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    High purity transparent silica glass
    71.
    发明授权
    High purity transparent silica glass 有权
    高纯度透明石英玻璃

    公开(公告)号：US6133178A

    公开(公告)日：2000-10-17

    申请号：US204160

    申请日：1998-12-03

    Applicant: Nobusuke Yamada ,  Shinkichi Hashimoto ,  Koji Tsukuma ,  Tomoyuki Akiyama ,  Yoshikazu Kikuchi ,  Hideaki Segawa

    Inventor： Nobusuke Yamada ,  Shinkichi Hashimoto ,  Koji Tsukuma ,  Tomoyuki Akiyama ,  Yoshikazu Kikuchi ,  Hideaki Segawa

    IPC: C03B19/06 ,  C03C3/06

    CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B20/00 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/50 ,  C03C2203/10

    Abstract: A high-purity transparent silica glass containing Fe, Na and K impurities each in an amount of 0.01-0.3 ppm, and an OH group in an amount of 0-3 ppm; among the Fe impurities, the content of metallic Fe having a valency of +0 being not larger than 0.1 ppm. This transparent silica glass exhibits, even when it is maintained at 900-1,400.degree. C. for at least 20 hours, an extinction coefficient of not larger than 0.009 at a wavelength of 400 nm, and does not become colored as visually examined. The silica glass is made by a process wherein powdery silica filled in a mold cavity is melted at 1,700.degree. C. or higher, characterized in that the melting is conducted in a graphite mold having a porous high-purity graphite layer provided on the mold inner surface so that the filled silica is not contacted with the mold; said porous layer having a bulk density of 0.1-1.5 g/cm.sup.3, and the content of each of Fe, Na and K impurities in the porous layer being not larger than 1 ppm.

    Abstract translation: 含有0.01-0.3ppm的Fe，Na和K杂质的高纯度透明石英玻璃，0-3ppm的OH基; 在Fe杂质中，化合价为+0的金属Fe的含量不大于0.1ppm。 该透明石英玻璃即使在900-1400℃保持至少20小时，在波长400nm下的消光系数不大于0.009，并且在目视检查中不会着色。 二氧化硅玻璃是通过将填充在模腔中的粉状二氧化硅在1700℃以上熔融的方法制造的，其特征在于，熔融在具有设置在模具内部的多孔高纯度石墨层的石墨模具中进行 使填充的二氧化硅不与模具接触; 所述多孔层的堆积密度为0.1〜1.5g / cm 3，多孔层中的Fe，Na，K杂质的含量不大于1ppm。

    Substrate having an active element array with low hydroxyl and chlorine
    72.
    发明授权
    Substrate having an active element array with low hydroxyl and chlorine 失效
    底物具有低羟基和氯的活性元素阵列

    公开(公告)号：US5349456A

    公开(公告)日：1994-09-20

    申请号：US9677

    申请日：1993-01-27

    Applicant: Toshihiko Iwanaga ,  Kazuyoshi Yoshida ,  Takusei Sato

    Inventor： Toshihiko Iwanaga ,  Kazuyoshi Yoshida ,  Takusei Sato

    IPC: C03C3/06 ,  C03C4/00 ,  G02F1/1333 ,  G02F1/136 ,  G02F1/1368

    CPC classification number: G02F1/1333 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2203/40 ,  G02F1/1368 ,  Y10S501/90

    Abstract: A synthetic quartz glass substrate (1) supporting active elements is formed of high-purity synthetic quartz glass having, a hydroxyl group content of 200 ppm or below and chlorine group content of 50 ppm or below. The substrate (1) may have an impurity level of 1 ppm or less sodium and 1 ppm or less aluminum. TFTs (6), i.e., active elements, and picture element electrodes (7) are formed on the surface of the synthetic quartz glass substrate (1) to construct a driving panel for a liquid crystal display of an active matrix type. A liquid crystal panel is formed by disposing the driving panel and a counter substrate (2) opposite to each other and sandwiching a liquid crystal layer (3) between the driving panel and the counter substrate (2).

    Abstract translation: 支承有源元件的合成石英玻璃基板（1）由羟基含量为200ppm以下，氯基含量为50ppm以下的高纯度合成石英玻璃形成。 衬底（1）可以具有1ppm或更少的钠和1ppm或更少的铝的杂质水平。 在合成石英玻璃基板（1）的表面上形成TFT（6）即有源元件和像素电极（7），构成有源矩阵型液晶显示器的驱动面板。 通过将驱动面板和对置基板（2）相对配置并将液晶层（3）夹在驱动面板和对置基板（2）之间来形成液晶面板。

    Fixation by anion exchange of toxic materials in a glass matrix
    74.
    发明授权
    Fixation by anion exchange of toxic materials in a glass matrix 失效
    通过玻璃基质中有毒物质的阴离子交换固定

    公开(公告)号：US4333847A

    公开(公告)日：1982-06-08

    申请号：US65752

    申请日：1979-08-10

    Applicant: Danh C. Tran ,  Pedro B. Macedo ,  Joseph H. Simmons ,  Catherine J. Simmons ,  Nicholas Lagakos

    Inventor： Danh C. Tran ,  Pedro B. Macedo ,  Joseph H. Simmons ,  Catherine J. Simmons ,  Nicholas Lagakos

    IPC: G21F9/02 ,  G21F9/30 ,  G21F9/36 ,  G21F9/16

    CPC classification number: C03C1/002 ,  C03C1/026 ,  C03C11/005 ,  C03C21/001 ,  C03C23/0095 ,  C03C3/06 ,  C03C3/061 ,  C03C3/089 ,  G21F9/02 ,  G21F9/305 ,  G21F9/36 ,  C03C2201/10 ,  C03C2201/20 ,  C03C2201/23 ,  C03C2201/3411 ,  C03C2201/3423 ,  C03C2201/3429 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2201/50 ,  C03C2201/54

    Abstract: This invention relates to the immobilization of toxic, e.g., radioactive materials, internally in a silicate glass or silica gel matrix for extremely long periods of time. Toxic materials, such as radioactive wastes containing radioactive anions, and in some cases cations, which may be in the form of liquids, or solids dissolved or dispersed in liquids or gases, are internally incorporated into a glass matrix, having hydrous organofunctionalsiloxy groups, e.g., hydrous aminoalkylsiloxy or carboxyorganosiloxy, bonded to silicon atoms of said glass and/or hydrous polyvalent metals bonded to silicon atoms of said glass through divalent oxygen linkages or otherwise immobilized therein, by a process which involves the ion exchange of said toxic, radioactive anions with hydroxyl groups attached to said organofunctionalsiloxy groups or with hydroxyl groups attached to the hydrous polyvalent metal. Thereafter, the resulting glass now characterized by a distribution of internally bonded or immobilized, toxic, radioactive anions can be packaged in suitable containers, and disposed of as by burial, and/or they can be sintered to collapse the pores thereof prior to disposal or for producing useful radiation sources. The porous glass or a porous silica gel having said silicon-bonded organofunctionalsiloxy groups and/or said hydrous polyvalent metal oxy groups, the pores of said glass or silica gel remaining open and uncollapsed, can be used advantageously as a backfill for an underground radioactive waste burial site and as overpack in the waste disposal container. Also included is a novel method for bonding the polyvalent metal to the porous silica glass or gel by substituting the protons of the silicon-bonded hydroxyl groups thereof with an alkali metal or ammonium cation followed by displacement of said cation with the non-radioactive polyvalent metal cation.

    Abstract translation: 本发明涉及在硅酸盐玻璃或硅胶基质中内部有毒的例如放射性物质固定极长时间。 含有放射性阴离子的放射性废物，以及在某些情况下，可能是液体形式的阳离子或溶解或分散在液体或气体中的固体的有毒材料内部加入到具有含水官能团的甲硅烷氧基的玻璃基质中，例如 ，含水氨基烷基甲硅烷氧基或羧基有机基甲硅烷氧基，通过涉及将所述有毒放射性阴离子与所述有机放射性阴离子的离子交换的方法，通过二价氧键键合到所述玻璃的硅原子和/或与所述玻璃的硅原子键合的含水多价金属， 连接到所述有机电致甲硅烷氧基基团的羟基或与水合多价金属连接的羟基的羟基。 此后，所得玻璃的特征在于内部结合或固定的，有毒的放射性阴离子的分布可以包装在合适的容器中，并且通过埋置进行处理和/或它们可以在处理之前烧结以使其孔隙塌缩，或 用于生产有用的辐射源。 所述多孔玻璃或多孔硅胶具有所述与硅键合的有机铁氧基甲硅烷氧基和/或所述含水多价金属氧基，所述玻璃或硅胶的孔保持开放和未破裂，可有利地用作地下放射性废物的回填 垃圾处理容器内的包装物， 还包括一种通过用碱金属或铵阳离子取代与硅键合的羟基的质子，然后用非放射性多价金属置换所述阳离子来将多价金属键合到多孔石英玻璃或凝胶上的新方法 阳离子。

    Stress profiles of glass-based articles having improved drop performance
    77.
    发明授权
    Stress profiles of glass-based articles having improved drop performance 有权

    公开(公告)号：US12122703B2

    公开(公告)日：2024-10-22

    申请号：US17480394

    申请日：2021-09-21

    Applicant: CORNING INCORPORATED

    Inventor： Xiaoju Guo ,  Jason Thomas Harris ,  Kevin Barry Reiman

    IPC: C03C21/00 ,  C03C3/097 ,  C03C10/00

    CPC classification number: C03C10/0027 ,  C03C3/097 ,  C03C21/002 ,  C03C2201/50 ,  C03C2204/00

    Abstract: Glass-based articles comprise stress profiles providing improved drop performance. A glass-based substrate comprises: a glass transition temperature (Tg), a liquid fragility index (m), and fictive temperature (Tf), wherein Tg is less than or equal to 650° C., a value of Tf minus Tg is greater than or equal to −30° C., and m is greater than or equal to 25. A stress relaxation rate is greater than or equal to 10%, or 20% or more. The articles can comprise a lithium-based aluminosilicate composition and a fracture toughness that is greater than or equal to 0.75 MPa*m0.5. The stress profiles comprise: a spike region extending from the first surface to a knee; and a tail region extending from the knee to a center of the glass-based article, the tail region comprising: a negative curvature region wherein a second derivative of stress as a function of depth is negative; a depth of compression (DOC) that is greater than or equal to 0.22t, and a parabolic region originating at the DOC and extending to the center of the glass-based article.

    Low-modulus ion-exchangeable glasses with enhanced thermal properties for manufacturing
    80.
    发明授权
    Low-modulus ion-exchangeable glasses with enhanced thermal properties for manufacturing 有权

    公开(公告)号：US11820703B2

    公开(公告)日：2023-11-21

    申请号：US17962772

    申请日：2022-10-10

    Applicant: CORNING INCORPORATED

    Inventor： Peter Joseph Lezzi

    IPC: C03C3/087 ,  C03C21/00

    CPC classification number: C03C21/002 ,  C03C3/087 ,  C03C2201/50

    Abstract: Ion-exchanged alkali aluminosilicate glass articles with a ratio of peak compressive stress value to Young's modulus value of 15 or more. The glass articles may include Al2O3 mol %+RO mol %≥17 mol %, where RO mol %=MgO mol %+CaO mol %, and be substantially free of ZnO, SrO, BaO, B2O3, P2O5, Li2O, and K2O. The glass articles may have a peak compressive stress value in a range of 500 MPa to 1300 MPa. The glass articles are suitable for various high-strength applications, including cover glass applications that experience significant bending stresses during use, for example, cover glasses for flexible displays.

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