公开(公告)号：US09455122B2

公开(公告)日：2016-09-27

申请号：US14400561

申请日：2013-05-08

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Teunis Van De Peut ,  Hendrik Den Boer

IPC: H01J37/317 ,  H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/30

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/243 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/0437 ,  H01J2237/2485 ,  H01J2237/31754 ,  H01J2237/31774

Abstract: The invention relates to a modulation device for modulating charged particle beamlets in accordance with pattern data in a multi-beamlet charged particle lithography system. The device comprises a plate-like body, an array of beamlet deflectors, a plurality of power supply terminals (202-205) for supplying at least two different voltages, a plurality of control circuits, and a conductive slab (201) for supplying electrical power to one or more of the power supply terminals (202-205). The plate-like body is divided into an elongated beam area (51) and an elongated non-beam area (52) positioned with their long edges adjacent to each other. The beamlet deflectors are located in the beam area. The control circuits are located in non-beam area. The conductive slab is connected to the control circuits in the non-beam area. The conductive slab comprises a plurality of thin conductive plates (202-205).

Abstract translation: 本发明涉及一种用于根据多子束带电粒子光刻系统中的图案数据调制带电粒子子束的调制装置。 该装置包括板状主体，​​子束偏转器阵列，用于提供至少两个不同电压的多个电源端子（202-205），多个控制电路和用于提供电气的导电板（201） 一个或多个电源端子（202-205）的电力。 板状体被分成细长的射束区域（51）和长边相邻的细长非光束区域（52）。 子束偏转器位于光束区域中。 控制电路位于非光束区域。 导电板连接到非射束区域中的控制电路。 导电板包括多个薄导电板（202-205）。

公开(公告)号：US09134261B2

公开(公告)日：2015-09-15

申请号：US14257071

申请日：2014-04-21

Applicant: EBARA CORPORATION

Inventor： Shoji Yoshikawa ,  Kiwamu Tsukamoto ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Tsutomu Karimata

IPC: H01J37/26 ,  G01N23/22 ,  H01J37/09 ,  H01J37/16 ,  H01J37/20 ,  H01J37/285 ,  G01N21/95

CPC classification number: H01J37/023 ,  G01N21/9501 ,  G01N23/2204 ,  H01J37/09 ,  H01J37/16 ,  H01J37/20 ,  H01J37/285 ,  H01J2237/022 ,  H01J2237/0264 ,  H01J2237/1501 ,  H01J2237/166 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/20221 ,  H01J2237/20278 ,  H01J2237/26

Abstract: An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.

Abstract translation: 提供了能够有助于降低设备成本的检查装置。 检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 将光束引导到保持在工作室中的可移动台上的检查对象中并用该束照射检查对象的主光学系统; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 检查装置还包括：驱动可动台的直线电机; 以及亥姆霍兹线圈，其在驱动可动载物台时引起磁场消除由线性马达引起的磁场。

公开(公告)号：US20150124229A1

公开(公告)日：2015-05-07

申请号：US14400569

申请日：2013-05-14

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Alexander Hendrik Vincent Van Veen ,  Willem Henk Urbanus

IPC: H01J37/317

CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/3007 ,  H01J37/302 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/026 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/16 ,  H01J2237/182 ,  H01J2237/188

Abstract: The invention relates to a charged particle lithography system for exposing a target. The system includes a charged particle beam generator for generating a charged particle beam; an aperture array (6) for forming a plurality of beamlets from the charged particle beam; and a beamlet projector (12) for projecting the beamlets onto a surface of the target. The charged particle beam generator includes a charged particle source (3) for generating a diverging charged particle beam; a collimator system (5a,5b,5c,5d; 72;300) for refracting the diverging charged particle beam; and a cooling arrangement (203) for removing heat from the collimator system, the cooling arrangement comprising a body surrounding at least a portion of the collimator system.

Abstract translation: 本发明涉及用于曝光目标物的带电粒子光刻系统。 该系统包括用于产生带电粒子束的带电粒子束发生器; 用于从带电粒子束形成多个子束的孔径阵列（6） 以及用于将子束投影到目标表面上的小射束投影仪（12）。 带电粒子束发生器包括用于产生发散带电粒子束的带电粒子源（3） 用于折射发散带电粒子束的准直器系统（5a，5b，5c，5d; 72; 300） 以及用于从准直器系统去除热的冷却装置（203），所述冷却装置包括围绕准直器系统的至少一部分的主体。

公开(公告)号：US09006653B2

公开(公告)日：2015-04-14

申请号：US13984329

申请日：2012-02-27

Applicant: Hideki Tanaka ,  Tsuyoshi Wakuda

Inventor： Hideki Tanaka ,  Tsuyoshi Wakuda

IPC: H01J37/14 ,  H01J37/04 ,  H01J37/09 ,  H01J37/16

CPC classification number: H01J37/04 ,  H01J37/09 ,  H01J37/14 ,  H01J37/16 ,  H01J2237/0264

Abstract: Provided is an electron microscope capable of enhancing a magnetic shield function even though the structure thereof has an objective tens that projects into a sample chamber space. The electron microscope includes: an objective lens (6) which focuses an electron beam to irradiate a sample (4) with; a sample chamber (5) which forms a sample space to contain the sample (4); a sample chamber magnetic shield (7) provided inside the sample chamber (5); and an objective lens magnetic shield (8) of a tubular shape which surrounds the periphery of the objective lens (6). A first and a second hole, which face to each other in a traveling direction of the electron beam, are provided in an upper plate (10) serving as an upper wall of the sample chamber (5) and in an upper shield (9) of the sample chamber magnetic shield (7). The objective lens (6) is held inside the first hole provided in the upper plate (10). A lower end of the objective lens (6) is disposed at a position lower than a lower end of the upper plate (10), and at a position of the second hole provided in the upper shield (9) or at a position near this position. The objective lens magnetic shield (8) is positioned inside the first hole, and a lower end thereof is connected to the upper shield (9).

Abstract translation: 提供一种能够增强磁屏蔽功能的电子显微镜，即使其结构具有突出到样品室空间中的目标数十。 电子显微镜包括：聚焦电子束以照射样品（4）的物镜（6）; 样品室（5），其形成容纳样品（4）的样品空间; 设置在所述样品室（5）内的样品室磁屏蔽（7）; 以及围绕物镜（6）的周边的管状的物镜磁屏蔽（8）。 在电子束的行进方向上彼此面对的第一和第二孔设置在用作样品室（5）的上壁的上板（10）中并在上屏蔽（9）中， 的样品室磁屏蔽（7）。 物镜（6）被保持在设置在上板（10）中的第一孔内。 物镜（6）的下端设置在比上板（10）的下端更低的位置，并且在设置在上罩（9）中的第二孔的位置或靠近该上罩 位置。 物镜磁屏蔽（8）位于第一孔内，其下端连接到上屏蔽（9）。

公开(公告)号：US08952330B2

公开(公告)日：2015-02-10

申请号：US14158591

申请日：2014-01-17

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Chia-Chi Tsao ,  Syun-Jie Jhan ,  Yi-Cheng Shih ,  Chwen Yu

IPC: G01N23/00 ,  G21K7/00 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28 ,  H01J37/09

CPC classification number: H05K9/0007 ,  H01J37/09 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0264 ,  H01J2237/0266

Abstract: System and method for EMI shielding for a CD-SEM are described. One embodiment is a scanning electron microscope (“SEM”) comprising an electron gun for producing an electron beam directed toward a sample; a secondary electron (“SE”) detector for detecting secondary electrons reflected from the sample in response to the electron beam; and a dual-layer shield disposed around and enclosing the SE detector. The shield comprises a magnetic shielding lamina layer and a metallic foil layer.

Abstract translation: 描述了用于CD-SEM的EMI屏蔽的系统和方法。 一个实施例是包括用于产生朝向样品的电子束的电子枪的扫描电子显微镜（“SEM”）; 用于响应于电子束检测从样品反射的二次电子的二次电子（“SE”）检测器; 以及设置在SE检测器周围并包围SE检测器的双层屏蔽。 屏蔽包括磁屏蔽层和金属箔层。

公开(公告)号：US08884253B2

公开(公告)日：2014-11-11

申请号：US13397703

申请日：2012-02-16

Applicant: Alon Rosenthal

Inventor： Alon Rosenthal

IPC: H01J37/08 ,  H01J37/09 ,  G03F7/20 ,  H01J37/317 ,  H01L21/67 ,  H01J37/147 ,  B82Y40/00 ,  B82Y10/00

CPC classification number: G03F7/70858 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/708 ,  H01J37/09 ,  H01J37/1475 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/31754 ,  H01J2237/31774 ,  H01J2237/31793 ,  H01L21/6719 ,  H01L21/67213

Abstract: The invention relates to a system for magnetically shielding a charged particle lithography apparatus. The system comprises a first chamber, a second chamber and a set of two coils. The first chamber has walls comprising a magnetic shielding material, and, at least partially, encloses the charged particle lithography apparatus. The second chamber also has walls comprising a magnetic shielding material, and encloses the first chamber. The set of two coils is disposed in the second chamber on opposing sides of the first chamber. The two coils have a common axis.

Abstract translation: 本发明涉及一种用于磁屏蔽带电粒子光刻设备的系统。 该系统包括第一室，第二室和一组两个盘管。 第一室具有包括磁屏蔽材料的壁，并且至少部分地包围带电粒子光刻设备。 第二室还具有包括磁屏蔽材料的壁，并且包围第一室。 该组两个线圈被布置在第二腔室中的第一腔室的相对侧上。 两个线圈具有公共轴。

公开(公告)号：US20140306123A1

公开(公告)日：2014-10-16

申请号：US14220684

申请日：2014-03-20

Applicant: CANON KABUSHIKI KAISHA

Inventor： Tomonori ISHIKAWA ,  Shinji UCHIDA

IPC: H01J37/20 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01J37/3174 ,  H01J2237/0264

Abstract: A stage apparatus includes: a stage; a linear motor configured to drive the stage; a magnetic shield unit configured to surround the linear motor to shield a magnetic field generated by a magnet of the linear motor; and a degaussing coil located in a space surrounded by the magnetic shield unit and configured to degauss the magnetic shield unit.

Abstract translation: 舞台装置包括：舞台; 构造成驱动所述载物台的线性马达; 磁屏蔽单元，被配置为围绕所述线性电动机以屏蔽由所述线性电动机的磁体产生的磁场; 以及位于由所述磁屏蔽单元包围并被构造为使所述磁屏蔽单元消磁的空间中的消磁线圈。

公开(公告)号：US20140124667A1

公开(公告)日：2014-05-08

申请号：US14158591

申请日：2014-01-17

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Chia-Chi Tsao ,  Syun-Jie Jhan ,  Yi-Cheng Shih ,  Chwen Yu

IPC: H05K9/00 ,  H01J37/26 ,  H01J37/244

CPC classification number: H05K9/0007 ,  H01J37/09 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0264 ,  H01J2237/0266

Abstract: System and method for EMI shielding for a CD-SEM are described. One embodiment is a scanning electron microscope (“SEM”) comprising an electron gun for producing an electron beam directed toward a sample; a secondary electron (“SE”) detector for detecting secondary electrons reflected from the sample in response to the electron beam; and a dual-layer shield disposed around and enclosing the SE detector. The shield comprises a magnetic shielding lamina layer and a metallic foil layer.

Abstract translation: 描述了用于CD-SEM的EMI屏蔽的系统和方法。 一个实施例是包括用于产生朝向样品的电子束的电子枪的扫描电子显微镜（“SEM”）; 用于响应于电子束检测从样品反射的二次电子的二次电子（“SE”）检测器; 以及设置在SE检测器周围并包围SE检测器的双层屏蔽。 屏蔽包括磁屏蔽层和金属箔层。

公开(公告)号：US20130313431A1

公开(公告)日：2013-11-28

申请号：US13984329

申请日：2012-02-27

Applicant: Hideki Tanaka ,  Tsuyoshi Wakuda

Inventor： Hideki Tanaka ,  Tsuyoshi Wakuda

IPC: H01J37/04

CPC classification number: H01J37/04 ,  H01J37/09 ,  H01J37/14 ,  H01J37/16 ,  H01J2237/0264

Abstract: Provided is an electron microscope capable of enhancing a magnetic shield function even though the structure thereof has an objective tens that projects into a sample chamber space. The electron microscope includes: an objective lens (6) which focuses an electron beam to irradiate a sample (4) with; a sample chamber (5) which forms a sample space to contain the sample (4); a sample chamber magnetic shield (7) provided inside the sample chamber (5); and an objective lens magnetic shield (8) of a tubular shape which surrounds the periphery of the objective lens (6). A first and a second hole, which face to each other in a traveling direction of the electron beam, are provided in an upper plate (10) serving as an upper wall of the sample chamber (5) and in an upper shield (9) of the sample chamber magnetic shield (7). The objective lens (6) is held inside the first hole provided in the upper plate (10). A lower end of the objective lens (6) is disposed at a position lower than a lower end of the upper plate (10), and at a position of the second hole provided in the upper shield (9) or at a position near this position. The objective lens magnetic shield (8) is positioned inside the first hole, and a lower end thereof is connected to the upper shield (9).

Abstract translation: 提供一种能够增强磁屏蔽功能的电子显微镜，即使其结构具有突出到样品室空间中的目标数十。 电子显微镜包括：聚焦电子束以照射样品（4）的物镜（6）; 样品室（5），其形成容纳样品（4）的样品空间; 设置在所述样品室（5）内的样品室磁屏蔽（7）; 以及围绕物镜（6）的周边的管状的物镜磁屏蔽（8）。 在电子束的行进方向上彼此面对的第一和第二孔设置在用作样品室（5）的上壁的上板（10）中并在上屏蔽（9）中， 的样品室磁屏蔽（7）。 物镜（6）保持在设置在上板（10）中的第一孔内。 物镜（6）的下端设置在比上板（10）的下端更低的位置，并且在设置在上罩（9）中的第二孔的位置或靠近该上罩 位置。 物镜磁屏蔽（8）位于第一孔内，其下端连接到上屏蔽（9）。

公开(公告)号：US20120305766A1

公开(公告)日：2012-12-06

申请号：US13489522

申请日：2012-06-06

Applicant: Hideki TANAKA ,  Masahiro Koyama ,  Masaki Mizuochi ,  Hiroshi Tsuji

Inventor： Hideki TANAKA ,  Masahiro Koyama ,  Masaki Mizuochi ,  Hiroshi Tsuji

IPC: H02K41/03 ,  H01J37/26 ,  H01J37/20

CPC classification number: H02K41/0356 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/0264 ,  H01J2237/20228 ,  H02K1/02 ,  H02K1/17 ,  H02K41/031

Abstract: It is an object to balance suppression of a leakage magnetic field and driving performance. In a linear motor including a stator including a first yoke having an open face and two rows of permanent magnets linearly arrayed inside the first yoke so that S-poles and N-poles are alternate and a movable element arranged between the two rows of permanent magnets and linearly moving, a second yoke is connected to an open end of the first yoke so as to cover the open end of the first yoke and the permanent magnets when viewed from the open face of the first yoke.

Abstract translation: 目的是平衡泄漏磁场的抑制和驱动性能。 在包括定子的线性电动机中，该定子包括具有开放面的第一磁轭和在第一磁轭内线性排列的两行永磁体，使得S极和N极交替，并且可移动元件布置在两排永磁体之间 并且线性移动时，第二磁轭连接到第一磁轭的开口端，从而当从第一磁轭的开放面观察时，覆盖第一磁轭和永磁体的开口端。