公开(公告)号：US20170352544A1

公开(公告)日：2017-12-07

申请号：US15609273

申请日：2017-05-31

Applicant: Axcelis Technologies, Inc.

Inventor： Marvin Farley ,  Mike Ameen ,  Causon Ko-Chuan Jen

IPC: H01L21/265 ,  H01L21/67 ,  C23C14/54 ,  H01J37/317 ,  H01J37/20 ,  H01L21/677 ,  C23C14/48

CPC classification number: H01L21/26513 ,  C23C14/48 ,  C23C14/541 ,  H01J37/185 ,  H01J37/20 ,  H01J37/3171 ,  H01J2237/002 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/31701 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/67115 ,  H01L21/67213 ,  H01L21/67742

Abstract: An ion implantation system has a first chamber and a process chamber with a heated chuck. A controller transfers the workpiece between the heated chuck and first chamber and selectively energizes the heated chuck first and second modes. In the first and second modes, the heated chuck is heated to a first and second temperature, respectively. The first temperature is predetermined. The second temperature is variable, whereby the controller determines the second temperature based on a thermal budget, an implant energy, and/or an initial temperature of the workpiece in the first chamber, and generally maintains the second temperature in the second mode. Transferring the workpiece from the heated chuck to the first chamber removes implant energy from the process chamber in the second mode. Heat may be further transferred from the heated chuck to a cooling platen by a transfer of the workpiece therebetween to sequentially cool the heated chuck.

公开(公告)号：US09688569B2

公开(公告)日：2017-06-27

申请号：US14820344

申请日：2015-08-06

Applicant: Infineon Technologies AG

Inventor： Karl Pilch

IPC: C03C25/68 ,  C03C15/00 ,  H01L21/306 ,  H01L21/02 ,  H01L21/67 ,  H01L21/66

CPC classification number: C03C15/00 ,  H01J2237/2001 ,  H01L21/02019 ,  H01L21/30604 ,  H01L21/30608 ,  H01L21/6708 ,  H01L21/67115 ,  H01L21/67248 ,  H01L22/12 ,  H01L22/26

Abstract: An etchant is supplied to a workpiece. Furthermore, the workpiece is irradiated with spatially modulated light to adjust a temperature profile of the workpiece while etchant is supplied.

公开(公告)号：US09679741B2

公开(公告)日：2017-06-13

申请号：US12942201

申请日：2010-11-09

Applicant: Libor Novak ,  Marek Uncovsky ,  Milos Toth ,  Martin Cafourek ,  William Parker ,  Marcus Straw ,  Mark Emerson

Inventor： Libor Novak ,  Marek Uncovsky ,  Milos Toth ,  Martin Cafourek ,  William Parker ,  Marcus Straw ,  Mark Emerson

IPC: G01N23/00 ,  H01J37/20 ,  H01J37/18 ,  H01J37/244

CPC classification number: H01J37/20 ,  H01J37/18 ,  H01J37/244 ,  H01J2237/024 ,  H01J2237/2001 ,  H01J2237/2003 ,  H01J2237/2445

Abstract: An environmental cell for a charged particle beam system allows relative motion between the cell mounted on an X-Y stage and the optical axis of the focusing column, thereby eliminating the need for a sub-stage within the cell. A flexible cell configuration, such as a retractable lid, permits a variety of processes, including beam-induced and thermally-induced processes. Photoelectron yield spectroscopy performed in a charged particle beam system and using gas cascade amplification of the photoelectrons allows analysis of material in the cell and monitoring of processing in the cell. Luminescence analysis can be also performed using a retractable mirror.

公开(公告)号：US20170114448A1

公开(公告)日：2017-04-27

申请号：US14923357

申请日：2015-10-26

Applicant: Tango Systems, Inc.

Inventor： Ravi Mullapudi ,  Harish Varma Penmethsa ,  Harshal T. Vasa ,  Srikanth Dasaradhi ,  Lee LaBlanc

IPC: C23C14/35 ,  H01J37/32 ,  H01J37/34 ,  C23C14/50 ,  C23C14/54

CPC classification number: C23C14/352 ,  C23C14/50 ,  C23C14/505 ,  C23C14/541 ,  H01J37/32724 ,  H01J37/3405 ,  H01J37/3411 ,  H01J37/3455 ,  H01J37/3464 ,  H01J2237/006 ,  H01J2237/2001 ,  H01J2237/20214

Abstract: A circular PVD chamber has a plurality of sputtering targets mounted on a top wall of the chamber. A pallet in the chamber is coupled to a motor for rotating the pallet about its center axis. The pallet has a diameter less than the diameter of the circular chamber. The pallet is also shiftable in an XY direction to move the center of the pallet beneath any of the targets so all areas of a workpiece supported by the pallet can be positioned directly below any one of the targets. A scanning magnet is in back of each target and is moved, via a programmed controller, to only be above portions of the workpiece so that no sputtered material is wasted. For depositing a material onto small workpieces, a cooling backside gas volume is created between the pallet and the underside of sticky tape supporting the workpieces.

公开(公告)号：US20170062177A1

公开(公告)日：2017-03-02

申请号：US15253126

申请日：2016-08-31

Applicant: PROTOCHIPS, INC.

Inventor： Franklin Stampley Walden II ,  John Damiano, JR. ,  Daniel Stephen Gardiner ,  David P. Nackashi ,  William Bradford Carpenter

IPC: H01J37/26 ,  H01J37/20

CPC classification number: H01J37/20 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01J2237/2003

Abstract: A heating device having a heating element patterned into a robust MEMs substrate, wherein the heating element is electrically isolated from a fluid reservoir or bulk conductive sample, but close enough in proximity to an imagable window/area having the fluid or sample thereon, such that the sample is heated through conduction. The heating device can be used in a microscope sample holder, e.g., for SEM, TEM, STEM, X-ray synchrotron, scanning probe microscopy, and optical microscopy.

Abstract translation: 一种加热装置，其具有图案化成坚固的MEMs基底的加热元件，其中加热元件与流体储存器或体导电样品电隔离，但足够靠近具有流体或样品的可成像窗口/区域，使得 样品通过传导加热。 加热装置可用于显微镜样品架，例如用于SEM，TEM，STEM，X射线同步加速器，扫描探针显微镜和光学显微镜。

公开(公告)号：US09543112B2

公开(公告)日：2017-01-10

申请号：US14410235

申请日：2013-06-04

Applicant: Hitachi High-Technologies Corporation

Inventor： Yasuhira Nagakubo ,  Takashi Mizuo

IPC: G21K5/10 ,  H01J37/20 ,  H01J37/26

CPC classification number: H01J37/20 ,  H01J37/26 ,  H01J2237/184 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01J2237/20207

Abstract: In an existing specimen cryo holder, a change in the orientation of a specimen would lead to tilting of a dewar together with the specimen and hence to bubbling of a cooling source contained in the dewar. In view of this, a specimen cryo holder, including a mechanism capable of cooling a specimen while keeping the posture of a dewar in a fixed direction even when the specimen is tilted into a direction suitable for processing or observation thereof, is provided. Also provided is a dewar in which a vacuum maintenance mechanism is mounted to an outer vessel so that an inner vessel holding a cooling source therein is vacuum-insulated from the outside air.

Abstract translation: 在现有的样品冷冻保持器中，样品的取向的变化将导致杜瓦瓶与样品一起倾斜，并因此产生包含在杜瓦瓶中的冷却源的起泡。 鉴于此，提供了一种样本冷冻保持器，其包括即使当试样倾斜到适合于其加工或观察的方向时，也能够将保持在固定方向上的杜瓦的姿势的样品冷却的机构。 还提供了一种杜瓦瓶，其中真空维护机构安装到外部容器，使得其中容纳冷却源的内部容器与外部空气真空绝缘。

公开(公告)号：US20160372352A1

公开(公告)日：2016-12-22

申请号：US14859951

申请日：2015-09-21

Applicant: Lam Research Corporation

Inventor： Benny Wu ,  Eric A. Pape ,  Keith William Gaff

IPC: H01L21/67 ,  G05B19/418 ,  G05D23/19 ,  H01L21/683

CPC classification number: H01L21/67248 ,  H01J2237/2001 ,  H01L21/324 ,  H01L21/6831 ,  H01L22/12

Abstract: A system for controlling a temperature of a wafer processing substrate includes memory that stores first data indicative of first temperature responses of at least one first thermal control element. The first data corresponds to the first temperature responses as observed when a first control parameter of the at least one first thermal control element is maintained at a first predetermined first value. A first controller receives a setpoint temperature for the wafer processing substrate and maintains the first control parameter of the at least one first thermal control element at a second value based on the received setpoint temperature. A second controller retrieves the first data from the memory, calculates second data indicative of temperature non-uniformities associated with the wafer processing substrate based on the first data and the second value, and controls a plurality of second thermal control elements based on the calculated second data.

Abstract translation: 用于控制晶片处理衬底的温度的系统包括存储器，其存储指示至少一个第一热控制元件的第一温度响应的第一数据。 第一数据对应于当至少一个第一热控制元件的第一控制参数保持在第一预定第一值时观察到的第一温度响应。 第一控制器接收晶片处理衬底的设定点温度，并且基于所接收的设定点温度将所述至少一个第一热控制元件的第一控制参数保持在第二值。 第二控制器从存储器检索第一数据，基于第一数据和第二值计算指示与晶片处理衬底相关联的温度不均匀性的第二数据，并且基于计算的第二数据控制多个第二热控元件 数据。

公开(公告)号：US09524850B2

公开(公告)日：2016-12-20

申请号：US13769040

申请日：2013-02-15

Applicant: FEI Company ,  Delft University of Technology

Inventor： Hendrik Willem Zandbergen ,  Pleun Dona ,  Gerardus Nicolaas Anne van Veen

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J2237/022 ,  H01J2237/2001 ,  H01J2237/2003 ,  H01J2237/2605 ,  H01J2237/2802

Abstract: A holder assembly comprises a first and a separable second part, the first part detachable from the second part, the first part comprising a tube and an environmental cell interface and the second part comprising an electron microscope interface, as a result of which the first part can be cleaned at high temperatures without exposing the second part to said high temperature.By forming the holder assembly from detachable parts, one part can be cleaned by heating it to a high temperature of, for example, 1000° C., clogging in the tubes can be removed by reduction of carbon, while keeping the other part (often comprising mechanical fittings, ball bearing, sliders, or such like) cool. The cleaning can be enhanced by blowing, for example, oxygen or hydrogen through the tubes.

Abstract translation: 通过从可拆卸部件形成保持器组件，可以通过将其加热至例如1000℃的高温来清洁一部分，可以通过还原碳来除去管中的堵塞，同时保持另一部分（通常 包括机械配件，滚珠轴承，滑块等）冷却。 可以通过吹送例如通过管的氧气或氢气来提高清洁。

公开(公告)号：US20160329190A1

公开(公告)日：2016-11-10

申请号：US14707025

申请日：2015-05-08

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Morgan D. Evans ,  Jason M. Schaller ,  D. Jeffrey Lischer ,  Ala Moradian

IPC: H01J37/317 ,  H01J37/20

CPC classification number: H01J37/3171 ,  H01J37/20 ,  H01J2237/2001

Abstract: A system and method for heating a substrate while that substrate is being processed by an ion beam is disclosed. The system comprises two arrays of light emitting diodes (LEDs) disposed above and below the ion beam. The LEDs may be GaN or GaP LEDs, which emit light at a wavelength which is readily absorbed by silicon, thus efficiently and quickly heating the substrate. The LED arrays may be arranged so that the ion beam passes between the two LED arrays and strikes the substrate. As the substrate is translated relative to the ion beam, the LEDs from the LED arrays provide heating to the substrate.

Abstract translation: 公开了一种用于在衬底被离子束加工的同时加热衬底的系统和方法。 该系统包括设置在离子束上方和下方的两组发光二极管（LED）阵列。 LED可以是GaN或GaP LED，其以易于被硅吸收的波长发光，从而有效地快速加热衬底。 LED阵列可以被布置成使得离子束在两个LED阵列之间通过并撞击基板。 当衬底相对于离子束平移时，来自LED阵列的LED向衬底提供加热。

公开(公告)号：US09378922B2

公开(公告)日：2016-06-28

申请号：US14417345

申请日：2013-06-19

Applicant: Hitachi High-Technologies Corporation

Inventor： Toshie Yaguchi ,  Yasuhira Nagakubo

IPC: H01J37/26 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/20 ,  H01J37/244 ,  H01J37/26 ,  H01J37/261 ,  H01J2237/006 ,  H01J2237/063 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/2007 ,  H01J2237/2448 ,  H01J2237/2602

Abstract: An object of the invention is to provide an electron microscope which can easily and safely prepare a gas or liquid environment in the electron microscope and can observe a specimen in the environment and a reaction of the specimen at a high resolution and to provide a specimen holder for the electron microscope. In the electron microscope including specimen holding means (6) for holding a specimen (23), the specimen (23) is placed in a capillary (17) through which electron beams are transmittable, the electron microscope includes a supply device for supplying gas or liquid into the capillary (17) and a collection device for collecting the gas or the liquid, and the electron microscope obtains a specimen image of the specimen while flowing the gas or the liquid.

Abstract translation: 本发明的目的是提供一种电子显微镜，其可以容易且安全地在电子显微镜中制备气体或液体环境，并且可以观察环境中的样品和高分辨率的样品的反应并提供样品架 用于电子显微镜。 在包括用于保持试样（23）的检体保持机构（6）的电子显微镜中，试样（23）被放置在可透射电子束的毛细管（17）中，电子显微镜包括用于供给气体的供给装置 液体进入毛细管（17）和用于收集气体或液体的收集装置，并且电子显微镜在流动气体或液体的同时获得样品的样本图像。