公开(公告)号：US20100179047A1

公开(公告)日：2010-07-15

申请号：US12718776

申请日：2010-03-05

Applicant: Akio KOIKE ,  Chikaya Tamitsuji ,  Kunio Watanabe ,  Tomonori Ogawa

Inventor： Akio KOIKE ,  Chikaya Tamitsuji ,  Kunio Watanabe ,  Tomonori Ogawa

IPC: C03C3/06 ,  C03C10/00

CPC classification number: C03C3/06 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1461 ,  C03B25/02 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/42 ,  C03B2207/36 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/54

Abstract: The present invention relates to an optical member including a TiO2-containing silica glass having: a TiO2 concentration of from 3 to 10% by mass; a Ti3+ concentration of 100 wt ppm or less; a thermal expansion coefficient at from 0 to 100° C., CTE0-100, of 0±150 ppb/° C.; and an internal transmittance in the wavelength range of 400 to 700 nm per a thickness of 1 mm, T400-700, of 80% or more, in which the optical member has a ratio of variation of Ti3+ concentration to an average value of the Ti3+ concentration, ΔTi3+/Ti3+, on an optical use surface, is 0.2 or less.

Abstract translation: 本发明涉及一种含有TiO2含量为3〜10质量％的含TiO 2的二氧化硅玻璃的光学构件， Ti3 +浓度为100重量ppm以下; 0-100℃的热膨胀系数，CTE0-100，为0±150ppb /℃。 并且在400〜700nm的波长范围内的内部透射率，每1mm厚度，T400〜700，为80％以上，其中光学部件具有Ti 3+浓度的变化比与Ti 3+的平均值的比值， 在光学用表面上的浓度＆Dgr; Ti 3+ / Ti 3+为0.2以下。

公开(公告)号：US20100091360A1

公开(公告)日：2010-04-15

申请号：US12449790

申请日：2008-02-20

Applicant: Bodo Kuehn ,  Stefan Ochs ,  Juergen Weber

Inventor： Bodo Kuehn ,  Stefan Ochs ,  Juergen Weber

IPC: G02B13/14 ,  C03C17/00 ,  G02B1/02

CPC classification number: C03B19/1453 ,  C03B2201/075 ,  C03B2201/10 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/24 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/40 ,  C03C3/06 ,  C03C2201/10 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/32 ,  C03C2201/3411 ,  C03C2201/3441 ,  C03C2201/40 ,  G03F7/70958

Abstract: To provide an optical component of quartz glass for use in a projection objective for immersion lithography at an operating wavelength below 250 nm, which component is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should contain hydroxyl groups in the range of from 1 wtppm to 60 wtppm and chemically bound nitrogen, and that the mean hydrogen content of the quartz glass should be in the range of 5×1015 molecules/cm to 1×1017 molecules/cm3.

Abstract translation: 为了提供石英玻璃的光学部件，用于在250nm以下的工作波长下用于浸没式光刻的投影物镜，该成分被优化用于线偏振UV激光辐射，特别是关于由各向异性密度变化引起的压实和双折射 根据本发明，建议石英玻璃应含有1〜60重量ppm的羟基和化学键合的氮，石英玻璃的平均氢含量应在5×1015的范围内 分子/ cm至1×1017分子/ cm 3。

公开(公告)号：US07635658B2

公开(公告)日：2009-12-22

申请号：US11583619

申请日：2006-10-19

Applicant: Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Ulrich Wilhelm Heinz Neukirch

Inventor： Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Ulrich Wilhelm Heinz Neukirch

IPC: C03C3/06 ,  C03C15/00 ,  C03B19/06 ,  C03B37/00 ,  C03B37/014

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B19/12 ,  C03B19/14 ,  C03B19/1453 ,  C03B20/00 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/08 ,  C03B2201/12 ,  C03B2201/22 ,  C03B2201/23 ,  C03B2201/32 ,  C03B2201/42 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/22 ,  C03C2201/23

Abstract: What is disclosed includes OD-doped synthetic silica glass capable of being used in optical elements for use in lithography below about 300 nm. OD-doped synthetic silica glass was found to have significantly lower polarization-induced birefringence value than non-OD-doped silica glass with comparable concentration of OH. Also disclosed are processes for making OD-doped synthetic silica glasses, optical member comprising such glasses, and lithographic systems comprising such optical member. The glass is particularly suitable for immersion lithographic systems due to the exceptionally low polarization-induced birefringence values at about 193 nm.

Abstract translation: 公开的内容包括能够用于低于约300nm的光刻中的光学元件的OD掺杂合成石英玻璃。 发现OD掺杂的合成二氧化硅玻璃具有比具有相当浓度的OH的非OD掺杂的石英玻璃具有显着更低的偏振诱导双折射值。 还公开了制造掺杂OD的合成二氧化硅玻璃，包含这种玻璃的光学构件以及包括这种光学构件的光刻系统的方法。 由于在约193nm处极度低的偏振诱发双折射值，该玻璃特别适用于浸没式光刻系统。

公开(公告)号：US07589039B2

公开(公告)日：2009-09-15

申请号：US11241075

申请日：2005-09-30

Applicant: Douglas Clippinger Allan ,  Dana Craig Bookbinder ,  Ulrich W H Neukirch ,  Charlene Marie Smith

Inventor： Douglas Clippinger Allan ,  Dana Craig Bookbinder ,  Ulrich W H Neukirch ,  Charlene Marie Smith

IPC: C03C3/06 ,  C03B19/00

CPC classification number: C03B19/1453 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C2201/23 ,  C03C2203/54

Abstract: Disclosed are synthetic silica glass having a low polarization-induced birefringence, process for making the glass and lithography system comprising optical element made of the glass. The silica glass has a polarization-induced birefringence measured at 633 nm of less than about 0.1 nm/cm when subjected to excimer laser pulses at about 193 nm having a fluence of about 40 μJ·cm−2·pulse−1 and a pulse length of about 25 ns for 5×109 pulses.

Abstract translation: 公开了具有低偏振诱发双折射的合成石英玻璃，用于制造玻璃的方法和包含由玻璃制成的光学元件的光刻系统。 当经受约193nm的准分子激光脉冲时，石英玻璃在633nm处测量的偏振诱发双折射小于约0.1nm / cm，具有约40μJ·cm -2脉冲-1的注量和脉冲长度 对于5x109个脉冲，约25ns。

公开(公告)号：US20090098370A1

公开(公告)日：2009-04-16

申请号：US12249616

申请日：2008-10-10

Applicant: Tatsuhiro Sato ,  Nobumasa Yoshida

Inventor： Tatsuhiro Sato ,  Nobumasa Yoshida

IPC: B32B17/06 ,  C03C15/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03C4/02 ,  C03C4/082 ,  C03C23/008 ,  C03C2201/02 ,  C03C2201/26 ,  C03C2203/54 ,  Y10T428/261

Abstract: To provide a black synthetic quartz glass with a transparent layer, which has high emissivity in the far infrared region, has excellent light-shielding properties, maintains the same degree of purity as synthetic quartz glass in terms of metal impurities, has high-temperature viscosity characteristics comparable to natural quartz glass, can undergo high-temperature processing like welding, and does not release carbon from its surface; together with a method for the production thereof.A porous silica glass body containing hydroxyl groups is subjected to a gas phase reaction in a volatile organosilicon compound atmosphere at a temperature between 100° C. and 1200° C. and, following the reaction, evacuation is commenced and, on reaching a degree of vacuum exceeding 10 mmHg (1343 Pa), heating is carried out at a temperature between 1200° C. and 2000° C. to produce a compact glass body.

Abstract translation: 为了提供具有透明层的黑色合成石英玻璃，其在远红外区域具有高发射率，具有优异的遮光性能，在金属杂质方面保持与合成石英玻璃相同的纯度，具有高温粘度 与天然石英玻璃相当的特性，可进行焊接等高温加工，不会从表面释放碳; 以及其生产方法。 含有羟基的多孔二氧化硅玻璃体在100℃〜1200℃的温度下在挥发性有机硅化合物气氛中进行气相反应，反应开始后，达到一定程度的 真空度超过10mmHg（1343Pa），在1200℃〜2000℃的温度下进行加热，生成紧凑的玻璃体。

公开(公告)号：US07514382B2

公开(公告)日：2009-04-07

申请号：US11398669

申请日：2006-04-06

Applicant: Yoshiaki Ikuta ,  Noriyuki Agata

Inventor： Yoshiaki Ikuta ,  Noriyuki Agata

IPC: C03C3/06 ,  C03B20/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  Y02P40/57

Abstract: A synthetic quartz glass for an optical member which is free from compaction and rarefaction is obtained. A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a light source, which contains substantially no oxygen excess defects, dissolved oxygen molecules nor reduction type defects, which has a chlorine concentration of at most 50 ppm and a OH group concentration of at most 100 ppm, and which contains oxygen deficient defects within a concentration range of at most 5×1014 defects/cm3 and at least 1×1013 defects/cm3. The fluorine concentration is preferably at most 100 ppm.

Abstract translation: 得到不含压实和稀释的用于光学构件的合成石英玻璃。 用于光学元件的合成石英玻璃，其用于使用波长最多为400nm且至少170nm的光作为光源的光学元件，其基本上不含氧过剩缺陷，溶解氧分子或还原型 其浓度最多为50ppm，OH基浓度为100ppm以下，含有缺氧缺陷量为5×1014个/ cm 3以下且至少1×10 13个缺陷/ cm 3以下的缺陷缺陷。 氟浓度优选为100ppm以下。

公开(公告)号：US07506521B2

公开(公告)日：2009-03-24

申请号：US11148504

申请日：2005-06-08

Applicant: Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Lisa Anne Moore ,  Susan Lee Schiefelbein

Inventor： Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Lisa Anne Moore ,  Susan Lee Schiefelbein

IPC: C03B20/00 ,  C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/54 ,  G03F7/70958

Abstract: Disclosed are high purity synthetic silica material having an internal transmission at 193 nm of at least 99.65%/cm and method of preparing such material. The material is also featured by a high compositional homogeneity in a plane transverse to the intended optical axis. The soot-to-glass process for making the material includes a step of consolidating the soot preform in the presence of H2O and/or O2.

Abstract translation: 公开了具有193nm以上的内透射率为至少99.65％/ cm 3的高纯度合成二氧化硅材料及其制备方法。 该材料的特征还在于横向于预期光轴的平面中具有高的组成均匀性。 用于制造该材料的烟灰 - 玻璃工艺包括在H 2 O和/或O 2存在下固化烟灰预制件的步骤。

公开(公告)号：US07469559B2

公开(公告)日：2008-12-30

申请号：US11004027

申请日：2004-12-02

Applicant: Laura J Ball ,  Bruno P M Baney ,  Dana C Bookbinder ,  Keith L House ,  Rostislav R Khrapko ,  Susan L Schiefelbein ,  Lisa A Moore

Inventor： Laura J Ball ,  Bruno P M Baney ,  Dana C Bookbinder ,  Keith L House ,  Rostislav R Khrapko ,  Susan L Schiefelbein ,  Lisa A Moore

IPC: C03C13/04

CPC classification number: C03C3/06 ,  C03B37/01211 ,  C03B37/01228 ,  C03B37/01426 ,  C03B37/01807 ,  C03B37/01861 ,  C03B37/01892 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/50 ,  C03B2201/54 ,  C03B2203/26 ,  C03B2207/30 ,  C03B2207/90 ,  C03C25/602 ,  C03C25/607 ,  C03C25/68 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/50 ,  C03C2203/50 ,  G02B6/02

Abstract: A method of forming an alkali metal oxide-doped optical fiber by diffusing an alkali metal into a surface of a glass article is disclosed. The silica glass article may be in the form of a tube or a rod, or a collection of tubes or rods. The silica glass article containing the alkali metal, and impurities that may have been unintentionally diffused into the glass article, is etched to a depth sufficient to remove the impurities. The silica glass article may be further processed to form a complete optical fiber preform. The preform, when drawn into an optical fiber, exhibits a low attenuation.

Abstract translation: 公开了一种通过将碱金属扩散到玻璃制品的表面中形成掺杂碱金属氧化物的光纤的方法。 石英玻璃制品可以是管或棒的形式，或者是管或棒的集合。 含有碱金属的二氧化硅玻璃制品和可能已经无意地扩散到玻璃制品中的杂质被蚀刻到足以除去杂质的深度。 石英玻璃制品可以进一步加工以形成完整的光纤预型件。 当预成型件被拉入光纤时，表现出低的衰减。

公开(公告)号：US07404302B2

公开(公告)日：2008-07-29

申请号：US10857081

申请日：2004-05-27

Applicant: Jitendra Balakrishnan ,  Steven A Dunwoody ,  Pushkar Tandon

Inventor： Jitendra Balakrishnan ,  Steven A Dunwoody ,  Pushkar Tandon

IPC: C03B37/012

CPC classification number: C03B37/0142 ,  C03B37/01413 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2207/36 ,  C03B2207/70 ,  C03B2207/81 ,  C03B2207/87

Abstract: A method for deposition glass soot for making an optical fiber preform. A fuel and a glass precursor are flowed to a burner flame forming glass soot which is deposited onto a glass target. By first depositing an insulating layer of glass soot with a low velocity burner flame, the amount of water which may be adsorbed into the surface of the glass target can be reduced. Thereafter, the flame velocity may be increased to increase the deposition rate of the glass soot without significantly increasing the concentration of water incorporated into the glass target.

Abstract translation: 一种用于制造光纤预制棒的沉积玻璃烟炱的方法。 燃料和玻璃前体流到燃烧器火焰形成的玻璃烟灰，其沉积在玻璃靶上。 通过首先用低速燃烧器火焰沉积玻璃烟炱的绝缘层，可以减少可能吸附到玻璃靶的表面中的水的量。 此后，可以增加火焰速度以增加玻璃烟炱的沉积速率，而不会显着增加掺入玻璃靶中的水的浓度。

公开(公告)号：US20070266733A1

公开(公告)日：2007-11-22

申请号：US11748151

申请日：2007-05-14

Applicant: Eric Eva

Inventor： Eric Eva

IPC: C03C15/00 ,  C03C19/00

CPC classification number: C03C3/06 ,  C03B23/0013 ,  C03B23/0026 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54

Abstract: The invention relates to a method for the manufacture of a lens of synthetic quartz glass with increased H2 content, in particular for a lens for an optical system with an operating wavelength of less than 250 nm, in particular less than 200 nm, with the steps:providing a precursor product of synthetic quartz glass, in particular with a first H2 content of less than 2·1015 molecules/cm3, with a circumferential border surface and two base surfaces lying on opposite sides, wherein at least one partial surface of at least one of said base surfaces has a curvature, andtreating the precursor product in an H2-containing atmosphere in order to produce a precursor product of synthetic quartz glass with a second H2 content that is increased in relation to the first H2 content, in particular with a second H2 content of more than 1016 molecules/cm3, and measuring at least one optical property of said precursor product with said second H2 content.

Abstract translation: 本发明涉及一种用于制造具有增加的H 2 O 3含量的合成石英玻璃透镜的方法，特别是用于具有小于250nm的工作波长的光学系统的透镜，特别是 小于200nm，步骤：提供合成石英玻璃的前体产物，特别是具有小于2.10 15分子/ cm 2的第一H 2 O 3含量 其具有周向边界表面和位于相对侧上的两个基面，其中至少一个所述基底表面的至少一个部分表面具有曲率，并且将前体产物处理成H 2 O 3， 2含量的气氛，以便产生合成石英玻璃的前体产物，其具有相对于第一H 2 N 2含量增加的第二H 2 N 2含量 特别是具有超过10个/ 16个分子/ cm 3的第二H 2 N 2含量，并且测量至少一种光学式 所述前体产物具有所述第二H 2 N 2含量的操作性。