Printed circuit board
    76.
    发明授权
    Printed circuit board 有权
    印刷电路板

    公开(公告)号:US09532452B2

    公开(公告)日:2016-12-27

    申请号:US14607199

    申请日:2015-01-28

    CPC classification number: H05K1/115 H05K1/0366 H05K2201/09863

    Abstract: A printed circuit board includes a substrate; and a hole passing through first and second surfaces of the substrate. The hole includes an area in which a width of the hole formed in an inner side of the substrate is formed larger than that of an opening formed on the first surface and/or the second surface.

    Abstract translation: 印刷电路板包括基板; 以及穿过基板的第一和第二表面的孔。 孔包括形成在基板的内侧的孔的宽度形成为大于形成在第一表面和/或第二表面上的开口的宽度的区域。

    Printed wiring board and method for manufacturing printed wiring board
    77.
    发明授权
    Printed wiring board and method for manufacturing printed wiring board 有权
    印刷电路板及制造印刷线路板的方法

    公开(公告)号:US09451711B2

    公开(公告)日:2016-09-20

    申请号:US14169314

    申请日:2014-01-31

    Inventor: Toshiaki Hibino

    Abstract: A printed wiring board includes an insulating substrate having a penetrating hole formed through the substrate, a first conductive pattern formed on first surface of the substrate, a second conductive pattern formed on second surface of the substrate on the opposite side of the first surface, and a through-hole conductor formed in the penetrating hole in the substrate such that the conductor is connecting the first conductive pattern on the first surface of the substrate and the second conductive pattern on the second surface of the substrate. The penetrating hole has a first opening portion opening on the first surface of the substrate, a second opening portion opening on the second surface of the substrate and a third opening portion connecting the first and second opening portions, and the third opening portion has the maximum diameter which is greater than the minimum diameters of the first and second opening portions.

    Abstract translation: 印刷布线板包括:绝缘基板,具有穿过该基板形成的贯通孔,形成在基板的第一面上的第一导体图案,形成在基板的与第一面相反一侧的第二面上的第二导电图案;以及 形成在所述基板的所述贯通孔中的通孔导体,使得所述导体将所述基板的第一表面上的所述第一导电图案与所述基板的所述第二表面上的所述第二导电图案连接。 所述贯通孔具有在所述基板的第一面上开口的第一开口部,在所述基板的第二面上开口的第二开口部,以及连接所述第一开口部和所述第二开口部的第三开口部, 其直径大于第一和第二开口部分的最小直径。

    METHOD FOR MANUFACTURING MULTILAYER WIRING SUBSTRATE
    78.
    发明申请
    METHOD FOR MANUFACTURING MULTILAYER WIRING SUBSTRATE 审中-公开
    制造多层布线基板的方法

    公开(公告)号:US20160249463A1

    公开(公告)日:2016-08-25

    申请号:US15027774

    申请日:2014-09-24

    Inventor: Nobuyuki YOSHIDA

    Abstract: The present invention is a method for manufacturing a multilayer wiring board having (1) a step of providing with a hole for a via hole, an overhang of a metal foil formed at an opening of the hole, and lower space formed between the overhang and an inside wall of the hole, by using a conformal method or a direct laser method; and (2) a step of filling in the hole by forming electrolytic filling plating layers within the hole and on the metal foil, wherein the filling-in of the hole by the formation of electrolytic filling plating layers in the step (2) is carried out by temporarily decreasing the electric current density of electrolytic filling plating in the middle of the electrolytic filling plating, and increasing it again.

    Abstract translation: 本发明是一种多层布线板的制造方法,其特征在于,具有(1)具有通孔的孔,形成在所述孔的开口部的金属箔的突出部以及所述突出部和 孔的内壁,通过使用保形法或直接激光法; (2)通过在孔内和金属箔上形成电解填充镀层来填充孔的步骤,其中在步骤(2)中通过形成电解填充镀层填充孔, 通过暂时降低电解填充电镀中间的电解填充电镀的电流密度,并再次增加。

    METHOD FOR MANUFACTURING MULTILAYER WIRING SUBSTRATE
    79.
    发明申请
    METHOD FOR MANUFACTURING MULTILAYER WIRING SUBSTRATE 审中-公开
    制造多层布线基板的方法

    公开(公告)号:US20160242299A1

    公开(公告)日:2016-08-18

    申请号:US15027756

    申请日:2014-09-24

    Inventor: Nobuyuki YOSHIDA

    Abstract: The present invention is a method for manufacturing a multilayer wiring board having (1) a step of providing with a hole for a via hole from a metal foil for an upper layer wiring pattern to an inner layer wiring pattern by using a conformal method or a direct laser method, and (2) a step of forming a via hole by forming electrolytic filling plating layers in the hole for a via hole, wherein the formation of the electrolytic filling plating layers in the step (2) is carried out by repeating change in electric current density of temporarily decreasing the electric current density of electrolytic filling plating in the middle of the electrolytic filling plating and then increasing it again, two or more times before the electrolytic filling plating layers block an opening of the hole for a via hole.

    Abstract translation: 本发明是一种多层布线基板的制造方法,其特征在于,具有(1)在上层布线图案的金属箔和内层布线图案之间设置用于通路孔的工序, 直接激光法,(2)通孔形成电解填充镀层形成通孔的步骤,其中在步骤(2)中形成电解填充电镀层是通过重复变化进行的 在电解填充电镀中间暂时降低电解填充电镀电流密度的电流密度,然后在电解填充电镀层阻挡用于通孔的孔的开口之前再次增加两次或更多次。

    CAPACITIVE MICROMACHINED ULTRASONIC TRANSDUCER (CMUT) FORMING
    80.
    发明申请
    CAPACITIVE MICROMACHINED ULTRASONIC TRANSDUCER (CMUT) FORMING 审中-公开
    电容式微型超声波传感器(CMUT)形成

    公开(公告)号:US20160221038A1

    公开(公告)日:2016-08-04

    申请号:US15095264

    申请日:2016-04-11

    Abstract: A Capacitive Micromachined Ultrasonic Transducer (CMUT) device including at least one CMUT element with at least one CMUT cell is formed. A patterned dielectric layer thereon including a thick and a thin dielectric region is formed on a top side of a single crystal material substrate. A second substrate is bonded to the thick dielectric region to provide at least one sealed micro-electro-mechanical system (MEMS) cavity. The second substrate is thinned to reduce a thickness of said second substrate to provide a membrane layer. The membrane layer is etched to form a movable membrane over said MEMS cavity and to remove said membrane layer over said top side substrate contact area. The thin dielectric region is removed from over said top side substrate contact area. A top side metal layer is formed including a trace portion coupling said top side substrate contact area to said movable membrane. From a bottom side surface of said first substrate, etching is performed to open an isolation trench around said single crystal material to form a through-substrate via (TSV) plug of said single crystal material at least under said top side substrate contact area which is electrically isolated from surrounding regions of said single crystal material.

    Abstract translation: 形成包括至少一个具有至少一个CMUT单元的CMUT元件的电容式微加工超声波传感器(CMUT)装置。 在单晶材料基板的上侧形成有包含厚而薄的电介质区域的图案化电介质层。 第二衬底被结合到厚电介质区域以提供至少一个密封的微机电系统(MEMS)空腔。 第二衬底被薄化以减小所述第二衬底的厚度以提供膜层。 蚀刻膜层以在所述MEMS空腔上形成可移动膜,并且在所述顶侧基板接触区域上去除所述膜层。 从所述顶侧基板接触区域的上方去除薄介电区域。 形成顶侧金属层,其包括将所述顶侧基板接触区域连接到所述可动膜的迹线部分。 从所述第一衬底的底侧表面进行蚀刻以打开围绕所述单晶材料的隔离沟槽,以至少在所述顶侧衬底接触区域的下方形成所述单晶材料的贯穿衬底通孔(TSV)插头 与所述单晶材料的周围区域电隔离。

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