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公开(公告)号：US11817290B2
公开(公告)日：2023-11-14
申请号：US18159261
申请日：2023-01-25
Applicant: FEI Company
Inventor： Maarten Bischoff , Peter Christiaan Tiemeijer , Tjerk Gerrit Spanjer , Stan Johan Pieter Konings
IPC: H01J37/153 , H01J37/147 , H01J37/20 , H01J37/22 , H01J37/28
CPC classification number: H01J37/153 , H01J37/1478 , H01J37/20 , H01J37/222 , H01J37/28 , H01J2237/1516 , H01J2237/1534 , H01J2237/202 , H01J2237/221 , H01J2237/2802
Abstract: A method for electron microscopy comprises: adjusting at least one of an electron beam and an image beam in such a way that off-axial aberrations inflicted on at least one of the electron beam and the image beam are minimized, the adjusting performed by using a beam adjusting component to obtain at least one modified image beam, wherein the adjusting comprises applying both shifting and tilting to at least one of the electron beam and the image beam and wherein the amount of tilting of at least one of the electron beam and the image beam depends on the amount of shifting of at least one of the electron beam and the image beam respectively and wherein the amount of tilting is computed based on at least one of coma and astigmatism introduced as a consequence of the shift.
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公开(公告)号：US11815476B2
公开(公告)日：2023-11-14
申请号：US17217103
申请日：2021-03-30
Applicant: FEI Company
Inventor： Bart Buijsse , Jaydeep Sanjay Belapure , Alexander Henstra , Michael Patrick Janus , Stefano Vespucci
IPC: G01N23/205 , H01J37/26 , G01N23/2055 , G01N23/20025 , G01N23/20058 , H01J37/147 , H01J37/22 , H01J37/28
CPC classification number: G01N23/2055 , G01N23/20025 , G01N23/20058 , H01J37/1472 , H01J37/222 , H01J37/28 , G01N2223/03 , G01N2223/0565 , G01N2223/0566 , G01N2223/32 , G01N2223/3302 , H01J2237/2802
Abstract: Crystallographic information of crystalline sample can be determined from one or more three-dimensional diffraction pattern datasets generated based on diffraction patterns collected from multiple crystals. The crystals for diffraction pattern acquisition may be selected based on a sample image. At a location of each selected crystal, multiple diffraction patterns of the crystal are acquired at different angles of incidence by tilting the electron beam, wherein the sample is not rotated while the electron beam is directed at the selected crystal.
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公开(公告)号：US11802823B2
公开(公告)日：2023-10-31
申请号：US17523246
申请日：2021-11-10
Applicant: FEI Company
CPC classification number: G01N1/42 , H01J37/20 , H01J37/26 , H01J2237/2007
Abstract: The invention relates to a Cryo-Charged Particle (CCP) sample handling and storage system. The system is used for storing and handling cryo-samples for use in charged particle microscopy, such as cryo-electron microscope samples for use in cryo-transmission electron microscopy. The system comprises a storage apparatus for storing a plurality of CCP samples, and a Charged Particle Apparatus (CPA), such as a cryo-TEM, at a location remote from said storage apparatus. The system further comprises a transfer device that is releasably connectable to said storage apparatus, and that is releasably connectable to said CPA as well. As defined herein, said transfer device is arranged for acquiring a CCP sample from said plurality of CCP samples when connected to said storage apparatus, and arranged for transferring said CCP sample from said transfer device to said CPA when connected to said CPA.
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44.发明公开公开(公告)号：US20230341341A1
公开(公告)日：2023-10-26
申请号：US17728869
申请日：2022-04-25
Applicant: FEI COMPANY
Inventor： Daniel TOTONJIAN , Aurelien Philippe Jean Maclou BOTMAN , Milos TOTH
IPC: G01N23/2206 , G01N23/2257 , G01N23/203 , G01N23/2252
CPC classification number: G01N23/2206 , G01N23/2257 , G01N23/203 , G01N23/2252
Abstract: Practical implementation of Particle-Induced X-ray Emission (PIXE) on a focused ion beam apparatus or on a dual-beam apparatus comprising both focused-ion beam and scanning microscopy capabilities is described. Accordingly, an analytical method comprises: directing and focusing a beam of ions comprising a mixture of protons and non-hydrogen ions onto a sample, wherein the kinetic energy of ions of the mixture is not greater than 50 kilo-electron-Volts (keV); and detecting and measuring X-rays that are emitted from the sample in response to the impingement of the protons and non-hydrogen ions onto the sample.
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公开(公告)号：US11799486B2
公开(公告)日：2023-10-24
申请号：US17964916
申请日：2022-10-13
Applicant: FEI Company
Inventor： Valentina Caprara Vivoli , Yuchen Deng , Erik Michiel Franken
CPC classification number: H03K19/195 , G06F17/14 , G06F17/15 , G06N10/00 , G06V10/751 , G06V20/69
Abstract: Methods and systems for quantum computing based sample analysis include computing cross-correlations of two images using a quantum processing system, and computing less noisy image based of two or more images using a quantum processing system. Specifically, the disclosure includes methods and systems for utilizing a quantum computing system to compute and store cross correlation values for two sets of data, which was previously believed to be physically impossible. Additionally, the disclosure also includes methods and systems for utilizing a quantum computing system to generate less noisy data sets using a quantum expectation maximization maximum likelihood (EMML). Specifically, the disclosed systems and methods allow for the generation of less noisy data sets by utilizing the special traits of quantum computers, the systems and methods disclosed herein represent a drastic improvement in efficiency over current systems and methods that rely on traditional computing systems.
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Patent Agency Ranking
公开(公告)号：US20230335371A1
公开(公告)日：2023-10-19
申请号：US18134528
申请日：2023-04-13
Applicant: FEI Company
Inventor： Lukáš Malý , Jaroslav Pavliš , Jan Klusácek , Lukáš Brínek
CPC classification number: H01J37/24 , G06T3/0068 , G06T5/001 , G06T5/50 , G06T7/30 , H01J37/28 , G06T2207/10061 , H01J2237/221
Abstract: The present invention relates to a method and a system for compensating interference in a charged particle beam microscopy system. A step of capturing data obtained from irradiation of a sample for a sampling duration can be implemented. In the system a respective data storage is provided for capturing and/or storing this data. Further steps of dividing at least representative parts of the sampling duration into time-windows and constructing, for each of the time-windows, an intermediate image, can be implemented. Detecting shift between the intermediate images and determining a compensation function for the shift between the intermediate images is realized as well. In a system the latter steps are automated by a respective processing component. The shift between intermediate images can be a two-dimensional shift and the compensation function represents a shift of the intermediate images in the two dimensions over time.
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公开(公告)号：US20230260085A1
公开(公告)日：2023-08-17
申请号：US17674412
申请日：2022-02-17
Applicant: FEI Company
Inventor： Umesh ADIGA
CPC classification number: G06T3/4076 , G06T5/20 , G06T5/002 , H01J37/222 , H01J37/263 , G06T2207/20212 , G06T2207/20081 , G06T2207/10061 , G06T2207/20084 , H01J37/28
Abstract: Methods and systems for performing a hybrid machine learning method for enhancing scanning electron microscopy (SEM) images are disclosed herein. Methods include the steps of acquiring a plurality of images of a region of a sample that were each generated by irradiating the sample with a pulsed charged particle beam, upscaling each of the individual images to generate a plurality of upscaled images of the region of the sample, and combining the plurality of upscaled images to form a noise reduced image of the region of the sample.
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公开(公告)号：US20230245334A1
公开(公告)日：2023-08-03
申请号：US17591455
申请日：2022-02-02
Applicant: FEI Company
Inventor： John Flanagan , Mary Wu , Erik Franken , Daniel Lichau
CPC classification number: G06T7/62 , G06F30/20 , G06T17/10 , G06F2111/10
Abstract: Methods include acquiring a series of images or spectra of a volume of a model sample, reconstructing a 3D image of the volume of the model sample using the series of images, constructing a 3D model of the volume of the model sample by forming a segmentation of the reconstructed 3D image and fitting one or more primitive geometrical shapes to the segmentation, acquiring test sample images or spectra, and measuring test sample critical dimensions using the constructed 3D model to guide analysis of test spectra or images. Additional methods and related systems are disclosed, optical critical dimension (OCD) methods and systems.
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公开(公告)号：US20230206489A1
公开(公告)日：2023-06-29
申请号：US17561554
申请日：2021-12-23
Applicant: FEI Company
Inventor： Jan STOPKA , Bohuslav SED'A , Radovan VASINA , Radim SEJNOHA
CPC classification number: G06T7/74 , G06T7/37 , G06T7/337 , G06T2207/10061
Abstract: Methods and systems to determine positions of multiple beamlets includes performing a first scan by scanning the beamlets over a first sample region and acquiring multiple cell images; and performing a second scan by scanning the beamlets over a second sample region and acquiring multiple cell images. Each cell image corresponds to a beamlet, and at least a part of an overlapped region between the first sample region and the second sample region is scanned by multiple beamlets during both the first scan and the second scan. Position of each beamlet may then be determined based on the corresponding cell images acquired during the first scan and the second scan.
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公开(公告)号：US20230179885A1
公开(公告)日：2023-06-08
申请号：US17545928
申请日：2021-12-08
Applicant: FEI Company
Inventor： Jeroen KEIZER , Francis-Paul JANSSEN , Jacob Simon FABER
IPC: H04N5/378 , H01J37/244 , H01J37/26 , H04N5/341 , H01J37/147
CPC classification number: H04N5/378 , H01J37/244 , H01J37/263 , H04N5/341 , H01J37/1471
Abstract: Techniques for acquiring an electron energy loss spectrum in two dimensions are disclosed herein. The technique at least includes exposing an electron sensor to an electron spectrum projected in two dimensions, wherein one of the two dimensions corresponds to a dispersive axis, and the other of the two dimensions corresponds to a non-dispersive axis, receiving an electron sensor readout frame from the electron sensor, where the electron sensor readout frame comprises a plurality of values representative of the electron spectrum in each of the two dimensions, and reducing a resolution of the electron sensor readout frame in at least one of the two dimensions, where reducing the resolution includes reducing the number of values in the at least one of the two dimensions, where the electron sensor readout frame comprises a plurality of values in each of the two dimensions after the reduction in resolution.
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