公开(公告)号：US08047023B2

公开(公告)日：2011-11-01

申请号：US09844947

申请日：2001-04-27

Applicant: Bradford Giles Ackerman ,  Kenneth Edward Hrdina ,  Lisa Anne Moore ,  Nikki Jo Russo ,  C. Charles Yu

Inventor： Bradford Giles Ackerman ,  Kenneth Edward Hrdina ,  Lisa Anne Moore ,  Nikki Jo Russo ,  C. Charles Yu

IPC: C03B37/014

CPC classification number: C03C4/0085 ,  C03B19/1415 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/12 ,  C03B2201/42 ,  C03B2207/32 ,  C03B2207/62 ,  C03B2207/70 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/12 ,  C03C2201/42 ,  C03C2203/40 ,  Y02P40/57

Abstract: A method for producing a fused silica glass containing titania includes synthesizing particles of silica and titania by delivering a mixture of a silica precursor and a titania precursor to a burner, growing a porous preform by successively depositing the particles on a deposition surface while rotating and translating the deposition surface relative to the burner, and consolidating the porous preform into a dense glass.

Abstract translation: 一种制备含有二氧化钛的熔融石英玻璃的方法包括通过将二氧化硅前体和二氧化钛前体的混合物输送到燃烧器来合成二氧化硅和二氧化钛的颗粒，通过将颗粒依次沉积在沉积表面上同时旋转和平移来生长多孔预型体 沉积表面相对于燃烧器，并将多孔预成型件固结成致密的玻璃。

公开(公告)号：US20100251771A1

公开(公告)日：2010-10-07

申请号：US12679006

申请日：2008-09-18

Applicant: Andreas Langner ,  Thomas Kayser ,  Gerhard Schoetz ,  Mario Such ,  Johannes Kirchhof ,  Stephan Grimm ,  Volker Reichel

Inventor： Andreas Langner ,  Thomas Kayser ,  Gerhard Schoetz ,  Mario Such ,  Johannes Kirchhof ,  Stephan Grimm ,  Volker Reichel

IPC: C03C21/00

CPC classification number: C03B37/01282 ,  C03B19/06 ,  C03B19/063 ,  C03B19/066 ,  C03B19/1065 ,  C03B19/1095 ,  C03B20/00 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/30 ,  C03B2201/34 ,  C03B2201/36 ,  C03B2201/40 ,  C03B2201/54 ,  C03C1/026 ,  C03C3/06 ,  C03C4/0071 ,  C03C4/10 ,  C03C13/045 ,  C03C14/008 ,  C03C23/0075 ,  C03C25/106 ,  C03C2201/12 ,  C03C2201/36 ,  C03C2203/20 ,  C03C2203/34

Abstract: The invention relates to a method allowing cost-effective production of doped quartz glass, particularly laser-active quartz glass, that is improved with regard to the homogeneity of the doping material distribution, in that a suspension is provided comprising SiO2 particles and an initial compound for at least one doping material in an aqueous fluid, the fluid being removed under formation of a doped intermediate product comprising particles of the doping material or particles of the precursor substance or the doping material, and the doped quartz glass is formed by sintering the doped intermediate product, wherein at least part of the particles of the doping material or the particles of the precursor substance of the same is generated in the suspension as a precipitate of a pH-value-controlled precipitation reaction of the initial compound.

Abstract translation: 本发明涉及一种允许成本有效地生产掺杂石英玻璃，特别是激光 - 活性石英玻璃的方法，其在掺杂材料分布的均匀性方面得到改进，因为提供了包含SiO 2颗粒和初始化合物 对于在水性流体中的至少一种掺杂材料，在形成包含掺杂材料的颗粒或前体物质的颗粒或掺杂材料的掺杂中间产物的情况下除去流体，掺杂的石英玻璃通过烧结掺杂的 中间产物，其中至少部分掺杂材料的颗粒或其前体物质的颗粒在悬浮液中作为初始化合物的pH值控制的沉淀反应的沉淀物产生。

公开(公告)号：US07592063B2

公开(公告)日：2009-09-22

申请号：US11514997

申请日：2006-09-05

Applicant: Yoshiaki Ikuta ,  Shinya Kikugawa

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa

IPC: B32B3/00 ,  B32B17/06 ,  B32B18/00 ,  B32B3/16 ,  C03C3/112 ,  C03C3/06 ,  C03C10/16 ,  G01N23/00

CPC classification number: C03B19/1453 ,  C03B2201/03 ,  C03B2201/12 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  Y10T428/166 ,  Y10T428/249969 ,  Y10T428/252

Abstract: For a substrate having fine convexoconcave patterns on its surface, the dimensions of the convexoconcave patterns in a vertical direction of a quartz glass substrate are controlled to be uniform with extreme accuracy and over the entire substrate surface. The quartz glass substrate is made to have a fictive temperature distribution of at most 40° C. and a halogen concentration of less than 400 ppm, and the etching rate of the surface of the quartz glass substrate is made uniform, whereby the dimensions of the convexoconcave patterns in a vertical direction of the quartz glass substrate are controlled to be uniform with good accuracy and over the entire substrate surface.

Abstract translation: 对于在其表面上具有细凹凸图案的基板，石英玻璃基板的垂直方向上的凸凹图案的尺寸被控制为以极高的精度和整个基板表面均匀。 使石英玻璃基板具有至多40℃的假想温度分布和小于400ppm的卤素浓度，并且使石英玻璃基板的表面的蚀刻速率均匀，由此， 在石英玻璃基板的垂直方向上的凸凹图案被控制为具有良好的精度和整个基板表面的均匀。

公开(公告)号：US20090122281A1

公开(公告)日：2009-05-14

申请号：US12351998

申请日：2009-01-12

Applicant: Yasutomi IWAHASHI ,  Akio Koike

Inventor： Yasutomi IWAHASHI ,  Akio Koike

IPC: G03B27/00 ,  C03C3/04

CPC classification number: C03B19/1415 ,  C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/54

Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

Abstract translation: 含有TiO 2的二氧化硅玻璃，其假想温度为至多1200℃，F浓度为至少100ppm，热膨胀系数为0±200ppb /℃，为0〜100℃。 含有TiO 2的二氧化硅玻璃的制造方法，其包括在通过玻璃形成材料的火焰水解得到的目标石英玻璃粒子上形成多孔玻璃体的工序，得到含氟多孔玻璃体的工序， 获得含氟玻璃化玻璃体，获得含氟成形玻璃体的步骤和进行退火处理的步骤。

公开(公告)号：US07501367B2

公开(公告)日：2009-03-10

申请号：US11403267

申请日：2006-04-13

Applicant: Bodo Kuehn ,  Stephan Ochs ,  Steffen Kaiser ,  Denis Kassube

Inventor： Bodo Kuehn ,  Stephan Ochs ,  Steffen Kaiser ,  Denis Kassube

IPC: C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  Y02P40/57

Abstract: To provide an optical component of quartz glass for use in a projection lens system for immersion lithography with an operating wavelength below 250 nm, which is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should show the combination of several properties: particularly a glass structure essentially without oxygen defects, a mean content of hydroxyl groups of less than 60 wt ppm, a mean content of fluorine of less than 10 wt ppm, a mean content of chlorine of less than 1 wt ppm. A method for producing such an optical component comprises the following method steps: producing and drying an SiO2 soot body under reducing conditions and treating the dried soot body before or during vitrification with a reagent reacting with oxygen defects of the quartz glass structure.

Abstract translation: 提供用于投影透镜系统的石英玻璃的光学部件，用于工作波长低于250nm的浸没式光刻，其被优化用于线偏振UV激光辐射，特别是关于由各向异性密度变化引起的压实和双折射 根据本发明，建议石英玻璃应显示几种性能的组合：特别是基本上没有氧缺陷的玻璃结构，羟基的平均含量小于60重量ppm，氟的平均含量小于 10重量ppm，氯的平均含量小于1重量ppm。 一种制造这种光学元件的方法包括以下方法步骤：在还原条件下制备和干燥SiO 2烟炱体，并在玻璃化之前或期间用与石英玻璃结构的氧缺陷反应的试剂处理干燥的烟炱体。

公开(公告)号：US20080274869A1

公开(公告)日：2008-11-06

申请号：US11597087

申请日：2005-05-11

Applicant: Wolfgang Englisch ,  Ralf Takke ,  Bodo Kuehn ,  Bruno Uebbing ,  Rainer Koeppler

Inventor： Wolfgang Englisch ,  Ralf Takke ,  Bodo Kuehn ,  Bruno Uebbing ,  Rainer Koeppler

IPC: C03C3/06 ,  C03B29/00

CPC classification number: C03B19/1469 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42

Abstract: The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass, doped with titanium and/or fluorine, which is distinguished by an extremely high homogeneity. The homogeneity relates to the following features: a) micro-inhomogeneities caused by a local variance of the TiO2 distribution (

Abstract translation: 本发明涉及一种用于传输波长为15nm和更短的辐射的光学部件的石英玻璃坯料，该坯料由掺杂有钛和/或氟的高纯石英玻璃组成，其特征在于极高的均匀性 。 均匀性涉及以下特征：a）由TiO 2分布（<0.05％TIO 2 2）的局部方差引起的微不均匀性，其平均值在 （5umum）相对于TiO 2含量的平均值），b）主要功能方向上的热膨胀系数Deltaalpha的绝对最大不均匀性（ <5ppb / K），c）在石英玻璃坯料的可用表面上的热膨胀系数的径向变化不大于0.4ppb /（K.cm）; d）具有特定进展的2nm / cm 2的主要功能方向的633nm处的最大应力双折射（SDB） 和e）根据（b）在光学表面上平均的Deltaalpha的特定进展。 所述石英玻璃坯料只能通过将含有硅，钛和/或氟的化合物的火焰水解获得的掺杂石英玻璃作为大体积的棒状起始体形成为均匀的石英玻璃坯料，其中使用几个成形步骤 并均质化。

公开(公告)号：US20080066497A1

公开(公告)日：2008-03-20

申请号：US11630405

申请日：2006-03-30

Applicant: Juergen Weber ,  Tobias Pogge ,  Martin Trommer ,  Bodo Kuehn ,  Ulrich Kirst ,  Waltraud Werdecker

Inventor： Juergen Weber ,  Tobias Pogge ,  Martin Trommer ,  Bodo Kuehn ,  Ulrich Kirst ,  Waltraud Werdecker

IPC: C03C3/06 ,  C03B19/14 ,  H01L21/00

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/09 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/24 ,  C03B2201/32 ,  C03C15/00 ,  C03C19/00 ,  C03C23/0025 ,  C03C23/006 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2203/54 ,  C30B25/12 ,  C30B31/14 ,  C30B35/00 ,  Y02P40/57

Abstract: An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.

Abstract translation: 用于具有蚀刻效果的环境中的晶片夹具的理想石英玻璃的特征在于高纯度和高耐干蚀刻性。 为了表明基本满足这些要求的石英玻璃，根据本发明提出，石英玻璃至少在近表面积中掺杂氮，其平均含量小于30重量ppm， 其假想温度低于1250℃，在1200℃的温度下其粘度至少为10-13Pa。制备这种石英玻璃的经济方法包括以下方法步骤 ：将SiO 2原料熔化，得到石英玻璃坯料，将SiO 2原料或石英玻璃坯料进行脱水处理，加热SiO _{2 原料或石英玻璃坯料，在含氨气氛中在1050℃至1850℃的范围内的氮化温度，使用石英玻璃的石英玻璃 将玻璃坯料设定为1250℃以下的假想温度，进行表面处理 石英玻璃夹具形成石英玻璃夹具。}

公开(公告)号：US07312170B2

公开(公告)日：2007-12-25

申请号：US10548237

申请日：2004-03-03

Applicant: Hiroyuki Nishimura ,  Akira Fujinoki

Inventor： Hiroyuki Nishimura ,  Akira Fujinoki

IPC: C03C3/06 ,  C03B37/07 ,  C03B37/075 ,  C03B37/018

CPC classification number: C03B32/00 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0071 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/42 ,  Y02P40/57

Abstract: The present invention provides an optical synthetic quartz glass material which substantially does not cause changes in transmitted wave surface (TWS) by solarization, compaction (TWS delayed), rarefaction (TWS progressed) and photorefractive effect when ArF excimer laser irradiation is applied at a low energy density, e.g. at energy density per pulse of 0.3 mJ/cm2 or less. The present invention further provides a method for manufacturing the same. In order to solve the above-mentioned problems, the optical synthetic quartz glass material of the present invention is characterized in that, in a synthetic quartz glass prepared by a flame hydrolysis method using a silicon compound as a material, the followings are satisfied that the amount of SiOH is within a range of more than 10 ppm by weight to 400 ppm by weight, content of fluorine is 30 to 1000 ppm by weight, content of hydrogen is 0.1×1017 to 10×1017 molecules/cm3 and, when the amounts of SiOH and fluorine are A and B, respectively, total amount of A and B is 100 ppm by weight or more and B/A is 0.25 to 25.

Abstract translation: 本发明提供了一种光学合成石英玻璃材料，其在低温下施加ArF准分子激光照射时，通过太阳化，压实（TWS延迟），稀释（TWS进行）和光折射效应基本上不会引起透射波面（TWS）的变化 能量密度，例如 每个脉冲的能量密度为0.3mJ / cm 2以下。 本发明还提供一种制造该方法的方法。 为了解决上述问题，本发明的光学合成石英玻璃材料的特征在于，在使用硅化合物作为材料的火焰水解法制备的合成石英玻璃中，满足以下条件： SiOH的量在大于10重量ppm至400重量ppm的范围内，氟含量为30至1000重量ppm，氢含量为0.1×10 17至10 10 17分子/ cm 3，当SiOH和氟的量分别为A和B时，A和B的总量为100重量ppm以上，B / A为 0.25至25。

公开(公告)号：US07159418B2

公开(公告)日：2007-01-09

申请号：US09930693

申请日：2001-08-17

Applicant: Koji Matsuo ,  Hisatoshi Otsuka ,  Kazuo Shirota ,  Shigeru Maida

Inventor： Koji Matsuo ,  Hisatoshi Otsuka ,  Kazuo Shirota ,  Shigeru Maida

IPC: C03B19/14 ,  C03C3/06

CPC classification number: C03B19/1453 ,  C03B19/1423 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/30 ,  C03B2207/64 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/42 ,  C03C2203/54 ,  Y02P40/57

Abstract: Fluorine-containing synthetic quartz glass is produced by feeding silica-forming material, hydrogen, and oxygen gases from a burner to a reaction zone, flame hydrolyzing the silica-forming material in the reaction zone to form particles of silica, depositing the silica particles on a rotatable substrate in the reaction zone to form a porous silica matrix, and heating and vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. During formation of the porous silica matrix, the angle between the center axes of the silica matrix and the silica-forming reactant flame from the burner is adjusted to 90–120° so that the porous silica matrix has a density of 0.1–1.0 g/cm3 with a narrow distribution within 0.1 g/cm3. The resulting quartz glass has a high transmittance to light in the vacuum ultraviolet region below 200 nm.

Abstract translation: 含氟合成石英玻璃是通过将二氧化硅形成材料，氢气和氧气从燃烧器送入反应区而产生的，火焰水解反应区中二氧化硅形成材料，形成二氧化硅颗粒，将二氧化硅颗粒沉积在 反应区中的可旋转基底，形成多孔二氧化硅基质，并在含氟化合物气体的气氛中加热和玻璃化多孔二氧化硅基质。 在形成多孔二氧化硅基体期间，将二氧化硅基体的中心轴线与来自燃烧器的形成二氧化硅的反应物火焰之间的角度调节至90-120°，使得多孔二氧化硅基质的密度为0.1-1.0g / cm 3，窄分布在0.1g / cm 3以内。 所得的石英玻璃对于低于200nm的真空紫外线区域的光具有高透射率。

公开(公告)号：US20060234848A1

公开(公告)日：2006-10-19

申请号：US11403267

申请日：2006-04-13

Applicant: Bodo Kuehn ,  Stefan Ochs ,  Steffen Kaiser ,  Denis Kassube

Inventor： Bodo Kuehn ,  Stefan Ochs ,  Steffen Kaiser ,  Denis Kassube

IPC: C03C3/06 ,  C03B19/06 ,  C03B19/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  Y02P40/57

Abstract: To provide an optical component of quartz glass for use in a projection lens system for immersion lithography with an operating wavelength below 250 nm, which is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should show the combination of several properties: particularly a glass structure essentially without oxygen defects, a mean content of hydroxyl groups of less than 60 wt ppm, a mean content of fluorine of less than 10 wt ppm, a mean content of chlorine of less than 1 wt ppm. A method for producing such an optical component comprises the following method steps: producing and drying an SiO2 soot body under reducing conditions and treating the dried soot body before or during vitrification with a reagent reacting with oxygen defects of the quartz glass structure.

Abstract translation: 提供用于投影透镜系统的石英玻璃的光学部件，用于工作波长低于250nm的浸没式光刻，其被优化用于线偏振UV激光辐射，特别是关于由各向异性密度变化引起的压实和双折射 根据本发明，建议石英玻璃应显示几种性能的组合：特别是基本上没有氧缺陷的玻璃结构，羟基的平均含量小于60重量ppm，氟的平均含量小于 10重量ppm，氯的平均含量小于1重量ppm。 制造这种光学部件的方法包括以下步骤：在还原条件下制备和干燥SiO 2烟炱体，并在玻璃化之前或期间用与氧缺陷反应的试剂处理干燥的烟炱体 石英玻璃结构。