公开(公告)号：US20170287579A1

公开(公告)日：2017-10-05

申请号：US15477680

申请日：2017-04-03

Applicant: Axcelis Technologies, Inc.

Inventor： Neil K. Colvin ,  Tseh-Jen Hsieh ,  Paul B. Silverstein

IPC: G21F1/06 ,  H01J27/08 ,  H01J37/317

CPC classification number: H01J37/32431 ,  G21F1/06 ,  H01J9/32 ,  H01J11/28 ,  H01J27/08 ,  H01J37/08 ,  H01J37/3171 ,  H01J37/32541 ,  H01J37/32559 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/03 ,  H01J2237/31701

Abstract: An arc chamber has a liner operably coupled to body. The liner has a second surface recessed from a first surface and a hole having a first diameter. The liner has a liner lip extending upwardly from the second surface toward the first surface that surrounds the hole and has a second diameter. An electrode has a shaft and head. The shaft has a third diameter that is less than the first diameter and passes through the body and hole and is electrically isolated from the liner by an annular gap. The head has a fourth diameter and a third surface having an electrode lip extending downwardly from the third surface toward the second surface. The electrode lip has a fifth diameter that is between the second and fourth diameters. A spacing between the liner lip and electrode lip defines a labyrinth seal and generally prevents contaminants from entering the annular gap. The shaft has an annular groove configured to accept a boron nitride seal.

公开(公告)号：USRE46452E1

公开(公告)日：2017-06-27

申请号：US14302522

申请日：2014-06-12

Applicant: Mapper Lithography IP B.V.

Inventor： Stijn Willem Herman Karel Steenbrink ,  Johan Joost Koning ,  Peter Veltman

IPC: G03B27/54 ,  H01J3/14 ,  B23P17/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/317

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/004 ,  H01J2237/0203 ,  H01J2237/03 ,  H01J2237/04924 ,  Y10T29/49

Abstract: An electrostatic lens comprising a first conductive plate with a first aperture, a second conductive plate with a second aperture, the second aperture being substantially aligned with the first aperture, a voltage supply for supplying a first voltage to the first conductive plate and a second voltage to the second conductive plate, the first voltage being lower than the second voltage, and an insulating structure for separating the first conductive plate from the second conductive plate. The insulating structure comprises a first portion in contact with the first conductive plate and a second portion in contact with the second conductive plate, the first portion having an overhanging portion and the second portion having an indented portion at an edge of the insulating structure, so that a gap is formed between the overhanging portion and the second conductive plate.

公开(公告)号：US08888951B2

公开(公告)日：2014-11-18

申请号：US12718544

申请日：2010-03-05

Applicant: Shinji Himori

Inventor： Shinji Himori

IPC: C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  H01J37/32

CPC classification number: H01J37/32577 ,  H01J37/3255 ,  H01J2237/03

Abstract: A plasma processing apparatus includes a processing chamber that plasma processes a target object therein, first and second electrodes that are provided in the processing chamber to face each other and have a processing space therebetween, and a high frequency power source that is connected to at least one of the first and second electrodes to supply high frequency power to the processing chamber. At least one of the first and second electrodes includes a base formed of a metal, a dielectric material provided at a central portion of a plasma side of the base, and a first resistor provided between the dielectric material and plasma, and formed of a metal with a predetermined pattern.

Abstract translation: 一种等离子体处理装置包括：处理室，其中处理目标物体;设置在处理室中的第一和第二电极彼此面对并具有其间的处理空间;以及高频电源，至少连接至 第一和第二电极之一，以向处理室提供高频功率。 第一电极和第二电极中的至少一个包括由金属形成的基底，设置在基底的等离子体侧的中心部分处的电介质材料和设置在电介质材料和等离子体之间的第一电阻器，并且由金属 具有预定的图案。

公开(公告)号：US08884246B2

公开(公告)日：2014-11-11

申请号：US13667337

申请日：2012-11-02

Applicant: Canon Kabushiki Kaisha

Inventor： Takahisa Kato

IPC: H01J37/147 ,  H01J29/74 ,  H01J37/317 ,  H01J37/04

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/03 ,  H01J2237/0435 ,  H01J2237/151

Abstract: An optical system for a charged particle includes a first member though which a charged particle beam is transmitted and a second member to control optically the charged particle beam transmitted through the first member. The second member has a fixing portion fixed to the first member. A slit is arranged between a part of the second member and the fixing portion to separate the part of the second member from the fixing portion, such that the part of the second member is a cantilever beam structure pivotal in relation to the fixing portion.

Abstract translation: 用于带电粒子的光学系统包括通过其传送带电粒子束的第一构件和用于光学地控制透射通过第一构件的带电粒子束的第二构件。 第二构件具有固定到第一构件的固定部。 在第二构件的一部分和固定部分之间布置狭缝，以将第二构件的一部分与固定部分分离，使得第二构件的一部分是相对于固定部分枢转的悬臂梁结构。

公开(公告)号：US20130112891A1

公开(公告)日：2013-05-09

申请号：US13667337

申请日：2012-11-02

Applicant: CANON KABUSHIKI KAISHA

Inventor： Takahisa Kato

IPC: H01J3/14 ,  H01J3/18 ,  H01J3/26 ,  G21K5/04

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/03 ,  H01J2237/0435 ,  H01J2237/151

Abstract: A charged particle optical system includes: a member 112 likely deforming due to heat; and an electrostatic deflector 113 deflecting a charged particle beam 1 and fixed to the member 112. An electrode supporting portion 5 is placed on the fixing portion 7 so as to reduce a transmission of a deforming stress from the member 112 to the electrode supporting portion 5 in a direction of the electric field through the fixing portion 7. The transmission of the stress from the member that causes deformation to the electrode supporting portion of the electrostatic deflector is suppressed, and the dispersion of the deflections of a plurality of the charged particle beams is reduced.

Abstract translation: 带电粒子光学系统包括：构件112可能由于热而变形; 以及使带电粒子束1偏转并固定到构件112的静电偏转器113.电极支撑部分5放置在固定部分7上，以便减小变形应力从构件112向电极支撑部分5的传递 在通过固定部分7的电场的方向上。抑制了从导致变形的构件到静电偏转器的电极支撑部分的应力的传递，并且多个带电粒子束的偏转的分散 降低了。

公开(公告)号：US20120288799A1

公开(公告)日：2012-11-15

申请号：US13462013

申请日：2012-05-02

Applicant: Hiromitsu Takase ,  Ichiro Tanaka ,  Akira Miyake

Inventor： Hiromitsu Takase ,  Ichiro Tanaka ,  Akira Miyake

IPC: G03F7/20 ,  G21K5/08

CPC classification number: H01J37/3177 ,  B08B5/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70925 ,  H01J2237/022 ,  H01J2237/03 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/1205

Abstract: A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case.

Abstract translation: 在带有带电粒子束的基板上进行拉伸的光刻设备包括具有孔板的光学系统，其中形成有第一数量的孔以通过第一数量的带电粒子束以进行绘图;基板 配置为清洁孔板的清洁单元和容纳光学系统和基板保持器的室。 清洁单元包括具有发射孔板的壳体，其中形成有第二数量的发射孔，第二数量小于第一数量，被配置为在壳体中产生活性物种的活性物质源和被配置为 移动案件。

公开(公告)号：US20120273691A1

公开(公告)日：2012-11-01

申请号：US13458936

申请日：2012-04-27

Applicant: Alrik van den Brom ,  Stijn Willem Herman Karel Steenbrink ,  Marco Jan-Jaco Wieland ,  Guido De Boer ,  Pieter Kappelhof

Inventor： Alrik van den Brom ,  Stijn Willem Herman Karel Steenbrink ,  Marco Jan-Jaco Wieland ,  Guido De Boer ,  Pieter Kappelhof

IPC: H01J3/14

CPC classification number: H01J37/20 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70975 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/024 ,  H01J2237/03 ,  H01J2237/0437 ,  H01J2237/1502 ,  H01J2237/153

Abstract: The invention relates to a charged particle system for processing a target surface with at least one charged particle beam. The system comprises an optical column with a beam generator module for generating a plurality of charged particle beams, a beam modulator module for switching on and off said plurality of beams and a beam projector module for projecting beams or subbeams on said target surface. The system further comprises a frame supporting each of said modules in a fixed position and alignment elements for aligning at least one of beams and/or subbeams with a downstream module element.

Abstract translation: 本发明涉及一种用至少一个带电粒子束来处理目标表面的带电粒子系统。 该系统包括具有用于产生多个带电粒子束的光束发生器模块的光学柱，用于接通和关闭所述多个光束的光束调制器模块和用于在所述目标表面上投射光束或子光束的光束投影器模块。 该系统还包括支撑固定位置的每个模块的框架和用于将梁和/或子梁中的至少一个与下游模块元件对准的对准元件。

公开(公告)号：US08072149B2

公开(公告)日：2011-12-06

申请号：US12079978

申请日：2008-03-31

Applicant: Jeong-Ha Cho ,  Bon-Woong Koo ,  Byung-Yeal Yoon ,  Yong-Tae Kim ,  Jeong-Ho Yoon

Inventor： Jeong-Ha Cho ,  Bon-Woong Koo ,  Byung-Yeal Yoon ,  Yong-Tae Kim ,  Jeong-Ho Yoon

IPC: H01J7/24

CPC classification number: H01J37/08 ,  H01J27/08 ,  H01J37/04 ,  H01J37/3171 ,  H01J2237/03 ,  H01J2237/06308 ,  H01J2237/082

Abstract: A dual unbalanced indirectly heated cathode (IHC) ion chamber is disclosed. The cathodes have different surface areas, thereby affecting the amount of heat radiated by each. In the preferred embodiment, one cathode is of the size and dimension typically used for IHC ionization, as traditionally used for hot mode operation. The second cathode, preferably located on the opposite wall of the chamber, is of a smaller size. This smaller cathode is still indirectly heated by a filament, but due to its smaller size, radiates less heat into the source chamber, allowing the ion source to operate in cold mode, thereby preserving the molecular structure of the target molecules. In both modes, the unused cathode is preferably biased so as to be at the same potential as the IHC, thus allowing it to act as a repeller.

Abstract translation: 公开了一种双重不平衡间接加热阴极（IHC）离子室。 阴极具有不同的表面积，从而影响每个阴极的辐射量。 在优选实施例中，一个阴极具有通常用于IHC电离的尺寸和尺寸，如传统上用于热模式操作。 优选地，位于腔室的相对壁上的第二阴极具有较小的尺寸。 这种较小的阴极仍然被灯丝间接加热，但是由于其尺寸较小，辐射较少的热量进入源室，从而允许离子源以冷模式运行，从而保持目标分子的分子结构。 在两种模式中，未使用的阴极优选被偏压以与IHC处于相同的电位，从而允许其用作推斥器。

公开(公告)号：US07692158B2

公开(公告)日：2010-04-06

申请号：US11710930

申请日：2007-02-27

Applicant: Munehiro Ogasawara

Inventor： Munehiro Ogasawara

IPC: G21K1/08 ,  H01J1/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J2237/03 ,  H01J2237/1504 ,  H01J2237/151

Abstract: A charged beam drawing apparatus deflects, by an electrostatic deflector, a charged beam generated from a charged beam source, and applies the charged beam to a desired position on a sample to draw a pattern. The electrostatic deflector includes a plurality of deflecting electrodes arranged symmetrically with respect to a point around an optical axis of the charged beam, a ground external cylinder which is disposed coaxially with the optical axis and which is provided to enclose the deflecting electrodes, a resistive film provided on an inner surface of the ground external cylinder, and a conductive film provided on a surface of the resistive film. A capacitance is formed between the deflecting electrodes and the conductive film, and a resistance is formed between the ground conductor and the conductive film.

Abstract translation: 带电束的拉伸装置通过静电偏转器偏转从带电束源产生的带电束，并将带电束施加到样品上的期望位置以绘制图案。 静电偏转器包括相对于带电光束的光轴围绕的点对称布置的多个偏转电极，与光轴同轴设置并且被设置为包围偏转电极的电阻膜 设置在接地外筒的内表面上，以及设置在电阻膜的表面上的导电膜。 在偏转电极和导电膜之间形成电容，并且在接地导体和导电膜之间形成电阻。

公开(公告)号：US20080231192A1

公开(公告)日：2008-09-25

申请号：US12033467

申请日：2008-02-19

Applicant: Munehiro Ogasawara

Inventor： Munehiro Ogasawara

IPC: H01J23/16

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J2237/03 ,  H01J2237/038 ,  H01J2237/1504 ,  H01J2237/151

Abstract: An electron beam drawing apparatus, comprises an electrostatic deflector which deflects the electron beam by an electric field, a coaxial cable which is connected to deflecting electrodes, and a resistive element which is connected between a central conductor and an outer conductor or the external cylinder. The electrostatic deflector includes the external cylinder provided more downstream than the electron source and kept at the ground potential and a plurality of deflecting electrodes which are provided in the external cylinder. The coaxial cable includes the central conductor and the tubular outer conductor, one end of the central conductor passing through the external cylinder and being connected to the deflecting electrodes and one end of the outer conductor being connected to the external cylinder. The resistive element is set to a resistance for obtaining impedance matching with the coaxial cable.

Abstract translation: 一种电子束描绘装置，包括通过电场使电子束偏转的静电偏转器，连接到偏转电极的同轴电缆，以及连接在中心导体和外部导体或外部气缸之间的电阻元件。 静电偏转器包括设置在电子源下游并保持在接地电位的外筒，以及设置在外筒中的多个偏转电极。 同轴电缆包括中心导体和管状外部导体，中心导体的一端穿过外部圆筒并连接到偏转电极，外部导体的一端连接到外部圆筒。 电阻元件被设置为用于获得与同轴电缆的阻抗匹配的电阻。