METHOD OF MANUFACTURING INERTIAL SENSOR
    41.
    发明申请
    METHOD OF MANUFACTURING INERTIAL SENSOR 审中-公开
    制造传感器的方法

    公开(公告)号:US20120267825A1

    公开(公告)日:2012-10-25

    申请号:US13184564

    申请日:2011-07-17

    Abstract: The method of manufacturing an inertial sensor includes: (A) disposing a first mold 120 and a second mold 125 on both surfaces of a predetermined region R in a plate-shaped membrane 110, (B) forming a mass body 130, a post 140, and an upper cap 150 through a plating process or a filling process, (C) disposing a third mold 160 on an exposed surface of the first mold 120 and the mass body 130, and (D) forming a lower cap 170 through the plating process or the filling process. Since the mass body 130 is made of metal by a plating process or a filling process, the density of the mass body 130 may be increased and the mass body 130 may be formed to have a structure of a high aspect ratio, thereby improving the sensitivity of the inertial sensor 100.

    Abstract translation: 惯性传感器的制造方法包括:(A)在板状膜110中的规定区域R的两面上设置第一模具120和第二模具125,(B)形成质量体130,柱140 ,以及通过电镀处理或填充处理的上盖150,(C)在第一模具120和质量体130的暴露表面上设置第三模具160,以及(D)通过电镀形成下盖170 过程或填充过程。 由于质量体130通过电镀处理或填充处理由金属制成,因此可以增加质量体130的密度,并且可以将质量体130形成为具有高纵横比的结构,从而提高灵敏度 的惯性传感器100。

    Fabrication method for hollow microneedles for drug delivery
    42.
    发明授权
    Fabrication method for hollow microneedles for drug delivery 有权
    用于药物输送的中空微针的制造方法

    公开(公告)号:US08137736B2

    公开(公告)日:2012-03-20

    申请号:US12348589

    申请日:2009-01-05

    Abstract: A novel method suitable for commercially mass production of hollow microneedle with high quality for delivery of drugs across or into biological tissue is provided. It typically includes the following processes: (1) coating an elongated template of a first material with a second material to form a cover; (2) removing tips of the template and cover to form an opening in the cover; and (3) removing the template of the first material to obtain hollow microneedles of the second material. This simple, efficient and cost-effective fabrication method can mass produce hollow microneedle arrays involving no complicated and expensive equipments or techniques, which can be used in commercial fabrication of hollow needles for delivering drugs or genes across or into skin or other tissue barriers with advantages of minimal damage, painless, long-term and continuous usages.

    Abstract translation: 提供了一种适用于商业上大规模生产用于将药物跨越或进入生物组织的高品质的中空微针的新方法。 它通常包括以下过程:(1)用第二材料涂覆第一材料的细长模板以形成盖子; (2)去除模板和盖子的尖端以在盖子上形成开口; 和(3)去除第一材料的模板以获得第二材料的中空微针。 这种简单,高效和成本有效的制造方法可以大规模生产中空微针阵列,其不涉及复杂而昂贵的设备或技术,其可用于商业制造用于将药物或基因跨越或进入皮肤或其它组织屏障的中空针 最小的伤害,无痛,长期和持续的使用。

    Method for integrating micro and nanoparticles into MEMS and apparatus including the same
    43.
    发明授权
    Method for integrating micro and nanoparticles into MEMS and apparatus including the same 有权
    将微纳米颗粒与微纳米颗粒整合到MEMS中的方法及包括其的设备

    公开(公告)号:US07994592B2

    公开(公告)日:2011-08-09

    申请号:US11182906

    申请日:2005-07-18

    Abstract: MEMs devices are integrally fabricated with included micro or nanoparticles by providing a mixture of a sacrificial material and a multiplicity of particles, disposing the mixture onto a substrate, fabricating a MEMs structure on the substrate including at least part of the mixture, so that at least some of the mixture is enclosed in the MEMs structure, removing the sacrificial material, and leaving at least some of the multiplicity of particles substantially free and enclosed in the MEMs structure. The step of fabricating a MEMs structure is quite general and is contemplated as including one or a multiplicity of additional steps for creating some type of structure in which the particles, which may be microbeads or nanobeads, are included. A wide variety of useful applications for MEMs integrated with micro or nanoparticles are available.

    Abstract translation: 通过提供牺牲材料和多个颗粒的混合物将MEM装置与包含的微型或纳米颗粒整体制造,将混合物设置在衬底上,在包括至少部分混合物的衬底上制造MEM结构,使得至少 一些混合物被包封在MEMs结构中,去除牺牲材料,并且使至少一些多个颗粒基本上自由并且封闭在MEM结构中。 制造MEMs结构的步骤是相当普遍的,并且被设想为包括用于产生某些类型的结构的一个或多个附加步骤,其中可以包括可以是微珠或纳米珠的颗粒。 可以使用与微型或纳米颗粒集成的MEM的各种有用的应用。

    Forming a sacrificial layer in order to realise a suspended element
    44.
    发明授权
    Forming a sacrificial layer in order to realise a suspended element 有权
    形成牺牲层以实现悬浮元件

    公开(公告)号:US07851366B2

    公开(公告)日:2010-12-14

    申请号:US11854155

    申请日:2007-09-12

    Abstract: The invention relates to a method of realization of a sacrificial layer, including the steps of: lithography of a resin deposited on a substrate in order to supply a lithographed resist pattern on a substrate zone, the zone having a given size and a given form, the pattern occupying a given volume, annealed according to a thermal cycle of the lithographed resist pattern, the method being characterised in that it includes, according to the resin, the determination of the size and of the form of said zone of the substrate, and the determination of the volume of the resin deposited on said zone so that the thermal cycle annealing supplies a profile chosen from among the following profiles: a planarising domed profile and a “double air gap” profile.

    Abstract translation: 本发明涉及一种实现牺牲层的方法,包括以下步骤:沉积在衬底上的树脂的光刻法,以便在衬底区域上提供光刻抗蚀剂图案,该区域具有给定的尺寸和给定的形式, 所述图案占据给定体积,根据所蚀刻的抗蚀剂图案的热循环退火,所述方法的特征在于,根据所述树脂,所述图案包括所述基材的所述区域的尺寸和形式的确定,以及 确定沉积在所述区域上的树脂的体积,使得热循环退火提供从以下简档中选择的轮廓:平面化圆顶轮廓和“双气隙”轮廓。

    Method for manufacturing MEMS structures
    47.
    发明授权
    Method for manufacturing MEMS structures 有权
    制造MEMS结构的方法

    公开(公告)号:US07176047B2

    公开(公告)日:2007-02-13

    申请号:US10769346

    申请日:2004-01-30

    Abstract: A method for forming a free standing micro-structural member including providing a substrate; blanket depositing a first sacrificial resist layer over the substrate; exposing and developing the first sacrificial resist layer to form a first resist portion; subjecting the first resist portion to at least a hard bake process to form the first resist portion having a predetermined first smaller volume compared to a desired final resist portion volume; blanket depositing at least a second sacrificial resist layer followed by exposure, development and the at least a hard bake process to form the final resist portion volume; and, depositing at least one structural material layer over the final resist portion.

    Abstract translation: 一种形成独立式微结构构件的方法,包括提供基底; 在衬底上铺设第一牺牲抗蚀剂层; 曝光和显影第一牺牲抗蚀剂层以形成第一抗蚀剂部分; 使所述第一抗蚀剂部分至少进行硬烘烤处理,以形成具有预定的第一较小体积的第一抗蚀剂部分,与期望的最终抗蚀剂部分体积相比; 毯毯沉积至少第二牺牲抗蚀剂层,随后曝光,显影和至少硬烘烤工艺以形成最终的抗蚀剂部分体积; 并且在最终抗蚀剂部分上沉积至少一个结构材料层。

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