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    Method for manufacturing microstructure using self-assembly of amphiphilic polymer
    51.
    发明授权
    Method for manufacturing microstructure using self-assembly of amphiphilic polymer 有权
    使用两亲聚合物的自组装制造微结构的方法

    公开(公告)号：US08673786B2

    公开(公告)日：2014-03-18

    申请号：US13424811

    申请日：2012-03-20

    Applicant: Kei Watanabe ,  Ichiro Mizushima

    Inventor： Kei Watanabe ,  Ichiro Mizushima

    IPC: H01L21/311

    CPC classification number: B81C1/00492 ,  B81C2201/0149 ,  B81C2201/0198 ,  H01L21/0337 ,  H01L21/3086 ,  H01L21/31144 ,  H01L21/32139

    Abstract: According to one embodiment, a method for manufacturing a microstructure includes forming a guide film on a patterning material, forming a cured film, forming a mask member, and performing processing of the patterning material using the mask member as a mask. An opening is made in the guide film. An upper surface of the guide film is hydrophilic, a side surface of the opening is hydrophobic. The forming the cured film includes applying a solution to cover the patterning material and the guide film, separating the solution into a hydrophobic block and a hydrophilic block, and curing the solution. The solution contains an amphiphilic polymer having a hydrophobic portion and a hydrophilic portion. A length of the hydrophobic portion is longer than a length of the hydrophilic portion. The mask member is formed by removing the hydrophilic block from the cured film.

    Abstract translation: 根据一个实施例，微结构的制造方法包括在图案形成材料上形成引导膜，形成固化膜，形成掩模部件，并使用掩模部件作为掩模进行图案形成材料的处理。 在引导膜中形成一个开口。 引导膜的上表面是亲水性的，开口的侧表面是疏水性的。 形成固化膜包括施加溶液以覆盖图案形成材料和引导膜，将溶液分离成疏水性嵌段和亲水性嵌段，并固化该溶液。 该溶液含有具有疏水部分和亲水部分的两亲性聚合物。 疏水部分的长度长于亲水部分的长度。 通过从固化膜除去亲水性嵌段形成掩模构件。

    PATTERN FORMING METHOD
    52.
    发明申请
    PATTERN FORMING METHOD 有权
    图案形成方法

    公开(公告)号：US20140069325A1

    公开(公告)日：2014-03-13

    申请号：US13784620

    申请日：2013-03-04

    Applicant: Kabushiki Kaisha Toshiba

    Inventor： Ayako KAWANISHI

    IPC: C30B19/00

    CPC classification number: C30B19/00 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0198 ,  G03F7/0002 ,  H01L21/0271 ,  H01L21/31144

    Abstract: According to one embodiment, a pattern forming method includes forming a graphoepitaxy on a substrate, a process of forming a first self-assembly material layer that contains a first segment and a second segment in a depressed portion of the graphoepitaxy, a process of forming a first self-assembly pattern that has a first region containing the first segment, and a second region containing the second segment by performing a phase separation of the first self-assembly material layer, a process of forming a second self-assembly material layer containing a third segment and a fourth segment on a projected portion of the graphoepitaxy, and the first self-assembly pattern, a process of forming a second self-assembly pattern that has a third region containing the third segment, and a fourth region containing the fourth segment by performing a phase separation of the second self-assembly material layer.

    Abstract translation: 根据一个实施例，图案形成方法包括在基底上形成划线蛋白石，形成第一自组装材料层的工艺，该第一自组装材料层包含第一部分和第二部分，所述第一部分和第二部分在凹凸部分中，形成 第一自组装图案，其具有包含第一段的第一区域，以及通过执行第一自组装材料层的相分离而包含第二区段的第二区域;形成包含第一自组装材料层的第二自组装材料层的工艺; 第三片段和第四片段，以及第一自组装图案，形成具有包含第三片段的第三区域的第二自组装图案的工艺，以及包含第四片段的第四片段 通过执行第二自组装材料层的相分离。

    NANO PATTERN FORMATION
    53.
    发明申请
    NANO PATTERN FORMATION 有权
    纳米图案形成

    公开(公告)号：US20140044933A1

    公开(公告)日：2014-02-13

    申请号：US14054679

    申请日：2013-10-15

    Applicant: KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION

    Inventor： Kwangyeol LEE

    IPC: B81C1/00

    CPC classification number: B81C1/00031 ,  B81C1/00373 ,  B81C2201/0149 ,  B81C2201/0191 ,  Y10T428/24612 ,  Y10T428/24802

    Abstract: Nano structure patterning formation includes coating a part of a structural guide with a hydrophobic polymer, positioning the structural guide on a substrate, coating at least a part of the substrate with a film made of a block copolymer, and annealing the film made of the block copolymer to align the block copolymer.

    Abstract translation: 纳米结构图案形成包括用疏水聚合物涂覆结构导向器的一部分，将结构引导件定位在基底上，用由嵌段共聚物制成的膜涂覆至少一部分基底，并且将由该块制成的膜退火 共聚物以对齐嵌段共聚物。

    METHODS OF FORMING A PATTERN
    56.
    发明申请
    METHODS OF FORMING A PATTERN 审中-公开
    形成图案的方法

    公开(公告)号：US20130288482A1

    公开(公告)日：2013-10-31

    申请号：US13630270

    申请日：2012-09-28

    Applicant: SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Jae-Woo Nam ,  Kyoung-Seon Kim ,  Eun-Sung Kim ,  Chul-Ho Shin ,  Shi-Yong Yi

    IPC: H01L21/31

    CPC classification number: H01L21/0273 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0198 ,  H01L21/0337 ,  H01L21/31144 ,  H01L21/32139

    Abstract: In a method of forming a pattern, a photoresist pattern is formed on a substrate including an etching target layer. A surface treatment is performed on the photoresist pattern to form a guide pattern having a higher heat-resistance than the photoresist pattern. A material layer including a block copolymer including at least two polymer blocks is coated on a portion of the substrate exposed by the guide pattern. A micro-phase separation is performed on the material layer to form a minute pattern layer including different polymer blocks arranged alternately. At least one polymer block is removed from the minute pattern layer to form a minute pattern mask. The etching target layer is etched by using the minute pattern mask to form a pattern. Minute patterns may be formed utilizing a less complex process that those employed during conventional processes of forming a minute pattern.

    Abstract translation: 在形成图案的方法中，在包括蚀刻目标层的基板上形成光致抗蚀剂图案。 在光致抗蚀剂图案上进行表面处理以形成具有比光致抗蚀剂图案更高的耐热性的引导图案。 包含至少两个聚合物嵌段的嵌段共聚物的材料层被涂覆在由引导图案暴露的基板的一部分上。 在材料层上进行微相分离以形成包括交替布置的不同聚合物嵌段的微小图案层。 从微图案层去除至少一个聚合物嵌段以形成微小图案掩模。 通过使用微图案掩模蚀刻蚀刻目标层以形成图案。 可以使用在形成微小图案的常规工艺中使用的较不复杂的工艺来形成分数图案。

    Method of producing nanopatterned articles using surface-reconstructed block copolymer films
    59.
    发明授权
    Method of producing nanopatterned articles using surface-reconstructed block copolymer films 有权
    使用表面重构的嵌段共聚物膜制备纳米图案制品的方法

    公开(公告)号：US08518837B2

    公开(公告)日：2013-08-27

    申请号：US12566705

    申请日：2009-09-25

    Applicant: Thomas P. Russell ,  Soojin Park ,  Jia-Yu Wang ,  Bokyung Kim

    Inventor： Thomas P. Russell ,  Soojin Park ,  Jia-Yu Wang ,  Bokyung Kim

    IPC: H01L21/31

    CPC classification number: B32B3/10 ,  B32B5/16 ,  B32B2264/105 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  Y10T428/12049 ,  Y10T428/24355

    Abstract: Nanopatterned surfaces are prepared by a method that includes forming a block copolymer film on a substrate, annealing and surface reconstructing the block copolymer film to create an array of cylindrical voids, depositing a metal on the surface-reconstructed block copolymer film, and heating the metal-coated block copolymer film to redistribute at least some of the metal into the cylindrical voids. When very thin metal layers and low heating temperatures are used, metal nanodots can be formed. When thicker metal layers and higher heating temperatures are used, the resulting metal structure includes nanoring-shaped voids. The nanopatterned surfaces can be transferred to the underlying substrates via etching, or used to prepare nanodot- or nanoring-decorated substrate surfaces.

    Abstract translation: 纳米图案化表面通过包括在基材上形成嵌段共聚物膜，退火和表面重构嵌段共聚物膜以形成圆柱形空隙的阵列，在表面重构的嵌段共聚物膜上沉积金属和加热金属的方法制备 涂覆的嵌段共聚物膜将至少一些金属重新分布到圆柱形空隙中。 当使用非常薄的金属层和低加热温度时，可以形成金属纳米点。 当使用较厚的金属层和较高的加热温度时，所得到的金属结构包括纳米形空隙。 纳米图案的表面可以通过蚀刻转移到下面的基底，或用于制备纳米点或纳米装饰的基底表面。

    Methods for the preparation of coil-comb block copolymers and their nanostructures
    60.
    发明授权
    Methods for the preparation of coil-comb block copolymers and their nanostructures 失效
    线圈梳状嵌段共聚物及其纳米结构的制备方法

    公开(公告)号：US08518497B2

    公开(公告)日：2013-08-27

    申请号：US12662313

    申请日：2010-04-09

    Applicant: Sang Youl Kim ,  Myungeun Seo

    Inventor： Sang Youl Kim ,  Myungeun Seo

    IPC: B05D3/02 ,  B05D3/06

    CPC classification number: C08F293/005 ,  B81B2203/0361 ,  B81C1/00031 ,  B81C2201/0149 ,  C08F2438/01 ,  C08F2438/03 ,  C08J5/18 ,  C08J7/12 ,  C08J2351/00

    Abstract: Provided is the preparation of a coil-comb block copolymer and a method for producing nanostructures formed by the copolymer. Particularly, provided is a method for producing nanostructured polymer thin films, including: preparing a coil-comb block copolymer via a controlled polymer polymerization process; forming a thin film of the block copolymer on a substrate and carrying out heat treatment to form nanostructures including vertically aligned cylindrical microstructures; and irradiating ultraviolet rays to the thin film and carrying out oxygen plasma treatment to form nanostructured polymer thin films including cylindrical pores.

    Abstract translation: 提供卷曲梳状嵌段共聚物的制备和由共聚物形成的纳米结构体的制造方法。 特别是提供一种生产纳米结构聚合物薄膜的方法，包括：通过受控的聚合物聚合方法制备卷曲梳状嵌段共聚物; 在基材上形成嵌段共聚物的薄膜并进行热处理以形成包括垂直排列的圆柱形微结构的纳米结构; 并向该薄膜照射紫外线并进行氧等离子体处理以形成包括圆柱形孔的纳米结构聚合物薄膜。

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