Method for decorating objects and device therefor
    62.
    发明授权
    Method for decorating objects and device therefor 失效
    用于装饰物体的方法及其装置

    公开(公告)号:US06928747B2

    公开(公告)日:2005-08-16

    申请号:US10496044

    申请日:2002-11-27

    Applicant: Fabien Lecart

    Inventor: Fabien Lecart

    Abstract: A method and a device for decorating objects made of a material such as glass or metal, which includes coating at least part of the surface of the objects with a substance adapted to form patterns during polymerization. The method also includes drying and dusting the objects by blowing; conditioning the objects so as to place them in specific physical conditions, for a certain time interval; applying, on the surface of each of the objects, the polymerizable substance; and placing the objects in an environment suitable for their polymerization by drying while forming the desired patterns.

    Abstract translation: 一种用于装饰由诸如玻璃或金属的材料制成的物体的方法和装置,其包括用适于在聚合过程中形成图案的物质涂覆物体的至少一部分表面。 该方法还包括通过吹吹干燥和除尘物体; 调节物体,使其处于特定的物理条件下一段时间间隔; 在每个物体的表面上施加可聚合物质; 并且通过在形成所需图案的同时通过干燥将物体放置在适于聚合的环境中。

    Process for priming a surface and article
    63.
    发明授权
    Process for priming a surface and article 有权
    灌注表面和制品的方法

    公开(公告)号:US06838177B2

    公开(公告)日:2005-01-04

    申请号:US10239604

    申请日:2001-02-27

    Abstract: There is disclosed a process of priming a surface (preferably part of a vehicle) comprising; i) applying a UV radiation curable primer to the area to be primed; ii) curing the primer with UV radiation provided by one or more UV lamps having a UV-B:UV-A ratio of 1:1 or less and substantially no UV-C content, the UV radiation curable primer containing: A. 0-84% by weight of one or more compounds containing one ethylenically unsaturated free-radically polymerisable group per molecule; B. 5-50% by weight of one or more compounds containing two or more ethylenically unsaturated free radically polymerisable groups per molecule; C. 10-70% by weight of one or more pigments, fillers and/or dyes; D. 1-8% by weight of one or more photoinitiators; E. 0-20% by weight of volatile organic solvent and; F. 0-15% by weight of customary additives. Preferably the process also includes sanding the primer and topcoating the primer with one or more topcoats. There is also disclosed a surface whenever treated in a process of the invention.

    Abstract translation: 公开了一种起动表面(优选车辆的一部分)的方法,包括: i)将紫外线辐射固化底漆施用于待引发区域; ii)用UV-B:UV-A比为1:1或更低且基本上不含UV-C含量的一种或多种UV灯提供的UV辐照固化底漆,所述UV辐射固化底漆包含:A.O- 84重量%的一种或多种每分子含有一个烯属不饱和可自由基聚合基团的化合物; B. 5-50重量%的一种或多种每分子含有两个或更多个烯属不饱和自由基可聚合基团的化合物; C. 10-70重量%的一种或多种颜料,填料和/或染料; D.1- 1-8重量%的一种或多种光引发剂; E. 0-20重量%的挥发性有机溶剂和; F. 0-15%重量的常规添加剂。 优选地,该方法还包括对底漆进行砂磨和用一种或多种面漆涂底漆。 当在本发明的方法中进行处理时,还公开了一种表面。

    Method for making synthetic leather

    公开(公告)号:US06773752B2

    公开(公告)日:2004-08-10

    申请号:US10283583

    申请日:2002-10-30

    Applicant: Hsi-Chin Lo

    Inventor: Hsi-Chin Lo

    CPC classification number: D06N3/0086 B05D3/107 B05D5/061 D06N3/0009 D06N3/14

    Abstract: A method for making synthetic leather includes the steps of: preparing a knitted substrate having a longitudinal direction and a transverse direction transverse to the longitudinal direction, the knitted substrate being stretchable in the longitudinal and transverse directions; positioning two opposite sides of the knitted substrate along the longitudinal direction respectively on two conveyer chains and advancing the knitted substrate without tensioning the substrate along the longitudinal direction; and forming a coating on the knitted substrate by applying a polyurethane solution on the knitted substrate.

    Method for producing a porous coating
    66.
    发明申请
    Method for producing a porous coating 有权
    多孔涂层的制造方法

    公开(公告)号:US20020132061A1

    公开(公告)日:2002-09-19

    申请号:US10098845

    申请日:2002-03-14

    Inventor: Recai Sezi

    Abstract: The present invention relates to a process for producing a porous layer adhering to a substrate, which comprises the steps: a. preparation of a composition comprising an organic polymer constituent and an inorganic-organic constituent and/or an inorganic constituent, b. application of this composition to a substrate and formation of a layer on the substrate, and c. removal of the inorganic-organic constituent and/or the inorganic constituent from the layer to form a porous layer adhering to the substrate.

    Abstract translation: 本发明涉及一种生产附着在基底上的多孔层的方法,该方法包括以下步骤:a。 制备包含有机聚合物成分和无机 - 有机成分和/或无机成分的组合物,b。 将该组合物施用于基材和在基材上形成层,以及c。 从层中除去无机 - 有机组分和/或无机组分以形成粘附到衬底的多孔层。

    Durable coating composition, process for producing durable, antireflective coatings, and coated articles
    67.
    发明申请
    Durable coating composition, process for producing durable, antireflective coatings, and coated articles 审中-公开
    耐用涂料组合物,生产耐用,抗反射涂料和涂层制品的方法

    公开(公告)号:US20010031811A1

    公开(公告)日:2001-10-18

    申请号:US09795619

    申请日:2001-02-28

    Abstract: Describes durable coating compositions and a process for the preparation of durable, broad-band antireflective coatings on organic polymeric host materials and photochromic organic polymeric host materials. The coating compositions consist essentially of a silane monomer mixture comprising glycidoxyalkylalkoxysilane and alkylalkoxysilane(s) with or without tetraalkoxysilanes; water-soluble organic polymer; a leveling amount of nonionic surfactant; a solvating amount of lower aliphatic alcohol; a catalytic amount of water-soluble acid; and water. The coating compositions may optionally contain fluorinated silane(s). Also describes a process for preparing antireflective coatings comprising the steps of coating a polymeric host material with the durable coating composition; curing the coating; treating the cured coating with an aqueous acidic solution to produce a graded refractive index; removing residual acid; and further curing the coating.

    Abstract translation: 描述耐久涂料组合物和在有机聚合物主体材料和光致变色有机聚合物主体材料上制备耐用的宽带抗反射涂层的方法。 涂料组合物基本上由含有或不具有四烷氧基硅烷的缩水甘油氧基烷基烷氧基硅烷和烷基烷氧基硅烷的硅烷单体混合物组成; 水溶性有机聚合物; 平衡量的非离子表面活性剂; 溶剂化的低级脂族醇; 催化量的水溶性酸; 和水。 涂料组合物可任选地含有氟化硅烷。 还描述了制备抗反射涂层的方法,包括以下步骤:用耐久涂料组合物涂覆聚合物主体材料; 固化涂层; 用酸性水溶液处理固化的涂层以产生渐变折射率; 去除残留酸; 并进一步固化涂层。

    Method and apparatus for processing substrate
    68.
    发明授权
    Method and apparatus for processing substrate 有权
    处理基板的方法和装置

    公开(公告)号:US06238511B1

    公开(公告)日:2001-05-29

    申请号:US09140327

    申请日:1998-08-26

    Abstract: A method of processing a substrate for removing a coating film from a substrate by dissolving the coating film with a solvent, comprising the steps of (a) supplying a solvent independently to each of peripheral portions of an upper surface side and a lower surface side of the substrate, and (b) supplying the solvent to the peripheral portion of the lower surface side of the substrate in an amount lower than the solvent supplied to the peripheral portion of the lower surface side in the step (a) or lower than that supplied to the peripheral portion of the upper surface side in this step (b), or terminating a supply of the solvent.

    Abstract translation: 一种通过用溶剂溶解涂膜来处理从基板除去涂膜的基板的方法,该方法包括以下步骤:(a)独立地向溶液的上表面侧和下表面侧的周边部分供给溶剂 所述基板,和(b)在所述工序(a)中将所述溶剂供给到所述基板的下表面侧的周边部分的量低于供给到所述下表面侧的周边部分的溶剂,或低于供给的 在该步骤(b)中的上表面侧的周边部分,或者终止溶剂的供给。

    Chemical dispensing system for semiconductor wafer processing
    70.
    发明授权
    Chemical dispensing system for semiconductor wafer processing 失效
    化学分配系统用于半导体晶圆加工

    公开(公告)号:US5952050A

    公开(公告)日:1999-09-14

    申请号:US944135

    申请日:1997-10-06

    Applicant: Trung T. Doan

    Inventor: Trung T. Doan

    Abstract: A method for dispensing a chemical, such as an edge bead removal solvent, onto a semiconductor wafer comprising the steps of dispensing the chemical selectively onto the wafer and applying a suction to the area immediately surrounding the location at which the chemical is dispensed onto the wafer. Preferably, the suction is applied simultaneously with the dispensing of the chemical. One specific version of the invention provides an edge bead removal system wherein suction is applied to the area immediately surrounding the solvent dispensing nozzle to remove dissolved coating material and excess solvent from the wafer. In one aspect of this system, an apparatus for removing the edge bead includes a mechanism for dispensing a solvent selectively onto the edge of the wafer, and a mechanism surrounding the dispensing mechanism for vacuuming excess solvent and dissolved coating material from the edge of the wafer. The edge bead removal apparatus preferably also includes mechanisms for spinning the semiconductor wafer and coating material on the spinning wafer. Another aspect of the system provides a method for removing an edge bead of a coating of material that has been spun onto the surface of a semiconductor wafer. The method includes the steps of dispensing a solvent selectively onto the edge of the wafer to dissolve the coating material at the extreme edge of the wafer, and applying a suction to vacuum excess solvent and dissolved coating material from the wafer.

    Abstract translation: 一种用于将化学品(例如边缘珠去除溶剂)分配到半导体晶片上的方法,包括以下步骤:将化学品选择性地分配到晶片上并且将吸力施加到紧邻化学品被分配到晶片上的位置周围的区域 。 优选地,抽吸与化学品的分配同时施加。 本发明的一个特定形式提供了边缘珠粒去除系统,其中将吸力施加到紧邻溶剂分配喷嘴的区域以从晶片去除溶解的涂层材料和多余的溶剂。 在该系统的一个方面,用于去除边缘珠的装置包括用于将溶剂选择性地分配到晶片边缘的机构,以及围绕分配机构的机构,用于从晶片的边缘抽真空多余的溶剂和溶解的涂层材料 。 边缘珠去除装置优选地还包括用于在旋转晶片上旋转半导体晶片和涂层材料的机构。 该系统的另一方面提供了一种用于去除已经旋转到半导体晶片的表面上的材料涂层的边缘珠的方法。 该方法包括以下步骤:将溶剂选择性地分配到晶片的边缘上,以将涂层材料溶解在晶片的最外边缘,并且从晶片上抽吸过量的溶剂和溶解的涂料。

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