公开(公告)号：US2440640A

公开(公告)日：1948-04-27

申请号：US71258546

申请日：1946-11-27

Applicant: RESEARCH CORP

Inventor： LADISLAUS MARTON

IPC: H01J37/285

CPC classification number: H01J37/285

公开(公告)号：US20250166964A1

公开(公告)日：2025-05-22

申请号：US18947905

申请日：2024-11-14

Applicant: FEI Company

Inventor： Tomas Onderlicka ,  Jaroslav Stárek ,  Jamie Dee Gravell

IPC: H01J37/285

Abstract: Embodiments herein relate to sample support imaging and sample location identification at a sample support to be used for microscopy imaging. A system can comprise a memory that stores, and a processor that executes, computer executable components. The computer executable components can comprise a beam directing component that instructs a focused ion beam (FIB) device of a beam system to direct an ion beam at a sample support, and a field application component that affects secondary charged particles, emitted from the sample support due to the ion beam, by directing activation of a negative field from the beam system during application of the ion beam by the FIB device.

公开(公告)号：US12094684B1

公开(公告)日：2024-09-17

申请号：US16532459

申请日：2019-08-05

Applicant: Mochii, Inc.

Inventor： Christopher Su-Yan Own ,  Matthew Francis Murfitt

IPC: H01J37/28 ,  G01N23/2252 ,  H01J37/153 ,  H01J37/285

CPC classification number: H01J37/28 ,  G01N23/2252 ,  H01J37/153 ,  H01J37/285 ,  H01J2237/221 ,  H01J2237/2482 ,  H01J2237/2807

Abstract: A compact charged-particle-beam microscope, weighing less than about 50 kg and having a size of less than about 1 m×1 m×1 m, is provided for imaging a sample. The microscope has a vacuum chamber to maintain a low-pressure environment, a stage to hold a sample in the vacuum chamber, a charged-particle beam source to generate a charged-particle beam, charged-particle beam optics to converge the charged-particle beam onto the sample, and one or more beam scanners to scan the charged-particle beam across the sample. A charged-particle detector is provided to detect charged-particle radiation emanating from the sample and generate a corresponding charged-particle-detection signal. At least one energy dispersive x-ray spectrometer (EDS) is provided to detect x-rays emanating from the sample and generate a corresponding x-ray-detection signal. A controller analyzes the charged-particle-detection signal and the x-ray-detection signal to generate an image of the sample and a histogram of x-ray energies for at least a portion of the sample.

公开(公告)号：US11713964B1

公开(公告)日：2023-08-01

申请号：US17574055

申请日：2022-01-12

Applicant: Applied Materials Israel Ltd.

Inventor： David Goldovsky ,  Ido Almog ,  Ronny Barnea

IPC: G01B15/04 ,  H01J37/285 ,  H01J37/244 ,  H01J37/28

CPC classification number: G01B15/04 ,  H01J37/244 ,  H01J37/28 ,  H01J37/285

Abstract: Disclosed herein is a system for profiling holes in non-opaque samples. The system includes: (i) an e-beam source configured to project an e-beam into an inspection hole in a sample, such that a wall of the inspection hole is struck and a localized electron cloud is produced; (ii) a light sensing infrastructure configured to sense cathodoluminescent light, generated by the electron cloud; and (iii) a computational module configured to analyze the measured signal to obtain the probed depth at which the wall was struck. A lateral offset, and/or orientation, of the e-beam is controllable, so as to allow generating localized electron clouds at each of a plurality of depths inside the inspection hole, and thereby obtain information at least about a two-dimensional geometry of the inspection hole.

公开(公告)号：US20230221112A1

公开(公告)日：2023-07-13

申请号：US17574055

申请日：2022-01-12

Applicant: Applied Materials Israel Ltd.

Inventor： David Goldovsky ,  Ido Almog ,  Ronny Barnea

IPC: G01B15/04 ,  H01J37/28 ,  H01J37/244 ,  H01J37/285

CPC classification number: G01B15/04 ,  H01J37/28 ,  H01J37/244 ,  H01J37/285

Abstract: Disclosed herein is a system for profiling holes in non-opaque samples. The system includes: (i) an e-beam source configured to project an e-beam into an inspection hole in a sample, such that a wall of the inspection hole is struck and a localized electron cloud is produced; (ii) a light sensing infrastructure configured to sense cathodoluminescent light, generated by the electron cloud; and (iii) a computational module configured to analyze the measured signal to obtain the probed depth at which the wall was struck. A lateral offset, and/or orientation, of the e-beam is controllable, so as to allow generating localized electron clouds at each of a plurality of depths inside the inspection hole, and thereby obtain information at least about a two-dimensional geometry of the inspection hole.

公开(公告)号：US20230071801A1

公开(公告)日：2023-03-09

申请号：US17878113

申请日：2022-08-01

Applicant: Hitachi High-Tech Corporation

Inventor： Momoyo ENYAMA ,  Akira IKEGAMI ,  Takeshi MORIMOTO ,  Shun KIZAWA

IPC: H01J37/10 ,  H01J37/285 ,  H01J37/22 ,  H01J37/21

Abstract: An electron beam application apparatus includes: an optical system configured to irradiate a sample with excitation light; an electron optical system configured to project, onto a camera, a photoelectron image formed by photoelectrons emitted from the sample irradiated with the excitation light; and a control unit. The optical system includes a light source configured to generate the excitation light and a pattern forming unit. The excitation light forms an optical pattern on a surface of the sample when the pattern forming unit is turned on, and the excitation light is emitted to the sample without forming the optical pattern on the surface of the sample when the pattern forming unit is turned off. The control unit adjusts the electron optical system based on feature data of a bright and dark pattern formed by the optical pattern in the photoelectron image obtained by turning on the pattern forming unit.

公开(公告)号：US11340256B2

公开(公告)日：2022-05-24

申请号：US16319620

申请日：2018-01-31

Applicant: CAMECA INSTRUMENTS INC.

Inventor： Joseph Hale Bunton ,  Daniel Robert Lenz ,  Dana Jeffrey Shepard

IPC: H01J37/285 ,  G01Q60/30 ,  G01N27/626 ,  G01N27/66 ,  G01Q60/38

Abstract: An atom probe directs two or more pulsed laser beams onto a specimen, with each laser beam being on a different side of the specimen, and with each laser beam supplying pulses at a time different from the other laser beams. The laser beams are preferably generated by splitting a single beam provided by a laser source. The laser beams are preferably successively aligned incident with the specimen by one or more beam steering mirrors, which may also scan each laser beam over the specimen to achieve a desired degree of specimen ionization.

公开(公告)号：US20210254209A1

公开(公告)日：2021-08-19

申请号：US16790559

申请日：2020-02-13

Applicant: UCHICAGO ARGONNE, LLC

Inventor： Jeffrey W. Elam ,  Anil U. Mane ,  Maximillian Gebhard

IPC: C23C16/30 ,  C23C16/44 ,  C23C16/455 ,  H01J37/285

Abstract: A secondary electron emissive coating. The coating is formed by atomic layer deposition of CaF2 on a substrate by ALD half cycle exposure of an alkaline metal amidinate and ALD half cycle exposure of a fluorinated compound, where the deposition occurs at a reaction temperature greater than a highest sublimation temperature of the first metal precursor and the second metal precursor and less than 50° C. above the highest sublimation temperature.

公开(公告)号：US10971329B2

公开(公告)日：2021-04-06

申请号：US16074601

申请日：2016-02-05

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Shinichi Matsubara ,  Hiroyasu Shichi ,  Tomihiro Hashizume ,  Yoshimi Kawanami

IPC: H01J37/285 ,  H01J37/08 ,  G02B21/00 ,  H01J27/02

Abstract: An H3+ ion is used as an ion beam to achieve improvement in focusing capability influencing observed resolution and machining width, improvement in the beam stability, and a reduction in damage to the sample surface during the beam irradiation, in the process of observation and machining of the sample surface by the ion beam. The H3+ ion can be obtained by use of a probe current within a voltage range 21 around a second peak 23 occurring when an extracted voltage is applied to a needle-shaped emitter tip with an apex terminated by three atoms or less, in an atmosphere of hydrogen gas.

公开(公告)号：US20210090844A1

公开(公告)日：2021-03-25

申请号：US17099476

申请日：2020-11-16

Applicant: KLA Corporation

Inventor： Robert Haynes ,  Aron Welk ,  Tomas Plettner ,  John Gerling ,  Mehran Nasser Ghodsi

IPC: H01J37/10 ,  H01J37/02 ,  H01J37/14 ,  H01J37/147 ,  H01J37/28 ,  H01J37/285

Abstract: A multi-column scanning electron microscopy (SEM) system includes a column assembly, where the column assembly includes a first substrate array assembly and at least a second substrate array assembly. The system also includes a source assembly, the source assembly including two or more illumination sources configured to generate two or more electron beams and two or more sets of a plurality of positioners configured to adjust a position of a particular illumination source of the two or more illumination sources in a plurality of directions. The system also includes a stage configured to secure a sample, where the column assembly directs at least a portion of the two or more electron beams onto a portion of the sample.