公开(公告)号：US20060087244A1

公开(公告)日：2006-04-27

申请号：US11259549

申请日：2005-10-25

Applicant: Kenneth Regan

Inventor： Kenneth Regan

IPC: H01J7/24

CPC classification number: H01J37/3171 ,  H01J27/026 ,  H01J37/08 ,  H01J37/241 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/0206 ,  H01J2237/0812 ,  H02H7/003

Abstract: In an ion bean acceleration system, transient electrical arc suppression and ion beam accelerator biasing circuitry. Two-terminal circuitry, connectable in series, for suppressing arcs by automatically sensing arc conditions and switch from at least a first operating state providing a relatively low resistance electrical pathway for current between source and load terminals to at least a second, relatively high resistance electrical pathway. Selection of circuit component characteristics permits controlling the delay in returning from the second state to the first state after the arc has been suppressed.

Abstract translation: 在离子豆加速系统中，瞬态电弧抑制和离子束加速器偏置电路。 两端子电路，可串联连接，用于通过自动感测电弧条件并从至少第一工作状态切换来抑制电弧，从而提供用于源极和负载端子之间的电流的相对较低电阻的电路，至少第二相对高电阻的电 途径。 选择电路元件特性允许控制在电弧被抑制之后从第二状态返回到第一状态的延迟。

公开(公告)号：US06982427B2

公开(公告)日：2006-01-03

申请号：US10754581

申请日：2004-01-12

Applicant: Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

Inventor： Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

IPC: G01K1/08 ,  G21K1/08

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1501 ,  H01J2237/1534 ,  H01J2237/21 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/31793

Abstract: An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

公开(公告)号：US06979831B2

公开(公告)日：2005-12-27

申请号：US10783584

申请日：2004-02-19

Applicant: Sundeep Chauhan ,  Lawrence Bryant ,  Neil Deeman ,  Christopher Formato ,  David Kuo

Inventor： Sundeep Chauhan ,  Lawrence Bryant ,  Neil Deeman ,  Christopher Formato ,  David Kuo

IPC: G11B5/596 ,  H01J37/00 ,  H01J37/304

CPC classification number: H01J37/302 ,  H01J37/3053

Abstract: Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured to provide rotational speed data signal to a rotational speed control system and a pattern generation clock circuit configured to a provide a corrected pattern generator clock signal to a pattern generator circuit. The pattern generation circuit is used to control modulation of an electron beam used for substrate processing. In one aspect of the present invention, repeatable deviations of the rotational speed are measured and processed during substrate processing to correct for such repeatable deviations to increase substrate pattern writing accuracy.

Abstract translation: 本发明的实施例通常提供电子束基板处理系统。 在一个实施例中，本发明提供一种电子束基板处理系统，其中用于在加工过程中旋转基板的主轴用于至少一个光学编码器轮组件。 光学编码器轮组件被配置为向旋转速度控制系统和图案生成时钟电路提供转速数据信号，其被配置为向模式发生器电路提供校正的图案生成器时钟信号。 图案生成电路用于控制用于基板处理的电子束的调制。 在本发明的一个方面，在衬底处理期间测量和处理转速的可重复偏差以校正这种可重复偏差以增加衬底图案写入精度。

公开(公告)号：US06828566B2

公开(公告)日：2004-12-07

申请号：US10395237

申请日：2003-03-25

Applicant: Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

Inventor： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

IPC: H01J3720

CPC classification number: G01N1/32 ,  G01N1/28 ,  G01N2001/028 ,  G01N2001/045 ,  G01N2001/282 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/31732 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A specimen fabrication apparatus including a movable sample stage on which a specimen substrate is mounted, a probe connector for firmly joining a tip of a probe to a portion of the specimen substrate in a vicinity of an area on the specimen substrate to be observed in an observation apparatus, a micro-specimen separator for separating from the specimen substrate a micro-specimen to which the tip of the probe is firmly joined, the micro-specimen including the area on the specimen substrate to be observed and the portion of the specimen substrate to which the tip of the probe is firmly joined, a micro-specimen fixer for fixing the micro-specimen separated from the specimen substrate to a specimen holder of the observation apparatus, and a probe separator for separating the tip of the probe from the micro-specimen fixed to the specimen holder.

Abstract translation: 一种试样制造装置，包括：安装有试样基板的可动试样台;探针连接器，用于将探针的前端牢固地接合到试样基板的一部分附近，以在待观察的样品基板上的区域 观察装置，用于从试样基板分离与探针的前端牢固接合的微型试样的微量试样分离体，包括待观察的试样基板上的区域的微量试样和试样基板的一部分 探针的尖端牢固地接合到其上的微型试样固定器，用于将从试样基板分离的微量样品固定到观察装置的试样支架上的探针分离器和用于将探针的尖端从微型 固定在样品架上。

公开(公告)号：US20040113101A1

公开(公告)日：2004-06-17

申请号：US10654804

申请日：2003-09-03

Applicant: Nikon Corporation

Inventor： Shiwen Li ,  Takaharu Miura

IPC: H01J037/304

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/02 ,  H01J37/302 ,  H01J37/3174 ,  H01J2237/0216 ,  H01J2237/1501 ,  H01J2237/30438 ,  H01J2237/3045 ,  H01J2237/30455

Abstract: Charged-particle-beam (CPB) microlithography systems are disclosed that detect displacements of certain components and implement corrective countermeasures to the displacements so that pattern-exposure accuracy and precision are not compromised by the displacements. In an embodiment, displacement sensors and corrective actuators are installed at respective locations in or on the microlithography system. If the displacement sensors detect displacements at the respective locations, corresponding electrical signals produced by the sensors are fed-back or fed-forward to the corrective actuators. Alternatively, the electrical signals are routed directly to a beam-position-control system or routed indirectly to a displacement predictor. The displacement predictor calculates estimates of displacements based on data obtained previously concerning operation of certain displacement-generating components of the system. The estimates are used in feed-forward control of the beam position in the microlithography system, thereby improving pattern-transfer performance of the system.

Abstract translation: 公开了带电粒子束（CPB）微光刻系统，其检测某些部件的位移并对位移实施校正对策，使得图案曝光精度和精度不受位移的影响。 在一个实施例中，位移传感器和校正致动器安装在微光刻系统中或其上的相应位置处。 如果位移传感器检测各个位置处的位移，则由传感器产生的对应的电信号被反馈或前馈到校正致动器。 或者，电信号被直接路由到波束位置控制系统或间接路由到位移预测器。 位移预测器基于先前关于系统的某些位移产生部件的操作获得的数据来计算位移的估计。 估计用于微光刻系统中光束位置的前馈控制，从而提高系统的图案转印性能。

公开(公告)号：US20030183776A1

公开(公告)日：2003-10-02

申请号：US10395237

申请日：2003-03-25

Inventor： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

IPC: H01J037/28 ,  G01N001/28

CPC classification number: G01N1/32 ,  G01N1/28 ,  G01N2001/028 ,  G01N2001/045 ,  G01N2001/282 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/31732 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A specimen fabrication apparatus including a movable sample stage on which a specimen substrate is mounted, a probe connector for firmly joining a tip of a probe to a portion of the specimen substrate in a vicinity of an area on the specimen substrate to be observed in an observation apparatus, a micro-specimen separator for separating from the specimen substrate a micro-specimen to which the tip of the probe is firmly joined, the micro-specimen including the area on the specimen substrate to be observed and the portion of the specimen substrate to which the tip of the probe is firmly joined, a micro-specimen fixer for fixing the micro-specimen separated from the specimen substrate to a specimen holder of the observation apparatus, and a probe separator for separating the tip of the probe from the micro-specimen fixed to the specimen holder.

Abstract translation: 一种试样制造装置，包括：安装有试样基板的可动试样台;探针连接器，用于将探针的前端牢固地接合到试样基板的一部分附近，以在待观察的样品基板上的区域 观察装置，用于从试样基板分离与探针的前端牢固接合的微型试样的微量试样分离体，包括待观察的试样基板上的区域的微量试样和试样基板的一部分 探针的尖端牢固地接合到其上的微型试样固定器，用于将从试样基板分离的微量样品固定到观察装置的试样支架上的探针分离器和用于将探针的尖端从微型 固定在样品架上。

公开(公告)号：US6011268A

公开(公告)日：2000-01-04

申请号：US120260

申请日：1998-07-21

Applicant: Mamoru Nakasuji

Inventor： Mamoru Nakasuji

IPC: G03F7/20 ,  H01J37/141 ,  H01J37/21 ,  H01J37/30 ,  H01J37/302 ,  H01J37/305 ,  H01L21/027

CPC classification number: H01J37/3007 ,  H01J37/302 ,  H01J2237/04922 ,  H01J2237/3175

Abstract: Electron-beam demagnifying projection-optical systems are disclosed that perform magnification adjustment, image-rotation adjustment, and focus correction while not contributing to aberrations. Also disclosed are electron-beam microlithography apparatus comprising such a projection-optical system. The projection-optical system comprises first and second projection lenses arranged on an optical axis, and project an electron beam, that has passed through a mask pattern, with demagnification on a substrate. Each projection lens includes an auxiliary lens that generates a magnetic field having an axial strength distribution proportional to the axial magnetic field distribution of the respective projection lens. By adjusting the direction and amount of electrical current through the auxiliary lenses at least of focal point, image rotation, and image magnification can be independently adjusted.

Abstract translation: 公开了电子束缩小投影光学系统，其在不造成像差的情况下进行放大调整，图像旋转调整和聚焦校正。 还公开了包括这种投影光学系统的电子束微光刻设备。 投影光学系统包括布置在光轴上的第一和第二投影透镜，并且已经通过掩模图案的电子束在基板上进行了缩小。 每个投影透镜包括产生具有与各个投影透镜的轴向磁场分布成比例的轴向强度分布的磁场的辅助透镜。 通过调整至少焦点的辅助透镜的电流的方向和量，可以独立调整图像旋转和图像放大。

公开(公告)号：US5424550A

公开(公告)日：1995-06-13

申请号：US183770

申请日：1994-01-21

Applicant: Masamichi Kawano ,  Masahide Okumura ,  Haruo Yoda ,  Yukinobu Shibata ,  Tadao Konishi

Inventor： Masamichi Kawano ,  Masahide Okumura ,  Haruo Yoda ,  Yukinobu Shibata ,  Tadao Konishi

IPC: H01L21/30 ,  H01J37/302 ,  H01J37/317 ,  H01L21/027

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/302 ,  H01J37/3174

Abstract: A charged particle beam exposure apparatus includes an irradiator for irradiating a sample with a charged particle beam, an analog controller for analog controlling the charged particle beam, a digital controller for digital controlling the analog controller, and a digital transmission path connecting the analog controller to the digital controller. The analog controller is disposed inside a room, and the digital controller is disposed outside the room.

Abstract translation: 带电粒子束曝光装置包括用于对带有粒子束的样品进行照射的照射器，用于模拟控制带电粒子束的模拟控制器，用于数字控制模拟控制器的数字控制器和将模拟控制器连接到 数字控制器。 模拟控制器设置在房间内，数字控制器设置在房间外。

公开(公告)号：US4736107A

公开(公告)日：1988-04-05

申请号：US911238

申请日：1986-09-24

Applicant: Douglas D. Myron

Inventor： Douglas D. Myron

IPC: H01L21/265 ,  H01J37/302 ,  H01J37/317

CPC classification number: H01J37/302 ,  H01J37/3171

Abstract: An ion beam implantation system utilizing two pairs of mutually orthogonal scanning electrodes. Two sawtooth waveforms of approximately the same frequency are applied to the scanning electrodes to produce four sided scanning patterns. The dimensions of these scanning patterns are varied to sweep out a scan pattern that uniformly implants a circular wafer. By perturbing the scanning voltages the instantaneous beam speed is adjusted to compensate for small dose nonuniformities.

Abstract translation: 一种利用两对相互正交的扫描电极的离子束注入系统。 将大致相同频率的两个锯齿形波形施加到扫描电极以产生四面扫描图案。 这些扫描图案的尺寸被改变以扫出均匀地植入圆形晶片的扫描图案。 通过扰乱扫描电压，调整瞬时光束速度以补偿小剂量不均匀性。

公开(公告)号：US4468566A

公开(公告)日：1984-08-28

申请号：US402228

申请日：1982-07-29

Applicant: Hans-Gunther Eichhorn ,  Jurgen Gramss

Inventor： Hans-Gunther Eichhorn ,  Jurgen Gramss

IPC: G05B15/02 ,  H01J37/302

CPC classification number: H01J37/302

Abstract: The invention relates to a digital circuit arrangement for control of a corpuscular beam in the procedure of structurizing areas by use of corpuscular irradiation devices operating with linearly extended multi-deflection systems, particularly for use in microlithography, constituted of a plurality of like circuit members for producing columns which contain figure edge points, each member including three triggers for storing edge course control signals indicative of the edge course, the three triggers output signals are combined in antivalence in the respective circuit member to yield an edge point signal. Furthermore, the circuit members are combined in a columnwise member arrangement in which the triggers form shift registers for a positive and negative shift direction. The complete bit pattern columns are generated in a logic circuit arrangement connected to the member arrangement hierarchically setup of antivalence gates from the outputs of which bright/dark control signals are derived for the multi-deflection system.

Abstract translation: 本发明涉及一种用于在结构化区域的过程中控制红细胞束的数字电路装置，该方法是使用以线性延伸的多偏转系统操作的微粒照射装置，特别是用于微光刻，由多个相似的电路部件 产生包含图形边缘点的列，每个构件包括用于存储指示边缘路线的边沿路线控制信号的三个触发器，三个触发输出信号在各个电路构件中以反价来组合以产生边缘点信号。 此外，电路构件被组合成一个列方式的构件布置，其中触发器形成正移位方向和负移位方向的移位寄存器。 完整的位模式列是在逻辑电路装置中产生的，该逻辑电路装置连接到从对于多偏转系统导出明/暗控制信号的输出分级设置反对门的构件装置。