Abstract:
A charged particle beam emitting device includes at least two charged particle beam guns, each of the at least two charged particle beam guns having a separate charged particle emitter with an emitting surface for emitting a respective charged particle beam. The charged particle beam emitting device further includes an aperture element comprising at least one aperture opening and a deflector unit. The deflector unit is adapted for alternatively directing the charged particle beams of the at least two charged particle beam guns on the at least one aperture opening so that, at the same time, one of the at least two charged particle beams is directed on the aperture opening while the respective other charged particle beam of the at least two charged particle beams is deflected from the aperture opening by the deflector unit. At the same time, only one of the two charged particle beam guns is used so that the temporarily unused charged particle beam gun can be subjected to a cleaning procedure. This ensures that the emitting surfaces of both charged particle beam guns can be alternatively and frequently cleaned with minimum interruption of the operation of the charged particle beam device.
Abstract:
A device which employs an electron beam, for performing a desired function, includes an electron gun for generating the electron beam. The electron gun includes a barrel shaped rotatable structure having a plurality of annularly disposed electron sources. A curvature of a surface portion of the rotatable structure is shaped to optimize electric field concentrations. The rotatable structure further includes end portion protrusions.
Abstract:
Provided is a micro-column electron beam apparatus including: a base; an electron lens bracket on which an electron lens modulate can be fixed, mounted in a central portion of the base; an electron beam source tip module vertically disposed on the electron lens module; a pan spring plate stage module that is mounted over the base, supports the electron beam source tip module at a central portion thereof, and includes a three-coupling pan spring plate portion including first through third spring units that are coupled to the electron beam source tip module in three directions on a plane perpendicular to the vertical axis, which vertically passes the center of the electron beam source tip module, to elastically support the electron beam source tip module in three directions; a first piezoelectric actuator coupled to the pan spring plate stage module to move the electron beam source tip module along a first axis perpendicular to the vertical axis; and a second piezoelectric actuator coupled to the pan spring plate stage module to move the electron beam source tip module along a second axis perpendicular to the vertical axis and the first axis.
Abstract:
The present invention provides a new extractor for a micro-column and an alignment method of the aperture of the extractor and an electron emitter for a micro-column. Further, the present invention provides a measuring system, a method for measuring, and an alignment method using the principle of the alignment.
Abstract:
A method and an accompanied apparatus for aligning an electron emitter with an extractor hole of a microcolumn. Four V-grooves, defined together with the window for forming the membrane and having bottoms situated on two axis are microfabricated on a chip. The axis intersect at a right angle and defines a center point for the extractor hole. The V-grooves are then used as references to align the electron emitter with the extractor hole, one axis at a time. The emitter is precisely aligned to the extractor hole because the extractor hole was formed with reference to the V-grooves. The thickness of the chip is used as the spacing reference between the emitter and the extractor.
Abstract:
A method and an accompanied apparatus for aligning an electron emitter with an extractor hole of a microcolumn. Four V-grooves, defined together with the window for forming the membrane and having bottoms situated on two axis are microfabricated on a chip. The axis intersect at a right angle and defines a center point for the extractor hole. The V-grooves are then used as references to align the electron emitter with the extractor hole, one axis at a time. The emitter is precisely aligned to the extractor hole because the extractor hole was formed with reference to the V-grooves. The thickness of the chip is used as the spacing reference between the emitter and the extractor.
Abstract:
An electron gun for producing a beam of electrons has an elongated, linear thermionic cathode and a focusing electrode. The opposite ends of the cathode are engaged by adjustable holders which enable the spatial separation between the cathode and focusing electrode to be easily varied. The focusing electrode is electrically isolated from the cathode whereby fine tuning of the electron beam may be accomplished by varying the potential difference between the focusing electrode and cathode.
Abstract:
In an electrode assembly, an electrode holder has a forward end thereof affixed coaxially to an electrode tip. An attachment member is affixed to the holder rearwardly of the electrode. A retaining assembly includes an outer cup component, an inner cup component and a magnet therein. An electrical lead is connected to the inner cup component. The electrode assembly fits coaxially into the retaining assembly with the attachment member adjacent to and retained by the magnet. The electrode holder is seated in electrical contact with the inner cup component. The holder, cup components and attachment member are magnetically permeable, and separated in each assembly by insulators, so as to effect an outer magnetic shielding loop and an inner magnetic shielding loop.
Abstract:
A piezoelectric crystal without spontaneous polarization such as Li.sub.2 B.sub.4 O.sub.7 or quartz crystal is jointed to a cathode on the side opposite to the tip thereof to finely drive the cathode. The surface observation apparatus mounting the cathode makes it possible to observe the surface of a sample at high speeds.