公开(公告)号：US10679820B2

公开(公告)日：2020-06-09

申请号：US16192559

申请日：2018-11-15

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Bao-Hua Niu ,  Jung-Hsiang Chuang ,  David Hung-I Su

IPC: H01J37/22 ,  H01J37/16 ,  H01J37/20 ,  H01J37/06 ,  H01J37/10 ,  H01J37/244

Abstract: A method includes applying a voltage to a wafer or a device under test (DUT). The wafer or the DUT is illuminated with an electron beam after applying the voltage to the wafer or the DUT. Cathodoluminescent light emitted from the wafer or the DUT in response to the electron beam is detected. One or more characteristics of the wafer or the DUT are determined based on the detected cathodoluminescent light.

公开(公告)号：US20200139620A1

公开(公告)日：2020-05-07

申请号：US16179546

申请日：2018-11-02

Applicant: Fermi Research Alliance, LLC

Inventor： Aaron Sauers ,  Robert Kephart

IPC: B29C64/135 ,  H01J37/305 ,  H01J37/06 ,  H01J37/147 ,  E01C23/14 ,  E01C11/00 ,  B29C64/264 ,  B33Y10/00

Abstract: A method and system for in situ cross-linking of polymers, Bitumen, and other materials to produce arbitrary functional or ornamental three-dimensional features using electron beams provided by mobile accelerators comprises defining a desired pattern for imparting on a target area, mapping the target area, defining at least one discrete voxel in the target area according to the desired pattern to be imparted on the target area, assigning an irradiation value to each of the at least one discrete voxels, and delivering a dose of irradiation to each of the at least one discrete voxels according to the assigned irradiation value.

公开(公告)号：US20200118784A1

公开(公告)日：2020-04-16

申请号：US16230325

申请日：2018-12-21

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears

IPC: H01J37/12 ,  H01J37/06

Abstract: An optical characterization system utilizing a micro-lens array (MLA) is provided. The system may include an electron source and a MLA including a micro-deflection array (MDA). The MDA may include an insulator substrate and a plurality of hexapole electrostatic deflectors disposed on the insulator substrate. The MDA may further include a plurality of voltage connecting lines configured to electrically couple the plurality of hexapole electrostatic deflectors to one or more voltage sources. The MDA may be configured to split a primary electron beam from the electron source into a plurality of primary electron beamlets. The system may be configured to focus the plurality of primary electron beamlets at a wafer plane.

公开(公告)号：US10607806B2

公开(公告)日：2020-03-31

申请号：US16153103

申请日：2018-10-05

Applicant: KLA-TENCOR CORPORATION

Inventor： Frances Hill ,  Gildardo R. Delgado ,  Rudy F. Garcia ,  Michael E. Romero ,  Katerina Ioakeimidi

IPC: H01J1/304 ,  H01J37/073 ,  H01J37/26 ,  G02B27/09 ,  H01J40/06 ,  H01J40/18 ,  H01J19/24 ,  H01J37/06 ,  H01J37/28 ,  H01J1/34 ,  H01L21/67

Abstract: Electron source designs are disclosed. The emitter structure, which may be silicon, has a layer on it. The layer may be graphene or a photoemissive material, such as an alkali halide. An additional layer between the emitter structure and the layer or a protective layer on the layer can be included. Methods of operation and methods of manufacturing also are disclosed.

公开(公告)号：US20200001423A1

公开(公告)日：2020-01-02

申请号：US16212035

申请日：2018-12-06

Applicant: Edmund Optics, Inc.

Inventor： Joel Bagwell ,  Nathan Carlie

IPC: B24B13/00 ,  H01S3/094 ,  H01J37/06 ,  C23C16/448

Abstract: A finishing and coating apparatus is configured for power polishing optical components. The apparatus includes a housing, a substrate holder, a vacuum pump system, a laser, and a coating source. The housing defines a chamber and the substrate holder is disposed within the chamber and configured to hold one or more optical components. The vacuum pump system is configured to create a vacuum within the chamber. The laser includes a laser engine and a laser beam delivery apparatus configured to direct a beam from the laser engine toward the one or more optical components. The laser is configured to finish the one or more optical components prior to coating the one or more optical components.

公开(公告)号：US20190355545A1

公开(公告)日：2019-11-21

申请号：US16416447

申请日：2019-05-20

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Dirk Zeidler ,  Stefan Schubert ,  Ingo Mueller ,  Joerg Jacobi ,  Mario Muetzel ,  Antonio Casares ,  Christof Riedesel

IPC: H01J37/14 ,  H01J37/05 ,  H01J37/147 ,  H01J37/21 ,  H01J37/06 ,  H01J37/244 ,  H01J37/28

Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors. The projection system images interaction products leaving the first region within the first plane due to impinging charged particles onto a first detector and images interaction products leaving the second region in the first plane onto a second detector.

公开(公告)号：US20190287759A1

公开(公告)日：2019-09-19

申请号：US15339922

申请日：2016-10-31

Applicant: Mochii, Inc. (d/b/a Voxa)

Inventor： Christopher Su-Yan Own ,  Matthew Francis Murfitt

IPC: H01J37/28 ,  H01J37/20 ,  H01J37/06 ,  H01J37/147 ,  H01J37/244 ,  H01J37/22

Abstract: A transmission electron microscope is provided for imaging a sample. The microscope has a stage to hold a sample and an electron beam column to direct an electron beam onto a field of view on the sample. The electron beam column includes an electron beam source to generate an electron beam, and electron beam optics to converge the electron beam onto a field of view on the sample. The microscope also has a beam scanner to scan the electron beam across multiple fields of view on the sample. The microscope additionally has a detector to detect radiation emanating from the sample to generate an image. A controller is provided to analyze the detected radiation to generate an image of the sample.

公开(公告)号：US20190259559A1

公开(公告)日：2019-08-22

申请号：US16270440

申请日：2019-02-07

Applicant: VEECO INSTRUMENTS, INC.

Inventor： Rustam YEVTUKHOV ,  Ivan SHKURENKOV ,  Boris DRUZ ,  Alan HAYES ,  Robert HIERONYMI

IPC: H01J37/02 ,  H01J37/06 ,  H01J37/08 ,  H01J3/02

Abstract: An ion beam neutralization system, often referred to as a plasma bridge neutralizer (PBN), as part of an ion beam (etch) system. The system utilizes an improved filament thermo-electron emitter PBN design, that when utilized in a particular method of operation, greatly extends filament life and minimizes variation in neutralizer operating parameters for long periods of operation. The PBN includes a solenoidal electromagnetic that produces an axial magnetic field within the PBN and a magnetic concentrator that facilitates the alignment of the magnetic field and inhibits stray fields. The PBN can readily provide a filament lifetime of at least 500 hours.

公开(公告)号：US20190214224A1

公开(公告)日：2019-07-11

申请号：US16237775

申请日：2019-01-02

Applicant: NuFlare Technology, Inc.

Inventor： Michihiro Kawaguchi ,  Kiminobu Akeno ,  Kiyoshi Nakaso ,  Keita Ideno ,  Shintaro Yamamoto ,  Keisuke Goto ,  Hitoshi Matsushita ,  Hirokazu Yoshioka ,  Ryouta Inoue ,  Yuuki Fukuda

IPC: H01J37/244 ,  H01J37/317 ,  H01J37/06

CPC classification number: H01J37/244 ,  H01J37/06 ,  H01J37/3174 ,  H01J2237/0216 ,  H01J2237/20264

Abstract: The vibration control system configured to control vibration of a vibration-controlled object is disclosed. The vibration control system comprises: (i) actuator units each including a piezoelectric element configured to expand and contract; (ii) a drive power source configured to supply drive voltages to the piezoelectric elements of the actuator units for causing the piezoelectric elements to expand and contract; (iii) a vibration detector configured to detect a status of vibration of the vibration-controlled object; and (iv) a vibration controller configured to control the vibration of the vibration-controlled object by controlling the voltages supplied by the drive power source to the piezoelectric elements of the actuator units based on the status of vibration detected by the vibration detector, respectively.

公开(公告)号：US20190202000A1

公开(公告)日：2019-07-04

申请号：US16322594

申请日：2017-08-04

Applicant: Consorzio Di Ricerca Hypatia

Inventor： Gildo Di Domenico ,  Flavio Lucibello ,  Lorenzo Scatena ,  Mariano Zarcone

IPC: B23K15/00 ,  B33Y30/00 ,  B23K15/02 ,  H01J37/147 ,  H01J37/12 ,  H01J25/10 ,  H01J37/06 ,  H01J37/315 ,  H01J37/301

CPC classification number: B23K15/0086 ,  B22F3/1055 ,  B22F2003/1056 ,  B23K15/0026 ,  B23K15/02 ,  B33Y30/00 ,  H01J25/02 ,  H01J25/04 ,  H01J25/10 ,  H01J25/36 ,  H01J25/42 ,  H01J37/06 ,  H01J37/12 ,  H01J37/147 ,  H01J37/301 ,  H01J37/315 ,  H01J37/3178 ,  H01J2237/0473 ,  H01J2237/3104 ,  H01J2237/3128 ,  H03B9/04 ,  Y02P10/295

Abstract: An electron beam 3D printing machine (1), comprising a chamber (2) for generating and accelerating an electron beam and an operating chamber (3) in which a metal powder is melted, with the consequent production of a three-dimensional product. The chamber (2) for generating and accelerating an electron beam houses means (4) for generating an electron beam and means (6) for accelerating the generated electron beam, while the operating chamber (3) houses at least one platform (16) for depositing the metal powder, metal powder handling means (18) and electron beam deflection means (15). The accelerator means for the generated electron beam comprise a series of resonant cavities fed with an alternating signal.