公开(公告)号：US20140206524A1

公开(公告)日：2014-07-24

申请号：US14146182

申请日：2014-01-02

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Shigeru Maida ,  Hisatoshi Otsuka ,  Tetsuji Ueda ,  Masanobu Ezaki

IPC: C03C10/00 ,  C03B20/00

CPC classification number: C03C10/00 ,  C03B19/1453 ,  C03B19/1469 ,  C03B20/00 ,  C03B25/02 ,  C03B2201/42 ,  C03B2207/20 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/42 ,  G03F1/22 ,  G03F1/60 ,  G03F7/70958

Abstract: A member is made of titania-doped quartz glass in which striae have a curvature radius of at least 150 mm in a surface perpendicular to an EUV-reflecting surface. The member free of exposed striae and having a high flatness is useful in EUV lithography.

Abstract translation: 成员由掺杂二氧化钛的石英玻璃制成，其中条纹在与EUV反射表面垂直的表面中具有至少150mm的曲率半径。 没有暴露的条纹并且具有高平整度的部件在EUV光刻中是有用的。

公开(公告)号：US08590342B2

公开(公告)日：2013-11-26

申请号：US13295652

申请日：2011-11-14

Applicant: Akio Koike ,  Takahiro Mitsumori ,  Yasutomi Iwahashi ,  Tomonori Ogawa

Inventor： Akio Koike ,  Takahiro Mitsumori ,  Yasutomi Iwahashi ,  Tomonori Ogawa

IPC: C03B25/00 ,  C03B19/00

CPC classification number: C03B19/1453 ,  B82Y10/00 ,  B82Y40/00 ,  C03B32/00 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/42 ,  C03C2203/52 ,  G03F1/24

Abstract: The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1(° C.), holding the glass body after transparent vitrification in a temperature region of from T1−90(° C.) to T1−220(° C.) for 120 hours or more.

Abstract translation: 本发明涉及一种制备TiO 2 -SiO 2玻璃体的方法，包括以下步骤：当将透明玻璃化后的TiO 2 -SiO 2玻璃体的退火点作为T1（℃）时，将玻璃体 在从T1-90（℃）到T1-220（℃）的温度区域透明玻璃化120小时以上。

公开(公告)号：US20130120863A1

公开(公告)日：2013-05-16

申请号：US13667862

申请日：2012-11-02

Applicant: CARL ZEISS SMT GMBH

Inventor： Julian KALLER ,  Wilfried CLAUSS ,  Michael GERHARD

IPC: G02B5/08 ,  C03C14/00

CPC classification number: G02B5/08 ,  C03B19/06 ,  C03B19/09 ,  C03C3/06 ,  C03C10/00 ,  C03C14/00 ,  C03C2201/42 ,  G03F7/70891

Abstract: For the production of mirrors for EUV lithography, substrates are suggested having a mean relative thermal longitudinal expansion of no more than 10 ppb across a temperature difference ΔT of 15° C. and a zero-crossing temperature in the range between 20° C. and 40° C. For this purpose, at least one first and one second material having low thermal expansion coefficients and opposite gradients of the relative thermal expansion as a function of temperature are selected and a substrate is produced by mixing and bonding these materials.

Abstract translation: 为了生产用于EUV光刻的反射镜，建议基板在15℃的温差DeltaT和10°C之间的过零点温度下具有不超过10ppb的平均相对热纵向膨胀，并且在20℃和 40℃。为此目的，选择具有低热膨胀系数和相对热膨胀作为温度的函数的相反梯度的至少一种第一和第二材料，并通过混合和粘合这些材料来生产基底。

公开(公告)号：US08410458B2

公开(公告)日：2013-04-02

申请号：US13262298

申请日：2010-03-11

Applicant: Christian Neumann

Inventor： Christian Neumann

IPC: G21K5/00

CPC classification number: G02B5/208 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/30 ,  C03C2201/42 ,  C03C2203/10 ,  G02B5/226

Abstract: The invention relates to an optical filter material made of doped quartz glass, which at a low dopant concentration exhibits spectral transmission as high as possible of at least 80% cm−1 for operating radiation of 254 nm, transmission as low as possible in the wave range below approximately 250 nm, and an edge wavelength λc within the wave range of 230 to 250 nm. It was found that this aim is achieved by doping comprising a gallium compound, which in the wave range below 250 nm has a maximum of an absorption band and thus determines the edge wave range λc.

Abstract translation: 本发明涉及由掺杂石英玻璃制成的滤光材料，其在低掺杂浓度下表现出尽可能高的至少80％cm -1的光谱透射率，用于操作254nm的辐射，在波中尽可能低的透射 范围在250nm以下，边缘波长λc在230〜250nm的波长范围内。 发现该目的通过掺杂包括镓化合物来实现，该镓化合物在250nm以下的波长范围内具有最大吸收带，从而确定边缘波长λc。

公开(公告)号：US08329604B2

公开(公告)日：2012-12-11

申请号：US12351998

申请日：2009-01-12

Applicant: Yasutomi Iwahashi ,  Akio Koike

Inventor： Yasutomi Iwahashi ,  Akio Koike

IPC: C03C3/06 ,  C03C3/04

CPC classification number: C03B19/1415 ,  C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/54

Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

Abstract translation: 含有TiO 2的二氧化硅玻璃，其假想温度为至多1200℃，F浓度为至少100ppm，热膨胀系数为0±200ppb /℃，为0〜100℃。 含有TiO 2的二氧化硅玻璃的制造方法，其包括在通过玻璃形成材料的火焰水解得到的目标石英玻璃粒子上形成多孔玻璃体的工序，得到含氟多孔玻璃体的工序， 获得含氟玻璃化玻璃体，获得含氟成形玻璃体的步骤和进行退火处理的步骤。

公开(公告)号：US20120238434A1

公开(公告)日：2012-09-20

申请号：US13486485

申请日：2012-06-01

Applicant: Akio Koike ,  Takahiro Mitsumori ,  Tomonori Ogawa

Inventor： Akio Koike ,  Takahiro Mitsumori ,  Tomonori Ogawa

IPC: C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/28 ,  C03B2201/42 ,  C03B2201/50 ,  C03C2201/10 ,  C03C2201/20 ,  C03C2201/28 ,  C03C2201/42

Abstract: The present invention relates to a TiO2-containing silica glass containing TiO2 in an amount of from 5 to 10 mass % and at least one of B2O3, P2O5 and S in an amount of from 50 ppb by mass to 5 mass % in terms of the total content.

Abstract translation: 本发明涉及含有5〜10质量％的TiO 2和B 2 O 3，P 2 O 5，S中的至少一种的含TiO 2的二氧化硅玻璃，其量为50ppb〜5质量％ 总内容

公开(公告)号：US20120205343A1

公开(公告)日：2012-08-16

申请号：US13445345

申请日：2012-04-12

Applicant: Akio Koike ,  Junko Miyasaka

Inventor： Akio Koike ,  Junko Miyasaka

IPC: C03C15/00

CPC classification number: G03F7/0002 ,  B29C33/3842 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/14 ,  C03B2201/42 ,  C03C3/06 ,  C03C15/00 ,  C03C2201/42 ,  C03C2203/44

Abstract: The present invention relates to a method for producing a silica glass substrate for an imprint mold, containing: obtaining a glass body from a glass-forming raw material containing an SiO2 precursor; machining the glass body into a glass substrate having a predetermined shape; and removing an affected layer on a surface of the glass substrate, to produce a silica glass substrate for an imprint mold having a fictive temperature distribution in a region from the surface to a depth of 10 μm on the side to be subjected to a transfer pattern formation of the glass substrate being within ±30° C.

Abstract translation: 本发明涉及一种压印模具用石英玻璃基板的制造方法，其特征在于，包括：从含有SiO 2前体的玻璃成形原料获得玻璃体; 将玻璃体加工成具有预定形状的玻璃基板; 并除去玻璃基板的表面上的受影响层，从而生成用于压印模具的石英玻璃基板，该印模具具有在要进行转印图案的一侧的表面至深度10μm的区域中具有虚构的温度分布 玻璃基板的形成在±30℃以内

公开(公告)号：US08093165B2

公开(公告)日：2012-01-10

申请号：US12869035

申请日：2010-08-26

Applicant: Akio Koike ,  Yasutomi Iwahashi ,  Shinya Kikugawa ,  Yuko Tachibana

Inventor： Akio Koike ,  Yasutomi Iwahashi ,  Shinya Kikugawa ,  Yuko Tachibana

IPC: C03C3/06 ,  C03B19/06 ,  C03B37/018 ,  C03B25/00

CPC classification number: C03B19/1453 ,  B82Y10/00 ,  B82Y40/00 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/06 ,  C03C3/076 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52 ,  C03C2203/54 ,  G03F1/24 ,  G03F7/70958 ,  Y02P40/57

Abstract: The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO2-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×1016 molecules/cm3 or more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.

Abstract translation: 本发明提供了一种TiO 2 -SiO 2玻璃，其中当用作用于EUVL的曝光工具的光学部件时，在高EUV能量光照射时热膨胀系数基本上为零，并且多层罐的物理性能 通过从玻璃中释放氢气，保持很长一段时间。 本发明涉及一种假想温度为1100℃或更低，氢分子浓度为1×1016分/厘米3或更高的含钛二氧化硅玻璃以及线性热膨胀系数为0的温度 ppb /℃，在40〜110℃的范围内。

公开(公告)号：US07939457B2

公开(公告)日：2011-05-10

申请号：US12277611

申请日：2008-11-25

Applicant: Kenneth Edward Hrdina ,  Robert Sabia

Inventor： Kenneth Edward Hrdina ,  Robert Sabia

IPC: C03C3/06 ,  C03C3/04

CPC classification number: C03C3/06 ,  C03B19/1407 ,  C03B19/143 ,  C03B19/1484 ,  C03B2201/42 ,  C03C2201/42 ,  C03C2203/40

Abstract: A low expansion glass substrate includes titania and silica and has a thermal expansivity with an average gradient less than 1 ppb/° C./° C. in a temperature range of 19° C. to 25° C.

Abstract translation: 低膨胀玻璃基板包括二氧化钛和二氧化硅，并且在19℃至25℃的温度范围内具有平均梯度小于1ppb /℃/℃的热膨胀性。

公开(公告)号：US07935648B2

公开(公告)日：2011-05-03

申请号：US12133007

申请日：2008-06-04

Applicant: Shigeru Maida ,  Hisatoshi Otsuka

Inventor： Shigeru Maida ,  Hisatoshi Otsuka

IPC: C03C3/06 ,  C03C3/076

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52

Abstract: In the nanoimprint lithography, a titania-doped quartz glass having a CTE of −300 to 300 ppb/° C. between 0° C. and 250° C. and a CTE distribution of up to 100 ppb/° C. at 25° C. is suited for use as nanoimprint molds.

Abstract translation: 在纳米压印光刻中，掺杂二氧化钛的石英玻璃在0℃和250℃之间具有-300至300ppb /℃的CTE，在25℃下的CTE分布高达100ppb /℃ C.适用于纳米压印模具。