公开(公告)号：USRE41220E1

公开(公告)日：2010-04-13

申请号：US11880425

申请日：2000-07-10

Applicant: Claude L. Davis Jr. ,  Kenneth E. Hrdina

Inventor： Claude L. Davis Jr. ,  Kenneth E. Hrdina

IPC: G21K1/06

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B2201/07 ,  C03B2201/42 ,  G02B5/0891 ,  G02B17/0615 ,  G02B17/0636 ,  G03F1/24 ,  G03F1/60 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70283 ,  G03F7/70891 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: The projection lithographic method for producing integrated circuits and forming patterns with extremely small feature dimensions includes an illumination sub-system (36) for producing and directing an extreme ultraviolet soft x-ray radiation λ from an extreme ultraviolet soft x-ray source (38); a mask stage (22) illuminated by the extreme ultraviolet soft x-ray radiation λ produced by illumination stage and the mask stage (22) includes a pattern when illuminated by radiation λ. A protection sub-system includes reflective multilayer coated Ti doped high purity SiO2 glass defect free surface (32) and printed media subject wafer which has a radiation sensitive surface.

Abstract translation: 用于制造集成电路和形成具有极小特征尺寸的图案的投影光刻方法包括用于产生和引导来自极紫外线软X射线源（38）的极紫外线软X射线辐射λ的照明子系统（36） ; 由照射级产生的极紫外线软X射线辐射λ照射的掩模台（22）和掩模台（22）包括当被辐射λ照射时的图案。 保护子系统包括具有辐射敏感表面的反射多层涂覆的Ti掺杂的高纯度SiO 2玻璃无缺陷表面（32）和印刷媒体对象晶片。

公开(公告)号：US07635658B2

公开(公告)日：2009-12-22

申请号：US11583619

申请日：2006-10-19

Applicant: Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Ulrich Wilhelm Heinz Neukirch

Inventor： Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Ulrich Wilhelm Heinz Neukirch

IPC: C03C3/06 ,  C03C15/00 ,  C03B19/06 ,  C03B37/00 ,  C03B37/014

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B19/12 ,  C03B19/14 ,  C03B19/1453 ,  C03B20/00 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/08 ,  C03B2201/12 ,  C03B2201/22 ,  C03B2201/23 ,  C03B2201/32 ,  C03B2201/42 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/22 ,  C03C2201/23

Abstract: What is disclosed includes OD-doped synthetic silica glass capable of being used in optical elements for use in lithography below about 300 nm. OD-doped synthetic silica glass was found to have significantly lower polarization-induced birefringence value than non-OD-doped silica glass with comparable concentration of OH. Also disclosed are processes for making OD-doped synthetic silica glasses, optical member comprising such glasses, and lithographic systems comprising such optical member. The glass is particularly suitable for immersion lithographic systems due to the exceptionally low polarization-induced birefringence values at about 193 nm.

Abstract translation: 公开的内容包括能够用于低于约300nm的光刻中的光学元件的OD掺杂合成石英玻璃。 发现OD掺杂的合成二氧化硅玻璃具有比具有相当浓度的OH的非OD掺杂的石英玻璃具有显着更低的偏振诱导双折射值。 还公开了制造掺杂OD的合成二氧化硅玻璃，包含这种玻璃的光学构件以及包括这种光学构件的光刻系统的方法。 由于在约193nm处极度低的偏振诱发双折射值，该玻璃特别适用于浸没式光刻系统。

公开(公告)号：US20090235696A1

公开(公告)日：2009-09-24

申请号：US11992544

申请日：2007-08-23

Applicant: Tomomi Ichinose ,  Toru Achiwa ,  Kouichi Sawafuji

Inventor： Tomomi Ichinose ,  Toru Achiwa ,  Kouichi Sawafuji

IPC: C03B37/016

CPC classification number: G02B3/0087 ,  C03B19/12 ,  C03B37/027 ,  C03B2201/30 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42 ,  C03B2203/26 ,  C03C1/006 ,  Y02P40/57

Abstract: A method of manufacturing a GRIN lens includes a forming a wet gel from an alcohol solution containing a silicon alkoxide, a dopant alkoxide, and an aluminum alkoxide; dissolving by leaching the dopant and aluminum away from an outer peripheral surface of the wet gel to provide a refractive index distribution; forming a dry gel by drying the wet gel; forming a glass preform by firing the dry gel; and wire-drawing the perform. In the step of leaching, most aluminum dissolves from the wet gel, thereby increasing the porosity of the dry gel and preventing cracking during sintering and foaming during wire-drawing.

Abstract translation: 制造GRIN透镜的方法包括从含有硅醇盐，掺杂剂醇盐和烷氧基铝的醇溶液形成湿凝胶; 通过将掺杂剂和铝从湿凝胶的外周表面浸出而溶解以提供折射率分布; 通过干燥湿凝胶形成干凝胶; 通过焙烧干凝胶形成玻璃预制件; 并绘制表演。 在浸出步骤中，大多数铝从湿凝胶中溶解，从而增加干凝胶的孔隙率，并防止在拉丝过程中烧结和发泡期间的开裂。

公开(公告)号：US07585598B2

公开(公告)日：2009-09-08

申请号：US11634270

申请日：2006-12-06

Applicant: Shigeru Maida ,  Motoyuki Yamada

Inventor： Shigeru Maida ,  Motoyuki Yamada

IPC: G03F1/00 ,  C03C3/06 ,  G02B1/00

CPC classification number: C03B19/1407 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B19/1446 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  G03F1/24 ,  G03F1/60 ,  G21K2201/067

Abstract: A titania-doped quartz glass containing 3-12 wt % of titania at a titania concentration gradient less than or equal to 0.01 wt %/μm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates.

Abstract translation: 在二氧化钛浓度梯度小于或等于0.01重量％/重量的情况下，含有3-12重量％的二氧化钛的二氧化钛掺杂的石英玻璃，并且对于440nm波长具有至多30％的表观透射率，厚度为6.35mm 具有这样的同质性，其提供了EUV光刻元件（通常为EUV光刻光掩模基板）所需的高表面精度。

公开(公告)号：US20090019894A1

公开(公告)日：2009-01-22

申请号：US12185463

申请日：2008-08-04

Applicant: Pieter Matthijse ,  Mattheus Jacobus Stralen ,  Mark Peter Marie Jetten ,  Gert-Jan Krabshuis

Inventor： Pieter Matthijse ,  Mattheus Jacobus Stralen ,  Mark Peter Marie Jetten ,  Gert-Jan Krabshuis

IPC: C03B37/018

CPC classification number: G02B6/02047 ,  C03B37/01807 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/24 ,  C03B2201/28 ,  C03B2201/30 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42 ,  C03B2203/26 ,  G02B6/0281 ,  G02B6/0288 ,  G02B6/036

Abstract: The invention relates to a multimode optical fibre having a refractive index profile, comprising a light-guiding core surrounded by one or more cladding layers. The present invention furthermore relates to an optical communication system comprising a transmitter, a receiver and a multimode optical fibre.

Abstract translation: 本发明涉及一种具有折射率分布的多模光纤，包括由一个或多个包覆层包围的导光芯。 本发明还涉及一种包括发射机，接收机和多模光纤的光通信系统。

公开(公告)号：US07429546B2

公开(公告)日：2008-09-30

申请号：US11172950

申请日：2005-07-05

Applicant: Yasutomi Iwahashi ,  Akio Koike

Inventor： Yasutomi Iwahashi ,  Akio Koike

IPC: C03C3/06 ,  C03C3/076 ,  C03C3/11 ,  C03C3/112 ,  C03B19/06 ,  C03B37/018

CPC classification number: C03B19/1415 ,  C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/54

Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

Abstract translation: 含有TiO 2的二氧化硅玻璃，其具有至多1200℃的假想温度，至少100ppm的F浓度和0±200ppb /℃的热膨胀系数。 0至100℃。一种制备含有TiO 2的石英玻璃的方法，其包括在通过玻璃形成材料的火焰水解获得的目标石英玻璃颗粒上形成多孔玻璃体的步骤 ，获得含氟多​​孔玻璃体的步骤，获得含氟玻璃化玻璃体的步骤，获得含氟成形玻璃体的步骤和进行退火处理的步骤。

公开(公告)号：US07386210B2

公开(公告)日：2008-06-10

申请号：US11538334

申请日：2006-10-03

Applicant: Julia A. Farroni ,  Adrian Carter ,  Kanishka Tankala

Inventor： Julia A. Farroni ,  Adrian Carter ,  Kanishka Tankala

IPC: G02B6/00

CPC classification number: G02B6/02114 ,  C03B37/01217 ,  C03B37/01231 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/34 ,  C03B2201/42 ,  C03B2203/23 ,  C03B2203/31 ,  G02B6/024

Abstract: An optical fiber comprises a photosensitive core that includes a concentration of a first material that increases the refractive index of the core and a concentration of a second material that is other than boron and that reduces the refractive index of the core. A cladding is disposed about the core for tending to confine light to the core. The fiber also includes at least one longitudinally extending region having a thermal coefficient of expansion that is different from the thermal coefficient of expansion of the cladding. In another embodiment, the core includes a concentration of germanium and a concentration of boron. Also disclosed is a polarization-maintaining double-clad (PM DC) fiber comprising one or both of at least one circular axially extending stress inducing region(s) and an inner cladding comprising a circular outer perimeter. Fibers according to the invention can include a rare earth dopant for emitting light of a selected wavelength responsive to being pumped by pump light of a pump wavelength that is different than the selected wavelength.

Abstract translation: 光纤包括感光芯，其包括提高芯的折射率的第一材料的浓度和不同于硼的第二材料的浓度，并降低芯的折射率。 围绕芯部布置包层以倾向于将光限制在芯部上。 纤维还包括具有不同于包层的热膨胀系数的热膨胀系数的至少一个纵向延伸区域。 在另一个实施方案中，芯包括锗的浓度和硼的浓度。 还公开了一种包括至少一个圆形轴向延伸的应力诱导区域和包含圆形外周边的内包层中的一个或两个的偏振保持双包层（PMDC）光纤。 根据本发明的纤维可以包括用于发射选定波长的光的稀土掺杂剂，其响应于通过不同于所选波长的泵浦波长的泵浦光泵浦。

公开(公告)号：US20070207911A1

公开(公告)日：2007-09-06

申请号：US11747698

申请日：2007-05-11

Applicant: Akio KOIKE ,  Yasutomi Iwahashi ,  Noriaki Shimodaira ,  Shinya Kikugawa ,  Naoki Sugimoto

Inventor： Akio KOIKE ,  Yasutomi Iwahashi ,  Noriaki Shimodaira ,  Shinya Kikugawa ,  Naoki Sugimoto

IPC: C03C3/06 ,  C03B19/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/21 ,  C03B2201/42 ,  C03C17/40 ,  C03C2201/21 ,  C03C2201/42 ,  G03F7/70958

Abstract: Conventional TiO2—SiO2 glass contains hydrogen atoms substantially, and during deposition under ultrahigh vacuum condition, the hydrogen molecules will diffuse in the chamber, and H2 molecules will be taken into a film thereby formed. Hydrogen molecules will readily diffuse, and the optical characteristics of the multilayer film are likely to be thereby changed. In an optical material for EUV lithography, a multilayer film is coated by ion beam sputtering on a silica glass having a TiO2 concentration of from 3 to 12 mass % and a hydrogen molecule content of less than 5×1017 molecules/cm3 in the glass.

Abstract translation: 常规的TiO 2 -SiO 2 SiO 2玻璃基本上含有氢原子，并且在超高真空条件下沉积期间，氢分子将在室中扩散，并且H 2 < / SUB>分子将被吸收到由此形成的膜中。 氢分子将容易扩散，并且可能由此改变多层膜的光学特性。 在用于EUV光刻的光学材料中，通过离子束溅射在具有3至12质量％的TiO 2浓度和小于5×10 5质量％的氢分子含量的二氧化硅玻璃上涂覆多层膜， SUP> 17分子/ cm 3在玻璃中。

公开(公告)号：US20060276323A1

公开(公告)日：2006-12-07

申请号：US11435887

申请日：2006-05-18

Applicant: Yasutomi Iwahashi ,  Akio Koike

Inventor： Yasutomi Iwahashi ,  Akio Koike

IPC: C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1415 ,  C03B19/1453 ,  C03B2201/12 ,  C03B2201/42 ,  C03B2207/30 ,  C03C2201/12 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/50 ,  C03C2203/54

Abstract: A silica glass containing from 3 to 10 mass % of TiO2, which has a coefficient of thermal expansion from 0 to 100° C., i.e. CTE0 to 100, of 0±300 ppb/° C. and an internal transmittance per mm in thickness within a wavelength region of from 200 to 700 nm, i.e. T200 to 700, of at most 80%.

Abstract translation: 含有3〜10质量％的TiO 2的二氧化硅玻璃，其热膨胀系数为0〜100℃，即CTE 0〜100℃ 0〜300ppb /℃，在200〜700nm的波长区域内的每mm厚度的内部透射率，即200〜700℃，为80％以下。

公开(公告)号：US06988377B2

公开(公告)日：2006-01-24

申请号：US10302347

申请日：2002-11-22

Applicant: James J. Bernas ,  Bradley F. Bowden ,  Kenneth E. Hrdina

Inventor： James J. Bernas ,  Bradley F. Bowden ,  Kenneth E. Hrdina

IPC: C03B19/06

CPC classification number: C03C3/06 ,  B33Y80/00 ,  C03B19/06 ,  C03B2201/42 ,  C03C2201/42 ,  C03C2203/10

Abstract: A method for forming EUV LITHOGRAPHY GLASS STRUCTURES WITH VOIDS is disclosed which includes forming a slurry mixture including silica soot particles, and inserting the slurry mixture into a casting mold. The method provides low weight mass reduced rigid glass structures with beneficial thermal stability. The casting mold includes therein a casting form. The casting form is adapted to provide selected geometry void spaces within the glass lithography structure. The slurry mixture is dried to form a green ware object. The casting form is removed from the green ware and the green ware object is consolidated into a lithography glass structure with voids.