中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

118 records (took 0.011 seconds)

    Engraving system for producing a screened rotary printing matrix with a variable diameter
    61.
    发明授权
    Engraving system for producing a screened rotary printing matrix with a variable diameter 失效
    用于生产具有可变直径的筛选旋转印刷矩阵的雕刻系统

    公开(公告)号：US3816699A

    公开(公告)日：1974-06-11

    申请号：US33212873

    申请日：1973-02-13

    Applicant: HELL R GMBH

    Inventor： WELLENDORF K ,  PADBERG P ,  STRUCK B

    IPC: B41C1/05 ,  H01J37/301 ,  B23K15/00

    CPC classification number: B41C1/05 ,  H01J37/301

    Abstract: An engraving apparatus for producing a printing cylinder with an electron beam, a device for producing the beam and having a vacuum chamber housing, the vacuum chamber housing forming a gap with the cylinder during engraving, the lower part of the housing being removable and has a curvature to fit a predetermined cylinder size to form a gap therewith.

    Abstract translation: 一种用于制造具有电子束的印刷滚筒的雕刻装置，用于制造所述梁并具有真空室壳体的装置，所述真空室壳体在雕刻期间与所述滚筒形成间隙，所述壳体的下部可拆卸并具有 曲率以适应预定的圆筒尺寸以与其形成间隙。

    Distribution and cutting of rocks,glass and the like
    62.
    发明授权
    Distribution and cutting of rocks,glass and the like 失效
    岩石，玻璃和类似物的分布和切割

    公开(公告)号：US3556600A

    公开(公告)日：1971-01-19

    申请号：US3556600D

    申请日：1968-08-30

    Applicant: WESTINGHOUSE ELECTRIC CORP

    Inventor： SHOUPP WILLIAM E ,  SCHUMACHER BERTHOLD W

    IPC: B28D1/22 ,  E21C37/18 ,  H01J37/301

    CPC classification number: B28D1/221 ,  E21C37/18 ,  H01J37/301 ,  Y10S65/04

    Abstract: A METHOD IS DISCLOSED FOR DRILLING HOLES, EXCAVATING AND/OR TUNNELING IN ROCKY TERRAIN OR CUTTING OR BREAKING UP ROCK OR GLASS WITH A CORPUSCULAR BEAM, OF ELECTRONS OR IONS OF HIGH ENERGY DENSITY, TYPICALLY EXCEEDING ABOUT 10**6 WATTS PER SQUARE CENTIMETER. THE BEAM IS PROJECTED INTO THE ATMOSPHERE FROM THE CHAMBER IN WHICH IT IS GENERATED. MOLTEN MATERIAL, FUMES AND DUST MAY BE BLASTED AWAY BY A STREAM OF GAS, WATER OR STEAM. THE SURFACE BEING IMPINGED BY THE BEAM MAY ADVANTAGEOUSLY BE UNDER WATER. THE PARTICLES OF THE BEAM MAY ALSO HAVE VERY HIGH ENERGY (ACCELERATING VOLTAGE ONE MILLION TO 100 MILLION VOLTS) TO PRODUCE A BLASTING EFFECT UNDER THE SURFACE OF THE MATERIAL BEING DISRUPTED.

    INTERFACE, A METHOD FOR OBSERVING AN OBJECT WITHIN A NON-VACUUM ENVIRONMENT AND A SCANNING ELECTRON MICROSCOPE
    68.
    发明申请
    INTERFACE, A METHOD FOR OBSERVING AN OBJECT WITHIN A NON-VACUUM ENVIRONMENT AND A SCANNING ELECTRON MICROSCOPE 有权
    界面，用于观察非真空环境中的对象和扫描电子显微镜的方法

    公开(公告)号：US20150235806A1

    公开(公告)日：2015-08-20

    申请号：US14687890

    申请日：2015-04-15

    Applicant: Dov SHACHAL

    Inventor： Dov SHACHAL

    IPC: H01J37/28 ,  H01J37/06

    CPC classification number: H01J37/285 ,  H01J37/06 ,  H01J37/20 ,  H01J37/28 ,  H01J37/301 ,  H01J2237/006 ,  H01J2237/0458 ,  H01J2237/15 ,  H01J2237/164 ,  H01J2237/182 ,  H01J2237/2002 ,  H01J2237/2006 ,  H01J2237/2605 ,  H01J2237/28 ,  H01J2237/2801 ,  H01J2237/2806 ,  H01J2237/2807

    Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.

    Abstract translation: 接口，扫描电子显微镜和用于观察位于非真空环境中的物体的方法。 该方法包括：使在真空环境中产生的至少一个电子束通过孔阵列中的至少一个孔并通过至少一个密封所述至少一个孔的超薄膜; 其中所述至少一个电子束被引向所述物体; 其中所述至少一个超薄膜承受真空环境和非真空环境之间的压力差; 以及检测响应于所述至少一个电子束和所述物体之间的相互作用而产生的微粒。

    DEVICE FOR GENERATING PLASMA AND DIRECTING AN ELECTRON BEAM TOWARDS A TARGET
    69.
    发明申请
    DEVICE FOR GENERATING PLASMA AND DIRECTING AN ELECTRON BEAM TOWARDS A TARGET 审中-公开
    用于产生等离子体和引导电子束的装置达到目标

    公开(公告)号：US20150136583A1

    公开(公告)日：2015-05-21

    申请号：US14404365

    申请日：2013-06-11

    Applicant: NOIVION S.R.L.

    Inventor： Libuse Skocdopolova

    IPC: H01J37/32 ,  C23C14/34

    CPC classification number: H01J37/3244 ,  C23C14/34 ,  H01J37/077 ,  H01J37/18 ,  H01J37/301 ,  H01J37/3053 ,  H01J37/315 ,  H01J37/34 ,  H01J2237/3137

    Abstract: A device (2; 2I; 2II; 2IV; 2V; 2VI; 2VII; 2VIII) for generating plasma and for directing an electron beam towards a target (3); the device (2; 2I; 2II; 2IV; 2V; 2VI; 2VII; 2VIII) comprises a hollow element (5); an activation group (21), which is designed to impose a difference in potential between the hollow element (5) and another element which is separate from it, in such a way as to direct the electron beam towards said separate element; and a de Laval nozzle (23), having at least one tapered portion (13), which is tapered towards the separate element and is designed to accelerate a gas flow towards the separate element.

    Abstract translation: 用于产生等离子体并用于将电子束引向目标（3）的装置（2; 2I; 2II; 2IV; 2V; 2VI; 2VII; 2VIII） 所述装置（2; 2I; 2II; 2IV; 2V; 2VI; 2VII; 2VIII）包括中空元件（5）; 激活组（21），其被设计成在中空元件（5）和与其分离的另一元件之间施加电位差，以将电子束引向所述分离元件; 和脱拉瓦尔喷嘴（23），其具有至少一个渐缩部分（13），该渐缩部分（13）朝着分离的元件逐渐变细，并且被设计成加速朝着分离元件的气流。

Patent Agency Ranking