公开(公告)号：US07457453B2

公开(公告)日：2008-11-25

申请号：US11782274

申请日：2007-07-24

Applicant: Takashi Hiroi ,  Masahiro Watanabe ,  Chie Shishido ,  Aritoshi Sugimoto ,  Maki Tanaka ,  Hiroshi Miyai ,  Asahiro Kuni ,  Yasuhiko Nara

Inventor： Takashi Hiroi ,  Masahiro Watanabe ,  Chie Shishido ,  Aritoshi Sugimoto ,  Maki Tanaka ,  Hiroshi Miyai ,  Asahiro Kuni ,  Yasuhiko Nara

IPC: G06K9/00

CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2021/8854 ,  G01N2021/8861 ,  G01N2021/8864 ,  G01R31/311 ,  G03F1/86 ,  G06T1/0007 ,  G06T7/0002 ,  G06T7/001 ,  G06T2200/24 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/28

Abstract: A pattern inspection apparatus including: an image detecting part for detecting a digital image of an object substrate; a display having a screen on which the digital image of the object substrate and/or a distribution of defect candidates in a map form are displayable; an input device for inputting information of a non-inspection region to be masked on the object substrate by defining a region on the screen on which said distribution of defect candidates is displayed in a map form; a memory part for storing coordinate data, pattern data or feature quantity data of the non-inspection region to be masked on the object substrate inputted on the screen by the input device; and a defect judging part in which the digital image detected by the image detecting part is examined in a state that a region matching with a condition stored in the memory part is masked and a defect is detected in a region other than said masked region.

Abstract translation: 一种图案检查装置，包括：图像检测部，用于检测对象基板的数字图像; 具有可以显示对象基板的数字图像的屏幕和/或以地图形式的缺陷候选的分布的显示器; 输入装置，用于通过在屏幕上定义要以掩模形式显示所述缺陷候选的分布的区域来输入要被掩蔽在对象基板上的不检查区域的信息; 用于存储由输入装置输入到屏幕上的待掩蔽的待检查区域的坐标数据，图案数据或特征量数据的存储部分; 以及缺陷判断部分，其中在与存储在存储器部分中的条件匹配的区域被屏蔽并且在除了所述屏蔽区域之外的区域中检测到缺陷的状态下，检查由图像检测部分检测到的数字图像。

公开(公告)号：US20080277583A1

公开(公告)日：2008-11-13

申请号：US12149218

申请日：2008-04-29

Applicant: Tasuku Yano ,  Zhaohui Cheng ,  Takashi Furukawa ,  Osamu Nasu

Inventor： Tasuku Yano ,  Zhaohui Cheng ,  Takashi Furukawa ,  Osamu Nasu

IPC: G01N23/00

CPC classification number: G01N23/225 ,  H01J37/026 ,  H01J37/248 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/28

Abstract: Electrification affected on a surface of a sample which is caused by irradiation of a primary charged particle beam is prevented when plural frames are integrated to obtain an image of a predetermined area of the sample in a charged particle beam apparatus. The predetermined area of the sample is scanned with a primary electron beam from an electron gun, and plural frames are generated and integrated while detecting generated secondary electrons with a detector to obtain the image of the predetermined area. If it is determined by a detection signal of the detector that an electrification amount at the predetermined area becomes a specified value when generating plural frames, an electricity removal voltage is applied to a boosting electrode to remove or reduce the electrification, prior to generation of the next frame. Accordingly, the signal-to-noise ratio of the image obtained by integrating plural frames can be improved.

Abstract translation: 当多个帧被一体化以防止在带电粒子束装置中的样品的预定区域的图像时，防止了由一次带电粒子束的照射引起的样品表面影响的电气化。 用来自电子枪的一次电子束扫描样品的预定区域，并且用检测器检测产生的二次电子并产生并整合多个帧以获得预定区域的图像。 如果通过检测器的检测信号确定当产生多个帧时，预定区域的通电量变为规定值，则在生成多个帧之前将电去除电压施加到升压电极以去除或减少通电， 下一帧。 因此，可以提高通过对多个帧进行积分而获得的图像的信噪比。

公开(公告)号：US07385194B2

公开(公告)日：2008-06-10

申请号：US11475934

申请日：2006-06-28

Applicant: Osamu Kamimura ,  Tadashi Kanosue ,  Yasunari Sohda ,  Susumu Goto

Inventor： Osamu Kamimura ,  Tadashi Kanosue ,  Yasunari Sohda ,  Susumu Goto

IPC: H01J37/28 ,  G01N13/10

CPC classification number: H01J37/265 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/3177 ,  H01J2237/24507 ,  H01J2237/24528 ,  H01J2237/28

Abstract: An object of the present invention is to measure a landing angle even in a multi electron beam lithography system in which current amount of each beam is small. Another object thereof is to measure an absolute value of the landing angle and a relative landing angle with the high SN ratio. In a transmission detector including two diaphragm plates (first and second diaphragms) and a detector, a detection angle determined by a distance between the first and second diaphragms and an aperture diameter of the second diaphragm is made equal to or smaller than the divergence angle of the electron beam to be measured, and the landing angle is determined based on the relation between a center of the fine hole of the first diaphragm and the center of the aperture of the second diaphragm at which the amount of detected current is maximum.

Abstract translation: 本发明的目的是即使在多束电子束光刻系统中也测量着色角，其中每个光束的电流量都很小。 其另一个目的是测量着陆角的绝对值和具有高SN比的相对着陆角。 在包括两个隔膜板（第一和第二隔膜）和检测器的传输检测器中，由第一和第二隔膜之间的距离和第二隔膜的孔径确定的检测角度等于或小于 基于第一膜片的细孔的中心与检测电流量最大的第二膜片的孔的中心之间的关系来确定待测量的电子束和着陆角。

公开(公告)号：US20080128635A1

公开(公告)日：2008-06-05

申请号：US11874604

申请日：2007-10-18

Applicant: Hidetaka SAWADA ,  Fumio HOSOKAWA

Inventor： Hidetaka SAWADA ,  Fumio HOSOKAWA

IPC: G21K1/08

CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J2237/1534 ,  H01J2237/2485 ,  H01J2237/28

Abstract: An aberration for correcting higher-order aberrations with a relatively small number of components. Let N1 be the aberration order at a first location. Let S1 be the symmetry at the first location. Let N2 be the aberration order at a second location. Let S2 be the symmetry at the second location. The produced combination aberration satisfies the following condition set 1. order=N1+N2−1 symmetry=|S1+S2| or |S2−S1| That is, two aberration-correcting elements (aberration-introducing elements) corresponding to the first and second locations, respectively, are prepared. An aberration satisfying the condition set 1 is corrected by making use of the produced combination aberration.

Abstract translation: 用相对较少数量的部件校正高阶像差的像差。 令N 1在第一位置处为像差顺序。 令S <1> 1在第一位置处是对称性。 令N <2>为第二位置处的像差顺序。 令S <2>为第二位置的对称性。 所产生的组合像差满足以下条件集1. <？in-line-formula description =“In-line formula”end =“lead”？> order = N＆lt; 1＆gt; N＆lt; 2＆ -1 <？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> 对称性= | S 1 + 2＆lt; 2＆gt ;. 或者“-in-line-formula description =”In-line Formulas“end =”tail“？>也就是说，两个像差 - 分别对应于第一和第二位置的校正元件（像差引入元件）。 通过利用所产生的组合像差校正满足条件集合1的像差。

公开(公告)号：US07365348B2

公开(公告)日：2008-04-29

申请号：US11758770

申请日：2007-06-06

Applicant: Jacques Gierak ,  Peter Hawkes

Inventor： Jacques Gierak ,  Peter Hawkes

IPC: G21G4/00

CPC classification number: B82Y30/00 ,  B82Y10/00 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/0653 ,  H01J2237/21 ,  H01J2237/24535 ,  H01J2237/2485 ,  H01J2237/28 ,  H01J2237/30438 ,  H01J2237/30472 ,  H01J2237/31749

Abstract: An adjusting device of an apparatus for generating a beam of charged particles, wherein said beam is for interacting with a target and wherein said adjusting device comprises interface means for receiving, from a user of the apparatus, a set of desired values of characteristics of the beam of charged particles; means for determining a set of nominal values of adjusting parameters of the apparatus, corresponding to said characteristics and for passing them to the apparatus; means for measuring said adjusting parameters of the apparatus, and for computing corresponding values of said characteristics of the beam; and means for determining whether a correction of said values of adjusting parameters is necessary.

Abstract translation: 一种用于产生带电粒子束的装置的调节装置，其中所述光束用于与目标相互作用，并且其中所述调节装置包括接口装置，用于从所述装置的用户接收一组期望的特征值 带电粒子束; 用于确定对应于所述特性并将其传递到所述装置的所述装置的调整参数的一组标称值的装置; 用于测量所述装置的所述调整参数并用于计算所述光束的所述特性的对应值的装置; 以及用于确定是否需要校正所述调整参数值的装置。

公开(公告)号：US20080093551A1

公开(公告)日：2008-04-24

申请号：US11773840

申请日：2007-07-05

Applicant: Ruriko TSUNETA ,  Masanari Koguchi ,  Hiromi Inada

Inventor： Ruriko TSUNETA ,  Masanari Koguchi ,  Hiromi Inada

IPC: H01J37/26 ,  G06K9/40

CPC classification number: H01J37/1475 ,  G06T5/006 ,  H01J37/153 ,  H01J37/222 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/1526 ,  H01J2237/1536 ,  H01J2237/221 ,  H01J2237/28 ,  H01J2237/2802 ,  H01J2237/2818 ,  H01J2237/2826 ,  H01J2237/3045

Abstract: An electric charged particle beam microscope measures a geometric distortion at an arbitrary magnification with high precision, and corrects the geometric distortion. A geometric distortion at a first magnification is measured as an absolute distortion based on a standard specimen having a cyclic structure. A microscopic structure specimen is photographed at a geometric distortion measured first magnification and at a geometric distortion unmeasured second magnification. The image at the first magnification is equally transformed to the second magnification to generate a scaled image. The geometric distortion at the second magnification is measured as a relative distortion based on the scaled image. The absolute distortion at the second magnification is obtained on the basis of the absolute distortion at the first magnification and the relative distortion at the second magnification. Subsequently, the second magnification is replaced with the first magnification, and the relative distortion measurement is repeated.

Abstract translation: 带电粒子束显微镜可以高精度地测量任意倍率的几何畸变，校正几何失真。 基于具有循环结构的标准样品，测量第一倍率下的几何失真作为绝对变形。 以几何失真测量的第一放大倍率和几何失真未测量的第二倍率拍摄微观结构样本。 将第一放大倍率下的图像等效地变换为第二放大率以生成缩放图像。 第二倍率下的几何畸变被测量为基于缩放图像的相对失真。 基于第一倍率下的绝对失真和第二倍率下的相对失真，获得第二放大倍率下的绝对失真。 随后，用第一倍率代替第二倍率，并重复相对失真测量。

公开(公告)号：US20080083884A1

公开(公告)日：2008-04-10

申请号：US11905803

申请日：2007-10-04

Applicant: Hiroyuki Kishimoto ,  Hirofumi Nakamae ,  Marina Kotani ,  Hidehiko Dohi ,  Hiroshi Jinnai ,  Takeshi Kaneko

Inventor： Hiroyuki Kishimoto ,  Hirofumi Nakamae ,  Marina Kotani ,  Hidehiko Dohi ,  Hiroshi Jinnai ,  Takeshi Kaneko

IPC: G21K5/10

CPC classification number: G01N3/04 ,  G01N3/08 ,  H01J37/20 ,  H01J37/26 ,  H01J2237/2007 ,  H01J2237/2062 ,  H01J2237/28

Abstract: Left and right sides of the mesh sandwiching the placing region therebetween are set as left and right to-be-fixed portions to be fixed to sample holder separation portions respectively to be moved in a stretch direction. A slit for dividing use is formed from a portion of the periphery of the mesh disposed between the left and right to-be-fixed portions thereof toward the rubber slice-placing position of the mesh in a direction orthogonal to the stretch direction of the rubber slice or a direction inclined thereto. When the to-be-fixed portions are moved in a separation direction by moving the sample holder separation portions, the mesh is divided into left and right parts by the slit for dividing use so that the rubber slice fixed to the left and right sides of the mesh is stretched.

Abstract translation: 将其间夹着放置区域的网的左右两侧分别设定为左右固定部，分别固定于试样保持架分离部，使其沿拉伸方向移动。 用于分割的狭缝由设置在其左右待固定部分之间的网的周边的一部分沿着与橡胶的拉伸方向正交的方向的网的橡胶片放置位置形成 切片或向其倾斜的方向。 当待固定部分通过移动样品架分离部分而在分离方向上移动时，通过用于分割的狭缝将网分成左右部分，使得固定在左侧和右侧的橡胶片 网格被拉伸。

公开(公告)号：US20080073582A1

公开(公告)日：2008-03-27

申请号：US11674262

申请日：2007-02-13

Applicant: Hiroyasu Shichi ,  Satoshi Tomimatsu ,  Noriyuki Kaneoka ,  Kaoru Umemura ,  Koji Ishiguro

Inventor： Hiroyasu Shichi ,  Satoshi Tomimatsu ,  Noriyuki Kaneoka ,  Kaoru Umemura ,  Koji Ishiguro

IPC: H01J37/08

CPC classification number: H01J37/261 ,  H01J37/20 ,  H01J37/3045 ,  H01J2237/08 ,  H01J2237/20207 ,  H01J2237/24528 ,  H01J2237/28 ,  H01J2237/31713 ,  H01J2237/3174 ,  H01J2237/31749

Abstract: The present invention provides an ion beam processing technology for improving the precision in processing a section of a sample using an ion beam without making a processing time longer than a conventionally required processing time, and for shortening the time required for separating a micro test piece without breaking the sample or the time required for making preparations for the separation. An ion beam processing apparatus is structured so that an axis along which an ion beam is drawn out of an ion source and an ion beam irradiation axis along which the ion beam is irradiated to a sample mounted on a first sample stage will meet at an angle. Furthermore, the ion beam processing apparatus has a tilting ability to vary an angle of irradiation, at which the ion beam is irradiated to the sample, by rotating a second sample stage, on which a test piece extracted from the sample by performing ion beam processing is mounted, about the tilting axis of the second sample stage. The ion beam processing apparatus is structured so that a segment drawn by projecting the axis, along which the ion beam is drawn out of the ion source, on a plane perpendicular to the ion beam irradiation axis can be at least substantially parallel to a segment drawn by projecting the tilting axis of the second sample stage on the plane perpendicular to the ion beam irradiation axis.

Abstract translation: 本发明提供了一种离子束处理技术，用于提高使用离子束处理样品的一部分的精度，而不需要比常规所需的处理时间长的处理时间，并且缩短了分离微测试件所需的时间，而没有 打破样品或准备分离所需的时间。 离子束处理装置被构造成使得离子束从离子源拉出的轴和离子束照射到安装在第一样品台上的样品的离子束照射轴将以一定角度相遇 。 此外，离子束处理装置具有通过旋转第二样品台而使离子束照射到样品上的照射角度的倾斜能力，通过进行离子束处理从样品中提取试验片 围绕第二样品台的倾斜轴安装。 离子束处理装置被构造成使得通过将离子束从离子源拉出的轴在垂直于离子束照射轴线的平面上突出的拉伸而绘制的区段可以至少基本上平行于拉伸的区段 通过将第二样品台的倾斜轴投影在垂直于离子束照射轴的平面上。

公开(公告)号：US20080067377A1

公开(公告)日：2008-03-20

申请号：US11760235

申请日：2007-06-08

Applicant: Masahiro Hatakeyama ,  Takeshi Murakami ,  Nobuharu Noji ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Satoshi Mori ,  Tsutomu Karimata

Inventor： Masahiro Hatakeyama ,  Takeshi Murakami ,  Nobuharu Noji ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Satoshi Mori ,  Tsutomu Karimata

IPC: G21K7/00

CPC classification number: H01J37/153 ,  H01J37/065 ,  H01J2237/061 ,  H01J2237/06375 ,  H01J2237/083 ,  H01J2237/1534 ,  H01J2237/24592 ,  H01J2237/28

Abstract: An electron beam apparatus for providing an evaluation of a sample, such as a semiconductor wafer, that includes a micro-pattern with a minimum line width not greater than 0.1 μm with high throughput. A primary electron beam generated by an electron gun is irradiated onto a sample and secondary electrons emanating from the sample are formed into an image on a detector by an image projection optical system. An electron gun 61 has a cathode 1 and a drawing electrode 3, and an electron emission surface 1a of the cathode defines a concave surface. The drawing electrode 3 has a convex surface 3a composed of a partial outer surface of a second sphere facing the electron emission surface 1a of the cathode and an aperture 73 formed through the convex surface for passage of the electrons. An aberration correction optical apparatus comprises two identically sized multi-polar Wien filters arranged such that their centers are in alignment with a 1/4 plane position and a ¾ plane position, respectively, along an object plane-image plane segment in the aberration correction optical apparatus, and optical elements having bidirectional focus disposed in an object plane position, an intermediate image-formation plane position and an image plane position, respectively, in the aberration correction optical apparatus.

Abstract translation: 一种用于提供诸如半导体晶片的样品的评估的电子束装置，其包括具有不大于0.1μm的最小线宽的微量图案，具有高生产量。 由电子枪产生的一次电子束照射在样品上，从样品发出的二次电子通过图像投影光学系统形成检测器上的图像。 电子枪61具有阴极1和拉伸电极3，阴极的电子发射表面1a限定凹面。 拉制电极3具有由面对阴极的电子发射表面1a的第二球体的部分外表面和由电子通过凸面形成的孔73构成的凸面3a。 像差校正光学装置包括两个相同大小的多极维恩滤波器，其布置成使得它们的中心分别与像差校正光学中的物平面图像平面段的1/4平面位置和¾平面位置对准 装置和具有分别设置在像差校正光学装置中的物平面位置，中间图像形成平面位置和图像平面位置的双向焦点的光学元件。

公开(公告)号：US07319336B2

公开(公告)日：2008-01-15

申请号：US11064127

申请日：2005-02-23

Applicant: Christof Baur ,  Robert J. Folaron ,  Adam Hartman ,  Philip C. Foster ,  Jay C. Nelson ,  Richard E. Stallcup, II

Inventor： Christof Baur ,  Robert J. Folaron ,  Adam Hartman ,  Philip C. Foster ,  Jay C. Nelson ,  Richard E. Stallcup, II

IPC: G01R31/305 ,  G01R31/02 ,  G01R31/26

CPC classification number: G01N1/28 ,  G01N1/32 ,  G01R31/307 ,  H01J37/3056 ,  H01J2237/20 ,  H01J2237/2008 ,  H01J2237/206 ,  H01J2237/24592 ,  H01J2237/2594 ,  H01J2237/28 ,  H01J2237/2817 ,  H01J2237/31745

Abstract: An apparatus including a positioner control device, a measuring device and a control routine. The positioner control device is communicatively coupled to a chamber of a charged particle beam device (CPBD) and is configured to individually manipulate each of a plurality of probes within the CPBD chamber to establish contact between ones of the plurality of probes and corresponding ones of a plurality of contact points of a sample positioned in the CPBD chamber. The measuring device is communicatively coupled to the CPBD and the positioner control device and is configured to perform one of a measurement and a detection of a characteristic associated with one of the plurality of contact points. The control routine is configured to at least partially automate control of at least one of the CPBD, the positioner control device and the measuring device.

Abstract translation: 一种包括定位器控制装置，测量装置和控制程序的装置。 定位器控制装置通信地耦合到带电粒子束装置（CPBD）的腔室，并且被配置为单独地操作CPBD室内的多个探针中的每一个，以建立多个探针中的一个探针和 位于CPBD室中的样品的多个接触点。 测量装置通信地耦合到CPBD和定位器控制装置，并被配置为执行与多个接触点之一相关联的特性的测量和检测中的一个。 控制程序被配置为至少部分地自动化对CPBD，定位器控制装置和测量装置中的至少一个的控制。