公开(公告)号：US09355815B2

公开(公告)日：2016-05-31

申请号：US14423081

申请日：2013-08-09

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Shin Imamura ,  Takashi Ohshima ,  Yoichi Ose ,  Kenichi Hirane

IPC: H01J37/00 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/28 ,  H01J2237/2801

Abstract: An electron microscope is provided with a scintillator (7) and a light guide (8). The scintillator (7) has an index of refraction greater than the index of refraction of the light guide (8), and an end surface (72) joined to the light guide (8) is formed from a curved surface with a convex shape on the outside. The scintillator (7) is formed by a Y—Al—O based ceramic sintered body represented by the compositional formula (Ln1-xCex)3M5O12 (wherein Ln represents at least one element selected from the group consisting of Y, Gd, La, and Lu, and M represents either or both of Al and Ga).

Abstract translation: 电子显微镜设有闪烁体（7）和光导（8）。 闪烁体（7）的折射率大于导光体（8）的折射率，与导光体（8）接合的端面（72）由凸形的曲面形成 外。 闪烁体（7）由组成式（Ln1-xCex）3M5O12表示的Y-Al-O系陶瓷烧结体形成（其中Ln表示选自Y，Gd，La和 Lu和M表示Al和Ga中的任一个或两者）。

公开(公告)号：US09343263B2

公开(公告)日：2016-05-17

申请号：US14656132

申请日：2015-03-12

Applicant: Sumitomo Heavy Industries Ion Technology Co., Ltd.

Inventor： Haruka Sasaki ,  Kazuhiro Watanabe ,  Hiroyuki Kariya

IPC: H01J37/00 ,  H01J37/244 ,  H01J37/317

CPC classification number: H01J37/244 ,  H01J37/3171 ,  H01J2237/057 ,  H01J2237/24514 ,  H01J2237/24528 ,  H01J2237/31703

Abstract: A beam energy measuring device in an ion implanter includes a parallelism measuring unit that measures a parallelism of an ion beam at a downstream of a beam collimator of the ion implanter and an energy calculating unit that calculates an energy of the ion beam from the measured parallelism. The ion implanter may further include a control unit that controls a high energy multistage linear acceleration unit based on the measured energy of the ion beam so that the ion beam has a target energy.

Abstract translation: 离子注入机中的光束能量测量装置包括平行度测量单元，其测量在离子注入机的光束准直器的下游处的离子束的平行度，以及能量计算单元，其计算来自所测量的平行度的离子束的能量 。 离子注入机还可以包括控制单元，其基于所测量的离子束的能量来控制高能量多级线性加速单元，使得离子束具有目标能量。

公开(公告)号：US09336994B2

公开(公告)日：2016-05-10

申请号：US14662612

申请日：2015-03-19

Applicant: NuFlare Technology, Inc.

Inventor： Yasuo Kato

IPC: H01J37/00 ,  H01J37/317 ,  G03F1/78 ,  H01J37/302 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  H01J37/3026 ,  H01J2237/31764 ,  H01J2237/31771 ,  H01J2237/31776 ,  H01J2237/31796

Abstract: A charged particle beam writing apparatus includes a storage unit to store each pattern data of plural figure patterns arranged in each of plural small regions made by virtually dividing a writing region of a target workpiece to be written on which resist being coated. The charged particle beam writing apparatus further including an assignment unit to assign each pattern data of each figure pattern to be arranged in each of the plural small regions concerned, and a writing unit to write, for each of plural groups, each figure pattern in each of the plural small regions concerned by using a charged particle beam.

Abstract translation: 带电粒子束写入装置包括：存储单元，用于存储多个图形图案中的每个图案数据，所述多个图形图案布置在通过实际上划分要涂覆的抗蚀剂的目标工件的写入区域而制成的多个小区域中。 所述带电粒子束写入装置还包括分配单元，用于分配要布置在所述多个小区域中的每一个中的每个图形模式的每个图案数据;以及写入单元，用于为每个所述多个组中的每一个写入每个图形模式 的多个小区域使用带电粒子束。

公开(公告)号：US09321027B2

公开(公告)日：2016-04-26

申请号：US13519446

申请日：2011-01-31

Applicant: Illya Kulyk

Inventor： Illya Kulyk

IPC: B01J19/08 ,  H01J37/00 ,  C23C16/50 ,  B05D3/14 ,  D06M10/02 ,  H01J37/32 ,  D06B19/00 ,  H05H1/48 ,  B29C59/14

CPC classification number: B01J19/088 ,  B01J2219/0809 ,  B01J2219/0818 ,  B01J2219/083 ,  B01J2219/0879 ,  B01J2219/0896 ,  B05D3/141 ,  B05D3/148 ,  B29C59/14 ,  C23C16/50 ,  D06B19/00 ,  D06M10/025 ,  H01J37/3277 ,  H01J37/32825 ,  H05H1/48 ,  H05H2001/485

Abstract: A machine for atmospheric plasma treatment of continuous material substrates comprises means for feeding a substrate for moving it along a feed path; at least two electrodes each positioned at one face of the substrate, each electrode facing a respective face of the substrate, a difference in electric potential being applicable across the electrodes for generating an electric discharge; the feed means comprising at least one first roller and one second roller, the first roller and the second roller coinciding with respective electrodes and each acting on a respective face of the substrate.

Abstract translation: 用于连续材料基板的大气等离子体处理的机器包括用于馈送基板以沿着进给路径移动基板的装置; 至少两个电极，每个电极分别位于所述基板的一个面上，每个电极面对所述基板的相应表面，所述电极的电位差可应用于用于产生放电的所述电极; 所述进给装置包括至少一个第一辊和一个第二辊，所述第一辊和所述第二辊与相应的电极重合并且各自作用在所述基板的相应表面上。

公开(公告)号：US09305742B2

公开(公告)日：2016-04-05

申请号：US14397245

申请日：2012-05-31

Applicant: Peter Simon Aptaker ,  Paul Beasley ,  Oliver Heid

Inventor： Peter Simon Aptaker ,  Paul Beasley ,  Oliver Heid

IPC: H01J37/00 ,  H01J37/147 ,  H05H7/18 ,  H05H7/22 ,  A61N5/10 ,  H05H7/02

CPC classification number: H01J37/1471 ,  A61N5/1077 ,  H05H7/18 ,  H05H7/22 ,  H05H2007/025

Abstract: A method for packetizing a beam-charged particle, in which the particles pass through an electric field in a device is provided. The device includes an annular shaped central electrode which, in the direction of the beam, is arranged between a first outer electrode and a second outer electrode. A time-dependent electric voltage signal is applied to the central electrode, the temporal course thereof being selected such that particles inside the device undergo a position-dependent speed modification. The course of the speed modification is approximately sawtooth-shaped in the direction of the beam. An associated device is also provided.

Abstract translation: 提供了一种用于打包粒子穿过器件中的电场的束带电粒子的方法。 该装置包括一个环形中心电极，它在梁的方向上设置在第一外电极和第二外电极之间。 时间依赖性电压信号被施加到中心电极，其时间过程被选择为使得器件内的颗粒经历位置相关的速度修改。 速度改变的过程在梁的方向上是近似锯齿形的。 还提供了相关联的设备。

公开(公告)号：US09202666B1

公开(公告)日：2015-12-01

申请号：US14340335

申请日：2014-07-24

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Jürgen Frosien

IPC: H01J37/00 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/147 ,  H01J37/28 ,  H01J2237/1508

Abstract: A method of operating a charged particle beam device is provided. The charged particle beam device includes a beam separator that defines an optical axis, and includes a magnetic beam separation portion and an electrostatic beam separation portion. The method includes generating a primary charged particle beam, and applying a voltage to a sample, the voltage being set to a first value to determine a first landing energy of the primary charged particle beam. The method further includes creating an electric current in the magnetic beam separation portion, the current being set to a first value to generate a first magnetic field, and applying a voltage to the electrostatic beam separation portion, the voltage being set to a first value to generate a first electric field. The method includes guiding the primary charged particle beam to the beam separator, wherein the primary charged particle beam enters the beam separator at a first angle relative to the optical axis and, under the influence of the first magnetic field and the first electric field, leaves the beam separator at a second angle relative to the optical axis. The method includes generating a secondary charged particle beam by impingement of the primary charged particle beam on the sample to which the voltage with the first value is applied, and separating the secondary charged particle beam from the primary charged particle beam in the beam separator, wherein the secondary charged particle beam enters the beam separator at a third angle relative to the optical axis and, under the influence of the first magnetic field and the first electric field, leaves the beam separator at a fourth angle relative to the optical axis. The first angle and the fourth angle are different. The method further includes applying the voltage to the sample, the voltage being set to a second value to determine a second landing energy of the primary charged particle beam, creating the electric current in the magnetic beam separation portion, the electric current being set to a second value to generate a second magnetic field, applying the voltage to the electrostatic beam separation portion, the voltage being set to a second value to generate a second electric field, guiding the primary charged particle beam to the beam separator, wherein the primary charged particle beam enters the beam separator at the first angle relative to the optical axis and, under the influence of the second magnetic field and the second electric field, leaves the beam separator at the second angle relative to the optical axis, generating the secondary charged particle beam by impingement of the primary charged particle beam on the sample to which the voltage with the second value is applied, and separating the secondary charged particle beam from the primary charged particle beam in the beam separator, wherein the secondary charged particle beam enters the beam separator at the third angle relative to the optical axis and, under the influence of the second magnetic field and the second electric field, leaves the beam separator at the fourth angle relative to the optical axis.

公开(公告)号：US09082602B2

公开(公告)日：2015-07-14

申请号：US14351703

申请日：2012-10-19

Applicant: SHIMADZU CORPORATION

Inventor： Vyacheslav Shchepunov ,  Roger Giles

IPC: H01J49/40 ,  H01J37/00 ,  H01J49/06 ,  H01J49/42

CPC classification number: H01J49/062 ,  H01J49/40 ,  H01J49/408 ,  H01J49/4245

Abstract: A mass analyzer for use in a mass spectrometer. The mass analyzer has a set of electrodes including electrodes arranged to form at least one electrostatic sector, the set of electrodes being spatially arranged to be capable of providing an electrostatic field in a reference plane suitable for guiding ions along a closed orbit in the reference plane, wherein the set of electrodes extend along a drift path that is locally orthogonal to the reference plane and that curves around a reference axis so that, in use, the set of electrodes provide a 3D electrostatic field region. The mass analyzer is configured so that, in use, the 3D electrostatic field region provided by the set of electrodes guides ions having different initial coordinates and velocities along a single predetermined 3D reference trajectory that curves around the reference axis.

Abstract translation: 用于质谱仪的质量分析仪。 质量分析器具有一组电极，其包括布置成形成至少一个静电扇区的电极，该组电极在空间上布置成能够在参考平面中提供适合于沿着参考平面中的闭合轨道引导离子的静电场 ，其中所述电极组沿着与所述参考平面局部正交并且围绕参考轴线弯曲的漂移路径延伸，使得在使用中所述电极组提供3D静电场区域。 质量分析器被配置为使得在使用中由该组电极提供的3D静电场区域沿着围绕参考轴线弯曲的单个预定3D参考轨迹引导具有不同初始坐标和速度的离子。

公开(公告)号：US08987691B2

公开(公告)日：2015-03-24

申请号：US13746257

申请日：2013-01-21

Applicant: Advanced Ion Beam Technology, Inc.

Inventor： Zhimin Wan ,  John D. Pollock ,  Don Berrian

IPC: H01J37/00 ,  H01L21/265 ,  C23C14/04 ,  C23C14/48 ,  C23C14/50 ,  H01J37/09 ,  H01J37/317

CPC classification number: H01L21/265 ,  C23C14/04 ,  C23C14/48 ,  C23C14/50 ,  H01J37/09 ,  H01J37/3171 ,  H01J2237/1503 ,  H01J2237/20228 ,  H01J2237/30488

Abstract: An ion implanter and an ion implant method are disclosed. Essentially, the wafer is moved along one direction and an aperture mechanism having an aperture is moved along another direction, so that the projected area of an ion beam filtered by the aperture is two-dimensionally scanned over the wafer. Thus, the required hardware and/or operation to move the wafer may be simplified. Further, when a ribbon ion beam is provided, the shape/size of the aperture may be similar to the size/shape of a traditional spot beam, so that a traditional two-dimensional scan may be achieved. Optionally, the ion beam path may be fixed without scanning the ion beam when the ion beam is to be implanted into the wafer, also the area of the aperture may be adjustable during a period of moving the aperture across the ion beam.

Abstract translation: 公开了一种离子注入机和离子注入方法。 基本上，晶片沿着一个方向移动，并且具有孔的孔径机构沿着另一个方向移动，使得被孔径过滤的离子束的投影面积在晶片上被二维地扫描。 因此，可以简化移动晶片所需的硬件和/或操作。 此外，当提供带状离子束时，孔的形状/尺寸可以类似于传统点波束的尺寸/形状，从而可以实现传统的二维扫描。 可选地，当将离子束注入到晶片中时，可以固定离子束路径而不扫描离子束，而在穿过离子束的孔移动期间，孔径的区域也可以是可调节的。

公开(公告)号：US08955456B2

公开(公告)日：2015-02-17

申请号：US13994836

申请日：2011-12-14

Applicant: Alexander Lamb Cullen ,  Joseph Michael Dodson ,  Stephen David Williams ,  John Robert Brandon

Inventor： Alexander Lamb Cullen ,  Joseph Michael Dodson ,  Stephen David Williams ,  John Robert Brandon

IPC: H01J37/00 ,  H01J37/32 ,  C23C16/27 ,  C23C16/511 ,  C23C16/00

CPC classification number: H01J37/32238 ,  C23C16/274 ,  C23C16/511 ,  H01J37/32009 ,  H01J37/32192 ,  H01J37/32211 ,  H01J37/32229 ,  H01J37/32266 ,  H01J37/3244 ,  H01J2237/3321

Abstract: A microwave plasma reactor for manufacturing a synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a plasma chamber (2); a substrate holder (4) disposed in the plasma chamber for supporting a substrate on which the synthetic diamond material is to be deposited in use; a microwave coupling configuration (12) for feeding microwaves from a microwave generator (8) into the plasma chamber; and a gas flow system (13,16) for feeding process gases into the plasma chamber and removing them therefrom, wherein the microwave coupling configuration for feeding microwaves from the microwave generator into the plasma chamber comprises: an annular dielectric window (18) formed in one or several sections; a coaxial waveguide (14) having a central inner conductor (20) and an outer conductor (22) for feeding microwaves to the annular dielectric window; and a waveguide plate (24) comprising a plurality of apertures (28) disposed in an annular configuration with a plurality of arms (26) extending between the apertures, each aperture forming a waveguide for coupling microwaves towards the plasma chamber.

Abstract translation: 一种用于通过化学气相沉积制造合成金刚石材料的微波等离子体反应器，所述微波等离子体反应器包括：等离子体室（2）; 设置在等离子体室中的衬底保持器（4），用于支撑在使用中沉积合成金刚石材料的衬底; 用于将微波从微波发生器（8）馈入等离子体室的微波耦合配置（12）; 以及用于将工艺气体进料到等离子体室中并将其从中除去的气体流动系统（13,16），其中用于将来自微波发生器的微波馈送到等离子体室中的微波耦合结构包括：环形介质窗（18），其形成在 一个或几个部分; 具有中心内部导体（20）和外部导体（22）的同轴波导（14），用于将微波馈送到环形电介质窗口; 以及波导板（24），其包括以环形构造设置的多个孔（28），所述孔具有在孔之间延伸的多个臂（26），每个孔形成用于将微波耦合到等离子体室的波导。

公开(公告)号：US08710468B2

公开(公告)日：2014-04-29

申请号：US13823981

申请日：2011-07-27

Applicant: Dai Tsunoda ,  Masahiro Shoji ,  Hiroyuki Tsunoe ,  Shuji Hada ,  Ayuko Sato

Inventor： Dai Tsunoda ,  Masahiro Shoji ,  Hiroyuki Tsunoe ,  Shuji Hada ,  Ayuko Sato

IPC: H01J37/00 ,  H01J37/302

CPC classification number: H01J37/3026 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31769 ,  H01J2237/31776 ,  H01L21/263

Abstract: Stored energy is evaluated for each of segmented regions, and using the evaluated stored energy, an optimal irradiation amount for an electron beam is evaluated by a conjugate gradient method. The evaluated stored energy is used instead of calculating a determinant (Apk) in the procedure that includes calculation of the determinant (Apk) from among repeated calculation procedures that follow the conjugate gradient method and seek to answer a simultaneous linear equation (Ax=b) with a matrix (A) as a coefficient. Thus it is possible to evaluate the optimal irradiation amount for an electron beam with a high processing speed and a high degree of accuracy, and without expressly requiring the calculation of Apk, by managing the giant matrix (A) comprising numerous factors according to reduction of lines of circuitry in a circuit pattern.

Abstract translation: 对于每个分段区域评估存储的能量，并且使用所评估的存储能量，通过共轭梯度法评估电子束的最佳照射量。 使用评估的存储能量来代替在包括计算迭代梯度方法的重复计算过程中的行列式（Apk）的计算过程中计算行列式（Apk），并尝试回答同时线性方程（Ax = b） 以矩阵（A）为系数。 因此，可以以高处理速度和高精确度来评估电子束的最佳照射量，并且不需要明确地要求计算Apk，通过根据减少的方式管理包括许多因素的巨型基质（A） 电路图案中的电路线。