Abstract:
A method for modifying a polymeric coating on an implantable medical device, such as a stent, is disclosed. The method includes application of a fluid to a wet or dry polymeric coating with and without drugs.
Abstract:
A method and a device for decorating objects made of a material such as glass or metal, which includes coating at least part of the surface of the objects with a substance adapted to form patterns during polymerization. The method also includes drying and dusting the objects by blowing; conditioning the objects so as to place them in specific physical conditions, for a certain time interval; applying, on the surface of each of the objects, the polymerizable substance; and placing the objects in an environment suitable for their polymerization by drying while forming the desired patterns.
Abstract:
There is disclosed a process of priming a surface (preferably part of a vehicle) comprising; i) applying a UV radiation curable primer to the area to be primed; ii) curing the primer with UV radiation provided by one or more UV lamps having a UV-B:UV-A ratio of 1:1 or less and substantially no UV-C content, the UV radiation curable primer containing: A. 0-84% by weight of one or more compounds containing one ethylenically unsaturated free-radically polymerisable group per molecule; B. 5-50% by weight of one or more compounds containing two or more ethylenically unsaturated free radically polymerisable groups per molecule; C. 10-70% by weight of one or more pigments, fillers and/or dyes; D. 1-8% by weight of one or more photoinitiators; E. 0-20% by weight of volatile organic solvent and; F. 0-15% by weight of customary additives. Preferably the process also includes sanding the primer and topcoating the primer with one or more topcoats. There is also disclosed a surface whenever treated in a process of the invention.
Abstract translation:公开了一种起动表面(优选车辆的一部分)的方法,包括: i)将紫外线辐射固化底漆施用于待引发区域; ii)用UV-B:UV-A比为1:1或更低且基本上不含UV-C含量的一种或多种UV灯提供的UV辐照固化底漆,所述UV辐射固化底漆包含:A.O- 84重量%的一种或多种每分子含有一个烯属不饱和可自由基聚合基团的化合物; B. 5-50重量%的一种或多种每分子含有两个或更多个烯属不饱和自由基可聚合基团的化合物; C. 10-70重量%的一种或多种颜料,填料和/或染料; D.1- 1-8重量%的一种或多种光引发剂; E. 0-20重量%的挥发性有机溶剂和; F. 0-15%重量的常规添加剂。 优选地,该方法还包括对底漆进行砂磨和用一种或多种面漆涂底漆。 当在本发明的方法中进行处理时,还公开了一种表面。
Abstract:
A method for making synthetic leather includes the steps of: preparing a knitted substrate having a longitudinal direction and a transverse direction transverse to the longitudinal direction, the knitted substrate being stretchable in the longitudinal and transverse directions; positioning two opposite sides of the knitted substrate along the longitudinal direction respectively on two conveyer chains and advancing the knitted substrate without tensioning the substrate along the longitudinal direction; and forming a coating on the knitted substrate by applying a polyurethane solution on the knitted substrate.
Abstract:
A patterned coating on a prosthesis, for example a stent, and a method for forming the coating are disclosed. Additionally, an apparatus for forming the patterned coating is disclosed.
Abstract:
The present invention relates to a process for producing a porous layer adhering to a substrate, which comprises the steps: a. preparation of a composition comprising an organic polymer constituent and an inorganic-organic constituent and/or an inorganic constituent, b. application of this composition to a substrate and formation of a layer on the substrate, and c. removal of the inorganic-organic constituent and/or the inorganic constituent from the layer to form a porous layer adhering to the substrate.
Abstract:
Describes durable coating compositions and a process for the preparation of durable, broad-band antireflective coatings on organic polymeric host materials and photochromic organic polymeric host materials. The coating compositions consist essentially of a silane monomer mixture comprising glycidoxyalkylalkoxysilane and alkylalkoxysilane(s) with or without tetraalkoxysilanes; water-soluble organic polymer; a leveling amount of nonionic surfactant; a solvating amount of lower aliphatic alcohol; a catalytic amount of water-soluble acid; and water. The coating compositions may optionally contain fluorinated silane(s). Also describes a process for preparing antireflective coatings comprising the steps of coating a polymeric host material with the durable coating composition; curing the coating; treating the cured coating with an aqueous acidic solution to produce a graded refractive index; removing residual acid; and further curing the coating.
Abstract:
A method of processing a substrate for removing a coating film from a substrate by dissolving the coating film with a solvent, comprising the steps of (a) supplying a solvent independently to each of peripheral portions of an upper surface side and a lower surface side of the substrate, and (b) supplying the solvent to the peripheral portion of the lower surface side of the substrate in an amount lower than the solvent supplied to the peripheral portion of the lower surface side in the step (a) or lower than that supplied to the peripheral portion of the upper surface side in this step (b), or terminating a supply of the solvent.
Abstract:
A robust, nontoxic, antifouling coating and bulk material and process for king the same are disclosed. The antifouling coating comprises a basecoat formed typically from a polyol and a poiyiisocyanate wherein a molar excess of poiyiisocyanate is typically used. A topcoat is formed on the basecoat by reacting the basecoat with aliphatic branched or unbranched mono-alcohol or polyol.
Abstract:
A method for dispensing a chemical, such as an edge bead removal solvent, onto a semiconductor wafer comprising the steps of dispensing the chemical selectively onto the wafer and applying a suction to the area immediately surrounding the location at which the chemical is dispensed onto the wafer. Preferably, the suction is applied simultaneously with the dispensing of the chemical. One specific version of the invention provides an edge bead removal system wherein suction is applied to the area immediately surrounding the solvent dispensing nozzle to remove dissolved coating material and excess solvent from the wafer. In one aspect of this system, an apparatus for removing the edge bead includes a mechanism for dispensing a solvent selectively onto the edge of the wafer, and a mechanism surrounding the dispensing mechanism for vacuuming excess solvent and dissolved coating material from the edge of the wafer. The edge bead removal apparatus preferably also includes mechanisms for spinning the semiconductor wafer and coating material on the spinning wafer. Another aspect of the system provides a method for removing an edge bead of a coating of material that has been spun onto the surface of a semiconductor wafer. The method includes the steps of dispensing a solvent selectively onto the edge of the wafer to dissolve the coating material at the extreme edge of the wafer, and applying a suction to vacuum excess solvent and dissolved coating material from the wafer.