公开(公告)号：US20030136917A1

公开(公告)日：2003-07-24

申请号：US10050146

申请日：2002-01-18

Inventor： David Woodburn ,  Walter Crewson

IPC: H01J003/14

CPC classification number: G21K5/04 ,  H01J2237/152

Abstract: A beam delivery system uses a set of electronically controlled magnets with a common magnetic yoke to steer the beam directly onto the products being irradiated with a very short distance between the magnets and the products.

Abstract translation: 光束传送系统使用一组具有公共磁轭的电子控制磁体，以将光束直接引导到被磁体和产品之间非常短距离照射的产品上。

公开(公告)号：US06588090B1

公开(公告)日：2003-07-08

申请号：US09325162

申请日：1999-06-03

Applicant: Rodney A. Kendall ,  David A. Pickney

Inventor： Rodney A. Kendall ,  David A. Pickney

IPC: H01F706

CPC classification number: H01J9/236 ,  H01J2237/152 ,  Y10T29/4902 ,  Y10T29/49073 ,  Y10T29/49117 ,  Y10T29/49128

Abstract: The present invention relates to a method and apparatus of fabricating electromagnetic coil vanes. The method involves placing a bonding composition on opposing surfaces of a substrate. First and second complementary coil patterns are formed, and are aligned and bonded to respective clamp plate fixtures. The first complementary coil pattern is bonded to one surface of the opposing surfaces of the substrate via the bonding composition, and the second complementary coil pattern is bonded to the other surface of the opposing surfaces of the substrate via the bonding composition. The bonding composition is cured, and the clamp plates are removed from the first and second complementary coil patterns.

Abstract translation: 本发明涉及制造电磁线圈叶片的方法和装置。 该方法包括将粘合组合物放置在基底的相对表面上。 形成第一和第二互补线圈图案，并对准并结合到相应的夹板固定装置。 第一互补线圈图案经由接合组合物结合到基板的相对表面的一个表面，并且第二互补线圈图案经由接合组合物结合到基板的相对表面的另一个表面。 粘合组合物固化，夹板从第一和第二互补线圈图案中去除。

公开(公告)号：US20010052467A1

公开(公告)日：2001-12-20

申请号：US09471613

申请日：1999-12-23

Inventor： DAVID J. PINCKNEY

IPC: C25D005/02 ,  C25D005/34 ,  C25D007/00 ,  H05K003/00 ,  H01R043/00 ,  C23C028/02

CPC classification number: C23C26/00 ,  C23C18/1605 ,  H01J9/236 ,  H01J2237/152 ,  H05K1/0306 ,  H05K3/108 ,  H05K3/426 ,  Y10T29/49117

Abstract: The present invention relates to a method and apparatus of fabricating electromagnetic coil vanes. The method involves photolithographically exposing high resolution, dense wire patterns in a flash coat of copper, on both sides of a ceramic vane substrate. The substrate can be pre-drilled with a through hole to connect the two copper coil patterns. Additional copper is then deposited on both high resolution patterns and in the through hole by plating until the desired thickness is obtained. A firing operation is then performed that eutectically bonds the copper to the ceramic.

Abstract translation: 本发明涉及制造电磁线圈叶片的方法和装置。 该方法包括在陶瓷叶片基板的两侧光刻地暴露在铜的闪光涂层中的高分辨率，致密的线图案。 基板可以预先钻出一个通孔，以连接两个铜线圈图案。 然后将另外的铜沉积在两个高分辨率图案上，并在通孔中通过电镀沉积，直到获得所需的厚度。 然后进行烧结操作，其将铜共晶地结合到陶瓷上。

公开(公告)号：US5753922A

公开(公告)日：1998-05-19

申请号：US745747

申请日：1996-11-12

Applicant: Mamoru Nakasuji

Inventor： Mamoru Nakasuji

IPC: H01J37/22 ,  H01F5/00 ,  H01J37/147 ,  H01J49/14 ,  H01J49/20 ,  H01L21/027

CPC classification number: H01J37/1472 ,  H01J49/142 ,  H01J2237/152

Abstract: Electromagnetic deflectors and methods for their manufacture are disclosed. The excitation coils inside such deflectors can be situated relative to each other and to an optical axis with a high degree of accuracy and precision. A pair of loop-shaped channels are formed opposite each other in the sides of a cylindrical insulating cylinder. An electrically conductive material is embedded in the channels to form a set of opposing coils operable to deflect a charged particle beam passing axially through the cylinder in one dimension. Multiple cylinders each comprising a set of opposing coils can be concentrically assembled to provide, e.g., a biaxial deflector operable to deflect the beam in an X-dimension and a Y-dimension. In such a biaxial deflector, the sets of coils are arranged perpendicular to each other. The cylinder(s) is placed concentrically inside a cylindrical outer casing made of a ferromagnetic material such as ferrite to make an electromagnetic deflector.

公开(公告)号：US5689117A

公开(公告)日：1997-11-18

申请号：US548616

申请日：1995-10-26

Applicant: Mamoru Nakasuji

Inventor： Mamoru Nakasuji

IPC: H01J37/141 ,  H01J37/147 ,  H01J37/317 ,  H01J37/30

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/141 ,  H01J37/1471 ,  H01J37/3174 ,  H01J2237/152 ,  H01J2237/1536 ,  H01J2237/31788

Abstract: An image transferring apparatus using a charged particle beam comprising a projection lens for transferring a pattern formed on a mask onto a target by focusing a charged particle beam passing perpendicularly through the mask, and a deflector for deflecting the charged particle beam passing through the mask toward a predetermined direction (x-axis direction) so that a transfer position of the pattern to the target is changed. In this apparatus, the deflector comprises a deflection coil for generating a deflection magnetic field extending in a direction (y-axis direction) perpendicular to the predetermined direction, and correction coils for generating correction magnetic fields extending in the same direction as the deflection magnetic field at areas spaced apart from the center of the deflection magnetic field along the direction (x-axis direction) perpendicular to the direction of the deflection magnetic field.

Abstract translation: 一种使用带电粒子束的图像传送装置，包括投影透镜，用于通过聚焦垂直通过掩模的带电粒子束将用于将形成在掩模上的图案转印到靶上的投影透镜，以及用于使通过掩模的带电粒子束偏转的偏转器 预定方向（x轴方向），使得图案向目标的转印位置改变。 在该装置中，偏转器包括用于产生沿垂直于预定方向的方向（y轴方向）延伸的偏转磁场的偏转线圈和用于产生沿与偏转磁场相同方向延伸的校正磁场的校正线圈 在与偏转磁场的方向（x轴方向）垂直的偏转磁场的中心隔开的区域。

公开(公告)号：US20240087861A1

公开(公告)日：2024-03-14

申请号：US18513313

申请日：2023-11-17

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Tsung-Jen YANG ,  Yi-Zhen CHEN ,  Chih-Pin WANG ,  Chao-Li SHIH ,  Ching-Hou SU ,  Cheng-Yi HUANG

IPC: H01J37/34 ,  C23C14/35

CPC classification number: H01J37/3408 ,  C23C14/35 ,  H01J37/3458 ,  H01J2237/152

Abstract: In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.

公开(公告)号：US11915916B2

公开(公告)日：2024-02-27

申请号：US17192781

申请日：2021-03-04

Applicant: Eric Benjamin Frederick Gilbert

Inventor： Eric Benjamin Frederick Gilbert

IPC: H01J37/32 ,  H01J37/34 ,  H05H1/24

CPC classification number: H01J37/3405 ,  H01J37/32669 ,  H01J2237/152

Abstract: A high temperature plasma generating system has a magnetron joined to a frustoconical waveguide reflector. An antenna is set on a cavity magnetron tube and extends the length of the antenna. Applying electrical power to the magnetron creates multipactor in the frustoconical waveguide reflector, generating plasma focused at the tip of the extended magnetron antenna.

公开(公告)号：US11810748B2

公开(公告)日：2023-11-07

申请号：US18155177

申请日：2023-01-17

Applicant: CANON ANELVA CORPORATION

Inventor： Tsutomu Hiroishi ,  Reiji Sakamoto ,  Hiroshi Yakushiji

IPC: H01J37/08 ,  H01J37/305

CPC classification number: H01J37/08 ,  H01J37/3053 ,  H01J2237/022 ,  H01J2237/152

Abstract: An ion gun according to one embodiment of the present invention has an anode, a cathode having a first portion and a second portion that face the anode, and a magnet that creates a spatial magnetic field between the first portion and the second portion. An annular gap including a curved portion is provided between the first portion and the second portion of the cathode. The magnet creates lines of magnetic field having the bottom inside with respect to the sectional center line of the gap between the first portion and the second portion of the curved portion.

公开(公告)号：US20190074159A1

公开(公告)日：2019-03-07

申请号：US16115287

申请日：2018-08-28

Applicant: Hitachi High-Technologies Corporation

Inventor： Noritsugu Takahashi ,  Yasunari Sohda ,  Akira Ikegami ,  Yuta Kawamoto

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/141 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/141 ,  H01J37/1471 ,  H01J37/1475 ,  H01J37/1477 ,  H01J37/244 ,  H01J2237/1504 ,  H01J2237/1508 ,  H01J2237/151 ,  H01J2237/152 ,  H01J2237/2449 ,  H01J2237/248 ,  H01J2237/2817

Abstract: The present invention enlarges a range of movement of field of view by beam deflection with a simple deflector configuration and suppresses deterioration of a signal electron detection rate caused by the beam deflection. A scanning electron microscope according to the present invention is provided with a first deflection field setting module that sets plural deflectors to move a scanning area on a specimen by a primary electron beam to a position deviated from an axis extended from an electron source toward the center of an objective lens and a second deflection field setting module that sets the plural deflectors so that trajectories of signal electrons are corrected without changing the scanning area set by the first deflection field setting module. The control unit controls the plural deflectors by adding a setting value set by the second deflection field setting module to a setting value set by the first deflection field setting module.

公开(公告)号：US20180145000A1

公开(公告)日：2018-05-24

申请号：US15816838

申请日：2017-11-17

Applicant: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.

Inventor： Hiroyuki Kariya ,  Hideki Morikawa ,  Masaki Ishikawa

IPC: H01L21/66 ,  H01L21/265 ,  H01J37/317 ,  H01J37/08 ,  H01J37/244 ,  H01J37/147

CPC classification number: H01L22/26 ,  H01J37/08 ,  H01J37/1474 ,  H01J37/244 ,  H01J37/3171 ,  H01J2237/152 ,  H01J2237/2448 ,  H01J2237/24585 ,  H01J2237/31701 ,  H01L21/265

Abstract: An ion implantation method includes measuring a beam energy of an ion beam that is generated by a high-energy multistage linear acceleration unit operating in accordance with a tentative high-frequency parameter, adjusting a value of the high-frequency parameter based on the measured beam energy, and performing ion implantation by using the ion beam generated by the high-energy multistage linear acceleration unit operating in accordance with the adjusted high-frequency parameter. The tentative high-frequency parameter provides a value different from a value of the high-frequency parameter for achieving a maximum acceleration in design to a high-frequency resonator in a part of stages including at least a most downstream stage. The adjusting includes changing at least one of a voltage amplitude and a phase set for the high-frequency resonator in the part including the at least most downstream stage.