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    METHOD OF MASKING AND DE-MASKING
    31.
    发明申请
    METHOD OF MASKING AND DE-MASKING 审中-公开

    公开(公告)号：US20180177062A1

    公开(公告)日：2018-06-21

    申请号：US15641138

    申请日：2017-07-03

    Applicant: HZO, Inc.

    Inventor： Joshua Su ,  Yang Yun ,  Howard Liu

    IPC: H05K3/46 ,  B05D1/32 ,  H05K3/28 ,  H05K3/00

    CPC classification number: H05K3/4644 ,  B05D1/322 ,  B05D2252/10 ,  H05K3/0044 ,  H05K3/0079 ,  H05K3/28 ,  H05K2203/0195 ,  H05K2203/0228 ,  H05K2203/0548 ,  H05K2203/1383

    Abstract: A method of masking a feature of a substrate using a fixture includes removably coupling a fixture to a first side of the feature of the substrate, the fixture including walls configured to abut sides of the feature and extend beyond a top surface of the feature when the fixture is removably coupled to the first side. The method further includes applying a masking material to the top surface of the feature. The method further includes removably coupling the fixture to a second side of the feature, the second side opposing the first side, the walls of the fixture configured to abut the sides of the feature and extend beyond a bottom surface of the feature when the fixture is removably coupled to the second side. The method further includes applying the masking material to the bottom surface of the feature while the fixture is removably coupled.

    TURBINE COMPONENT SURFACE TREATMENT PROCESSES AND SYSTEMS
    33.
    发明申请
    TURBINE COMPONENT SURFACE TREATMENT PROCESSES AND SYSTEMS 有权
    涡轮组件表面处理工艺和系统

    公开(公告)号：US20160169035A1

    公开(公告)日：2016-06-16

    申请号：US14568424

    申请日：2014-12-12

    Applicant: General Electric Company

    Inventor： James Carroll Baummer ,  Thomas Robert Reid

    IPC: F01D25/08 ,  B05D1/32 ,  B05C9/04 ,  B05C7/00 ,  B05C9/12 ,  F01D25/00 ,  B05D3/06

    CPC classification number: F01D25/08 ,  B05C7/00 ,  B05C9/04 ,  B05C9/12 ,  B05D1/322 ,  B05D3/067 ,  C23C4/01 ,  C23C14/042 ,  F01D25/002 ,  F05D2230/90

    Abstract: A turbine component surface treatment process includes passing a UV-curable maskant through one or more fluid flow passages, wherein at least a portion of the UV-curable maskant exits the one or more fluid flow passages at an exterior surface of the turbine component, applying a UV light to the exterior surface of the turbine component, wherein the UV light cures at least a portion of the UV-curable maskant exiting the one or more fluid flow passages, and, treating the exterior surface with a treatment material, wherein the portion of the UV-curable maskant cured by the UV light substantially blocks the treatment material from entering the one or more fluid flow passages.

    Abstract translation: 涡轮机部件表面处理方法包括使可UV固化掩蔽剂通过一个或多个流体流动通道，其中至少一部分可UV固化的掩模剂在涡轮机部件的外表面处离开一个或多个流体流动通道，施加 UV光到达所述涡轮机部件的外表面，其中所述UV光固化出离开所述一个或多个流体流动通道的所述UV可固化掩蔽剂的至少一部分，以及用处理材料处理所述外表面，其中所述部分 通过UV光固化的UV可固化掩模剂基本上阻止处理材料进入一个或多个流体流动通道。

    METHOD OF PRODUCING A CONVERSION ELEMENT
    35.
    发明申请
    METHOD OF PRODUCING A CONVERSION ELEMENT 有权
    生产转换元件的方法

    公开(公告)号：US20160133802A1

    公开(公告)日：2016-05-12

    申请号：US14896950

    申请日：2014-06-06

    Applicant: OSRAM OPTO SEMICONDUCTORS GMBH

    Inventor： Markus Richter ,  Markus Burger

    IPC: H01L33/50

    CPC classification number: H01L33/505 ,  B05D1/32 ,  B05D1/322 ,  B05D3/02 ,  H01L33/50 ,  H01L2933/0041

    Abstract: A method of producing a conversion element includes providing a substrate having a surface; forming a first mask structure above the surface, wherein the first mask structure has first webs and first openings arranged between the first webs and the first openings form cavities in which the surface of the substrate is accessible; arranging a second mask structure above the first mask structure, wherein the second mask structure has second webs and second openings arranged between the second webs, the first webs are at least partly covered by the second webs, and the cavities remain at least partly accessible through the second openings; spraying a material into the cavities through the second openings; removing the second mask structure; and removing the first mask structure.

    Abstract translation: 制造转换元件的方法包括提供具有表面的基板; 在所述表面上形成第一掩模结构，其中所述第一掩模结构具有第一腹板，并且布置在所述第一腹板和所述第一开口之间的第一开口形成空腔，所述基底的表面可接近; 在所述第一掩模结构之上布置第二掩模结构，其中所述第二掩模结构具有布置在所述第二网之间的第二腹板和第二开口，所述第一腹板至少部分地被所述第二腹板覆盖，并且所述腔保持至少部分地通过 第二个开口; 通过第二开口将材料喷射到空腔中; 去除第二掩模结构; 并移除第一掩模结构。

    BOTTOM LAYER FILM-FORMATION COMPOSITION OF SELF-ORGANIZING FILM CONTAINING POLYCYCLIC ORGANIC VINYL COMPOUND
    37.
    发明申请
    BOTTOM LAYER FILM-FORMATION COMPOSITION OF SELF-ORGANIZING FILM CONTAINING POLYCYCLIC ORGANIC VINYL COMPOUND 审中-公开
    含有多环状有机化合物的自组织膜的底层成膜组合物

    公开(公告)号：US20150322219A1

    公开(公告)日：2015-11-12

    申请号：US14651998

    申请日：2013-12-13

    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.

    Inventor： Yasunobu SOMEYA ,  Hiroyuki WAKAYAMA ,  Takafumi ENDO ,  Rikimaru SAKAMOTO

    IPC: C08J5/18 ,  B05D3/02 ,  B05D1/32 ,  B05D1/00

    CPC classification number: C08J5/18 ,  B05D1/005 ,  B05D1/322 ,  B05D3/0254 ,  C08F212/32 ,  C08J2325/02 ,  C08J2325/08 ,  C08J2325/14 ,  C08J2333/12 ,  C08J2339/04 ,  C09D139/04 ,  C09D145/00 ,  C09D153/00 ,  C09D201/00 ,  G03F7/0002 ,  Y10T428/24802 ,  C08F2220/281 ,  C08F2220/325 ,  C08F220/20 ,  C08F212/14 ,  C08F226/06 ,  C08F220/14 ,  C08F212/06

    Abstract: An underlayer film-forming composition for a self-assembled film having a polymer including 0.2% by mole or more of a unit structure of a polycyclic aromatic vinyl compound relative to all unit structures of the polymer. The polymer includes 20% by mole or more of a unit structure of an aromatic vinyl compound relative to all the unit structures of the polymer and includes 1% by mole or more of a unit structure of the polycyclic aromatic vinyl compound relative to all the unit structures of the aromatic vinyl compound. The aromatic vinyl compound includes an optionally substituted vinylnaphthalene, acenaphthylene, or vinylcarbazole, and the polycyclic aromatic vinyl compound is vinylnaphthalene, acenaphthylene, or vinylcarbazole. The aromatic vinyl compound includes an optionally substituted styrene and an optionally substituted vinylnaphthalene, acenaphthylene, or vinylcarbazole, and the polycyclic aromatic vinyl compound is vinylnaphthalene, acenaphthylene, or vinylcarbazole.

    Abstract translation: 一种用于自组装膜的下层膜组合物，其具有相对于聚合物的所有单元结构具有包含0.2摩尔％以上的多环芳族乙烯基化合物的单元结构的聚合物。 该聚合物相对于聚合物的所有单元结构包含20摩尔％以上的芳族乙烯基化合物的单元结构，相对于所有单元，包括1摩尔％以上的多环芳香族乙烯基化合物的单元结构 芳族乙烯基化合物的结构。 芳族乙烯基化合物包括任选取代的乙烯基萘，苊烯或乙烯基咔唑，多环芳族乙烯基化合物是乙烯基萘，苊烯或乙烯基咔唑。 芳族乙烯基化合物包括任选取代的苯乙烯和任选取代的乙烯基萘，苊烯或乙烯基咔唑，多环芳族乙烯基化合物是乙烯基萘，苊烯或乙烯基咔唑。

    METHOD FOR FORMING PATTERN, STRUCTURAL BODY, METHOD FOR PRODUCING COMB-SHAPED ELECTRODE, AND SECONDARY CELL
    38.
    发明申请
    METHOD FOR FORMING PATTERN, STRUCTURAL BODY, METHOD FOR PRODUCING COMB-SHAPED ELECTRODE, AND SECONDARY CELL 审中-公开
    形成图案，结构体，生产组合电极的方法和二次电池的方法

    公开(公告)号：US20140295264A1

    公开(公告)日：2014-10-02

    申请号：US14229131

    申请日：2014-03-28

    Applicant: TOKYO OHKA KOGYO CO., LTD.

    Inventor： Takahiro Asai ,  Kaoru Ishikawa

    IPC: H01M4/04 ,  H01M4/139 ,  B05D1/32

    CPC classification number: H01M4/0404 ,  B05D1/322 ,  G03F7/023 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/40 ,  H01M4/0414 ,  H01M4/13 ,  H01M4/139 ,  H01M4/661 ,  H01M6/40 ,  H01M10/0525 ,  Y10T428/24322

    Abstract: A method for forming a pattern, a structural body, a method for producing a comb-shaped electrode, and a secondary cell. The pattern forming method, in which n patterns (n≧2) are formed on a support, includes forming a first resist layer on the support surface; and repeating: forming a guide hole through a kth resist layer by exposure and development, filling a kth pattern material into the guide hole by a screen printing process, removing the kth resist layer, and forming a (k+1)th resist layer on the support and all pattern materials, regarding kth (k=1 to n−1) pattern material and resist layer in order of k=1 to n−1; forming a guide hole and nth pattern material filling similarly, and removing the nth resist layer.

    Abstract translation: 形成图案的方法，结构体，梳状电极的制造方法以及二次电池。 在支撑体上形成n个图案（n≥2）的图案形成方法包括在支撑面上形成第一抗蚀剂层; 并重复：通过曝光和显影通过第k抗蚀剂层形成引导孔，通过丝网印刷工艺将第k个图案材料填充到引导孔中，去除第k个抗蚀剂层，以及形成第（k + 1）个抗蚀剂层 关于第k（k = 1到n-1）个图案材料和抗蚀剂层的支撑和所有图案材料，其顺序为k = 1到n-1; 形成类似地填充的导孔和第n图案材料，并且去除第n抗蚀剂层。

    Electronic devices with moisture guiding structures
    39.
    发明授权
    Electronic devices with moisture guiding structures 有权
    具有导湿结构的电子设备

    公开(公告)号：US08824162B2

    公开(公告)日：2014-09-02

    申请号：US12871804

    申请日：2010-08-30

    Applicant: Felix Alvarez ,  Kyle H. Yeates

    Inventor： Felix Alvarez ,  Kyle H. Yeates

    IPC: H05K1/16 ,  H05K1/00 ,  H05K5/00

    CPC classification number: H05K5/065 ,  B05D1/02 ,  B05D1/18 ,  B05D1/28 ,  B05D1/322 ,  H05K3/282 ,  H05K3/284 ,  H05K5/0213 ,  H05K5/069 ,  H05K7/1427

    Abstract: Electronic devices may have housings in which components are mounted. Some of the components may be sensitive to moisture. Other components may be insensitive to moisture and may form openings in a device housing that allow moisture to escape from within the housing. Components may be mounted on substrates such as printed circuit board substrates. Moisture repelling layers and moisture attracting layers may be patterned to form channels and other structures that guide moisture away from sensitive components towards insensitive components. Moisture repelling and attracting layers may also be used to limit the lateral spread of a conformal coating layer when coating components.

    Abstract translation: 电子设备可以具有安装部件的壳体。 一些组分可能对水分敏感。 其他部件可能对湿气不敏感，并且可能在装置壳体中形成允许湿气从壳体内逸出的开口。 组件可以安装在诸如印刷电路板基板的基板上。 防水层和吸湿层可以被图案化以形成通道和其它结构，其将水分从敏感组件导向不敏感组件。 当涂覆组分时，防潮和吸引层也可用于限制保形涂层的侧向扩展。

    METHOD OF PROTECTING A SURFACE
    40.
    发明申请
    METHOD OF PROTECTING A SURFACE 有权
    保护表面的方法

    公开(公告)号：US20140234555A1

    公开(公告)日：2014-08-21

    申请号：US13772807

    申请日：2013-02-21

    Applicant: PRATT & WHITNEY CANADA CORP.

    Inventor： Phillippe SAINT-JACQUES

    IPC: F01D5/28

    CPC classification number: B05D1/322 ,  C23C4/02 ,  C23C4/18 ,  F01D5/288 ,  F05D2230/90

    Abstract: A method of masking part of a surface of a wall of a gas turbine component including at least one area having cooling holes defined therein, the method including applying a viscous curable masking compound to the part of the surface over an entirety of each of the at least one area, including blocking access to the cooling holes from the surface by applying the masking compound over the cooling holes without completely filling the cooling holes with the masking compound, and forming a respective solid masking element completely covering each of the at least one area and the cooling holes defined therein by curing the masking compound.

    Abstract translation: 一种掩盖燃气轮机部件的壁的一部分表面的方法，包括至少一个具有限定在其中的冷却孔的区域，所述方法包括将粘性可固化掩模化合物施加到表面的整个部分 至少一个区域，包括通过在掩蔽化合物上完全填充冷却孔而将掩蔽化合物涂覆在冷却孔上而阻止从表面进入冷却孔，以及形成完全覆盖至少一个区域中的每一个的相应的固体掩蔽元件 以及通过固化掩蔽化合物限定在其中的冷却孔。

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