Inspection device
    56.
    发明授权
    Inspection device 有权
    检查装置

    公开(公告)号:US09568437B2

    公开(公告)日:2017-02-14

    申请号:US14895618

    申请日:2014-05-19

    Abstract: An inspection device is required to detect a minute defect, that is, to have high sensitivity as semiconductor devices become finer. There are some approaches for improving the sensitivity. One is to shorten the wavelength of illuminating light radiated onto a sample. This is because, assuming that the wavelength of the illuminating light is λ, I∝λ−4 is established between the magnitude of scattered light is I and λ. Another approach is to use illuminating light including multiple wavelengths. An approach for taking in more scattered light generated from the sample is also possible. However, an optical system suitable for these approaches has not been sufficiently found in conventional techniques. One feature of the present invention is to detect a defect by using a Wolter optical system including a Wolter mirror.

    Abstract translation: 需要检查装置来检测微小缺陷,即,随着半导体器件变得更细,具有高灵敏度。 有一些提高灵敏度的方法。 一个是缩短辐射到样品上的照明光的波长。 这是因为,假设照明光的波长为λ,则在散射光的大小为I和λ之间建立Iαλ-4。 另一种方法是使用包括多个波长的照明光。 采用从样品产生的更多散射光的方法也是可能的。 然而,适用于这些方法的光学系统在常规技术中尚未充分发现。 本发明的一个特征是通过使用包括Wolter反射镜的Wolter光学系统来检测缺陷。

    Measuring apparatus, measuring method, and parameter setting method
    57.
    发明授权
    Measuring apparatus, measuring method, and parameter setting method 有权
    测量装置,测量方法和参数设定方法

    公开(公告)号:US09566005B2

    公开(公告)日:2017-02-14

    申请号:US14356020

    申请日:2012-09-10

    CPC classification number: A61B5/0075 A61B5/0079 G01N21/474 G01N2021/4761

    Abstract: There is provided a measuring apparatus, including a light receiving element, provided at a position facing a measurement object region on which is placed a measurement object, which forms an image with light from the measurement object region, light emitting elements, arranged surrounding the light receiving element, which emit light for measuring the measurement object, and reflective optical elements, provided above the light emitting elements, which guide, to the measurement object region, emission light radiated from the light emitting elements. A light receiving surface of the light receiving element and light emission surfaces of the light emitting elements are positioned mutually on a same plane. The emission light radiated from the light emitting elements is reflected by the reflective optical elements, and center lines of the emission light radiated from each of the light emitting elements pass through an approximate center of the measurement object region.

    Abstract translation: 提供了一种测量装置,包括:光接收元件,设置在面向测量对象区域的位置,测量对象区域上放置有测量对象的光,其与来自测量对象区域的光形成图像;发光元件,布置在光周围 发射用于测量测量对象的光的接收元件和设置在发光元件上方的反射光学元件,其将从发光元件辐射的发射光引导到测量对象区域。 光接收元件的光接收表面和发光元件的发光表面相互位于同一平面上。 从发光元件照射的发射光被反射光学元件反射,从每个发光元件辐射的发射光的中心线通过测量对象区域的大致中心。

    UV/Vis HPLC photometer
    58.
    发明授权
    UV/Vis HPLC photometer 有权
    UV / Vis HPLC光度计

    公开(公告)号:US09541532B2

    公开(公告)日:2017-01-10

    申请号:US14466088

    申请日:2014-08-22

    Inventor: Günes Barka

    Abstract: An ultraviolet-visible spectrophotometry (UV/Vis) high-performance liquid chromatography (HPLC) photometer includes a nano flow cell in which a light source feeds a reference light channel and a sample light channel, a reference photodiode for evaluating the reference light channel, and a sample photodiode for evaluating the sample light channel, which extends through the nano flow cell. To create a photometer whose signal evaluation is improved, respective effective exposure times of the sample photodiode and the reference photodiode are settable separately from one another.

    Abstract translation: 紫外可见分光光度法(UV / Vis)高效液相色谱(HPLC)光度计包括其中光源馈送参考光通道和样品光通道的纳米流动池,用于评估参考光通道的参考光电二极管, 以及用于评估延伸穿过纳米流动池的样品光通道的样品光电二极管。 为了创建其信号评估提高的光度计,样品光电二极管和参考光电二极管的相应有效曝光时间可以彼此分开地设置。

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