公开(公告)号：US08362441B2

公开(公告)日：2013-01-29

申请号：US12901468

申请日：2010-10-08

Applicant: Johan Joost Koning ,  Stijn Willem Herman Steenbrink ,  Bart Schipper

Inventor： Johan Joost Koning ,  Stijn Willem Herman Steenbrink ,  Bart Schipper

IPC: H01J37/12

CPC classification number: H01J3/26 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  Y10T29/49002

Abstract: The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.

公开(公告)号：US20120097861A1

公开(公告)日：2012-04-26

申请号：US13280162

申请日：2011-10-24

Applicant: Nicholas White ,  Zhimin Wan ,  Erik Collart

Inventor： Nicholas White ,  Zhimin Wan ,  Erik Collart

IPC: H01J3/20 ,  H01J3/14 ,  H01J3/26

CPC classification number: H01J37/05 ,  H01J3/04 ,  H01J3/26 ,  H01J37/1472 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/04756 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/151 ,  H01J2237/303 ,  H01J2237/31701

Abstract: A deceleration apparatus capable of decelerating a short spot beam or a tall. ribbon beam is disclosed. In either case, effects tending to degrade the shape of the beam profile are controlled. Caps to shield the ion beam from external potentials are provided. Electrodes whose position and potentials are adjustable are provided, on opposite sides of the beam, to ensure that the shape of the decelerating and deflecting electric fields does not significantly deviate from the optimum shape, even in the presence of the significant space-charge of high current low-energy beams of heavy ions.

Abstract translation: 减速装置，能够使短点梁或高度减速。 公开了带状束。 在任一种情况下，都会控制趋向于降低光束轮廓形状的效果。 提供了用于将离子束屏蔽到外部电位的盖子。 其位置和电位可调的电极设置在梁的相对两侧，以确保减速和偏转电场的形状不会显着偏离最佳形状，即使存在显着的空间电荷高 目前低能量的重离子束。

公开(公告)号：US20110215256A1

公开(公告)日：2011-09-08

申请号：US12931987

申请日：2011-02-15

Applicant: Takashi Ogawa ,  Kenichi Nishinaka ,  Yasuhiko Sugiyama

Inventor： Takashi Ogawa ,  Kenichi Nishinaka ,  Yasuhiko Sugiyama

IPC: H01J3/14 ,  H01J3/26

CPC classification number: H01J3/14 ,  H01J3/26

Abstract: A focused ion beam apparatus includes an ion gun unit having an emitter tip, a gas supply unit including an ion source gas nozzle configured to supply gas to the tip and an ion source gas supply source. An extracting electrode ionizes the gas adsorbed onto the surface of the tip and extracts ions by applying a voltage between the extracting electrode and the tip. A cathode electrode accelerates the ions toward a sample, and a gun alignment electrode positioned on the side of the sample with respect to the ion gun unit and adjusts the direction of irradiation of the ion beam ejected from the ion gun unit. A lens system includes a focusing lens electrode and an objective lens electrode to focus the ion beam onto the sample.

Abstract translation: 聚焦离子束装置包括具有发射极尖端的离子枪单元，气体供给单元，其包括被配置为向尖端供应气体的离子源气体喷嘴和离子源气体供给源。 提取电极通过在提取电极和尖端之间施加电压使吸附在尖端表面上的气体电离并提取离子。 阴极电极将离子朝向样品加速，并且枪对准电极相对于离子枪单元位于样品侧，并调节从离子枪单元喷射的离子束的照射方向。 透镜系统包括聚焦透镜电极和用于将离子束聚焦到样品上的物镜电极。

公开(公告)号：US20110192973A1

公开(公告)日：2011-08-11

申请号：US12931358

申请日：2011-01-27

Applicant: Albrecht Glasmachers ,  Alexander Laue ,  Michel Aliman ,  Hubert Mantz ,  Ulrike Zeile ,  Holger Dömer

Inventor： Albrecht Glasmachers ,  Alexander Laue ,  Michel Aliman ,  Hubert Mantz ,  Ulrike Zeile ,  Holger Dömer

IPC: H01J49/10 ,  H01J3/26 ,  B82Y30/00

CPC classification number: H01J37/265 ,  H01J3/26 ,  H01J37/244 ,  H01J37/256 ,  H01J37/28 ,  H01J49/063 ,  H01J49/065 ,  H01J49/10 ,  H01J2237/05 ,  H01J2237/2449 ,  H01J2237/2527

Abstract: An apparatus for transmission of energy of an ion to at least one gas particle and/or for transportation of an ion and a particle beam device having an apparatus such as this are disclosed. In particular, a container is provided, in which a gas is arranged which has gas particles, wherein the container has a transport axis. Furthermore, at least one first multipole unit and at least one second multipole unit are provided, which are arranged along the transport axis. The first multipole unit and the second multipole unit are formed by printed circuit boards. Furthermore, an electronic circuit is provided, which provides each multipole unit with a potential, such that a potential gradient is generated, in particular along the transport axis.

Abstract translation: 公开了一种用于将离子的能量传输到至少一个气体颗粒和/或用于输送离子的装置和具有这样的装置的粒子束装置。 特别地，提供一种容器，其中布置有气体颗粒的气体，其中容器具有输送轴线。 此外，提供沿着输送轴线布置的至少一个第一多极单元和至少一个第二多极单元。 第一多极单元和第二多极单元由印刷电路板形成。 此外，提供了一种电子电路，其为每个多极单元提供电势，使得产生电位梯度，特别是沿输送轴。

公开(公告)号：US20110049382A1

公开(公告)日：2011-03-03

申请号：US12870816

申请日：2010-08-28

Applicant: Tom Miller ,  Gene Mirro ,  Cornelis Sander Kooijman ,  Hendrik Jan De Vos

Inventor： Tom Miller ,  Gene Mirro ,  Cornelis Sander Kooijman ,  Hendrik Jan De Vos

IPC: H01J3/14

CPC classification number: H01J3/26 ,  H01J37/1472 ,  H01J37/1477 ,  H01J37/3026 ,  H01J2237/1504 ,  H01J2237/1518 ,  H01J2237/1526 ,  H01J2237/30416 ,  H01J2237/3045 ,  H01J2237/30461

Abstract: An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the invention, a digital filter is applied to the scan pattern prior to digital-to-analog (D/A) conversion in order to reduce or eliminate over-shoot effects that can result from TOF errors. In other embodiments, analog filters or the use of signal amplifiers with a lower bandwidth can also be used to compensate for TOF errors. By altering the scan pattern, over-shoot effects can be significantly reduced or eliminated.

Abstract translation: 引导带电粒子束的改进方法，其补偿带电粒子通过改变一个或多个偏转器信号而穿过系统所需的时间。 根据本发明的一个实施例，在数模（D / A）转换之前，将数字滤波器应用于扫描图案，以便减少或消除可能由TOF误差引起的过拍影响。 在其他实施例中，也可以使用模拟滤波器或具有较低带宽的信号放大器的使用来补偿TOF误差。 通过改变扫描图案，可以显着减少或消除超拍效果。

公开(公告)号：US20040217299A1

公开(公告)日：2004-11-04

申请号：US10853519

申请日：2004-05-26

Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE.

Inventor： Sang Kuk Choi ,  Dae Yong Kim ,  Dong Yel Kang

IPC: G01N021/00

CPC classification number: H01J9/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/1477 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1516 ,  H01J2237/31793

Abstract: The present invention relates to a deflector of a micro-column electron beam apparatus and method for fabricating the same, which forms a seed metal layer and a mask layer on both sides of a substrate, and exposes some of the seed metal layer on which deflecting plates, wirings and pads are to be formed by lithography process using a predetermined mask. The wirings and pads are formed by plating metal on the exposed portion, and some of the metal layer is also exposed on which the deflecting plates are to be formed using a predetermined mask, and then the metal is plated with desired thickness, thereby the deflecting plates are completed. Therefore, by forming plurality of deflecting plates on both sides of the substrate at the same time through plating process, alignment between the deflecting plates formed on both sides of the substrate can be exactly made, and by fabricating a deflector integrated with the substrate and deflecting plates in a batch process, productivity and reproducibility is improved. In addition, since the deflecting plates, wirings and pads are directly formed on the substrate, structural safety is improved and thereby durability is also improved.

公开(公告)号：US20040099811A1

公开(公告)日：2004-05-27

申请号：US10617703

申请日：2003-07-14

Inventor： Sang Kuk Choi ,  Dae Yong Kim ,  Dong Yel Kang

IPC: H01J003/26

CPC classification number: H01J9/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/1477 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1516 ,  H01J2237/31793

Abstract: The present invention relates to a deflector of a micro-column electron beam apparatus and method for fabricating the same, which forms a seed metal layer and a mask layer on both sides of a substrate, and exposes some of the seed metal layer on which deflecting plates, wirings and pads are to be formed by lithography process using a predetermined mask. The wirings and pads are formed by plating metal on the exposed portion, and some of the metal layer is also exposed on which the deflecting plates are to be formed using a predetermined mask, and then the metal is plated with desired thickness, thereby the deflecting plates are completed. Therefore, by forming plurality of deflecting plates on both sides of the substrate at the same time through plating process, alignment between the deflecting plates formed on both sides of the substrate can be exactly made, and by fabricating a deflector integrated with the substrate and deflecting plates in a batch process, productivity and reproducibility is improved. In addition, since the deflecting plates, wirings and pads are directly formed on the substrate, structural safety is improved and thereby durability is also improved.

Abstract translation: 微柱电子束装置的偏转器及其制造方法技术领域本发明涉及一种微柱电子束装置的偏转器及其制造方法，其在基板的两面形成种子金属层和掩模层，并使一些种子金属层露出偏转 板，布线和焊盘将通过使用预定掩模的光刻工艺形成。 布线和焊盘通过在暴露部分上电镀金属而形成，并且一些金属层也暴露在其上将使用预定掩模在其上形成偏转板，然后以期望的厚度镀覆金属，由此偏转 板块完成。 因此，通过电镀处理同时在基板的两面形成多个偏转板，可以精确地形成形成在基板两侧的偏转板之间的对准，并且通过制造与基板一体化的偏转板和偏转 分批处理板，提高了生产率和再现性。 此外，由于偏转板，布线和焊盘直接形成在基板上，所以结构安全性得到改善，从而也提高了耐久性。

公开(公告)号：US06329769B1

公开(公告)日：2001-12-11

申请号：US09275786

申请日：1999-03-25

Applicant: Yoshihiko Naito

Inventor： Yoshihiko Naito

IPC: H01J2970

CPC classification number: B01D53/007 ,  B01D2259/812 ,  H01J3/26

Abstract: To provide an electron beam irradiation device capable of avoiding a problem of convergence of an electron beam at the maximum scanning points, and constantly obtaining an irradiated region of uniform energy density, an electron beam irradiation device comprising an electron beam source 12, an accelerating tube 13 for accelerating electrons emitted from said electron beam source, a focusing electromagnet 16 for applying a magnetic field to a high energy electron beam, which is formed by the accelerating tube, for controlling the beam diameter of the electron beam, and an electromagnet 17 for deflecting and scanning the beam-diameter-controlled electron beam by applying a magnetic field to the electron beam, wherein an electric current component IF which is synchronized with an electric current IS of the scanning electromagnet 17 is superimposed on an electric current IF of the focusing electromagnet 16, thereby controlling the electric current IF of the focusing electromagnet in a manner that said beam diameter becomes maximum at the maximum scanning points.

Abstract translation: 为了提供能够避免电子束在最大扫描点会聚的问题的电子束照射装置，并且不断地获得均匀的能量密度的照射区域，电子束照射装置包括电子束源12，加速管 13，用于加速从所述电子束源发射的电子;聚焦电磁体16，用于对由加速管形成的用于控制电子束的光束直径的高能电子束施加磁场;电磁体17，用于 通过向电子束施加磁场来偏转和扫描光束直径受控的电子束，其中与扫描电磁体17的电流IS同步的电流分量IF被叠加在聚焦的电流IF上 电磁体16，从而控制聚光电磁铁的电流IF 所述光束直径在最大扫描点处变得最大。