公开(公告)号：US11731164B2

公开(公告)日：2023-08-22

申请号：US17449235

申请日：2021-09-28

Applicant: The Board of Trustees of the Leland Stanford Junior University

Inventor： Bo Ma ,  Kamyar Firouzi ,  Butrus T. Khuri-Yakub ,  Jose Joseph

IPC: B06B1/02 ,  B06B1/06 ,  B81B3/00 ,  B81C1/00 ,  G01N29/06 ,  G01N29/24 ,  G01N29/22

CPC classification number: B06B1/0215 ,  B06B1/0292 ,  B06B1/0651 ,  B06B1/0662 ,  B81B3/0021 ,  B81C1/00166 ,  G01N29/0654 ,  G01N29/2406 ,  B06B2201/55 ,  B81B2201/0271 ,  B81B2203/04 ,  B81C2201/0157 ,  B81C2201/0178 ,  G01N29/22

Abstract: Aspects of this disclosure relate to driving a capacitive micromachined ultrasonic transducer (CMUT) with a pulse train of unipolar pulses. The CMUT may be electrically excited with a pulse train of unipolar pulses such that the CMUT operates in a continuous wave mode. In some embodiments, the CMUT may have a contoured electrode.

公开(公告)号：US20160118265A1

公开(公告)日：2016-04-28

申请号：US14988895

申请日：2016-01-06

Applicant: The Board of Trustees of the University of Illinois

Inventor： Lynford Goddard ,  Kaiyuan Wang ,  Chris Edwards ,  Lonna Edwards ,  Xin Yu ,  Gang Logan Liu ,  Samuel Washington ,  Shailendra Srivastava ,  Terry Koker ,  Julianne Lee ,  Catherine Britt Carlson

IPC: H01L21/306 ,  H01L31/0236 ,  H01L21/768 ,  H01L31/0232

CPC classification number: H01L21/30604 ,  B81C1/00103 ,  B81C1/00111 ,  B81C1/00119 ,  B81C1/00214 ,  B81C1/00484 ,  B81C1/00539 ,  B81C1/00595 ,  B81C2201/0114 ,  B81C2201/0139 ,  B81C2201/0157 ,  C25F3/12 ,  C25F3/14 ,  G01B11/2441 ,  H01L21/30617 ,  H01L21/3063 ,  H01L21/76886 ,  H01L22/12 ,  H01L31/02327 ,  H01L31/02363

Abstract: Methods and apparatus for subtractively fabricating three-dimensional structures relative to a surface of a substrate and for additively depositing metal and dopant atoms onto the surface and for diffusing them into the bulk. A chemical solution is applied to the surface of the semiconductor substrate, and a spatial pattern of electron-hole pairs is generated by projecting a spatial pattern of illumination characterized by a specified intensity, wavelength and duration at each pixel of a plurality of pixels on the surface. An electrical potential is applied across the interface of the semiconductor and the solution with a specified temporal profile relative to the temporal profile of the spatial pattern of illumination. Such methods are applied to the fabrication of a photodetector integral with a parabolic reflector, cell size sorting chips, a three-dimensional photonic bandgap chip, a photonic integrated circuit, and an integrated photonic microfluidic circuit.

Abstract translation: 用于相对于衬底的表面相对地制造三维结构并用于在表面上相加地沉积金属和掺杂剂原子并将其扩散到本体中的方法和装置。 将化学溶液施加到半导体衬底的表面，并且通过将在特定强度，波长和持续时间上的特定的照明的空间图案投影在多个像素的每个像素上来产生电子 - 空穴对的空间图案 表面。 相对于照明的空间模式的时间分布，电势跨越半导体和解决方案的界面以特定的时间分布被施加。 这种方法适用于与抛物面反射器，单元尺寸分选芯片，三维光子带隙芯片，光子集成电路和集成光子微流体电路集成的光电检测器的制造。

公开(公告)号：US08482088B2

公开(公告)日：2013-07-09

申请号：US12678903

申请日：2008-09-18

Applicant: Richard Ian Laming ,  Colin Robert Jenkins ,  Anthony Bernard Traynor

Inventor： Richard Ian Laming ,  Colin Robert Jenkins ,  Anthony Bernard Traynor

IPC: H01L29/84

CPC classification number: B81B3/0072 ,  B81B2201/0257 ,  B81B2201/0264 ,  B81B2203/0127 ,  B81B2203/019 ,  B81C1/00103 ,  B81C2201/0108 ,  B81C2201/0157 ,  H04R19/005 ,  H04R19/04

Abstract: A MEMS device comprises a membrane layer and a back-plate layer formed over the membrane layer. The membrane layer comprises an outer portion and an inner portion raised relative to the outer portion and a sidewall for connecting the inner portion and the outer portion. The sidewall is non-orthogonal to the outer portion.

Abstract translation: MEMS器件包括膜层和形成在膜层上的背板层。 膜层包括外部部分和相对于外部部分凸起的内部部分和用于连接内部部分和外部部分的侧壁。 侧壁与外部部分不正交。

公开(公告)号：US20090155728A1

公开(公告)日：2009-06-18

申请号：US12127352

申请日：2008-05-27

Applicant: Laurie E. Locascio ,  Francisco Javier Atencia-Fernandez ,  Susan Barnes ,  Jack F. Douglas

Inventor： Laurie E. Locascio ,  Francisco Javier Atencia-Fernandez ,  Susan Barnes ,  Jack F. Douglas

IPC: G03F7/20

CPC classification number: B01F5/0646 ,  B01F5/0647 ,  B01F13/0059 ,  B01L3/502707 ,  B01L2300/0874 ,  B81B2201/058 ,  B81C99/0085 ,  B81C99/009 ,  B81C2201/0157 ,  B81C2201/019 ,  G03F1/50

Abstract: A method for microfabrication of a microfluidic device having sub-millimeter three dimensional relief structures is disclosed. In this method, homogeneous surfaces, which do not exhibit apparent pixel geometry, emerge from the interaction of the overlapping of diffracted light under opaque pixels and the nonlinear polymerization properties of the photoresist material. The method requires a single photolithographic step and allows for the fabrication of microstructures over large areas (centimeters) with topographic modulation of features smaller than 100 micrometers. The method generates topography that is useful in a broad range of microfluidic applications.

Abstract translation: 公开了一种具有亚毫米三维浮雕结构的微流体装置的微细加工方法。 在这种方法中，不表现出明显的像素几何形状的均匀表面从不透明像素处的衍射光的重叠与光致抗蚀剂材料的非线性聚合性质的相互作用中出现。 该方法需要单个光刻步骤，并且允许在大面积（厘米）上制造具有小于100微米的特征的地形调制的微结构。 该方法产生在广泛的微流体应用中有用的形貌。

公开(公告)号：US07448273B2

公开(公告)日：2008-11-11

申请号：US10990178

申请日：2004-11-16

Applicant: Thomas W. Ives

Inventor： Thomas W. Ives

IPC: G01N9/18 ,  G11B23/00

CPC classification number: B81B3/0083 ,  B81B2201/0292 ,  B81B2201/047 ,  B81C2201/0157 ,  B82Y10/00 ,  G02B5/12 ,  G02B26/0833 ,  G11B9/1427 ,  G11B9/1481

Abstract: A low mass device is disclosed. The low mass device includes a body member defining a surface and a retroreflective pattern formed in the surface of the body member.

Abstract translation: 公开了一种低质量装置。 低质量装置包括限定表面的本体构件和形成在主体构件的表面中的回射图案。

公开(公告)号：US20060104164A1

公开(公告)日：2006-05-18

申请号：US10990178

申请日：2004-11-16

Applicant: Thomas Ives

Inventor： Thomas Ives

IPC: G02B26/08 ,  G11B7/00

CPC classification number: B81B3/0083 ,  B81B2201/0292 ,  B81B2201/047 ,  B81C2201/0157 ,  B82Y10/00 ,  G02B5/12 ,  G02B26/0833 ,  G11B9/1427 ,  G11B9/1481

Abstract: A low mass device is disclosed. The low mass device includes a body member defining a surface and a retroreflective pattern formed in the surface of the body member.

Abstract translation: 公开了一种低质量装置。 低质量装置包括限定表面的本体构件和形成在主体构件的表面中的回射图案。

公开(公告)号：US06780570B2

公开(公告)日：2004-08-24

申请号：US09888989

申请日：2001-06-25

Applicant: Hubert Jerominek

Inventor： Hubert Jerominek

IPC: G03F716

CPC classification number: B81C1/0019 ,  B81B2203/0118 ,  B81B2203/019 ,  B81B2203/0384 ,  B81C1/00396 ,  B81C2201/0157 ,  G03F7/2008

Abstract: The method of fabricating a suspended microstructure with a sloped support, comprises the steps of (a) providing a member having three stacked up layers including a first substrate layer, a second temporary layer and a third photoresist layer; (b) photolithographically transferring a sloped pattern to the third photoresist layer by means of a grey scale mask; (c) etching the second layer through the third layer resulting from step (b) to obtain a surface with at least one continuous slope with a predetermined angle with respect to the first substrate layer; (d) depositing a fourth layer on the previous layers; (e) etching the fourth layer to obtain the sloped support; (f) (i) depositing a fifth planarization layer, (ii) depositing a sixth layer, and (iii) etching the sixth layer; and (g) removing the second layer and the fifth layer to obtain the suspended microstructure with the sloped support. The invention is also concerned with a suspended microstructure fabricated by the method.

Abstract translation: 制造具有倾斜载体的悬浮微结构的方法包括以下步骤：（a）提供具有三层叠层的构件，其包括第一衬底层，第二临时层和第三光致抗蚀剂层; （b）通过灰度掩模将倾斜图案光刻地转印到第三光致抗蚀剂层; （c）通过步骤（b）得到的第三层蚀刻第二层，以获得具有相对于第一基底层具有预定角度的至少一个连续斜面的表面; （d）在先前的层上沉积第四层; （e）蚀刻第四层以获得倾斜的支撑; （f）（i）沉积第五平坦化层，（ii）沉积第六层，和（iii）蚀刻第六层; 和（g）去除第二层和第五层，以获得具有倾斜载体的悬浮微结构。 本发明还涉及通过该方法制造的悬浮微结构。