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公开(公告)号：US12140873B2
公开(公告)日：2024-11-12
申请号：US17793525
申请日：2021-01-14
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/00
Abstract: A positioning device, including: a first positioning module arranged to support and position a first substrate, a second positioning module arranged to support and position a second substrate, a first positioning field in which the first and second positioning modules can be alternatingly positioned to carry out a first processing sequence, a second positioning field in which the first and second positioning modules can be alternatingly positioned to carry out a second processing sequence, wherein when one of the first and second positioning modules is carrying out or finishing the first processing sequence, the other of the first and second positioning modules has finished the second processing sequence and is positioned closer to the one of the first and second positioning modules.
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公开(公告)号：US12139436B2
公开(公告)日：2024-11-12
申请号：US17767179
申请日：2020-10-09
Applicant: ASML Netherlands B.V.
Inventor： Dietmar Uwe Herbert Trees , Edwin Johan Buis , Theodorus Wilhelmus Driessen , Benjamin Andrew Sams , Brandon Michael Johnson
Abstract: A method of manufacturing a nozzle for a droplet generator for a laser-produced plasma radiation source is disclosed. The method comprises disposing a glass capillary in a throughbore of a metal fitting, heating the metal fitting; and applying a pressure to the glass capillary such that the glass capillary conforms to the shape of, and forms a direct glass-to-metal seal with, the throughbore. Also disclosed is a nozzle for a droplet generator for a laser-produced plasma radiation source, and the radiation source itself, wherein the nozzle comprises the glass capillary for emitting fuel as droplets and the metal fitting for coupling the glass capillary to a body of the droplet generator, the glass capillary being conformed to a shape of a throughbore of the metal fitting, and wherein the glass capillary forms a direct glass-to-metal seal with the throughbore.
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公开(公告)号：US20240361222A1
公开(公告)日：2024-10-31
申请号：US18576266
申请日：2022-06-24
Applicant: ASML Netherlands B.V.
Inventor： Dustin Michael Urone , Theodorus Wilhelmus Driessen , Daniel Jason Riggs , Rodney D. Simmons , Jaden Robert Bankhead , Paul Alexander McKenzie
IPC: G01N15/0205 , H05G2/00
CPC classification number: G01N15/0211 , H05G2/008
Abstract: Disclosed is an apparatus for and method of detecting a droplet of target material in a system for generating EUV radiation in which an illumination system is used to illuminate the droplet of a target material and a detector is arranged to detect radiation from the illumination system that has been forward or side scattered by the droplet of target material.
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公开(公告)号：US20240354552A1
公开(公告)日：2024-10-24
申请号：US18259344
申请日：2021-12-20
Applicant: ASML Netherlands B.V.
Inventor： Alexandru ONOSE , Bart Jacobus Martinus TIEMERSMA , Nick VERHEUL , Remco DIRKS , Davide BARBIERI , Hendrik Adriaan VAN LAARHOVEN
IPC: G06N3/0455
CPC classification number: G06N3/0455
Abstract: A modular autoencoder model is described. The modular autoencoder model comprises input models configured to process one or more inputs to a first level of dimensionality suitable for combination with other inputs: a common model configured to: reduce a dimensionality of combined processed inputs to generate low dimensional data in a latent space; and expand the low dimensional data in the latent space into one or more expanded versions of the one or more inputs suitable for generating one or more different outputs; output models configured to use the one or more expanded versions of the one or more inputs to generate the one or more different outputs, the one or more different outputs being approximations of the one or more inputs; and a prediction model configured to estimate one or more parameters based on the low dimensional data in the latent space.
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45.发明公开公开(公告)号：US20240353749A1
公开(公告)日：2024-10-24
申请号：US18713143
申请日：2022-11-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Xingyue PENG , Ningning JIA , Zhan SHI , Rafael C. HOWELL
IPC: G03F1/36
CPC classification number: G03F1/36
Abstract: Methods, software, and systems are disclosed for determining mask patterns. The determination can include obtaining a mask pattern including sub-resolution assist features (SRAFs) each having constant widths. The widths are set as continuous variables and so can be optimized along with other variables during a mask optimization process of the mask pattern. Based on their population and/or statistics, the optimized continuous widths are then discretized to a limited number of global width levels. Further mask optimization be performed with the SRAFs having discretized optimized global width levels, where the width assigned to an individual SRAF may be adjusted to a different level of the global width levels.
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Patent Agency Ranking
公开(公告)号：US12125671B2
公开(公告)日：2024-10-22
申请号：US17778036
申请日：2020-11-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Stijn Wilem Herman Karel Steenbrink , Marco Jan-Jaco Wieland , Albertus Victor Gerardus Mangnus
IPC: H01J37/317 , H01J37/141 , H01J37/147 , H01J37/28
CPC classification number: H01J37/3177 , H01J37/141 , H01J37/1474 , H01J37/28 , H01J2237/0453 , H01J2237/2817
Abstract: A multi-source illumination apparatus for illuminating a sample with charged particles, wherein beams, from a plurality of sources, are arranged such that a beam from at least one source intersects, at a plane of a condenser lens, with at least part of one other beam from a different one of the plurality of sources. The condenser lens is configured to separately collimate the received beams from each source. A manipulator array arrangement is configured to manipulate the collimated beams to generate one or more beams, in a single column, that include charged particles from the plurality of sources. The manipulator array arrangement includes a multi-beam generator configured to receive the plurality of substantially parallel substantially collimated beams generated by the deflector array, and generate a multibeam in dependence on the received plurality of substantially parallel substantially collimated beams, wherein the multi-beam includes a plurality of substantially collimated sub-beams.
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公开(公告)号：US12124176B2
公开(公告)日：2024-10-22
申请号：US17943809
申请日：2022-09-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Pawel Safinowski , Derk Servatius Gertruda Brouns
CPC classification number: G03F7/7065 , G03F1/62
Abstract: An inspection apparatus for inspecting an object such as a pellicle for use in an EUV lithographic apparatus, the inspection apparatus including: a vacuum chamber; a load lock forming an interface between the vacuum chamber and an ambient environment; and a stage apparatus configured to receive the object from the load lock and displace the object inside the vacuum chamber, wherein the vacuum chamber comprises a first parking position and a second parking position for temporarily storing the object.
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公开(公告)号：US20240347311A1
公开(公告)日：2024-10-17
申请号：US18580152
申请日：2022-06-23
Applicant: ASML Netherlands B.V.
Inventor： Bruno LA FONTAINE , Juying DOU , Zhidong DU , Che-Chia KUO
IPC: H01J37/065
CPC classification number: H01J37/065 , H01J2237/06375
Abstract: Apparatuses and systems for stabilizing electron sources in charged particle beam inspection systems are provided. In some embodiments, a system may include an electron source comprising an emitting tip electrically connected to two electrodes and configured to emit an electron; and a base coupled to the emitting tip, wherein the base is configured to stabilize the emitting tip via the coupling.
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公开(公告)号：US20240345492A1
公开(公告)日：2024-10-17
申请号：US18683389
申请日：2022-08-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Gijs KRAMER
IPC: G03F7/00 , G01B11/06 , G01B11/245 , G03F9/00
CPC classification number: G03F7/7085 , G01B11/0608 , G01B11/245 , G03F7/70783 , G03F9/7034 , G01B2210/50
Abstract: A sensor system for measuring a shape of a substrate, the sensor system include: a substrate support to support a surface of the substrate; at least one sensor device, each sensor device including an optical emitter to emit radiation onto the surface of the substrate, and an optical receiver to receive the radiation reflected from the surface; and a controller. The controller is configured to: determine at least one measurement height of the surface of the substrate above each of the at least one sensor device, based on the received radiation; compensate for gravitational sag of the substrate relative to a calibration height; and determine the shape of the substrate based on a comparison of the calibration height and the at least one measurement height.
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公开(公告)号：US20240345490A1
公开(公告)日：2024-10-17
申请号：US18294202
申请日：2022-07-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Paul VAN DONGEN
IPC: G03F7/00 , B25J15/06 , H01L21/683
CPC classification number: G03F7/707 , B25J15/0658 , G03F7/70341 , G03F7/70875 , G03F7/70925 , H01L21/6838
Abstract: A gripper for an object handler includes an engaging surface for engaging a surface of an object, and a first channel connected to a first outlet, the first outlet being configured to operate, during use, as a vacuum clamp arranged to secure the engaging surface to the surface of the object. The gripper further includes a second channel arranged to be connected to a pressure source, and at least one second outlet arranged adjacent to the engaging surface and connected to the second channel.
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