Single crystal silicon pulling silica container and manufacturing method thereof
    22.
    发明授权
    Single crystal silicon pulling silica container and manufacturing method thereof 有权
    单晶硅拉硅胶容器及其制造方法

    公开(公告)号:US09382640B2

    公开(公告)日:2016-07-05

    申请号:US14004085

    申请日:2012-10-02

    Inventor: Shigeru Yamagata

    Abstract: The present invention provides a single-crystal silicon pulling silica container including an outer layer made of opaque silica glass containing gaseous bubbles and an inner layer made of transparent silica glass that does not substantially contain the gaseous bubbles; the container also including: a bottom portion, a curved portion, and a straight body portion, wherein continuous grooves are formed on a surface of the inner layer from at least part of the bottom portion to at least part of the straight body portion through the curved portion. As a result, there are provided the single-crystal silicon pulling silica container that can reduce defects called voids or pinholes in the pulled single-crystal silicon and a method for manufacturing such a silica container.

    Abstract translation: 本发明提供一种单晶硅拉硅石容器,其包括由含有气泡的不透明石英玻璃制成的外层和由实质上不含有气泡的透明石英玻璃制成的内层; 所述容器还包括:底部,弯曲部分和直体部分,其中在所述内层的表面上从所述底部的至少一部分到所述直体部分的至少一部分通过所述内部部分形成连续的凹槽 弯曲部分。 结果,提供了可以减少拉制的单晶硅中的称为空洞或针孔的缺陷的单晶硅拉硅
    石容器以及这种二氧化硅容器的制造方法。

    TiO2-containing silica glass for optical member for EUV lithography
    24.
    发明授权
    TiO2-containing silica glass for optical member for EUV lithography 失效
    用于EUV光刻的光学元件的含TiO 2的二氧化硅玻璃

    公开(公告)号:US08039409B2

    公开(公告)日:2011-10-18

    申请号:US12904236

    申请日:2010-10-14

    Abstract: The present invention provides a TiO2-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO2-containing silica glass for optical member for EUV lithography, having a TiO2 concentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T400-700, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T400-3,000, of 70% or more.

    Abstract translation: 本发明提供一种含TiO 2的二氧化硅玻璃,可以得到透明度极高的透明性高且热膨胀系数基本上为零的温度区域的玻璃。 本发明涉及TiO 2浓度为3〜14质量%的用于EUV光刻用的光学部件的含TiO 2的二氧化硅玻璃, 在400〜700nm波长范围内,每1mm厚的内透射率,T400-700,97%以上; 在400〜3000nm的波长范围内,每1mm厚的内透射率,T400-3,000,70%以上。

    TIO2-CONTAINING SILICA GLASS FOR OPTICAL MEMBER FOR EUV LITHOGRAPHY
    25.
    发明申请
    TIO2-CONTAINING SILICA GLASS FOR OPTICAL MEMBER FOR EUV LITHOGRAPHY 失效
    用于EUV光刻的光学成员的含TIO2的二氧化硅玻璃

    公开(公告)号:US20110028299A1

    公开(公告)日:2011-02-03

    申请号:US12904236

    申请日:2010-10-14

    Abstract: The present invention provides a TiO2-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO2-containing silica glass for optical member for EUV lithography, having a TiO2 concentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T400-700, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T400-3000, of 70% or more.

    Abstract translation: 本发明提供一种含TiO 2的二氧化硅玻璃,可以得到透明度极高的透明性高且热膨胀系数基本上为零的温度区域的玻璃。 本发明涉及TiO 2浓度为3〜14质量%的用于EUV光刻用的光学部件的含TiO 2的二氧化硅玻璃, 在400〜700nm波长范围内,每1mm厚的内透射率,T400-700,97%以上; 在400〜3000nm的波长范围内,每1mm厚的内透射率为T400〜3000,为70%以上。

    SILICA GLASS AND OPTICAL MATERIAL
    27.
    发明申请
    SILICA GLASS AND OPTICAL MATERIAL 失效
    二氧化硅玻璃和光学材料

    公开(公告)号:US20080103038A1

    公开(公告)日:2008-05-01

    申请号:US11962936

    申请日:2007-12-21

    CPC classification number: C03C3/06 C03C4/0085 C03C2201/30 C03C2201/42

    Abstract: It is to obtain a silica glass suitable as a material for an optical material constituting an optical system to be used for EUVL, which has a low coefficient of thermal expansion from 0 to 100° C., and on which formation of concave defects is suppressed in a polishing step to achieve a high level of flatness. A silica glass containing from 0.1 to 10 mass % of Sn calculated as SnO2 and from 3 to 10 mass % of Ti calculated as TiO2, which has a homogeneity of the coefficient of thermal expansion from 0 to 100° C. to the temperature of from 50 to 200 ppb/° C., a coefficient of thermal expansion from 0 to 100° C. of 0±250 ppb/° C., and a Vickers hardness of at most 650.

    Abstract translation: 获得适合作为构成用于EUVL的光学系统的光学材料的石英玻璃,其具有0至100℃的低热膨胀系数,并且其中凹陷缺陷的形成被抑制 在抛光步骤中达到高水平的平整度。 含有0.1〜10质量%的以SnO 2 2计的Sn和3〜10质量%的TiO 2计算的二氧化硅玻璃,其Ti均匀度为 热膨胀系数为0〜100℃,温度为50〜200ppb /℃,0〜100℃的热膨胀系数为0±250ppb /℃,Vickers 硬度至多650。

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