公开(公告)号：US06993241B2

公开(公告)日：2006-01-31

申请号：US10658606

申请日：2003-09-08

Applicant: Mara Bagnasco ,  Valeria Gusmeroli

Inventor： Mara Bagnasco ,  Valeria Gusmeroli

IPC: G02B6/16 ,  G02B6/34

CPC classification number: G02B6/02114 ,  C03C13/046 ,  C03C25/6226 ,  C03C2201/06 ,  C03C2201/12 ,  C03C2201/31 ,  G02B6/02123 ,  G02B6/443

Abstract: The present invention provides an optical fiber providing high photosensitivity in the absence of hydrogen loading as well as a low numerical aperture. One aspect of the present invention relates to an optical fiber including a core, the core comprising silica doped with at least about 6 mol % germania and at least about 0.9 wt % fluorine; and a cladding surrounding the core. The optical fiber of the present invention is suitable for the production of fiber Bragg gratings.

Abstract translation: 本发明提供了一种在不存在氢负载和低数值孔径下提供高光敏性的光纤。 本发明的一个方面涉及一种包括芯的光纤，所述芯包括掺杂有至少约6mol％的氧化锗和至少约0.9wt％的氟的二氧化硅; 以及围绕芯的包层。 本发明的光纤适用于制造光纤布拉格光栅。

公开(公告)号：US20050155388A1

公开(公告)日：2005-07-21

申请号：US11034359

申请日：2005-01-10

Applicant: Gerald Burke ,  Steven Dawes ,  V. Srikant ,  Pushkar Tandon

Inventor： Gerald Burke ,  Steven Dawes ,  V. Srikant ,  Pushkar Tandon

IPC: C03B37/018 ,  C03B19/14 ,  C03B37/012 ,  C03B37/014 ,  C03C3/06 ,  F23D14/22 ,  F23D14/32 ,  G03F1/00 ,  G03F7/20

CPC classification number: G03F7/70216 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B37/01202 ,  C03B37/01406 ,  C03B37/01413 ,  C03B37/0142 ,  C03B37/0146 ,  C03B2201/12 ,  C03B2203/22 ,  C03B2207/02 ,  C03B2207/06 ,  C03B2207/08 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/30 ,  C03B2207/38 ,  C03B2207/40 ,  C03B2207/42 ,  C03B2207/46 ,  C03B2207/54 ,  C03B2207/70 ,  C03B2207/81 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/20 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  F23D14/22 ,  F23D14/32 ,  G03F1/60 ,  G03F7/70958

Abstract: Methods, apparatus and precursors for producing substantially water-free silica soot, preforms and glass. The methods and apparatus make substantially water-free fused silica preforms or glass by removing water as a reaction product, removing water from the atmosphere, removing water from the transport process, or combinations thereof. In a first embodiment, substantially water-free soot, preforms or glass are achieved by using a hydrogen-free fuel, such as carbon monoxide, in the deposition process. In another embodiment, a soot producing burner has parameters that enable operation on a substantially hydrogen-free fuel. End burners, which minimize water production, are also described. Such water-free methods are useful in depositing fluorine-doped soot because of the low water present and the efficiency in which fluorine is incorporated. In another embodiment, glassy barrier layer methods and apparatus are described for minimizing dopant migration, especially fluorine. Laser and induction methods and apparatus for forming the barrier layer are depicted. A chlorine, fluorine and silica precursor, such as chlorofluorosilane, may be utilized to form fluorinated soot. Other methods and apparatus are directed to combinations of conventional and substantially water-free processes. One embodiment is directed to combustion enhancing additives for addition to the substantially hydrogen-free fuels. The methods and apparatus in accordance with the invention are particularly useful for producing photomask substrates and optical fiber preforms.

公开(公告)号：US06833949B2

公开(公告)日：2004-12-21

申请号：US10238099

申请日：2002-09-09

Applicant: Robert L. Maier ,  Lisa A. Moore ,  Charlene M. Smith

Inventor： Robert L. Maier ,  Lisa A. Moore ,  Charlene M. Smith

IPC: G02B1314

CPC classification number: C03C17/02 ,  C03B19/1453 ,  C03B19/1461 ,  C03B2201/075 ,  C03B2201/12 ,  C03C3/06 ,  C03C17/3452 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/46 ,  G02B1/105 ,  G02B1/14 ,  G02B5/208 ,  G03F7/70958

Abstract: The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.

Abstract translation: 本发明提供涂覆光学光刻元件和涂覆光学元件的方法，特别是用于使用不大于约193nm的真空紫外光（VUV）光刻波长的240nm以下的光学光刻系统的光学光刻元件，例如VUV投影光刻系统 利用193nm或157nm区域中的波长。 光学器件利用沉积的氟氧化硅膜操纵小于250nm的真空紫外光刻光。 沉积的氟氧化硅光学涂层有助于对入射光的操纵并保护底层的光学材料，层和表面。

公开(公告)号：US06757474B2

公开(公告)日：2004-06-29

申请号：US10299222

申请日：2002-11-19

Applicant: Mark T. Anderson ,  Craig R. Schardt ,  James R. Onstott ,  Kenton D. Budd

Inventor： Mark T. Anderson ,  Craig R. Schardt ,  James R. Onstott ,  Kenton D. Budd

IPC: G02B600

CPC classification number: G02B6/03622 ,  C03B19/102 ,  C03B19/1065 ,  C03B37/01807 ,  C03B37/01838 ,  C03B2201/12 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/36 ,  C03B2203/22 ,  C03B2203/29 ,  C03C3/06 ,  C03C13/046 ,  C03C2201/12 ,  C03C2201/28 ,  C03C2201/31 ,  C03C2201/3417 ,  C03C2201/3458 ,  C03C2201/3476 ,  C03C2201/3482 ,  C03C2201/36 ,  H01S3/067 ,  H01S3/06716 ,  H01S3/0677 ,  H01S3/06775 ,  H01S3/1608 ,  H01S3/1616 ,  Y02P40/57 ,  Y10T428/2982

Abstract: A co-doped silicate optical waveguide having a core including silica, and oxides of aluminum, germanium, erbium and thulium. The composition concentrations are: Er from 15 ppm to 3000 ppm; Al from 0.5 mol % to 12 mol %; Tm from 15 ppm to 10000 ppm; and Ge from 1 mol % to 20 mol %. In a specific embodiment, the concentration of Er is from 150 ppm to 1500 ppm; Al is from 2 mol % to 8 mol %; and Tm is from 15 ppm to 3000 ppm. A boron-less cladding surrounds the core.

Abstract translation: 一种具有包括二氧化硅的芯和铝，锗，铒和and的氧化物的共掺杂硅酸盐光波导。 组成浓度为：从15ppm至3000ppm的Er; Al为0.5mol％至12mol％; Tm从15ppm到10000ppm; Ge为1mol％至20mol％。 在一个具体实施方案中，Er的浓度为150ppm至1500ppm; Al为2mol％至8mol％; Tm为15ppm〜3000ppm。 不含核的包层围绕着芯。

公开(公告)号：US06698054B2

公开(公告)日：2004-03-02

申请号：US09750510

申请日：2000-12-28

Applicant: Jeong-Hyun Oh ,  Mi-Kyung Lee

Inventor： Jeong-Hyun Oh ,  Mi-Kyung Lee

IPC: C03B3706

CPC classification number: C03B19/12 ,  C03B2201/12 ,  C03C1/006 ,  C03C2201/12 ,  C03C2203/20 ,  C03C2203/22 ,  C03C2203/30 ,  C03C2203/34

Abstract: Disclosed is a method for fabricating high-purity silica glass using a sol-gel processing that includes the steps of: (a) mixing a deionized water with a fluorine compound and a dispersion agent to prepare an aqueous premix solution; (b) mixing the aqueous premix solution with a fumed silica; (c) mixing the resulting mixture to form a dispersed sol; (d) aging the sol at the ambient temperature to stabilize silica particles; and, (e) removing air voids from the sol and adding a gelation agent.

Abstract translation: 公开了一种使用溶胶 - 凝胶法制造高纯度二氧化硅玻璃的方法，该方法包括以下步骤：（a）将去离子水与氟化合物和分散剂混合以制备含水预混溶液; （b）将水性预混物溶液与煅制二氧化硅混合; （c）将所得混合物混合以形成分散的溶胶; （d）在环境温度下老化溶胶以稳定二氧化硅颗粒; 和（e）从溶胶中除去空气空隙并加入凝胶剂。

公开(公告)号：US20030195107A1

公开(公告)日：2003-10-16

申请号：US10317068

申请日：2002-12-12

Applicant: ASAHI GLASS COMPANY LIMITED

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa ,  Noriaki Shimodaira ,  Akio Masui ,  Shuhei Yoshizawa

IPC: C03C010/16 ,  C03C003/112

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C23/002 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54 ,  Y02P40/57 ,  Y10S65/16 ,  Y10S501/90 ,  Y10S501/905

Abstract: A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cmnull1 (I2250) to the scattering peak intensity of 800 cmnull1 (I800), i.e. I2250/I800, of at most 1null10null4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2null10null3 cmnull1.

Abstract translation: 一种用于光学用的合成石英玻璃，其用于通过在含有氟的紫外线区域至真空紫外线区域的范围内的光照射而使用，该散射峰强度比例为2250cm <上标> -1 >（I <下标> 2250 ）到800 cm <上标> -1>（I <下标> 800 ）的散射峰强度，即I <下标> 2250 / I 在激光拉曼光谱中，最多为1×10 <上标> -4>的<下标> 800 ，其吸光系数为245nm，最多为2×10 <上标> -3> cm -1>。

公开(公告)号：US20030156818A1

公开(公告)日：2003-08-21

申请号：US10038370

申请日：2001-12-31

Inventor： Mark T. Anderson ,  Craig R. Schardt ,  James R. Onstott ,  Kenton D. Budd

IPC: G02B006/16 ,  H01S003/00

CPC classification number: C03C17/3618 ,  C03C3/06 ,  C03C13/046 ,  C03C17/3626 ,  C03C17/3644 ,  C03C17/3652 ,  C03C2201/12 ,  C03C2201/28 ,  C03C2201/31 ,  C03C2201/3405 ,  C03C2201/3411 ,  C03C2201/3417 ,  C03C2201/3458 ,  C03C2201/3476 ,  C03C2201/3482 ,  C03C2201/3494 ,  C03C2201/36 ,  H01S3/06716 ,  H01S3/1608 ,  H01S3/1616 ,  H01S3/1693 ,  H01S3/1695 ,  H01S3/176

Abstract: An optical waveguide including a core having silica, Al, a non-fluorescent rare-earth ion, Ge, Er, and Tm. The non-fluorescent rare-earth ion may be La. Exemplary compositions concentrations are Er is from 15 ppm to 3000 ppm, Al is from 0.5 mol % to 12 mol %, La is less than or equal to 2 mol %, Tm is from 15 ppm to 10,000 ppm; and the Ge is less than or equal to 15 mol %. The core may further include F. An exemplary concentration of F is less than or equal to 6 anion mol %.

Abstract translation: 包括具有二氧化硅的芯，Al，非荧光稀土离子，Ge，Er和Tm的光波导。 非荧光稀土离子可以是La，示例性组合物浓度为Er为15ppm至3000ppm，Al为0.5mol％至12mol％，La为小于或等于2mol％，Tm为 15 ppm至10,000 ppm; Ge小于或等于15mol％。 芯可以进一步包括F. F的示例性浓度小于或等于6阴离子摩尔％。

公开(公告)号：US06502426B2

公开(公告)日：2003-01-07

申请号：US09997782

申请日：2001-11-28

Applicant: Lisa A. Moore ,  Charlene M. Smith

Inventor： Lisa A. Moore ,  Charlene M. Smith

IPC: C03B3200

CPC classification number: G03F7/70958 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2203/54 ,  G03F1/60

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a “dry,” silicon oxyfluoride glass which contains doped O2 molecules and which exhibits very high transmittance and laser transmission durability in the vacuum ultraviolet (VUV) wavelength region. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm contains intersticial O2 molecules which provide improved endurance to laser exposure. Preferably the O2 doped silicon oxyfluoride glass is characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract translation: 公开了适用于在低于190nm的VUV波长区域中用于光刻应用的光掩模基板的高纯度氟氧化硅玻璃。 本发明的氟氧化硅玻璃在157nm波长下是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模衬底是含有掺杂的O 2分子并且在真空紫外（VUV）波长区域中显示非常高的透射率和激光透射耐久性的“干式”氟氧化硅玻璃。 除了含氟并且具有很少或不具有OH含量之外，本发明的适用于157nm的光掩模衬底的氟氧化硅玻璃含有间隔的O 2分子，其提供了对激光曝光的改善的耐久性。 优选地，掺杂氧的氟氧化硅玻璃的特征在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

公开(公告)号：US06385384B1

公开(公告)日：2002-05-07

申请号：US09268768

申请日：1999-03-15

Applicant: Huailiang Wei

Inventor： Huailiang Wei

IPC: G02B600

CPC classification number: C03C3/06 ,  C03B37/01433 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/28 ,  C03B2201/30 ,  C03B2201/31 ,  C03B2201/34 ,  C03B2201/36 ,  C03B2201/50 ,  C03B2201/54 ,  C03C23/0095 ,  C03C2201/12 ,  C03C2201/31 ,  C03C2201/34 ,  C03C2203/50

Abstract: A non-porous, transparent glass-ceramic body that is consolidated from a predominately silica-based preform (SiO2+GeO2 85-99.0 wt. %) containing rare earth fluoride crystals embedded within by solution chemistry. The glass ceramic body is suited for making fibers for optical amplifiers.

Abstract translation: 一种无孔，透明的玻璃陶瓷体，其主要由含有稀土氟化物晶体的硅基预制体（SiO 2 + GeO 2 85-99.0重量％）固结，其中通过溶液化学方式嵌入。 玻璃陶瓷体适用于制造光放大器的光纤。

公开(公告)号：US06376086B1

公开(公告)日：2002-04-23

申请号：US09362547

申请日：1999-07-28

Applicant: Tomonori Nagashima ,  Naoki Nakamura

Inventor： Tomonori Nagashima ,  Naoki Nakamura

IPC: B32B900

CPC classification number: G02F1/3555 ,  C03C3/06 ,  C03C3/076 ,  C03C3/11 ,  C03C2201/08 ,  C03C2201/12 ,  C03C2201/21

Abstract: A nonlinear optical silica material mainly consisting of SiO2—GeO2 to which hydrogen or halogen element X is added. Oxygen bonded to Ge contained in the nonlinear optical silica material is replaced by H or X, and one Ge has two Ge—O bonds and one Ge—H (or Ge—X) bond at Ge· points where nonlinearity is exhibited in the silica material. The Ge—H (or Ge—X) bond does not relate to a crystal network, so that when the polarity is oriented in order to exhibit nonlinearity at Ge·, an electric field to be applied can be lowered, and when a optical semiconductor hybrid element or the like is produced, other portions of the semiconductor elements can be prevented from being broken or degraded in performance. An insulating film can be interposed between the semiconductor substrate and the nonlinear optical silica film to prevent undesired impurities from dispersing into the semiconductor substrate and other elements and preventing a defect from being caused in the crystal of the substrate due to the silica film.

Abstract translation: 主要由添加有氢或卤素元素X的SiO 2 -GOO组成的非线性光学二氧化硅材料。 在非线性光学二氧化硅材料中包含的与Ge结合的氧被H或X替代，并且一个Ge在Ge处具有两个Ge-O键和一个Ge-H（或Ge-X）键。 在二氧化硅材料中显示出非线性的点。 Ge-H（或Ge-X）键与晶体网络无关，因此当极性取向为在Ge表现出非线性时，可以降低要施加的电场，而当光半导体 制造混合元件等，可以防止半导体元件的其他部分的性能破坏或劣化。 可以在半导体衬底和非线性光学二氧化硅膜之间插入绝缘膜，以防止不期望的杂质分散到半导体衬底和其它元件中，并防止由于二氧化硅膜而在衬底的晶体中引起缺陷。