公开(公告)号：US6046457A

公开(公告)日：2000-04-04

申请号：US005612

申请日：1998-01-09

Applicant: Carl E. Bohnenkamp ,  Chester T. Dziobkowski

Inventor： Carl E. Bohnenkamp ,  Chester T. Dziobkowski

IPC: G21K5/04 ,  G01Q30/10 ,  G01Q60/00 ,  H01J37/02 ,  H01J37/09 ,  H01J37/18 ,  H01L21/027 ,  G01N21/00 ,  G01N23/00

CPC classification number: H01J37/02 ,  H01J2237/002 ,  H01J2237/022 ,  H01J2237/045 ,  H01J2237/244

Abstract: A charged particle beam apparatus having a cold trap positioned in proximity to components, such as a shaping aperture and a backscattered electrons detector, to which contaminants tend to migrate to adversely affect the functions of these components. As a coolant is passed through the cold trap, the contaminants condense on the cold trap and away from the shaping aperture and the backscattered electrons detector.

Abstract translation: 一种带电粒子束装置，其具有位于接近诸如成形孔和后向散射电子检测器的部件附近的冷阱，污染物倾向于迁移到这些部件上以不利地影响这些部件的功能。 当冷却剂通过冷阱时，污染物冷凝在冷阱上并远离成形孔和背散射电子检测器。

公开(公告)号：US09206500B2

公开(公告)日：2015-12-08

申请号：US12212844

申请日：2008-09-18

Applicant: Boris Druz ,  Roger P. Fremgen, Jr. ,  Alan V. Hayes ,  Viktor Kanarov ,  Robert Krause ,  Ira Reiss ,  Piero Sferlazzo

Inventor： Boris Druz ,  Roger P. Fremgen, Jr. ,  Alan V. Hayes ,  Viktor Kanarov ,  Robert Krause ,  Ira Reiss ,  Piero Sferlazzo

IPC: C23C14/04 ,  C23C14/22 ,  H01J37/20 ,  H01J37/302 ,  H01J37/317

CPC classification number: H01J37/3488 ,  C23C14/044 ,  C23C14/221 ,  C23C14/46 ,  H01J37/20 ,  H01J37/302 ,  H01J37/317 ,  H01J37/32752 ,  H01J37/3441 ,  H01J37/3476 ,  H01J2237/0245 ,  H01J2237/045 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/30472 ,  H01J2237/3146

Abstract: Method and apparatus for processing a substrate with an energetic particle beam. Features on the substrate are oriented relative to the energetic particle beam and the substrate is scanned through the energetic particle beam. The substrate is periodically indexed about its azimuthal axis of symmetry, while shielded from exposure to the energetic particle beam, to reorient the features relative to the major dimension of the beam.

Abstract translation: 用能量粒子束处理衬底的方法和设备。 衬底上的特征相对于能量粒子束定向，并且通过能量粒子束扫描衬底。 衬底围绕其方位角对称轴周期性地被索引，同时被屏蔽以防止暴露于能量粒子束，以相对于束的主要尺寸重新定向特征。

公开(公告)号：US20150014528A1

公开(公告)日：2015-01-15

申请号：US14324360

申请日：2014-07-07

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Lorenz Lechner

IPC: G01N23/225 ,  H01J37/244

CPC classification number: G01N23/2251 ,  H01J37/026 ,  H01J37/28 ,  H01J2237/045

Abstract: A method of operating a particle beam microscope includes: directing a particle beam onto a sample and detecting particles emanating from the sample during a first period for generating an image of the sample; generating electrons having a first distribution of kinetic energies and directing these electrons onto the sample during a second period for reducing a charge of the sample being generated while the directing the particle beam onto the sample; and generating electrons having a second distribution of their kinetic energies and directing these electrons onto the sample during a third period for further reducing the charge of the sample being generated while the directing of the particle beam onto the sample. An average value of the kinetic energy of the first distribution of the kinetic energy is greater than an average value of the kinetic energy of the second distribution of kinetic energies.

Abstract translation: 操作粒子束显微镜的方法包括：在第一时间段期间将粒子束引导到样品上并检测从样品发出的颗粒，以产生样品的图像; 产生具有动能的第一分布的电子，并且在第二时段期间将这些电子引导到样品上以减少在将粒子束引导到样品上时产生的样品的电荷; 以及产生具有其动能的第二分布的电子并且在第三周期期间将这些电子引导到样品上，以进一步减少在将粒子束引导到样品上时产生的样品的电荷。 动能的第一次分布的动能的平均值大于动能的第二次分布的动能的平均值。

公开(公告)号：US08492732B2

公开(公告)日：2013-07-23

申请号：US13633468

申请日：2012-10-02

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro Ogasawara

IPC: H01J3/07 ,  H01J37/141 ,  G21K5/04

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J2237/0213 ,  H01J2237/0435 ,  H01J2237/045

Abstract: A multi charged particle beam writing apparatus according to one aspect of the present invention includes a first aperture member to form multiple beams, a blanker array provided with a plurality of blankers which respectively perform blanking deflection of a corresponding beam in the multiple beams, a first electromagnetic lens and a second electromagnetic lens arranged between the first aperture member and the blanker array, a second aperture member arranged between the first electromagnetic lens and the second electromagnetic lens and at a position of a convergence point of the multiple beams and configured to restrict passage of charged particles deviated from the convergence point, and a third aperture member to block each beam which was deflected to be in a beam off state by the plurality of blankers.

Abstract translation: 根据本发明的一个方面的多带电粒子束写入装置包括形成多个光束的第一孔径构件，设置有分别对多个光束中的对应光束进行消隐偏转的多个消隐器的消隐器阵列，第一 电磁透镜和布置在所述第一孔径构件和所述遮蔽器阵列之间的第二电磁透镜，布置在所述第一电磁透镜和所述第二电磁透镜之间并且在所述多个光束的会聚点的位置处的第二孔径构件， 的带电粒子偏离会聚点，以及第三孔径构件，用于阻挡被多个阻挡器偏转成束束状态的每个束。

公开(公告)号：US08461525B2

公开(公告)日：2013-06-11

申请号：US13198640

申请日：2011-08-04

Applicant: Alexander Henstra

Inventor： Alexander Henstra

IPC: H01J3/26 ,  H01J40/00

CPC classification number: H01J37/05 ,  H01J3/027 ,  H01J3/04 ,  H01J37/063 ,  H01J2237/045 ,  H01J2237/057 ,  H01J2237/061 ,  H01J2237/08 ,  H01J2237/15 ,  H01J2237/1534

Abstract: A particle source in which energy selection occurs by sending a beam of electrically charged particles eccentrically through a lens so that energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit in an energy selecting diaphragm, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam will have a reduced energy spread. The energy dispersed spot is imaged on the slit by a deflector. When positioning the energy dispersed spot on the slit, central beam is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector is avoided.

Abstract translation: 通过使透过透镜偏心地发送带电粒子的束使能量分散发生在由透镜形成的图像中而发生能量选择的粒子源。 通过将该图像投影到能量选择隔膜的狭缝上，可以仅允许能谱范围的有限部分中的粒子通过。 因此，通过的光束将具有减小的能量扩展。 能量分散点通过偏转器在狭缝上成像。 当将能量分散点定位在狭缝上时，中心束从轴线偏转到其被能量选择隔膜停止的程度。 因此避免了在隔膜之后的区域中由该光束产生的反射和污染。 避免了来自中心束的电子的电子 - 电子相互作用，与偏转器区域中的能量过滤光束相互作用。

公开(公告)号：US20130088775A1

公开(公告)日：2013-04-11

申请号：US13638981

申请日：2011-04-06

Applicant: Kuniaki Nagayama ,  Yoshihiro Arai ,  Hirofumi Iijima ,  Susumu Terakawa

Inventor： Kuniaki Nagayama ,  Yoshihiro Arai ,  Hirofumi Iijima ,  Susumu Terakawa

IPC: G02B21/00

CPC classification number: G02B21/0076 ,  G02B21/0032 ,  G02B21/365 ,  H01J37/228 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/045 ,  H01J2237/2608

Abstract: A compound microscope device allowing simultaneous observation of one specimen by a transmission electron microscope and an optical microscope, is provided. A compound microscope device 1 of the present invention has a transmission electron microscope 2 and an optical microscope 4. A specimen 10 and a reflection mirror 41 are disposed on an electron optical axis C of an electron ray. The reflection mirror 41 is inclined from the electron optical axis C toward the optical object lens 43 and the specimen 10. Light from the specimen 10 (fluorescent light, reflection light, and the like) is reflected by the reflection mirror 41 and entered into the optical object lens 43. The electron ray from the electron microscope 2 passes through a mounting center hole 42 of the reflection mirror 41. This makes it possible to observe one specimen simultaneously by the electron microscope 2 and the optical microscope 4.

Abstract translation: 提供通过透射电子显微镜和光学显微镜同时观察一个样品的复合显微镜装置。 本发明的复合显微镜装置1具有透射电子显微镜2和光学显微镜4.试样10和反射镜41配置在电子射线的电子光轴C上。 反射镜41从电子光轴C朝向光学物镜43和样本10倾斜。来自样本10的光（荧光，反射光等）被反射镜41反射并进入 光学物镜43.来自电子显微镜2的电子射线通过反射镜41的安装中心孔42.这样可以通过电子显微镜2和光学显微镜4同时观察一个样本。

公开(公告)号：US20130082187A1

公开(公告)日：2013-04-04

申请号：US13633468

申请日：2012-10-02

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA

IPC: G21K5/04

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J2237/0213 ,  H01J2237/0435 ,  H01J2237/045

Abstract: A multi charged particle beam writing apparatus according to one aspect of the present invention includes a first aperture member to form multiple beams, a blanker array provided with a plurality of blankers which respectively perform blanking deflection of a corresponding beam in the multiple beams, a first electromagnetic lens and a second electromagnetic lens arranged between the first aperture member and the blanker array, a second aperture member arranged between the first electromagnetic lens and the second electromagnetic lens and at a position of a convergence point of the multiple beams and configured to restrict passage of charged particles deviated from the convergence point, and a third aperture member to block each beam which was deflected to be in a beam off state by the plurality of blankers.

Abstract translation: 根据本发明的一个方面的多带电粒子束写入装置包括形成多个光束的第一孔径构件，设置有分别对多个光束中的对应光束进行消隐偏转的多个消隐器的消隐器阵列，第一 电磁透镜和布置在所述第一孔径构件和所述遮蔽器阵列之间的第二电磁透镜，布置在所述第一电磁透镜和所述第二电磁透镜之间并且在所述多个光束的会聚点的位置处的第二孔径构件， 的带电粒子偏离会聚点，以及第三孔径构件，用于阻挡被多个阻挡器偏转成束束状态的每个束。

公开(公告)号：US20120061236A1

公开(公告)日：2012-03-15

申请号：US13226423

申请日：2011-09-06

Applicant: Sven Kiontke

Inventor： Sven Kiontke

IPC: C23C14/46

CPC classification number: H01J37/305 ,  H01J37/18 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/045

Abstract: In a method of machining a substrate by an ion beam, the ion beam is guided by an orifice plate formed at least partly of carbon-containing material. Between the orifice plate and the substrate, an educt that is reactive with carbon is guided such that carbon released from the orifice plate by the ion beam oxidizes. An ion beam device for machining a substrate includes an ion beam source and at least one orifice plate, disposed between the ion beam source and the substrate, for adjusting a cross section of and guiding the ion beam. The orifice plate is formed of carbon-containing material. A delivery unit, for delivering an educt that is reactive with carbon, is disposed such that the educt can be guided between the orifice plate and the substrate, so that carbon released from the orifice plate by the ion beam oxidizes.

Abstract translation: 在通过离子束加工衬底的方法中，离子束由至少部分由含碳材料形成的孔板引导。 在孔板和基板之间，引导与碳反应的析出物，使得通过离子束从孔板释放的碳氧化。 用于加工衬底的离子束装置包括设置在离子束源和衬底之间的离子束源和至少一个孔板，用于调节离子束的横截面和引导离子束。 孔板由含碳材料形成。 设置用于输送与碳反应的喷射器的输送单元，使得喷射管能够在孔板和基板之间被引导，使得通过离子束从孔板释放的碳被氧化。

公开(公告)号：US20110155897A1

公开(公告)日：2011-06-30

申请号：US12825504

申请日：2010-06-29

Applicant: Stanley Harrison

Inventor： Stanley Harrison

IPC: H05H3/02 ,  G21K5/00

CPC classification number: H01J37/08 ,  H01J37/301 ,  H01J2237/045 ,  H01J2237/0812 ,  H01J2237/083 ,  H01J2237/31

Abstract: A gas-cluster-jet generator with improved vacuum management techniques and apparatus is disclosed. The gas-cluster-jet generator comprises a substantially conically shaped vacuum chamber for housing the nozzle and jet exit portions of the gas-cluster-jet generator. A skimmer may be located at the narrow end of the conical chamber and a close-coupled vacuum pump is located at the wide end of the conical chamber. Support members for the nozzle are high conductivity “spider” supports that provide support rigidity while minimizing gas flow obstruction for high pumping speed. The conically shaped vacuum chamber redirects un-clustered gas in a direction opposite the direction of the gas-cluster-jet for efficient evacuation of the un-clustered gas. The nozzle and a skimmer may have fixed precision relative alignment, or may optionally have a nozzle aiming adjustment feature for aligning the gas-cluster-jet with the skimmer and downstream beamline components. Also disclosed are various configurations of gas-cluster ion-beam processing tools employing the improved gas-cluster-jet generator.

Abstract translation: 公开了一种具有改进的真空管理技术和设备的气体簇射流发生器。 气体簇喷射发生器包括用于容纳喷气发生器的喷嘴和喷射出口部分的大致锥形的真空室。 撇渣器可以位于锥形室的窄端，并且紧密联接的真空泵位于锥形室的宽端。 喷嘴的支撑构件是高导电性“蜘蛛”支撑，其提供支撑刚度，同时最大限度地减少气流阻塞以实现高泵送速度。 圆锥形真空室沿着与气体簇射流方向相反的方向重新定向未聚集的气体，以有效排出未聚集的气体。 喷嘴和撇渣器可以具有固定的精确度相对对准，或者可以可选地具有用于使气体簇射流与分离器和下游束线部件对准的喷嘴瞄准调整特征。 还公开了采用改进的气体 - 簇射流发生器的气体 - 团簇离子束加工工具的各种构造。

公开(公告)号：US07750323B1

公开(公告)日：2010-07-06

申请号：US12465189

申请日：2009-05-13

Applicant: Zhimin Wan ,  Cheng-Hui Shen ,  Ko-Chuan Jen

Inventor： Zhimin Wan ,  Cheng-Hui Shen ,  Ko-Chuan Jen

IPC: H01J37/317 ,  H01J37/08 ,  H01L21/265

CPC classification number: H01J37/3172 ,  H01J37/3023 ,  H01J2237/043 ,  H01J2237/045 ,  H01J2237/30461 ,  H01J2237/30477 ,  H01J2237/30483

Abstract: An ion implanter and a method for implanting a wafer are provided, wherein the method includes the following steps. First, a wafer has at least a first portion requiring a first doping density and a second portion requiring a second doping density is provided. The first doping density is larger than the second doping density. Thereafter, the first portion is scanned by an ion beam with a first scanning parameter value, and the second portion is scanned by the ion beam with a second scanning parameter value. The first scanning parameter value can be a first scan velocity, and the second scanning parameter value can be a second scan velocity different than the first scan velocity. Alternatively, the first scanning parameter value can be a first beam current, and the second scanning parameter value can be a second beam current different than the first beam current.

Abstract translation: 提供一种用于植入晶片的离子注入机和方法，其中该方法包括以下步骤。 首先，晶片至少具有需要第一掺杂密度的第一部分，并且提供需要第二掺杂密度的第二部分。 第一掺杂密度大于第二掺杂密度。 此后，通过具有第一扫描参数值的离子束扫描第一部分，并且用第二扫描参数值用离子束扫描第二部分。 第一扫描参数值可以是第一扫描速度，并且第二扫描参数值可以是不同于第一扫描速度的第二扫描速度。 或者，第一扫描参数值可以是第一束电流，并且第二扫描参数值可以是不同于第一束电流的第二束电流。