公开(公告)号：US20150239022A1

公开(公告)日：2015-08-27

申请号：US14415973

申请日：2013-07-10

Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.

Inventor： Junpei Kobayashi ,  Taku Kato ,  Masayoshi Suzuki

IPC: B08B17/06 ,  B29C59/16

CPC classification number: C08J5/18 ,  B05D1/40 ,  B05D3/06 ,  B08B17/06 ,  B08B17/065 ,  B29C59/022 ,  B29C59/026 ,  B29C59/16 ,  B29C2059/023 ,  B29K2033/04 ,  B29K2083/00 ,  B29K2105/0005 ,  B29K2995/007 ,  B29L2011/00 ,  C08G18/2825 ,  C08G18/6725 ,  C08G18/73 ,  C08G18/7642 ,  C08G18/792 ,  C08G18/8029 ,  C08G77/14 ,  C08G77/46 ,  C08J2475/16 ,  G02B1/18 ,  G02B27/0006 ,  H01L31/02366 ,  H01L33/44 ,  H01L2924/0002 ,  Y02E10/50 ,  Y10T428/24479 ,  Y10T428/24612 ,  H01L2924/00

Abstract: A structure having dry-wiping off characteristic relative to dirt attached to a concave-convex shaped surface of the structure, and a method for producing the structure. A structure having a concave-convex shaped surface, fabricated from a composition containing at least one compound having in a molecule, one to ten polymerizable group(s) and a photopolymerization initiator, wherein the structure has a Martens hardness of 3 N/mm2 or more and 130 N/mm2 or less when the Martens hardness of the structure is measured under a condition under which a Martens hardness of a molten quartz is 4,100 N/mm2. The structure is produced by applying the composition onto a substrate; pressing a coating film on the substrate into a concave-convex shaped face of a mold; photocuring the coating film while it is pressed into the concave-convex shaped face of the mold; and peeling the cured film on the substrate from the mold.

Abstract translation: 具有相对于附着于该结构体的凹凸形状的表面的污物具有干擦拭特性的结构体及其制造方法。 由含有至少一种分子中的化合物，1〜10个聚合性基团和光聚合引发剂的组合物制成的具有凹凸形状的结构体，其特征在于，所述结构体的马氏体硬度为3N / mm 2， 当在熔融石英的马氏体硬度为4100N / mm 2的条件下测量结构的马氏体硬度时，测得130N / mm2以下。 该结构通过将该组合物施加到基底上而制成; 将基板上的涂膜压入模具的凹凸面; 在将涂布膜压入模具的凹凸形状的表面的同时对涂膜进行光固化; 并从模具剥离基板上的固化膜。

公开(公告)号：US09115428B2

公开(公告)日：2015-08-25

申请号：US14001939

申请日：2012-01-02

Applicant: Winfried Hoehn ,  Helmut Oberhoffer ,  Benjamin Johannes Liebscher ,  Reiner Sauer

Inventor： Winfried Hoehn ,  Helmut Oberhoffer ,  Benjamin Johannes Liebscher ,  Reiner Sauer

IPC: C23C2/28 ,  B05D3/06 ,  C23C26/00 ,  C23C2/08 ,  C25D5/50

CPC classification number: C23C26/00 ,  B05D3/06 ,  C23C2/08 ,  C23C2/28 ,  C23C2/285 ,  C25D5/505 ,  Y10T428/12722 ,  Y10T428/12799 ,  Y10T428/12937

Abstract: The invention relates to a method for enhancing a metallic coating on a steel strip or steel plate, the coating being melted by heating to a temperature above the melting temperature of the material of the coating, the heating taking place by irradiation of the surface of the coating with electromagnetic radiation having a high power density over a limited irradiation time of not more than 10 μs, and the mandated irradiation time and the energy density introduced into the coating by the electromagnetic radiation being selected such that the coating melts completely over its entire thickness down to the boundary layer with the steel strip, thereby forming a thin alloy layer at the boundary layer between the coating and the steel strip. The invention further relates to a steel strip or steel plate having a metallic coating, more particularly a coating of tin, zinc or nickel, in which, at the boundary layer between the steel and the coating, an alloy layer which is thin—compared with the thickness of the coating—and at the same time is dense, and is composed of iron atoms and atoms of the coating material, is formed, the thickness of the alloy layer corresponding to an alloy-layer add-on of less than 0.3 g/m2.

Abstract translation: 本发明涉及一种用于增强钢带或钢板上的金属涂层的方法，该涂层通过加热熔化至高于涂层材料的熔融温度的温度，通过照射该涂层的表面进行加热 在不超过10μs的有限的照射时间内用具有高功率密度的电磁辐射进行涂覆，并且通过选择电磁辐射来引入到涂层中的强制照射时间和能量密度使得涂层在整个厚度上完全熔化 直到钢带的边界层，从而在涂层和钢带之间的边界层处形成薄的合金层。 本发明还涉及一种具有金属涂层的钢带或钢板，特别是锡，锌或镍的涂层，其中在钢和涂层之间的边界层处，与 涂层的厚度 - 同时是致密的，由铁原子和涂层材料的原子组成，合金层的厚度对应于合金层附着量小于0.3g / m2。

公开(公告)号：US09095874B2

公开(公告)日：2015-08-04

申请号：US14171298

申请日：2014-02-03

Applicant: NCC NANO, LLC

Inventor： Kurt A Schroder ,  Karl M Martin ,  Doug K. Jackson ,  Steven C McCool

IPC: H05B41/14 ,  B05D3/06 ,  F26B3/34 ,  H05B41/34 ,  H05K3/12 ,  H05K1/09

CPC classification number: H05K3/1283 ,  B05D3/06 ,  F26B3/343 ,  H05B41/34 ,  H05B41/38 ,  H05K1/095 ,  H05K1/097 ,  H05K2203/1545

Abstract: A curing apparatus for thermally processing thin films on low-temperature substrates at high speeds is disclosed. The curing apparatus includes a strobe head, a strobe control module and a conveyor control module. The strobe control module controls the power, duration and repetition rate of a set of pulses generated by a flash lamp on the strobe head. The conveyor control module along with the strobe control module provide real-time synchronization between the repetition rate of the set of pulses and the speed at which the substrate is being moved under the strobe head, according to the speed information.

Abstract translation: 公开了一种用于在低温基板上高速热处理薄膜的固化装置。 固化设备包括闪光灯头，闪光灯控制模块和输送机控制模块。 选通控制模块控制由闪光灯在闪光灯头上产生的一组脉冲的功率，持续时间和重复率。 输送机控制模块与选通控制模块一起提供脉冲组的重复率与基板在频闪头之下的速度之间的实时同步，速度信息。

公开(公告)号：US09067238B2

公开(公告)日：2015-06-30

申请号：US13741446

申请日：2013-01-15

Applicant: MacDermid Acumen, Inc.

Inventor： Robert Hamilton ,  Ernest Long ,  Andrew M. Krol

IPC: B05D1/18 ,  B05D3/00 ,  C08J7/18 ,  B05D3/06 ,  C23C18/16 ,  C23C18/20 ,  C23C18/38 ,  H05K3/18

CPC classification number: B05D3/06 ,  C23C18/1612 ,  C23C18/204 ,  C23C18/2086 ,  C23C18/38 ,  H05K3/185 ,  H05K2201/0236 ,  H05K2201/09118 ,  H05K2203/0786 ,  H05K2203/107 ,  H05K2203/122

Abstract: A method of treating a laser-activated thermoplastic substrate having a metal compound dispersed therein is described. The substrate is contacted with an aqueous composition comprising: (i) a thiol functional organic compound; (ii) an ethoxylated alcohol surfactant; and (iii) xanthan gum. By use of the treatment composition, when the substrate is subsequently laser-activated and plated by electroless plating, extraneous plating of the substrate is substantially eliminated.

公开(公告)号：US09034439B2

公开(公告)日：2015-05-19

申请号：US13539520

申请日：2012-07-02

Applicant: Tahsin J. Chow ,  Chung-Chih Wu ,  Ta-Hsien Chuang ,  Hsing-Hung Hsieh ,  Hsin-Hui Huang

Inventor： Tahsin J. Chow ,  Chung-Chih Wu ,  Ta-Hsien Chuang ,  Hsing-Hung Hsieh ,  Hsin-Hui Huang

IPC: C07C25/22 ,  C07C49/665 ,  C07C49/683 ,  C07C49/753 ,  C07D333/08 ,  C07C205/45 ,  C07C255/56 ,  B05D1/32 ,  B05D3/02 ,  B05D3/06 ,  H01L51/00

CPC classification number: C07C25/22 ,  B05D1/327 ,  B05D3/0254 ,  B05D3/06 ,  C07C49/665 ,  C07C49/683 ,  C07C49/753 ,  C07C205/45 ,  C07C255/56 ,  C07C2603/86 ,  C07C2603/90 ,  C07D333/08 ,  H01L51/0003 ,  H01L51/0055 ,  H01L51/0068 ,  Y02E10/549

Abstract: The present disclosure relates to methods and systems for synthesis of bridged-hydropentacene, hydroanthracene and hydrotetracene from the precursor compounds pentacene derivatives, tetracene derivatives, and anthracene derivatives. The invention further relates to methods and systems for forming thin films for use in electrically conductive assemblies, such as semiconductors or photovoltaic devices.

Abstract translation: 本公开内容涉及从前体化合物并五苯衍生物，并四苯衍生物和蒽衍生物合成桥联 - 水合氢，氢蒽和氢化四苯的方法和系统。 本发明还涉及用于形成用于诸如半导体或光伏器件的导电组件中的薄膜的方法和系统。

公开(公告)号：US20150118444A1

公开(公告)日：2015-04-30

申请号：US14068840

申请日：2013-10-31

Applicant: GENERAL ELECTRIC COMPANY

Inventor： Don Mark Lipkin ,  Curtis Alan Johnson ,  Joshua Lee Margolies ,  Larry Steven Rosenzweig ,  Julin Wan

IPC: C04B41/00 ,  B05D5/00 ,  B05D3/00 ,  B05D1/02 ,  B05D1/32 ,  B05D3/06

CPC classification number: C04B41/009 ,  B05D1/02 ,  B05D1/32 ,  B05D3/007 ,  B05D3/06 ,  B05D5/00 ,  C04B41/52 ,  C04B41/89 ,  F01D5/286 ,  F01D5/288 ,  F05D2300/2261 ,  F05D2300/2283 ,  Y10T428/24521 ,  Y10T428/24545 ,  C04B35/565 ,  C04B35/806 ,  C04B41/5096 ,  C04B41/5024 ,  C04B41/0036 ,  C04B41/53

Abstract: A method of forming an article includes forming a silicon-containing layer on a silicon-containing region of a surface of a substrate of the article; forming a plurality of channels and ridges in the silicon-containing layer; and forming at least one outer layer overlying the surface of the silicon-containing region. The plurality of channels and ridges may be formed by adding silicon-containing material to the silicon-containing layer. The channels and ridges may be formed by subtracting material from the silicon-containing layer. The channels and ridges may be formed by forming channels or grooves in the silicon-containing region of the surface of the substrate prior to formation of the silicon-containing layer.

Abstract translation: 形成制品的方法包括在制品的基材的表面的含硅区域上形成含硅层; 在所述含硅层中形成多个通道和脊; 以及形成覆盖所述含硅区域的表面的至少一个外层。 可以通过将含硅材料添加到含硅层来形成多个通道和脊。 可以通过从含硅层减去材料来形成通道和脊。 沟道和脊可以通过在形成含硅层之前在衬底的表面的含硅区域中形成通道或沟槽而形成。

公开(公告)号：US08993060B2

公开(公告)日：2015-03-31

申请号：US12273791

申请日：2008-11-19

Applicant: Shuaigang Xiao ,  Xiaomin Yang

Inventor： Shuaigang Xiao ,  Xiaomin Yang

IPC: B05D5/00 ,  G11B5/82 ,  B05D1/32 ,  B05D3/06 ,  B81C1/00 ,  B82Y10/00 ,  G11B5/74 ,  G11B5/855

CPC classification number: G11B5/84 ,  B05D1/322 ,  B05D3/00 ,  B05D3/06 ,  B05D5/00 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  G03F7/0002 ,  G11B5/59633 ,  G11B5/743 ,  G11B5/746 ,  G11B5/82 ,  G11B5/855 ,  Y10T428/24802

Abstract: A method includes: providing a substrate having a plurality of chemically contrasted alignment features, and depositing a self-assembled material on at least a portion of the substrate, wherein the position and/or orientation of substantially spherical or cylindrical domains of the self-assembled material is directed by the alignment features, to form a nanostructure pattern, and wherein the period of the alignment features is between about 2 times and about 10 times the period of the spherical or cylindrical domains. An apparatus fabricated according to the method is also provided.

Abstract translation: 一种方法包括：提供具有多个化学对比对准特征的衬底，以及在衬底的至少一部分上沉积自组装材料，其中自组装的基本上球形或圆柱形域的位置和/或取向 材料由对准特征引导以形成纳米结构图案，并且其中对准特征的周期在球形或圆柱形区域的周期的约2倍至约10倍之间。 还提供了根据该方法制造的装置。

公开(公告)号：US08985050B2

公开(公告)日：2015-03-24

申请号：US12940703

申请日：2010-11-05

Applicant: Robert J Von Gutfeld

Inventor： Robert J Von Gutfeld

IPC: B05C1/06 ,  B05C1/04 ,  B05D3/06 ,  C25D17/00 ,  C25D5/10 ,  C25D5/38 ,  C25D5/36 ,  C25D5/34 ,  C25D5/44

CPC classification number: C25D5/34 ,  B05C1/06 ,  B05D3/06 ,  C25D5/36 ,  C25D5/38 ,  C25D5/44 ,  C25D17/00

Abstract: Method of ablating the surface of a substrate including providing a dry substrate and an electrolyte source, ablating the surface of the dry substrate to at least partially remove a native oxide layer, and immersing the ablated dry substrate in the electrolyte source, in which the dry substrate is ablated prior to being introduced into the electrolyte source. Also provided is a method of ablating the surface of a substrate that includes providing a dry substrate and an electrolyte, depositing a portion of the electrolyte on the substrate at a thickness of less than 10 microns and ablating the surface of the substrate with the electrolyte applied thereon. System for use in the ablation of the surface of a substrate are also provided.

Abstract translation: 消除基材表面的方法，包括提供干基质和电解质源，对干基质表面进行烧蚀以至少部分除去天然氧化物层，以及将消融的干基质浸入电解质源中，其中干燥 衬底在被引入电解质源之前被消融。 还提供了一种消除基底表面的方法，其包括提供干燥的基底和电解质，将电解质的一部分沉积在基底上，厚度小于10微米，并且用施加的电解质来烧蚀基底的表面 上。 还提供了用于消除基底表面的系统。

公开(公告)号：US20150056410A1

公开(公告)日：2015-02-26

申请号：US14533126

申请日：2014-11-05

Applicant: Cuptronic Technology Ltd.

Inventor： Sven GÖTHE ,  Björn ATTHOFF

IPC: B05D7/00 ,  B05D5/00 ,  C08J7/04 ,  B05D3/06

CPC classification number: B05D7/548 ,  B05D3/06 ,  B05D5/00 ,  C08J7/045 ,  C08J2355/02 ,  C08J2369/00 ,  C08J2433/02 ,  C23C18/1608 ,  C23C18/1612 ,  C23C18/182 ,  C23C18/1844 ,  C23C18/1868 ,  C23C18/1882 ,  C23C18/2006 ,  C23C18/204 ,  C23C18/2086 ,  C23C18/30 ,  Y10T428/24355

Abstract: A process for application of metal on a substrate surface comprises applying a mixture of a solvent, a polymerizable monomer, and a photoinitiator on a substrate surface, wherein the photoinitiator does not form two phases together with the monomer and the solvent, i.e. it forms an amorphous mixture without any crystals. The monomer is able to polymerize to a polymer comprising at least one carboxylic group. Thereafter the solvent is evaporated. Polymerization is induced by irradiating the applied dried mixture. Ions are applied and reduced to metal and thereafter further metal can be deposited. The method can be used in industrial processes, both 2D and 3D surfaces can be coated with metal. Materials sensitive to standard grafting chemicals and/or polymers containing halogen atoms can be coated.

Abstract translation: 在基材表面上施用金属的方法包括在基材表面上涂覆溶剂，可聚合单体和光引发剂的混合物，其中光引发剂与单体和溶剂一起不形成两相，即它形成 无定形混合物，无任何晶体。 单体能够聚合成包含至少一个羧基的聚合物。 然后蒸发溶剂。 通过照射施加的干燥混合物诱导聚合。 离子被施加并还原成金属，此后可以沉积更多的金属。 该方法可用于工业过程中，2D和3D表面均可镀金属。 对标准接枝化学品和/或含有卤素原子的聚合物敏感的材料可以被涂覆。

公开(公告)号：US20150037513A1

公开(公告)日：2015-02-05

申请号：US14489035

申请日：2014-09-17

Applicant: NeoPhotonics Corporation

Inventor： Xiangxin Bi ,  Herman A. Lopez ,  Prasad Narasimha ,  Eric Euvrard ,  Ronald J. Mosso

IPC: G02B1/12 ,  B05D3/06 ,  B05D1/12

CPC classification number: G02B1/12 ,  B05D1/12 ,  B05D3/06 ,  C03B19/01 ,  C03B19/1415 ,  C03B37/0128 ,  C03B37/01294 ,  C03B37/01406 ,  C03B37/01413 ,  C03B37/0142 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2207/34 ,  C23C16/401 ,  C23C16/482 ,  C23C16/483 ,  C23C16/56 ,  C23C24/00 ,  C23C24/04 ,  G02B6/036 ,  G02B6/132 ,  Y02P40/57

Abstract: High rate deposition methods comprise depositing a powder coating from a product flow. The product flow results from a chemical reaction within the flow. Some of the powder coatings consolidate under appropriate conditions into an optical coating. The substrate can have a first optical coating onto which the powder coating is placed. The resulting optical coating following consolidation can have a large index-of-refraction difference with the underlying first optical coating, high thickness and index-of-refraction uniformity across the substrate and high thickness and index-of-refraction uniformity between coatings formed on different substrates under equivalent conditions. In some embodiments, the deposition can result in a powder coating of at least about 100 nm in no more than about 30 minutes with a substrate having a surface area of at least about 25 square centimeters.

Abstract translation: 高速沉积方法包括从产品流中沉积粉末涂层。 产物流由流动内的化学反应产生。 一些粉末涂料在合适的条件下固化成光学涂层。 基底可以具有第一光学涂层，其上放置粉末涂层。 固结后的所得光学涂层可以具有与基底的第一光学涂层，基底上的高厚度和折射率均匀性的较大的折射率差异，以及形成在不同的涂层之间的涂层之间的高厚度和折射率均匀性 在相同条件下的底物。 在一些实施方案中，沉积可导致至少约100nm的粉末涂层，其表面积至少约25平方厘米，其表面积至少约为25平方厘米。