公开(公告)号：US20080067375A1

公开(公告)日：2008-03-20

申请号：US11746096

申请日：2007-05-09

Applicant: Hiroto Kasai ,  Yutaka Kaneko

Inventor： Hiroto Kasai ,  Yutaka Kaneko

IPC: G21K7/00

CPC classification number: H01J37/147 ,  G03H5/00 ,  H01J37/26 ,  H01J2237/1514 ,  H01J2237/2487 ,  H01J2237/2614

Abstract: In electron holography observation using a transmission electron microscope, searching of conditions of an electron optical condition which are necessary for realizing a requested spatial resolution is sophisticated and for persons unaccustomed to operation of the electron microscope, the observation is time consuming work. In addition to the fundamental electron microscope proper, an input unit for inputting a spatial resolution requested in the holography observation, a calculation unit for calculating positions of electron biprism and specimen necessary for realizing the requested spatial resolution from the inputted value and parameters characteristic of the device and mechanisms for moving the two positions for realizing the obtained calculation results are provided.

Abstract translation: 在使用透射电子显微镜的电子全息观察中，为了实现所要求的空间分辨率而需要搜索电子光学条件的条件是复杂的，对于不习惯电子显微镜操作的人，观察是耗时的工作。 除了基本电子显微镜本身之外，输入单元用于输入在全息图观察中要求的空间分辨率，计算单元，用于根据输入的值和参数特性来计算实现所请求的空间分辨率所需的电子双棱镜和样本的位置 提供了用于移动两个位置以实现所获得的计算结果的装置和机构。

公开(公告)号：US20080062608A1

公开(公告)日：2008-03-13

申请号：US11932625

申请日：2007-10-31

Applicant: Takashi FUSE ,  Tadashi KOTSUGI ,  Kyo TSUBOI ,  Koji TAKEYA

Inventor： Takashi FUSE ,  Tadashi KOTSUGI ,  Kyo TSUBOI ,  Koji TAKEYA

IPC: H05F3/00

CPC classification number: H01J37/1474 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/026 ,  H01J37/147 ,  H01J37/3174 ,  H01J2237/03 ,  H01J2237/151 ,  H01L21/67017 ,  H01L21/67213 ,  Y10T29/49117 ,  Y10T29/49204 ,  Y10T29/49224 ,  Y10T29/49885

Abstract: A substrate processing apparatus which irradiates a substrate under processing with an electron beam and processes the substrate with the electron beam is disclosed. The substrate processing apparatus includes an electron beam generation mechanism which generates the electron beam, first area having a plurality of first static electricity deflecting devices whose thicknesses gradually increase in a traveling direction of the electron beam, and a second area disposed on a downstream side of the electron beam of the first area and having a plurality of second static electricity deflecting devices whose thicknesses are nearly same in the traveling direction of the electron beam. The substrate processing apparatus may further include a plurality of lenses whose thicknesses gradually decrease in the traveling direction of the electron beam, at least one of the plurality of lenses being disposed in each of the first area and the second area.

Abstract translation: 公开了一种用电子束照射处理基板并用电子束处理基板的基板处理装置。 基板处理装置包括：电子束发生机构，其产生电子束，第一区域具有多个第一静电偏转装置，其厚度在电子束的行进方向上逐渐增加，第二区域设置在电子束的下游侧 第一区域的电子束，并且具有多个第二静电偏转装置，其厚度在电子束的行进方向上几乎相同。 基板处理装置还可以包括其厚度在电子束的行进方向上逐渐减小的多个透镜，多个透镜中的至少一个设置在第一区域和第二区域中的每一个中。

公开(公告)号：US20070228285A1

公开(公告)日：2007-10-04

申请号：US11615588

申请日：2006-12-22

Applicant: Takashi Fuse ,  Tadashi Kotsugi ,  Kyo Tsuboi ,  Koji Takeya

Inventor： Takashi Fuse ,  Tadashi Kotsugi ,  Kyo Tsuboi ,  Koji Takeya

IPC: G21K1/08 ,  H01R43/00

CPC classification number: H01J37/1474 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/026 ,  H01J37/147 ,  H01J37/3174 ,  H01J2237/03 ,  H01J2237/151 ,  H01L21/67017 ,  H01L21/67213 ,  Y10T29/49117 ,  Y10T29/49204 ,  Y10T29/49224 ,  Y10T29/49885

Abstract: A substrate processing apparatus which irradiates a substrate under processing with an electron beam and processes the substrate with the electron beam is disclosed. The substrate processing apparatus includes an electron beam generation mechanism which generates the electron beam, first area having a plurality of first static electricity deflecting devices whose thicknesses gradually increase in a traveling direction of the electron beam, and a second area disposed on a downstream side of the electron beam of the first area and having a plurality of second static electricity deflecting devices whose thicknesses are nearly same in the traveling direction of the electron beam. The substrate processing apparatus may further include a plurality of lenses whose thicknesses gradually decrease in the traveling direction of the electron beam, at least one of the plurality of lenses being disposed in each of the first area and the second area.

公开(公告)号：US20070138413A1

公开(公告)日：2007-06-21

申请号：US11563109

申请日：2006-11-24

Applicant: Takayuki ABE ,  Jun Yashima

Inventor： Takayuki ABE ,  Jun Yashima

IPC: G21K5/10

CPC classification number: H01J37/147 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  H01J37/045 ,  H01J37/24 ,  H01J37/3023 ,  H01J37/3174 ,  H01J2237/0432 ,  H01J2237/1504 ,  H01J2237/30472

Abstract: A charged particle beam writing method includes irradiating a shot of a charged particle beam, and deflecting the charged particle beam of the shot using a plurality of deflectors arranged on an optical path of the charged particle beam to write a pattern on a target object, wherein any one of the plurality of deflectors controls deflection of a charged particle beam of a shot different from a shot which is controlled in deflection by another deflector in the same period.

Abstract translation: 带电粒子束写入方法包括照射带电粒子束的镜头，并且使用布置在带电粒子束的光路上的多个偏转器偏转拍摄的带电粒子束以将目标物体写入图案，其中 所述多个偏转器中的任何一个控制在相同的周期内不同于由另一偏转器偏转控制的镜头的镜头的带电粒子束的偏转。

公开(公告)号：US07227155B2

公开(公告)日：2007-06-05

申请号：US11241789

申请日：2005-09-30

Applicant: Benyamin Buller ,  William J. Devore ,  Juergen Frosien ,  Eugene Mirro, Jr. ,  Henry Pearce-Percy ,  Dieter Winkler

Inventor： Benyamin Buller ,  William J. Devore ,  Juergen Frosien ,  Eugene Mirro, Jr. ,  Henry Pearce-Percy ,  Dieter Winkler

IPC: H01J37/147

CPC classification number: H01J37/147 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/24 ,  H01J37/3174 ,  H01J2237/0432 ,  H01J2237/1504 ,  H01J2237/28

Abstract: An apparatus and method for deflecting electron beams with high precision and high throughput. At least one electrode of a deflecting capacitor is connected to a signal source via a coaxial cable. A termination resistor is further connected to the coaxial cable and the electrode at the joint of the coaxial cable and the electrode. The termination resistor has a resistance matched to the impedance of the coaxial cable and the electrode has an impedance matched to half of the impedance of the coaxial. The deflecting capacitors of the present invention have a minimized loss of precision due to eddy current. The spacing of electrodes in the deflecting capacitors is reduced by a factor of approximately two compared to the state-the-art system.

Abstract translation: 一种高精度高通量偏转电子束的装置和方法。 偏转电容器的至少一个电极通过同轴电缆连接到信号源。 终端电阻器还连接到同轴电缆和在同轴电缆和电极的接头处的电极。 终端电阻器具有与同轴电缆的阻抗匹配的电阻，并且电极具有与同轴电缆的阻抗的一半相匹配的阻抗。 本发明的偏转电容器由于涡电流而具有最小的精度损失。 与现有技术的系统相比，偏转电容器中的电极间距减小约2倍。

公开(公告)号：US20070075257A1

公开(公告)日：2007-04-05

申请号：US11430195

申请日：2006-05-09

Applicant: Takashi Kametani ,  Masahiro Inoue

Inventor： Takashi Kametani ,  Masahiro Inoue

IPC: H01J37/147

CPC classification number: H01J37/147 ,  H01J37/1477 ,  H01J2209/00

Abstract: An electrostatic deflector that can be manufactured easily and very accurately without using a member for positioning is provided. After multiple slits 81d to 88d have been formed in the same direction as that of the bus bar of an approximately conical electrode material 100 whose large-diameter section is formed with flange portions 81a to 88a for installation on an insulator 90, each of the flange portions is coupled with the insulator 90, then the electrode material 100 is cut along extension lines of the slits 81d to 88d, and thus, multiple electrode members electrically isolated from one another are formed.

Abstract translation: 提供了一种可以容易且非常准确地制造而不使用用于定位的构件的静电偏转器。 在多个狭缝81d至88d已经形成在大直径部分形成有用于安装在绝缘体90上的凸缘部分81a至88a的大致锥形电极材料100的汇流条的方向相同的方向上， 每个凸缘部分与绝缘体90连接，然后沿着狭缝81d至88d的延长线切割电极材料100，从而形成彼此电隔离的多个电极部件。

公开(公告)号：US20060255896A1

公开(公告)日：2006-11-16

申请号：US11486504

申请日：2006-07-15

Applicant: Glenn Martin ,  Ronald Rohde ,  John Nisownger

Inventor： Glenn Martin ,  Ronald Rohde ,  John Nisownger

IPC: H01F27/08

CPC classification number: H01J37/147 ,  G21K5/04 ,  H01F7/20

Abstract: A coil apparatus is described that incorporates two or more conductors, wound in parallel, following the same path, in intimate physical contact throughout the path but electrically isolated. The current applied to each of the coils can be selected independently. The field generated by the coil, or force on the coil in a magnetic field, is proportional to the algebraic sum of the currents. The power applied to the coil is proportional to the sum of square of the currents. By independently selecting the appropriate current's to apply to each of the conductors, a desired field, or force, can be generated by the coil for any desired power applied to the coil. By judiciously selecting appropriate currents to apply to each of the conductors, a range of fields, or forces, may be selected for which a constant power may be applied to the coil. A constant power enables the coil to operate at a constant temperature.

Abstract translation: 描述了一种线圈装置，其包括沿着相同路径并联缠绕的两个或更多个导体，在整个路径上进行紧密的物理接触但电隔离。 施加到每个线圈的电流可以独立地选择。 由线圈产生的磁场或在磁场中的线圈上的力与电流的代数和成比例。 施加到线圈的功率与电流的平方和成正比。 通过独立地选择适用于每个导体的适当电流，线圈可以产生期望的场或力，以施加到线圈上的任何所需功率。 通过明智地选择适用于每个导体的适当电流，可以选择可以向线圈施加恒定功率的场或力的范围。 恒定功率使线圈能够在恒定温度下工作。

公开(公告)号：US20060255268A1

公开(公告)日：2006-11-16

申请号：US10550177

申请日：2004-03-18

Applicant: Juergen Frosien

Inventor： Juergen Frosien

IPC: G21K7/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/28 ,  H01J37/3174

Abstract: The invention provides a charged particle beam device and a method of operation thereof. An emitter (2) emits a primary charged particle beam (12). Depending on the action of a deflection system, which comprises at least three deflection stages (14), it can be switched between at least two detection units (16, 44). Further, beam shaping means (15; 41) is provided and a lens for focusing at the primary charged particle beam on a specimen.

Abstract translation: 本发明提供一种带电粒子束装置及其操作方法。 发射器（2）发射初级带电粒子束（12）。 根据包括至少三个偏转级（14）的偏转系统的动作，它可以在至少两个检测单元（16,44）之间切换。 此外，提供光束整形装置（15; 41）和用于在初级带电粒子束聚焦在样本上的透镜。

公开(公告)号：US07112803B2

公开(公告)日：2006-09-26

申请号：US10897635

申请日：2004-07-23

Applicant: Igor Petrov ,  Igor Krivts (Krayvitz) ,  Albert Karabekov

Inventor： Igor Petrov ,  Igor Krivts (Krayvitz) ,  Albert Karabekov

IPC: H01J37/10 ,  H01J37/147

CPC classification number: H01J37/147 ,  H01J37/026 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/1405 ,  H01J2237/1526

Abstract: A method and system are presented for directing a charged particle beam towards and away from a sample. The system comprises a lens arrangement having an electrode formed with a beam opening for a charged particle beam passage therethrough; and a magnetic deflector. The magnetic deflector has a magnetic circuit formed by a core part for carrying excitation coils and a polepieces part. The polepieces of the magnetic deflector are in electrical communication with the electrode of the lens arrangement and are electrically insulated from the other part of the magnetic circuit.

Abstract translation: 提出了一种用于将带电粒子束朝向和远离样品引导的方法和系统。 该系统包括透镜装置，其具有形成有用于带电粒子束通过的光束开口的电极; 和磁偏转器。 磁偏转器具有由用于承载励磁线圈的芯部和极靴部分形成的磁路。 磁偏转器的极点与透镜装置的电极电连通，并且与磁路的另一部分电绝缘。

公开(公告)号：US07105833B2

公开(公告)日：2006-09-12

申请号：US10477664

申请日：2002-03-04

Applicant: Matthias Brunner ,  Ralf Schmid

Inventor： Matthias Brunner ,  Ralf Schmid

IPC: H01J3/14

CPC classification number: H01J37/153 ,  H01J37/147

Abstract: A particle beam apparatus and a device for an energy corrected deflection by a predetermined deflection angle of a particle beam coming in along a beam axis are disclosed, whereby the particle beam consists of charged particles with energy values scattered around a predetermined energy value. The device comprises a corrector, whereby the corrector, by means of a first electric field and a superimposed first magnetic field, deflects the charged particles depending on their energies, and whereby the direction of the charged particles with the predetermined energy value is maintained during the passage through the corrector. The device further comprises a deflector applied after the corrector, whereby the deflector, by means of a second electric field or by means of a second magnetic field, deflects the charged particles with the predetermined energy vague by the predetermined deflection angle away from the beam axis, whereby the deflector focuses the charged particles. Further, the device comprises a controller to control the corrector and the deflector.

Abstract translation: 公开了一种粒子束装置和用于通过沿着光束轴线进入的粒子束的预定偏转角的能量校正偏转的装置，由此粒子束由具有以预定能量值散射的能量值的带电粒子组成。 该装置包括校正器，由此校正器借助于第一电场和叠加的第一磁场根据其能量使带电粒子偏转，并且由此在期间保持具有预定能量值的带电粒子的方向 通过校正器。 该装置还包括在校正器之后施加的偏转器，由此偏转器借助于第二电场或借助于第二磁场使预定能量的带电粒子偏转远离光束轴线的预定偏转角 由此偏转器将带电粒子聚焦。 此外，该装置包括用于控制校正器和偏转器的控制器。