公开(公告)号：US06963162B1

公开(公告)日：2005-11-08

申请号：US10459883

申请日：2003-06-12

Applicant: Dominick Centurioni

Inventor： Dominick Centurioni

IPC: H01J27/02 ,  H01J27/08 ,  H05H1/00

CPC classification number: H01J27/022 ,  H01J27/146

Abstract: A gas distributor for an ion source includes a plate having a recess and a series of apertures spaced radially outward from the recess. The apertures define paths for the flow of a gas through the plate, and the gas distributor further includes a sacrificial element that is separate from the plate and that is receivable and seats within the recess. The sacrificial element forms an area of the gas distributor that is subjected to erosive forces during normal operations of the ion source, and therefore, prevents erosion of the surface of the plate. The sacrificial element is removable from the plate and replaceable with another sacrificial element during a procedure which neither requires the plate to be removed from the ion source nor the ion source to be disassembled.

Abstract translation: 用于离子源的气体分配器包括具有凹部的板和从凹部径向向外间隔开的一系列孔。 所述孔限定了通过所述板的气体流动的路径，并且所述气体分配器还包括与所述板分离并且可接收并位于所述凹部内的牺牲元件。 牺牲元件形成在离子源的正常操作期间经受侵蚀力的气体分配器的区域，因此防止了板的表面的侵蚀。 牺牲元件可以从板移除并且在过程期间可以替换为另外的牺牲元件，这既不需要将板从离子源移除，也不需要拆卸离子源。

公开(公告)号：US6022258A

公开(公告)日：2000-02-08

申请号：US2803

申请日：1998-01-05

Applicant: Richard C. Abbott ,  Raymond C. DesMarais

Inventor： Richard C. Abbott ,  Raymond C. DesMarais

IPC: H01J27/04 ,  H01J27/08 ,  H01J27/16 ,  H01J27/22 ,  H01J37/08 ,  H01J37/317

CPC classification number: H01J27/08 ,  H01J27/04 ,  H01J27/16 ,  H01J27/22 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/31701

Abstract: The present invention relates to the fabrication of materials and structures having selected mechanical, thermal and electrical properties. More particularly, the invention relates to the use of these materials and structures in ion implantation systems. Structures comprising boron material provide components for use in implanters including arc chambers with which a beam of ions is generated for implantation into a target such as a semiconductor wafer.

Abstract translation: 本发明涉及具有选择的机械，热和电特性的材料和结构的制造。 更具体地说，本发明涉及这些材料和结构在离子注入系统中的应用。 包括硼材料的结构提供了用于包括电弧室的注入器中的组件，通过该组件产生离子束用于注入诸如半导体晶片的靶。

公开(公告)号：US5883393A

公开(公告)日：1999-03-16

申请号：US55435

申请日：1998-04-06

Applicant: Fu-Kang Tien ,  H. J. Chang

Inventor： Fu-Kang Tien ,  H. J. Chang

IPC: H01J27/02 ,  H01J27/08 ,  H01J37/09

CPC classification number: H01J27/024 ,  H01J27/08 ,  H01J37/09 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/08 ,  H01J2237/31701

Abstract: A plurality of removable shields are disclosed for use with ion source in ion implanters. Specifically, the shields fit over the extraction electrode assembly, the sides of the interior walls and the cold-plate inside an ion source chamber. The shields are easily mountable and dismountable by the maintenance personnel. It is shown that shields can very effectively protect the insides of ion source from contamination by toxic materials emanating from the ionization source. A method is also disclosed for cleaning the shields outside the ion source by means of bead blasting followed by washing by deionized water and rinse with isopropyl alcohol. It is shown that the turn-around-time for preventive maintenance of an ion source in an ion implanter can be shortened by a factor of four.

Abstract translation: 公开了用于离子注入机中的离子源的多个可移除屏蔽件。 具体地说，屏蔽件适合于提取电极组件，内壁的侧面和离子源室内的冷板。 护罩可以由维护人员轻松安装和拆卸。 显示屏蔽可以非常有效地保护离子源的内部免受从电离源发出的有毒材料的污染。 还公开了一种通过珠粒喷射清洁离子源外部的屏蔽物，然后用去离子水洗涤并用异丙醇冲洗的方法。 表明离子注入机中离子源的预防性维护的周转时间可以缩短四倍。

公开(公告)号：US5866909A

公开(公告)日：1999-02-02

申请号：US875822

申请日：1997-08-07

Applicant: James Harry Freeman

Inventor： James Harry Freeman

IPC: H01J27/08 ,  H01J27/20 ,  H01J37/05 ,  H01J37/08 ,  H01J37/317 ,  H01J49/10 ,  B01D59/44

CPC classification number: H01J49/10 ,  H01J27/20 ,  H01J37/05

Abstract: A mass-analysed ion beam generator in which the ion beam is in the form of a thin flat ribbon with its major transverse dimension aligned parallel with the direction of the mass-analysing magnetic field.

Abstract translation: PCT No.PCT / GB96 / 00359 Sec。 371日期1997年8月7日 102（e）日期1997年8月7日PCT 1996年2月16日PCT公布。 出版物WO96 / 26530 日期1996年8月29日一种质量分析离子束发生器，其中离子束是薄平坦带形式，其主横向尺寸与质量分析磁场的方向平行排列。

公开(公告)号：US5808416A

公开(公告)日：1998-09-15

申请号：US742896

申请日：1996-11-01

Applicant: Anthony J. Armini

Inventor： Anthony J. Armini

IPC: H01J27/04 ,  H01J27/08 ,  H01J7/24

CPC classification number: H01J27/04 ,  H01J27/08 ,  H01J2237/31701

Abstract: An ion source generating device having a main arc chamber and an auxiliary chamber attached to and in fluid communication with the main chamber. The auxiliary chamber contains solid reactants consisting of Ca.sub.3 P.sub.2 or Mg.sub.3 As.sub.2 to provide a reduction reaction of feed gas such as HF or H.sub.2 O respectively, passing through the chamber and into the main chamber, in which the ion beam is generated.

Abstract translation: 一种离子源产生装置，其具有连接到主室并与主室流体连通的主电弧室和辅助室。 辅助室包含由Ca 3 P 2或Mg 3 As 2组成的固体反应物，以分别提供通过室并进入其中产生离子束的主室中的诸如HF或H 2 H的进料气体的还原反应。

公开(公告)号：US5763895A

公开(公告)日：1998-06-09

申请号：US782709

申请日：1997-01-13

Applicant: Fu-Kang Tien ,  H. J. Chang

Inventor： Fu-Kang Tien ,  H. J. Chang

IPC: H01J27/02 ,  H01J27/08 ,  H01J37/09 ,  H01J37/20

CPC classification number: H01J27/024 ,  H01J27/08 ,  H01J37/09 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/08 ,  H01J2237/31701

Abstract: A plurality of removable shields are disclosed for use with ion source in ion implanters. Specifically, the shields fit over the extraction electrode assembly, the sides of the interior walls and the cold-plate inside an ion source chamber. The shields are easily mountable and dismountable by the maintenance personnel. It is shown that shields can very effectively protect the insides of ion source from contamination by toxic materials emanating from the ionization source. A method is also disclosed for cleaning the shields outside the ion source by means of bead blasting followed by washing by deionized water and rinse with isopropyl alcohol. It is shown that the turn-around-time for preventive maintenance of an ion source in an ion implanter can be shortened by a factor of four.

公开(公告)号：US5640009A

公开(公告)日：1997-06-17

申请号：US943569

申请日：1992-09-11

Applicant: Masahiro Hatakeyama

Inventor： Masahiro Hatakeyama

IPC: G21K1/00 ,  H01J27/08 ,  H05H3/02

CPC classification number: H05H3/02

Abstract: A small fast atom beam source is capable of neutralizing ions at a high rate and of emitting a fast atom beam efficiently and with excellent directivity. A gas is introduced into the area between a plate-shaped anode having a plurality of atom emitting holes and a plate-shaped anode facing the cathode. A gas discharge is induced by a DC high-voltage power supply, thereby forming a plasma. Ions that are produced by the plasma are accelerated toward the cathode and neutralized in and near the atom emitting holes, which have lengths larger than the diameters thereof, thereby emitting a fast atom beam at a high rate of neutralization.

Abstract translation: 一个小的快速原子束源能够以高的速率中和离子并且有效地发射快速原子束并具有优良的方向性。 在具有多个原子发射孔的板状阳极和面向阴极的板状阳极之间的区域中引入气体。 由直流高压电源引起气体放电，从而形成等离子体。 由等离子体产生的离子将朝着阴极加速并在原子发射孔内和附近中和，其长度大于其直径，从而以高的中和速率发射快速原子束。

公开(公告)号：US5559391A

公开(公告)日：1996-09-24

申请号：US391503

申请日：1995-02-21

Applicant: Dominique Valentian

Inventor： Dominique Valentian

IPC: H01J27/08 ,  F03H1/00 ,  H01J27/02 ,  H01J37/08 ,  H01J23/18

CPC classification number: H01J37/08 ,  F03H1/0043 ,  H01J27/024

Abstract: The present invention relates to an ion-optical system for a gas-discharge ion source, the system comprising a screen grid and an accelerator grid each constituted by a respective frame and a set of wires held parallel by supports and fixed to said frames by means of springs, the frames and the grids being assembled together by means of insulators to which they are fixed. According to the invention, the system further comprises a decelerator grid constituted by a frame and a set of wires, the frame of the decelerator grid being engaged in the frame of the accelerator grid and being separated therefrom by insulators. The supports of the wires are constituted either by a comb-shaped plate or by rollers with at least one of the rollers installed in the screen grid being shaped so as to be barrel-shaped, having a larger diameter in its center than at its ends. The pitch of the wires of the screen grid is preferably determined in such a manner as to ensure that the outermost beams converge towards the central beam by a predetermined amount.

Abstract translation: 本发明涉及一种用于气体放电离子源的离子光学系统，该系统包括筛网格和加速器格栅，每个栅格网格和加速器栅格由相应的框架和由支撑件平行保持并通过装置固定到所述框架的一组电线构成 的弹簧，框架和网格通过固定到其上的绝缘体组装在一起。 根据本发明，该系统还包括由框架和一组电线构成的减速器格栅，减速器网格的框架接合在加速器格栅的框架中并由绝缘体与其分离。 电线的支撑体由梳形板或辊组成，其中安装在筛网中的至少一个辊成形为筒状，其中心的直径比其端部的直径大 。 优选地以确保最外面的光束朝向中心光束会聚预定量的方式来确定屏幕网格的电线的间距。

公开(公告)号：US5532495A

公开(公告)日：1996-07-02

申请号：US317948

申请日：1994-10-04

Applicant: Douglas D. Bloomquist ,  Rudy Buchheit ,  John B. Greenly ,  Dale C. McIntyre ,  Eugene L. Neau ,  Regan W. Stinnett

Inventor： Douglas D. Bloomquist ,  Rudy Buchheit ,  John B. Greenly ,  Dale C. McIntyre ,  Eugene L. Neau ,  Regan W. Stinnett

IPC: B29C35/08 ,  B29C59/16 ,  C23C8/36 ,  C23C14/48 ,  G21K5/04 ,  H01J3/04 ,  H01J27/00 ,  H01J27/08 ,  H01J27/14 ,  H01J37/08 ,  H01L21/48

CPC classification number: C08J7/123 ,  B29C59/16 ,  C23C14/48 ,  C23C8/36 ,  H01J27/14 ,  B29C2035/0872 ,  H01J2237/08 ,  H01J2237/31701

Abstract: A method and apparatus for treating material surfaces using a repetitively pulsed ion beam. In particular, a method of treating magnetic material surfaces in order to reduce surface defects, and produce amorphous fine grained magnetic material with properties that can be tailored by adjusting treatment parameters of a pulsed ion beam. In addition to a method of surface treating materials for wear and corrosion resistance using pulsed particle ion beams.

Abstract translation: 一种使用重复脉冲离子束处理材料表面的方法和装置。 特别是一种处理磁性材料表面以减少表面缺陷的方法，并且产生具有可通过调节脉冲离子束的处理参数来调整的特性的无定形细粒磁性材料。 除了使用脉冲粒子离子束表面处理材料的耐磨损和耐腐蚀性的方法之外。

公开(公告)号：US5517077A

公开(公告)日：1996-05-14

申请号：US105522

申请日：1993-08-11

Applicant: Nicholas Bright ,  Paul A. Burfield ,  John Pontefract ,  Bernard F. Harrison ,  Peter Meares ,  David R. Burgin ,  Andrew S. Devaney ,  Peter T. Kindersley

Inventor： Nicholas Bright ,  Paul A. Burfield ,  John Pontefract ,  Bernard F. Harrison ,  Peter Meares ,  David R. Burgin ,  Andrew S. Devaney ,  Peter T. Kindersley

IPC: H01J27/02 ,  H01J27/08 ,  H01J27/18 ,  H05H1/48

CPC classification number: H01J27/18 ,  H01J27/022 ,  H01J27/08 ,  H01J2237/31701 ,  H01J2237/31705

Abstract: Ion implantation equipment is modified so as to provide filament reflectors to a filament inside of an arc chamber, and to remove the electrical insulators for the filament outside of the arc chamber and providing a means of shielding, thereby reducing the formation of a conductive layer on said insulators and greatly extending the lifetime and reducing downtime of the equipment. The efficiency of the equipment is further enhanced by means of an interchangeable liner for the arc chamber that increases the wall temperature of the arc chamber and thus the electron temperature. The use of tungsten parts inside the arc chamber, obtained either by making the arc chamber itself or portions thereof of tungsten, particularly the front plate having the exit aperture for the ion beam, or by inserting a removable tungsten liner therein, decreases contamination of the ion beam. Serviceability of the arc chamber is improved by means of a unitary clamp that separately grips both the filament and filament reflectors. This clamp can also advantageously be made of tungsten.

Abstract translation: 离子注入设备被修改，以便为电弧室内的灯丝提供灯丝反射器，并且去除电弧室外的灯丝的电绝缘体并提供屏蔽装置，从而减少导电层的形成 表示绝缘子，大大延长了使用寿命，减少了设备停机时间。 通过用于电弧室的可更换衬垫进一步提高了设备​​的效率，从而提高了电弧室的壁温，从而提高了电子温度。 通过使电弧室本身或其部分的钨，特别是具有用于离子束的出射孔的前板或通过在其中插入可移除的钨衬垫而获得的钨部件的使用减少了 离子束。 电弧室的可维护性通过单独夹紧来改善，该夹具分别夹住灯丝和灯丝反射器。 该夹具还可以有利地由钨制成。