image of the light beam on the calibration surface. The image of the light beam may be used to align the light beam to the charged particle beam.

公开(公告)号：US09799490B2

公开(公告)日：2017-10-24

申请号：US14674558

申请日：2015-03-31

Applicant: FEI Company

Inventor： Aiden Martin ,  Geoff McCredie ,  Milos Toth

IPC: A61N5/00 ,  H01J37/32 ,  H01J37/18 ,  H01J37/305 ,  H01J37/317 ,  H01J37/30

CPC classification number: H01J37/32 ,  H01J37/18 ,  H01J37/3002 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/2003 ,  H01J2237/24445 ,  H01J2237/30472 ,  H01J2237/317

Abstract: A cold trap is provided to reduce contamination gases that react with the beam during operations that use a process gas. The cold trap is set to a temperature that condenses the contamination gas but does not condense the process gas. Cold traps may be used in the sample chamber and in the gas line.

公开(公告)号：US20160293380A1

公开(公告)日：2016-10-06

申请号：US14674558

申请日：2015-03-31

Applicant: FEI Company

Inventor： Aiden Martin ,  Geoff McCredie ,  Milos Toth

IPC: H01J37/32 ,  H01J37/30

CPC classification number: H01J37/32 ,  H01J37/18 ,  H01J37/3002 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/2003 ,  H01J2237/24445 ,  H01J2237/30472 ,  H01J2237/317

Abstract: A cold trap is provided to reduce contamination gases that react with the beam during operations that use a process gas. The cold trap is set to a temperature that condenses the contamination gas but does not condense the process gas. Cold traps may be used in the sample chamber and in the gas line.

Abstract translation: 提供冷阱以减少在使用工艺气体的操作期间与梁发生反应的污染气体。 冷阱设置为冷凝污染气体但不会使工艺气体冷凝的温度。 冷阱可用于样品室和气体管线中。

公开(公告)号：US20160189920A1

公开(公告)日：2016-06-30

申请号：US14978180

申请日：2015-12-22

Applicant: FEI Company

Inventor： David H. Narum ,  Milos Toth ,  Steven Randolph ,  Aurelien Philippe Jean Maclou Botman

IPC: H01J37/20 ,  H01J37/18 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/20 ,  C25D5/003 ,  C25D5/02 ,  C25D5/026 ,  C25D5/04 ,  C25D17/005 ,  C25D17/10 ,  C25D17/12 ,  C25D21/04 ,  C25D21/12 ,  H01J37/18 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/182 ,  H01J2237/2003 ,  H01J2237/202 ,  H01J2237/2801

Abstract: A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.

Abstract translation: 电荷转移机构用于局部沉积或去除小结构的材料。 产生局部电化学电池，而不必将整个工件浸入浴中。 电荷转移机构可以与带电粒子束或激光系统一起使用以修改小结构，例如集成电路或微机电系统。 电荷转移过程可以在空气中或在一些实施方案中在真空室中进行。