中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

134 records (took 0.016 seconds)

    Deceleration lens
    72.
    发明授权
    Deceleration lens 有权
    减速镜

    公开(公告)号：US08481960B2

    公开(公告)日：2013-07-09

    申请号：US13167399

    申请日：2011-06-23

    Applicant: Svetlana Radovanov ,  Jason Schaller ,  Richard White ,  Kevin Verrier ,  James Blanchette ,  Bon-Woong Koo ,  Eric Hermanson ,  Kevin Daniels

    Inventor： Svetlana Radovanov ,  Jason Schaller ,  Richard White ,  Kevin Verrier ,  James Blanchette ,  Bon-Woong Koo ,  Eric Hermanson ,  Kevin Daniels

    IPC: G21K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J49/42

    CPC classification number: H01J37/12 ,  H01J37/3171 ,  H01J2237/0213 ,  H01J2237/032 ,  H01J2237/0475

    Abstract: A system and method are disclosed for controlling an ion beam. A deceleration lens is disclosed for use in an ion implanter. The lens may include a suppression electrode, first and second focus electrodes, and first and second shields. The shields may be positioned between upper and lower portions of the suppression electrode. The first and second shields are positioned between the first focus electrode and an end station of the ion implanter. Thus positioned, the first and second shields protect support surfaces of said first and second focus electrodes from deposition of back-streaming particles generated from said ion beam. In some embodiments, the first and second focus electrodes may be adjustable to enable the electrode surfaces to be adjusted with respect to a direction of the ion beam. By adjusting the angle of the focus electrodes, parallelism of the ion beam can be controlled. Other embodiments are described and claimed.

    Abstract translation: 公开了用于控制离子束的系统和方法。 公开了用于离子注入机的减速透镜。 透镜可以包括抑制电极，第一和第二聚焦电极以及第一和第二屏蔽。 屏蔽件可以位于抑制电极的上部和下部之间。 第一和第二屏蔽件位于离子注入机的第一聚焦电极和端电极之间。 如此定位，第一和第二屏蔽件保护所述第一和第二聚焦电极的支撑表面不会沉积从所述离子束产生的回流颗粒。 在一些实施例中，第一和第二聚焦电极可以是可调节的，以使电极表面相对于离子束的方向被调整。 通过调整聚焦电极的角度，可以控制离子束的平行度。 描述和要求保护其他实施例。

    Anchoring inserts, electrode assemblies, and plasma processing chambers
    74.
    发明授权
    Anchoring inserts, electrode assemblies, and plasma processing chambers 有权
    锚固插件，电极组件和等离子体处理室

    公开(公告)号：US08187414B2

    公开(公告)日：2012-05-29

    申请号：US12409984

    申请日：2009-03-24

    Applicant: Randall Hardin ,  John Keihl ,  Duane Lytle

    Inventor： Randall Hardin ,  John Keihl ,  Duane Lytle

    IPC: C23C16/00 ,  H01L21/306 ,  C23F1/00

    CPC classification number: H01J37/04 ,  C23C16/4401 ,  C23C16/45565 ,  H01J37/3255 ,  H01J37/32605 ,  H01J37/32724 ,  H01J2237/032

    Abstract: A silicon-based showerhead electrode is provided where backside inserts are positioned in backside recesses formed along the backside of the electrode. The backside inserts comprise a threaded outside diameter, a threaded inside diameter, and a tool engaging portion formed in the threaded inside diameter. The tool engaging portion is formed such that the backside insert further comprises one or more lateral shielding portions between the tool engaging portion and the threaded outside diameter to prevent a tool engaged with the tool engaging portion of the backside insert from extending beyond the threaded outside diameter of the insert. Further, the tool engaging portion of the backside insert comprises a plurality of torque-receiving slots arranged about the axis of rotation of the backside insert. The torque-receiving slots are arranged to avoid on-axis rotation of the backside insert via opposing pairs of torque receiving slots.

    Abstract translation: 提供硅基喷头电极，其中后侧插入件位于沿着电极的背面形成的背面凹部中。 后侧插入件包括螺纹外径，螺纹内径和形成为螺纹内径的工具接合部分。 工具接合部分形成为使得后侧插入件还包括在工具接合部分和螺纹外径之间的一个或多个横向遮蔽部分，以防止与后侧插入件的工具接合部分接合的工具延伸超出螺纹外径 的插入。 此外，后侧插入件的工具接合部分包括围绕后侧插入件的旋转轴线布置的多个扭矩接收槽。 扭矩接收槽布置成避免背面插入件经由相对的扭矩接收槽对的轴向旋转。

    Showerhead electrode assemblies and plasma processing chambers incorporating the same
    75.
    发明授权
    Showerhead electrode assemblies and plasma processing chambers incorporating the same 有权
    喷头电极组件和包括其的等离子体处理室

    公开(公告)号：US08152954B2

    公开(公告)日：2012-04-10

    申请号：US11871586

    申请日：2007-10-12

    Applicant: Greg Bettencourt ,  Raj Dhindsa ,  George Diercks ,  Randall A. Hardin ,  Jon Keihl ,  Duane Lytle ,  Alexei Marakhtanov ,  Roger Patrick ,  John Pegg ,  Shannon Spencer

    Inventor： Greg Bettencourt ,  Raj Dhindsa ,  George Diercks ,  Randall A. Hardin ,  Jon Keihl ,  Duane Lytle ,  Alexei Marakhtanov ,  Roger Patrick ,  John Pegg ,  Shannon Spencer

    IPC: C23F1/00 ,  H01L21/306

    CPC classification number: H01J37/04 ,  C23C16/4401 ,  C23C16/45565 ,  H01J37/3255 ,  H01J37/32605 ,  H01J37/32724 ,  H01J2237/032

    Abstract: The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, and securing hardware, wherein the silicon-based showerhead electrode comprises a plurality of partial recesses formed in the backside of the silicon-based showerhead electrode and backside inserts positioned in the partial recesses. The thermal control plate comprises securing hardware passages configured to permit securing hardware to access the backside inserts. The securing hardware and the backside inserts are configured to maintain engagement of the thermal control plate and the silicon-based showerhead electrode and to permit disengagement of the thermal control plate and the silicon-based showerhead electrode while isolating the silicon-based electrode material of the silicon-based showerhead electrode from frictional contact with the securing hardware during disengagement.

    Abstract translation: 本发明一般涉及等离子体处理，更具体地，涉及其中使用的等离子体处理室和电极组件。 根据本发明的一个实施例，提供一种电极组件，其包括热控制板，硅基喷头电极和固定硬件，其中硅基喷头电极包括多个部分凹部，其形成在 硅基喷头电极和位于部分凹部中的背面插入件。 热控制板包括固定硬件通道，其配置成允许固定硬件以接近背面插入件。 固定硬件和背面插入件被配置为保持热控制板和硅基喷头电极的接合，并且允许热控制板和硅基喷头电极分离，同时隔离硅基电极材料的硅基电极材料 硅基喷头电极在分离时与固定硬件摩擦接触。

    ARC CHAMBER FOR AN ION IMPLANTATION SYSTEM
    77.
    发明申请
    ARC CHAMBER FOR AN ION IMPLANTATION SYSTEM 有权
    用于离子植入系统的电弧室

    公开(公告)号：US20090008570A1

    公开(公告)日：2009-01-08

    申请号：US11772822

    申请日：2007-07-02

    Applicant: Jung-Chi Chen

    Inventor： Jung-Chi Chen

    IPC: H01J27/08

    CPC classification number: H01J37/08 ,  H01J27/14 ,  H01J37/023 ,  H01J2237/032 ,  H01J2237/038

    Abstract: An arc chamber for an ion implantation system includes an exit aperture positioned at a wall of the arc chamber, filaments respectively positioned at two opposing sides within the arc chamber, and repeller structures respectively positioned at two opposing walls within the arc chamber between the filaments and the arc chamber. The repeller structure includes a repeller substrate with a screw axis for fitting the repeller structure to the arc chamber, an insulator positioned underneath the repeller substrate providing an electrical isolation between the repeller substrate and the arc chamber, and a conductive spacer covering a portion of the insulator positioned in between the insulator and the arc chamber.

    Abstract translation: 用于离子注入系统的电弧室包括位于电弧室的壁处的出口孔，分别位于电弧室内的两个相对侧的细丝和分别位于电弧室内的两个相对的壁之间的排斥结构， 电弧室。 反射器结构包括具有用于将反射器结构装配到电弧室的螺旋轴线的排斥衬底，位于推斥层衬底下方的绝缘体，其提供了在该斥力衬底和电弧室之间的电隔离，以及覆盖部分 绝缘体位于绝缘体和电弧室之间。

    UNIFORM PLASMA PROCESSING WITH A LINEAR PLASMA SOURCE
    78.
    发明公开
    UNIFORM PLASMA PROCESSING WITH A LINEAR PLASMA SOURCE 审中-公开

    公开(公告)号：US20240355592A1

    公开(公告)日：2024-10-24

    申请号：US18138629

    申请日：2023-04-24

    Applicant: Applied Materials, Inc.

    Inventor： Vladimir Nagorny ,  Rene George

    IPC: H01J37/32 ,  G06N3/084

    CPC classification number: H01J37/32568 ,  G06N3/084 ,  H01J37/32348 ,  H01J37/32449 ,  H01J2237/032 ,  H01J2237/20214

    Abstract: A plasma generating component for a process chamber includes a first pair of linear electrodes. Each electrode of the first pair of linear electrodes extends from a first edge of a plasma generating region of the plasma generating component to a second edge of the plasma generating region of the plasma generating component. Electrodes of the first pair of linear electrodes are substantially parallel. The plasma generating component further includes a second pair of linear electrodes, substantially parallel to the first pair of linear electrodes. The plasma generating component further includes a dielectric support to which the first pair of linear electrodes and the second pair of linear electrodes are secured.

    Lattice Based Voltage Standoff
    79.
    发明公开
    Lattice Based Voltage Standoff 审中-公开

    公开(公告)号：US20240177960A1

    公开(公告)日：2024-05-30

    申请号：US18070640

    申请日：2022-11-29

    Applicant: Applied Materials, Inc.

    Inventor： Adam M. McLaughlin ,  Craig R. Chaney

    IPC: H01J37/147 ,  H01J37/317

    CPC classification number: H01J37/147 ,  H01J37/3171 ,  H01J2237/032 ,  H01J2237/038

    Abstract: An insulator that has a lattice is disclosed. The insulator may have a shaft with two ends. The lattice may be disposed on the outer surface of the shaft. In some embodiments, one or more sheaths are used to cover portions of the shaft. A lattice may also be disposed on the inner wall and/or outer walls of the sheaths. The lattice serves to increase the tracking length between the two ends of the shaft. This results in longer times before failure. This insulator may be used in an ion implantation system to physically and electrically separate two components.

    LOW PROFILE EXTRACTION ELECTRODE ASSEMBLY
    80.
    发明申请
    LOW PROFILE EXTRACTION ELECTRODE ASSEMBLY 审中-公开

    公开(公告)号：US20180342367A1

    公开(公告)日：2018-11-29

    申请号：US15727910

    申请日：2017-10-09

    Applicant: Varian Semiconductor Equipment Associates, Inc.

    Inventor： Jeffrey A. BURGESS

    IPC: H01J37/147 ,  H01J37/317 ,  H01J37/08

    CPC classification number: H01J37/147 ,  H01J27/024 ,  H01J37/08 ,  H01J37/1471 ,  H01J37/3171 ,  H01J2237/032 ,  H01J2237/31701

    Abstract: A low profile extraction electrode assembly including an insulator having a main body, a plurality of spaced apart mounting legs extending from a first face of the main body, a plurality of spaced apart mounting legs extending from a second face of the main body opposite the first face, the plurality of spaced apart mounting legs extending from the second face offset from the plurality of spaced apart mounting legs extending from the first face in a direction orthogonal to an axis of the main body, the low profile extraction electrode assembly further comprising a ground electrode fastened to the mounting legs extending from the first face, and a suppression electrode fastened to the mounting legs extending from the second face, wherein a tracking distance between the ground electrode and the suppression electrode is greater than a focal distance between the ground electrode and the suppression electrode.

Patent Agency Ranking