公开(公告)号：US5086352A

公开(公告)日：1992-02-04

申请号：US535205

申请日：1990-06-08

Applicant: Shigeru Yamagata ,  Kyoichi Inaki ,  Toshikatu Matsuya ,  Ralf Takke ,  Stephan Thomas ,  Heinz Fabian

Inventor： Shigeru Yamagata ,  Kyoichi Inaki ,  Toshikatu Matsuya ,  Ralf Takke ,  Stephan Thomas ,  Heinz Fabian

IPC: C03B19/14 ,  C03B32/00 ,  C03C3/06 ,  C03C23/00 ,  G02B1/00 ,  G03F7/20

CPC classification number: G03F7/70241 ,  C03B19/1423 ,  C03B19/1453 ,  C03B32/00 ,  C03C23/007 ,  C03C3/06 ,  G02B1/00 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/08 ,  C03B2207/12 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/42 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/54 ,  Y02P40/57 ,  Y10S65/90

Abstract: The invention relates to lenses, prisms or other optical members which are subjected to high-power ultraviolet light having a wavelength of about 360 nm or less, or ionizing radiation, particularly optical members for use in laser exposure apparatus for lithography, and to blanks for such optical members. The homogeneity of the refractive index distribution and the resistance to optical deterioration when the optical members are exposed for a long period of time to short wavelength ultraviolet light from a laser beam are improved. The optical members are made of high-purity synthetic silica glass material containing at least about 50 wt. ppm of OH groups, and are doped with hydrogen. The refractive index distribution caused by the fictive temperature distribution during heat treatment in the process of producing high-purity silica glass blanks for optical members in accordance with the present invention is offset by the combined refractive index distribution determined by the OH group concentration distribution or by the OH group concentration distribution and the Cl concentration distribution in the glass.

Abstract translation: 本发明涉及经受大约360nm或更小的波长的大功率紫外光的透镜，棱镜或其它光学构件，或者电离辐射，特别是用于光刻的激光曝光装置的光学构件，以及用于 这种光学构件。 当光学元件长时间暴露于来自激光束的短波长紫外光时，折射率分布的均匀性和光学劣化的抵抗性得到改善。 光学构件由含有至少约50重量％的高纯度合成石英玻璃材料制成。 ppm的OH基团，并掺杂氢气。 在根据本发明的用于制造用于光学部件的高纯度二氧化硅玻璃毛坯的过程中由热处理期间的假想温度分布引起的折射率分布由由OH基浓度分布或由OH基浓度分布确定的组合折射率分布或由 玻璃中的OH基浓度分布和Cl浓度分布。

公开(公告)号：US09932261B2

公开(公告)日：2018-04-03

申请号：US15297534

申请日：2016-10-19

Applicant: Corning Incorporated

Inventor： Sezhian Annamalai ,  Steven Bruce Dawes ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina ,  William Rogers Rosch ,  Bryan Ray Wheaton

IPC: C03C3/06 ,  C03C3/089 ,  C03B25/02 ,  C03C4/00 ,  C03B19/14

CPC classification number: C03C3/089 ,  C03B19/14 ,  C03B25/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/10 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/00 ,  C03C23/007 ,  C03C2201/10 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/54

Abstract: A doped silica-titania (“DST”) glass article that includes a glass article having a glass composition comprising a silica-titania base glass containing titania at 7 to 14 wt. % and a balance of silica, and a dopant selected from the group consisting of (a) F at 0.7 to 1.5 wt. %, (b) B2O3 at 1.5 to 5 wt. %, (c) OH at 1000 to 3000 ppm, and (d) B2O3 at 0.5 to 2.5 wt. % and OH at 100 to 1400 ppm. The glass article has an expansivity slope of less than about 1.3 ppb/K2 at 20° C. For DST glass articles doped with F or B2O3, the OH level can be held to less than 10 ppm, or less than 100 ppm, respectively. In many aspects, the DST glass articles are substantially free of titania in crystalline form.

公开(公告)号：US20140182510A1

公开(公告)日：2014-07-03

申请号：US14122509

申请日：2013-02-19

Applicant: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.

Inventor： Shigeru Yamagata

IPC: C30B15/10 ,  C03B19/02

CPC classification number: C03B19/02 ,  C03B19/095 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/23 ,  C03B2201/54 ,  C03C3/06 ,  C03C8/02 ,  C03C10/0009 ,  C03C21/008 ,  C03C23/007 ,  C03C2201/02 ,  C03C2201/54 ,  C03C2201/80 ,  C03C2203/10 ,  C30B15/10 ,  C30B29/06 ,  Y02P40/57 ,  Y10T117/1032

Abstract: A single-crystal silicon pulling silica container including: a transparent silica glass layer in the inner side of the silica container; and an opaque silica glass layer containing gaseous bubbles in the outer side of the silica container, wherein the transparent layer constitutes of a high-OH group layer placed on an inner surface side of the silica container containing the OH group at a concentration of 200 to 2000 ppm by mass and a low-OH group layer having the OH group concentration lower than the high-OH group layer containing Ba at a concentration of 50 to 2000 ppm by mass. Resulting in the silica container used for pulling single-crystal silicon, providing the silica container improves etching corrosion resistance of the container inner surface to silicon melt when the entire inner surface of transparent silica glass of the container is crystallized short after using the container and method for such silica container.

Abstract translation: 一种单晶硅拉硅石容器，其包括：二氧化硅容器的内侧的透明石英玻璃层; 以及在二氧化硅容器的外侧含有气泡的不透明二氧化硅玻璃层，其中，所述透明层构成高OH基层，所述高OH基层位于含有浓度为200〜200的OH基团的二氧化硅容器的内表面侧 2000质量ppm，OH基浓度低于含有浓度为50〜2000质量ppm的Ba的高OH基层的低-OH基层。 导致用于拉拔单晶硅的二氧化硅容器，当容器内透明石英玻璃的整个内表面在使用容器之后结晶短时，提供二氧化硅容器提高容器内表面对硅熔体的耐蚀刻腐蚀性和方法 用于这种二氧化硅容器。

公开(公告)号：US20120192593A1

公开(公告)日：2012-08-02

申请号：US13356984

申请日：2012-01-24

Applicant: Tetsuya HARUNA ,  Masaaki Hirano ,  Yoshiaki Tamura

Inventor： Tetsuya HARUNA ,  Masaaki Hirano ,  Yoshiaki Tamura

IPC: C03C25/12 ,  C03C25/42

CPC classification number: C03B37/01211 ,  C03B37/01413 ,  C03B37/01807 ,  C03B37/01861 ,  C03B37/01869 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/50 ,  G02B6/02019 ,  G02B6/02242 ,  G02B6/02266 ,  G02B6/03611 ,  G02B6/03627

Abstract: There is provided a method for producing an optical fiber preform used in producing an optical fiber having low attenuation. The production method includes (1) a rod formation step of forming a glass rod of a silica glass containing an alkali metal element, the average concentration of the alkali metal element being 5 at·ppm or more, (2) a heat treatment step of heat-treating the glass rod, (3) a core part formation step of forming an alkali metal element-free silica glass layer having a chlorine concentration of 6000 at·ppm or more around the perimeter of the glass rod heat-treated in the heat treatment step to form a core part including the glass rod and the silica glass layer, and (4) a cladding part formation step of forming a cladding part of a silica-based glass having a lower refractive index than the core part around the perimeter of the core part.

Abstract translation: 提供了用于制造具有低衰减的光纤的光纤预制件的制造方法。 制造方法包括：（1）形成含有碱金属元素的石英玻璃的玻璃棒的棒形成工序，碱金属元素的平均浓度为5atppm以上，（2）热处理工序 对玻璃棒进行热处理，（3）在热处理的玻璃棒的周边周围形成氯浓度为6000以上的碱金属元素的二氧化硅玻璃层的芯部形成工序 处理步骤以形成包括玻璃棒和石英玻璃层的核心部分，以及（4）包层部分形成步骤，形成具有比围绕周边的核心部分的折射率低的二氧化硅基玻璃的包层部分 核心部分。

公开(公告)号：US20100316858A1

公开(公告)日：2010-12-16

申请号：US12515727

申请日：2007-12-04

Applicant: Tatsuhiro Sato ,  Nobumasa Yoshida ,  Katsuhide Orikasa ,  Makoto Tanaka

Inventor： Tatsuhiro Sato ,  Nobumasa Yoshida ,  Katsuhide Orikasa ,  Makoto Tanaka

IPC: C03B20/00 ,  C03B8/04 ,  C03C11/00 ,  B32B17/00

CPC classification number: C03B19/1453 ,  C03B2201/07 ,  C03B2201/23 ,  C03C3/06 ,  C03C2201/80 ,  Y10T428/24967 ,  Y10T428/249969

Abstract: Provided is a method for producing a synthetic opaque quartz glass where flame processing can be performed in high purity with a simple way and even a large sized one can be produced, and the synthetic opaque quartz glass.A method for producing a synthetic opaque quartz glass which comprises the step of heating and burning a quartz glass porous body under a pressure of from 0.15 MPa to 1000 MPa at a temperature of from 1200° C. to 2000° C. The quartz glass porous body is prepared by depositing quartz glass particles which are produced by hydrolyzing a silicon compound with an oxyhydrogen flame.

Abstract translation: 提供一种制造合成不透明石英玻璃的方法，其中可以以简单的方式进行高纯度的火焰加工，甚至可以制造大尺寸的方法，以及合成的不透明石英玻璃。 一种合成不透明石英玻璃的制造方法，其特征在于，在1200℃〜2000℃的温度下，在0.15MPa〜1000MPa的压力下对石英玻璃多孔体进行加热燃烧的工序。 通过沉积通过用氢氧焰水解硅化合物而制备的石英玻璃颗粒来制备体。

公开(公告)号：US07727918B2

公开(公告)日：2010-06-01

申请号：US11932024

申请日：2007-10-31

Applicant: Tomohiro Watanabe ,  Taihei Mukaide ,  Hidenosuke Itoh

Inventor： Tomohiro Watanabe ,  Taihei Mukaide ,  Hidenosuke Itoh

IPC: C03C3/085

CPC classification number: C03C4/0085 ,  C03B19/1438 ,  C03B2201/07 ,  C03B2201/23 ,  C03C3/085 ,  Y10T428/261

Abstract: An optical glass that contains Si, Al, Mg, and O is provided. The optical glass contains Si in an amount of 40% or more and 60% or less, in cation percent, Al in an amount of 10% or more and 35% or less, in cation percent, and Mg in an amount of 20% or more and 35% or less, in cation percent. In the optical glass, the total amount of Si, Al, and Mg is 99.5% or more, in cation percent. Furthermore, the optical glass contains Fe and Na each in an amount of 0.01 wtppm or less and has a transmittance to a light having a wavelength of 248 nm of 40% or more at a thickness of 5 mm.

Abstract translation: 提供含有Si，Al，Mg和O的光学玻璃。 光学玻璃的阳离子含量为40％以上且60％以下的Si，阳离子％为10％以上且35％以下的Al，20质量％的Mg， 以上且35％以下，以阳离子％计。 在光学玻璃中，Si，Al，Mg的总量为99.5％以上。 此外，光学玻璃含有0.01重量ppm以下的Fe和Na，并且对于厚度为5mm的波长为248nm的光的透射率为40％以上。

公开(公告)号：US07637126B2

公开(公告)日：2009-12-29

申请号：US10582117

申请日：2004-11-30

Applicant: Rainer Koeppler ,  Bodo Kuehn ,  Waltraud Werdecker ,  Ulrich Kirst ,  Walter Lehmann

Inventor： Rainer Koeppler ,  Bodo Kuehn ,  Waltraud Werdecker ,  Ulrich Kirst ,  Walter Lehmann

IPC: C03B37/075

CPC classification number: C03C4/0071 ,  C03B19/06 ,  C03B19/063 ,  C03B19/066 ,  C03B19/1005 ,  C03B19/1065 ,  C03B19/108 ,  C03B19/1095 ,  C03B20/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/34 ,  C03C1/026 ,  C03C3/06 ,  C03C2201/23 ,  C03C2201/3411 ,  C03C2201/3435 ,  C03C2201/3488 ,  C03C2201/36 ,  C03C2203/22 ,  C03C2203/30 ,  C03C2203/44 ,  C03C2203/52

Abstract: The invention relates to a method for the economic production of a blank for a component made from laser-active quartz glass in any form or dimension. The method comprises the following method steps: a) preparation of a dispersion with a solids content of at least 40 wt. %, comprising SiO2 nanopowder and doping agents, including a cation of the rare earth metals and transition metals in a fluid, b) granulation by agitation of the dispersion, with removal of moisture to form a doped SiO2 granulate of spherical porous granular particles with a moisture content of less than 35 wt. % and a density of at least 0.95 g/cm3, c) drying and purification of the SiO2 granulate, by heating to a temperature of at least 1000° C. to form doped porous SiO2 grains with an OH content of less than 10 ppm and d) sintering or fusing the doped SiO2 grains in a reducing atmosphere to give the blank made from doped quartz glass.

Abstract translation: 本发明涉及一种用于经济地生产用于由任何形式或尺寸的激光 - 活性石英玻璃制成的部件的坯料的方法。 该方法包括以下方法步骤：a）制备固体含量为至少40wt。 ％，包括SiO 2纳米粉末和掺杂剂，其包括流体中的稀土金属和过渡金属的阳离子，b）通过搅拌分散体制粒，除去水分以形成掺杂的SiO 2颗粒的球形多孔颗粒，其具有 含水量小于35wt。 ％和密度至少为0.95g / cm 3，c）通过加热到至少1000℃的温度来干燥和纯化SiO 2颗粒，以形成OH含量低于10ppm的掺杂多孔SiO 2颗粒，以及 d）在还原气氛中烧结或熔融掺杂的SiO 2晶粒，得到由掺杂的石英玻璃制成的坯料。

公开(公告)号：US07506522B2

公开(公告)日：2009-03-24

申请号：US11148764

申请日：2005-06-08

Applicant: Daniel Joseph Bleaking ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Kenneth E. Hrdina ,  Pushkar Tandon ,  John E. Maxon ,  Kimberly Ann Wilbert

Inventor： Daniel Joseph Bleaking ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Kenneth E. Hrdina ,  Pushkar Tandon ,  John E. Maxon ,  Kimberly Ann Wilbert

IPC: C03B20/00 ,  C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23

Abstract: Disclosed are high purity synthetic silica glass material having a high OH concentration homogeneity in a plane perpendicular to the optical axis, and process of making the same. The glass has high refractive index homogeneity. The glass can have high internal transmission of at least 99.65%/cm at 193 nm. The process does not require a post-sintering homogenization step. The controlling factors for high compositional homogeneity, thus high refractive index homogeneity, include high initial local soot density uniformity in the soot preform and slow sintering, notably isothermal treatment during consolidation.

Abstract translation: 公开了在垂直于光轴的平面中具有高OH浓度均匀性的高纯度合成石英玻璃材料及其制备方法。 玻璃具有高折射率均匀性。 该玻璃在193nm处可以具有至少99.65％/ cm的高内部透射率。 该方法不需要后烧结均质化步骤。 组合均匀性高，因此具有高折射率均匀性的控制因素包括烟灰预制件中的初始局部烟灰密度均匀性和缓慢烧结，特别是固结期间的等温处理。

公开(公告)号：US20070145332A1

公开(公告)日：2007-06-28

申请号：US10582117

申请日：2004-11-30

Applicant: Rainer Koeppler ,  Bodo Kuehn ,  Waltraud Werdecker ,  Ulrich Kirst ,  Walter Lehmann

Inventor： Rainer Koeppler ,  Bodo Kuehn ,  Waltraud Werdecker ,  Ulrich Kirst ,  Walter Lehmann

IPC: C09K11/66 ,  C03B8/00 ,  C03B19/00

CPC classification number: C03C4/0071 ,  C03B19/06 ,  C03B19/063 ,  C03B19/066 ,  C03B19/1005 ,  C03B19/1065 ,  C03B19/108 ,  C03B19/1095 ,  C03B20/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/34 ,  C03C1/026 ,  C03C3/06 ,  C03C2201/23 ,  C03C2201/3411 ,  C03C2201/3435 ,  C03C2201/3488 ,  C03C2201/36 ,  C03C2203/22 ,  C03C2203/30 ,  C03C2203/44 ,  C03C2203/52

Abstract: The invention relates to a method for the economic production of a blank for a component made from laser-active quartz glass in any form or dimension. The method comprises the following method steps: a) preparation of a dispersion with a solids content of at least 40 wt. %, comprising SiO2 nanopowder and doping agents, including a cation of the rare earth metals and transition metals in a fluid, b) granulation by agitation of the dispersion, with removal of moisture to form a doped SiO2 granulate of spherical porous granular particles with a moisture content of less than 35 wt. % and a density of at least 0.95 g/cm3, c) drying and purification of the SiO2 granulate, by heating to a temperature of at least 1000° C. to form doped porous SiO2 grains with an OH content of less than 10 ppm and d) sintering or fusing the doped SiO2 grains in a reducing atmosphere to give the blank made from doped quartz glass.

Abstract translation: 本发明涉及一种用于经济地生产用于由任何形式或尺寸的激光 - 活性石英玻璃制成的部件的坯料的方法。 该方法包括以下方法步骤：a）制备固体含量为至少40wt。 ％，包括SiO 2纳米粉末和掺杂剂，其包括流体中的稀土金属和过渡金属的阳离子，b）通过搅拌分散体制粒，除去水分以形成掺杂的SiO 水分含量小于35重量％的球形多孔粒状颗粒颗粒。 ％，密度至少为0.95g / cm 3，c）通过加热到至少1000℃的温度来干燥和纯化SiO 2颗粒。 以形成OH含量小于10ppm的掺杂多孔SiO 2颗粒，以及d）在还原气氛中烧结或熔合掺杂的SiO 2颗粒，得到坯料 来自掺杂石英玻璃。

公开(公告)号：US20070105704A1

公开(公告)日：2007-05-10

申请号：US11583619

申请日：2006-10-19

Applicant: Dana Bookbinder ,  Richard Fiacco ,  Ulrich Neukirch

Inventor： Dana Bookbinder ,  Richard Fiacco ,  Ulrich Neukirch

IPC: C03C3/06 ,  C03B8/00 ,  C03B19/06

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B19/12 ,  C03B19/14 ,  C03B19/1453 ,  C03B20/00 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/08 ,  C03B2201/12 ,  C03B2201/22 ,  C03B2201/23 ,  C03B2201/32 ,  C03B2201/42 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/22 ,  C03C2201/23

Abstract: What is disclosed includes OD-doped synthetic silica glass capable of being used in optical elements for use in lithography below about 300 nm. OD-doped synthetic silica glass was found to have significantly lower polarization-induced birefringence value than non-OD-doped silica glass with comparable concentration of OH. Also disclosed are processes for making OD-doped synthetic silica glasses, optical member comprising such glasses, and lithographic systems comprising such optical member. The glass is particularly suitable for immersion lithographic systems due to the exceptionally low polarization-induced birefringence values at about 193 nm.

Abstract translation: 公开的内容包括能够用于低于约300nm的光刻中的光学元件的OD掺杂合成石英玻璃。 发现OD掺杂的合成二氧化硅玻璃具有比具有相当浓度的OH的非OD掺杂的石英玻璃具有显着更低的偏振诱导双折射值。 还公开了制造掺杂OD的合成二氧化硅玻璃，包含这种玻璃的光学构件以及包括这种光学构件的光刻系统的方法。 由于在约193nm处极度低的偏振诱发双折射值，该玻璃特别适用于浸没式光刻系统。