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    CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND METHODS RELATED THERETO
    21.
    发明申请
    CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND METHODS RELATED THERETO 审中-公开
    充电颗粒光束辐射装置及其相关方法

    公开(公告)号：US20140377891A1

    公开(公告)日：2014-12-25

    申请号：US14311092

    申请日：2014-06-20

    Applicant: CANON KABUSHIKI KAISHA

    Inventor： Go Tsuchiya ,  Wataru Yamaguchi

    IPC: H01J37/244 ,  H01J37/317 ,  H01L21/66

    CPC classification number: H01J37/3174 ,  H01J37/304 ,  H01J2237/20292 ,  H01J2237/21 ,  H01J2237/248 ,  H01L22/12

    Abstract: A charged particle beam irradiation apparatus, which irradiates a substrate with a charged particle beam, includes a capacitance sensor and an optical sensor configured to measure a surface position of the substrate, a storage unit configured to store respective measurement values of the surface position of the substrate measured by the optical sensor and the capacitance sensor, and a calculation unit configured to obtain surface position data of the substrate, in which the calculation unit obtains a correction amount by using respective measurement values of the surface position measured by the capacitance sensor and the optical sensor in a region within a scribe line formed on the substrate, which are stored in the stored unit, and applies the correction amount to the measurement value of the surface position measured by the capacitance sensor, to obtain the surface position data of the substrate.

    Abstract translation: 带有带电粒子束照射基板的带电粒子束照射装置包括：电容传感器和被配置为测量基板的表面位置的光学传感器;存储单元，被配置为存储基板的表面位置的各自的测量值 由光学传感器和电容传感器测量的基板和计算单元，被配置为获得基板的表面位置数据，其中计算单元通过使用由电容传感器测量的表面位置的各个测量值和 在存储在存储单元中的形成在基板上的划线内的区域内的光学传感器，并且将校正量应用于由电容传感器测量的表面位置的测量值，以获得基板的表面位置数据 。

    Manufacturing equipment using ION beam or electron beam
    24.
    发明授权
    Manufacturing equipment using ION beam or electron beam 有权
    使用ION光束或电子束的制造设备

    公开(公告)号：US07592606B2

    公开(公告)日：2009-09-22

    申请号：US11779686

    申请日：2007-07-18

    Applicant: Koji Ishiguro ,  Kaoru Umemura ,  Noriyuki Kaneoka

    Inventor： Koji Ishiguro ,  Kaoru Umemura ,  Noriyuki Kaneoka

    IPC: G08B21/00

    CPC classification number: H01J37/3056 ,  H01J37/3005 ,  H01J37/304 ,  H01J2237/0225 ,  H01J2237/05 ,  H01J2237/24514 ,  H01J2237/248 ,  H01J2237/30455 ,  H01J2237/31744 ,  H01J2237/31745

    Abstract: Provided is a charged particle beam processing apparatus capable of improving yields by suppressing the spread of metal pollution to a semiconductor manufacturing process to a minimum. The charged particle beam processing apparatus includes an ion beam column 1 that is connected to a vacuum vessel 10 and irradiates a sample 35 with an ion beam 11 of nonmetal ion species, a microsampling unit 3 having a probe 16 that extracts a microsample 43 cut out from a sample 35 by the ion beam 11, a gas gun 2 that discharges a gas for bonding the microsample 43 and the probe 16, a pollution measuring beam column 6A that is connected to the same vacuum vessel 10 to which the ion beam column 1 is connected and irradiates an ion beam irradiation traces by the ion beam column 1 with a pollution measuring beam 13, and a detector 7 that detects characteristic X-rays emitted from the ion beam irradiation traces by the ion beam column 1 upon irradiation with the pollution measuring beam 13.

    Abstract translation: 提供一种能够通过将半导体制造工序的金属污染的扩散抑制到最小来提高产率的带电粒子束处理装置。 带电粒子束处理装置包括离子束柱1，其连接到真空容器10并用非金属离子种类的离子束11照射样品35，微量取样单元3具有探针16，其提取切出的微量样品43 从样品35通过离子束11，放出用于接合微量样品43和探针16的气体的气枪2，污染测量束柱6A，连接到相同的真空容器10，离子束柱1 用离子束柱1连接并用污染测量光束13照射离子束照射迹线;以及检测器7，其在照射污染物时检测由离子束柱1从离子束照射迹线发射的特征X射线 测量光束13。

    METHOD AND APPARATUS FOR SETTING SAMPLE OBSERVATION CONDITION, AND METHOD AND APPARATUS FOR SAMPLE OBSERVATION
    25.
    发明申请
    METHOD AND APPARATUS FOR SETTING SAMPLE OBSERVATION CONDITION, AND METHOD AND APPARATUS FOR SAMPLE OBSERVATION 失效
    用于设置样本观测条件的方法和装置，以及样本观测的方法和装置

    公开(公告)号：US20080217532A1

    公开(公告)日：2008-09-11

    申请号：US12043946

    申请日：2008-03-06

    Applicant: Kazuhiro Ueda ,  Tatsuya Maeda

    Inventor： Kazuhiro Ueda ,  Tatsuya Maeda

    IPC: G01N23/00

    CPC classification number: G01N23/2251 ,  H01J2237/0041 ,  H01J2237/221 ,  H01J2237/248 ,  H01J2237/28

    Abstract: A method and apparatus for setting a sample observation condition and a method and apparatus for sample observation which allow sample observation by speedily and simply finding an optimum condition while suppressing damage to the sample are provided. The setting of a sample observation condition according to the present invention is realized by an electron beam apparatus acquiring a profile at a predetermined evaluation location of a sample under a reference observation condition, by a processing section judging whether or not the above described acquired profile is located within a predetermined setting range and setting an optimum observation condition to be used for sample observation based on this judgment result. More specifically, locations where the condition can be examined are registered beforehand first and then a jump is made to the corresponding location which is irradiated with an electron beam (hereinafter referred to as “predosing”) at a low magnification, the surface of the sample is charged, enlarged to an observation magnification and secondary electron information on the target location is obtained. After that, secondary electron information is obtained at any time while performing predosing, it is successively judged from the information whether the pattern bottom part can be observed/measured or whether or not the sample is destroyed and an optimum observation condition is thereby found.

    Abstract translation: 提供了一种用于设置样品观察条件的方法和装置以及用于样品观察的方法和装置，其允许通过快速简单地找到最佳条件同时抑制对样品的损伤的样品观察。 根据本发明的样品观察条件的设定是通过电子束装置实现的，该电子束装置在参考观察条件下在样本的预定评估位置获取轮廓，通过处理部分判断上述获得的轮廓是否为 位于预定设定范围内，并且基于该判断结果设定用于样本观察的最佳观察条件。 更具体地说，先检查条件的位置，然后，以低放大倍数，以低放大倍率，对照射有电子束的对应位置（以下称为“预取”）进行跳转，将样品的表面 被放大到观察倍率，并且获得目标位置上的二次电子信息。 之后，在执行预取时随时获得二次电子信息，根据信息连续判断图案底部是否可以被观察/测量，或者样品是否被破坏，从而找到最佳观察条件。

    Electron microscope
    30.
    发明授权
    Electron microscope 失效
    电子显微镜

    公开(公告)号：US5814814A

    公开(公告)日：1998-09-29

    申请号：US607613

    申请日：1996-02-27

    Applicant: Yoichi Kanemitsu ,  Katsuhide Watanabe

    Inventor： Yoichi Kanemitsu ,  Katsuhide Watanabe

    IPC: H01J37/28 ,  H01J37/244

    CPC classification number: H01J37/28 ,  H01J2237/0216 ,  H01J2237/15 ,  H01J2237/248

    Abstract: An electron microscope has an electron gun for emitting an electron beam, a specimen holder for holding a specimen thereon, and a deflection coil for applying the electron beam from the electron gun to the specimen on the specimen holder. A controller produces a differential signal representing the difference between a signal from a vibration sensor which detects vibrations of the electron gun and a signal from another vibration sensor which detects vibrations of the specimen holder. The differential signal is added to a deflection signal for the deflection coil for thereby effecting feedforward control of the electron beam to cause the electron beam to reach the specimen on the specimen holder, irrespective of the vibrations of the electron gun and the specimen holder.

    Abstract translation: 电子显微镜具有用于发射电子束的电子枪，用于在其上保持试样的试样保持器和用于将来自电子枪的电子束施加到试样保持器上的试样的偏转线圈。 控制器产生表示来自检测电子枪的振动的振动传感器的信号与检测试样保持器的振动的另一振动传感器的信号之间的差的差分信号。 差分信号被加到偏转线圈的偏转信号上，从而进行电子束的前馈控制，使电子束到达试样架上的试样，而与电子枪和试样架的振动无关。

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